Abstract: Disclosed herein is an article comprising a substrate; a first region having a first brush polymer chemically bonded to the substrate; where the first brush polymer comprises repeat units of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer; where the first ethylenically unsaturated monomer comprises a first electroactive moiety and where the second ethylenically unsaturated monomer comprises a second electroactive moiety that is different from the first electroactive moiety; where at least one of the first electroactive moiety or the second electroactive moiety is an emitter moiety and where the repeat units of the first ethylenically unsaturated monomer are covalently bonded to repeat units of the second ethylenically unsaturated monomer.

Abstract: The invention provides a fiber containing (A) a polymer compound containing a structural unit having, in a side chain, at least one kind of organic group selected from a hydroxy group, a hydroxymethyl group and an alkoxymethyl group having 1-5 carbon atoms, and (B) a photoacid generator.

Abstract: A mask blank includes a glass substrate including a first main surface and a second main surface, an absorbing film formed above the first main surface, and a conductive film formed on the second main surface. A reflective film is provided between the absorbing film and the glass substrate. In a surface of the conductive film on an opposite side to the glass substrate, when a surface shape of a square central area having a length of 142 mm and a width of 142 mm excluding a four-sided frame-shaped peripheral area thereof is expressed by the specific formula, flatness of a component obtained by summing all aklPk(x)Pl(y) with the sum of k and l being 3 or more and 25 or less is 20 nm or less.

Abstract: Herein provided are radiation-sensitive colored compositions suppressing a phenomenon in which a radiation-sensitive colored composition of another color penetrates into previously formed pixels to result in a decrease in the color purity of the previously obtained pixels; cured colored films and color filters using them; processes for forming colored patterns; processes for preparing the color filters; solid-state image sensors; and image display devices. The radiation-sensitive colored compositions comprise a dyestuff, a photopolymerizable compound, a photoinitiator, and a nonionic surfactant containing a partial structure represented by formula (1) or (2) below and having a weight average molecular weight of 2500 or less and an HLB value of 9.2 to 15.5 as determined by Griffin's method. In formula (1) and (2), R1 and R2 each independently represent a hydrocarbon group containing 8 or more carbon atoms, and n1 and n2 each independently represent 4 to 25.

Abstract: An optical film includes a polarizing film including a polyolefin and a dichroic dye, a first photo-alignment layer on a side of the polarizing film, and a first liquid crystal layer on a side of the first photo-alignment layer, wherein the polarizing film and the first liquid crystal layer are in close contact with the first photo-alignment layer to provide a self-integrated structure. A method of manufacturing the same and a display device including the optical film are also provided.

Abstract: An UV curing mask plate, comprising: a mask layer, wherein: the mask layer is arranged on the substrate, and has a position corresponding to alignment marks, selection marks and an area not covered by the sealing frame glue to be cured; the material of the mask layer is a material with the function of blocking UV light.

Abstract: The present disclosure provides a light-diffusion powder, a quantum-dot-containing photoresist, and a quantum-dot-containing color film, and their preparation methods. The light-diffusion powder is obtained from an alkoxysilane having a chemical structure represented by formula (I): where R1 includes a C1˜C50 alkyl group, and R? includes one or more of an alkyl and a substituted alkyl group.

Abstract: The present disclosure discloses a color film substrate that can restrain light leakage and a manufacturing method thereof, as well as a display panel comprising said color film substrate and a display device comprising said display panel. The color film substrate comprises: a base substrate; a color filter layer formed on the base substrate, comprising a plurality of adjacently arranged filters; a protective layer formed on the color filter layer; an alignment layer formed on the protective layer, wherein the color film substrate further comprises a light shielding layer formed at positions on the alignment layer corresponding to peripheral areas of the filters.

Abstract: An oxime ester compound represented by general formula (I), wherein R1to R8 are as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.

Abstract: A method for forming a color filter array includes a step of exposing a photosensitive color filter film, a step of forming a color filter array from the color filter film by developing the color filter film using a developer, and a step of cleaning the color filter array while rotating the color filter array and moving a nozzle for spraying fluid containing liquid and gas above the color filter array in a direction intersecting with an axis of the rotation. The method reduces variation in thickness of a color filter that is generated in the cleaning step.

Abstract: A coloring composition having good light fastness and exposure sensitivity in the case of preparing a cured film; and a cured film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid-state imaging device, an image display device, and a dye multimer, each using the coloring composition, are provided.

Abstract: Methods for manufacturing a photomask, photomask blanks, and photomasks used in chip fabrication. A phase-shift layer is formed on a mask blank, a hardmask layer is formed on the phase-shift layer, and a layer stack is formed on the hardmask layer to make a photomask blank. The layer stack includes a first layer comprised of a first material and a second layer comprised of a second material that can be etched selective to the first material. The first layer is thicker than the second layer, and the first layer is also thicker than the hardmask layer. The photomask blank may be used to make a photomask in which, during manufacture, the hardmask layer is used to pattern mask features in a chip area of the photomask and the thicker of the first layer or the second layer is used to pattern a frame of the photomask.

Abstract: The disclosure provides a reactive perpendicular aligned organosilicon material and a manufacture method of a liquid crystal display panel, a general structural formula of the reactive perpendicular aligned organosilicon material is A-R, A is —SiCl3; R represents a linear chained or a branched chained alkyl group with 5˜20 C atoms, a CH2 group in the alkyl group is substituted by a phenyl group, a naphthenic base, —CONH—, —COO—, —O—CO—, —S—, —CO— or —CH?CH—, or a F atom or a Cl atom substitutes for a H atom in the alkyl group. A Cl atom in the reactive perpendicular aligned organosilicon material and —OH on a surface of the substrate without a PI film can form a hydrogen bond, leading to vertical arrangement of liquid crystal molecules.

Abstract: A photoresist composition including a photoresist composition includes a photo-luminescence nanocomposite, a photopolymerizable monomer, a first photopolymerization initiator, a second photopolymerization initiator, a binder resin, and a solvent. The photo-luminescence nanocomposite includes a first quantum dot nanocomposite, a second quantum dot nanocomposite, or a combination thereof. The first quantum dot nanocomposite includes a first quantum dot nanoparticle and a first coating layer surrounding the first quantum dot nanoparticle, the first coating layer including a first inorganic material. The second quantum dot nanocomposite includes a second quantum dot nanoparticle and a second coating layer surrounding the second quantum dot nanoparticle, the second coating layer including a second inorganic material.

Abstract: The purpose of the present invention is to provide a method for stripping a resist film, which includes a cured resin having a phosphate ester group or a carboxyl group, by using a resist stripping solution having high strippability, the method being characterized in that deterioration of the strippability of the resist stripping solution is suppressed and the phosphorus concentration in the resist stripping solution is not substantially increased. In this method, a resist stripping solution is brought into contact with a resist film, which includes a cured resin having a phosphate ester group or a carboxyl group and is disposed on a metal plate, and the resist film is stripped from the metal plate. In this method, the resist stripping solution contains a benzyl alcohol, water in a mass ratio to the benzyl alcohol of 0.3-2.5, and a surfactant, and is substantially free of caustic alkali components.

Abstract: The present disclosure discloses a method of manufacturing a display panel. The method includes: providing a first substrate, and forming a release layer on the first substrate; forming a thin film transistor driving layer on the first substrate; forming a display element on the first substrate, wherein a part of the display element forms above the release layer and another part of the display element forms above the thin film transistor driving layer; separating the release layer and the first substrate with a laser; removing the release layer and the display element above the release layer, and forming a hollow portion on the first substrate; packaging the display element to form a display panel, wherein the display panel at least includes a first packaging portion; and providing a through hole passing through the display panel at a region on the display panel corresponding to the hollow portion.

Abstract: An electrooptical apparatus includes a torsion hinge and a mirror support post that are formed integrally with an electroconductive member. Of the mirror support post (second support post), a first end portion at a substrate side has an open end whose opening faces the substrate. Of the mirror support post, a second end portion at a mirror side is a flat plate portion that closes the opening of the mirror support post. A mirror is in contact with the opposite side of the flat plate portion to the substrate. A first sacrificial layer for use for production of the electrooptical apparatus is formed by exposing and developing a photosensitive resist.

Abstract: A glass substrate for a mask blank includes a rectangular-shaped main surface on which a film having a circuit pattern is to be formed. The main surface includes a quadrangular peripheral frame and a square-shaped center area defined by excluding the frame. The center area has a longitudinal length of 142 mm and a lateral length of 142 mm. A surface morphology of the center area is expressed by { z ? ( x , y ) = ? k = 0 N 1 ? ? l = 0 N 2 ? a kl ? P k ? ( x ) ? P l ? ( y ) P k ? ( x ) = 1 2 k ? k ! ? d k dx k ? [ ( x 2 - 1 ) k ] P l ? ( y ) = 1 2 l ? l ! ? d l dy l ? [ ( y 2 - 1 ) l ] . A flatness of a sum of compositing all of aklPk(x)Pl(y) is less than or equal to 20 nm when a sum of k and l is greater than or equal to 3 and less than or equal to 9. The flatness is less than or equal to 20 nm when a sum of k and l is greater than or equal to 10 and less than or equal to 30.

Abstract: A glass substrate for a mask blank includes a rectangular-shaped main surface on which a film having a circuit pattern is to be formed. The main surface includes a quadrangular peripheral frame and a square-shaped center area defined by excluding the frame. The center area has a longitudinal length of 142 mm and a lateral length of 142 mm. A surface morphology of the center area is expressed by the following formulas. A flatness of a sum of compositing all of aklPk(x)Pl(y) is less than or equal to 20 nm when a sum of k and l is greater than or equal to 3 and less than or equal to 9. The flatness is less than or equal to 20 nm when a sum of k and l is greater than or equal to 10 and less than or equal to 30.

Abstract: A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.