Patents Examined by John A. McPherson
  • Patent number: 10126598
    Abstract: A color filter including a first region configured to emit a first light, a second region configured to emit a second light having a longer wavelength than a wavelength of the first light, a third region configured to emit a third light having a longer wavelength than the wavelength of the second light, a first layer including two or more quantum dots, and a second layer formed on at least one surface of the first layer, wherein the first layer and the second layer are disposed in at least the second region and the third region.
    Type: Grant
    Filed: January 16, 2018
    Date of Patent: November 13, 2018
    Assignees: SAMSUNG DISPLAY CO., LTD., SAMSUNG SDI CO., LTD., SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yong Seok Han, Nayoun Won, Hyun A Kang, Ha Il Kwon, Shang Hyeun Park, Eun Joo Jang, Shin Ae Jun, Deukseok Chung, Tae Won Jeong
  • Patent number: 10114283
    Abstract: The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: October 30, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Pengyu Qi, Changjun Zha, Yanping Wang, Dong Wang, Jianfeng Yuan, Xibin Shao, Yan Zhang, Jintao Xiao, Yangchen Guo
  • Patent number: 10108043
    Abstract: The present invention provides a color filter substrate and a display device. The color filter substrate of the present invention includes a backing plate, a black matrix arranged on the backing plate, and a plurality of color resist blocks arranged on the backing plate and spaced from each other by the black matrix. The color resist blocks include a multiple-pore support layer and a color resist material distributed in the multiple-pore support layer. The color resist material includes pigment molecules.
    Type: Grant
    Filed: July 20, 2016
    Date of Patent: October 23, 2018
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Biao Pan
  • Patent number: 10101655
    Abstract: A compound, an acrylic polymer formed by a copolymerization reaction of the compound with an ethylenic unsaturated monomer, photosensitive resin composition including the compound being represented by Chemical Formula 1 and a color filter:
    Type: Grant
    Filed: January 12, 2017
    Date of Patent: October 16, 2018
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Kyuyoung Kim, Hyeongmook Kim, Young Lee, Myoungyoup Shin, Seungjib Choi
  • Patent number: 10095104
    Abstract: A spacer manufacturing device is disclosed. The device includes a photo mask having a central light-transmitting region and a peripheral light-transmitting region disposed at a periphery of the central light-transmitting region; and an exposure device right opposite to the photo mask. Light emitted from the exposure device is irradiated to a negative photoresist material after passing through the photo mask, the light intensity passing through the peripheral light-transmitting region is less than the light intensity passing through the central light-transmitting region. A spacer is also disclosed. Only one exposure process is required to realize the spacer having a convex-shaped cross section. The process is simple and the manufacturing cost is low. At the same time, flatness of the convex shoulder of the spacer having a convex-shaped cross section is adjustable, which can satisfy the requirement for manufacturing spacers having different specifications.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: October 9, 2018
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventors: Huan Liu, Zui Wang, Jinbo Guo, Shih-hsun Lo
  • Patent number: 10095107
    Abstract: A composition, a method fabricating the infrared ray transmitting filter, and an infrared ray sensor are provided. When the composition forms a film with a thickness of 1 ?m, transmittance of the film in a wavelength in a range from 400 nm to 700 nm is less than 4%, and transmittance of the film in a wavelength in a range from 900 nm to 1300 nm is more than 90%. The composition comprises an alkali-soluble resin at least containing an acrylic group, a carboxyl group, and a fluorene ring, a photoinitiator, an unsaturated monomer, a pigment mixture, and a solvent. The pigment mixture is formed by mixing a colorant dispersion and a pigment in a weight ratio from 60:40 to 70:30.
    Type: Grant
    Filed: October 7, 2016
    Date of Patent: October 9, 2018
    Assignee: eChem Solutions Corp.
    Inventors: Chen Wen Chiu, Chia Hao Lou, Ya Ting Chen
  • Patent number: 10086642
    Abstract: The method makes it possible to produce a decorated element for a timepiece or piece of jewelry. This decorated element may be, for example, a watch dial. The method includes the steps of taking a base substrate, and micromachining on said base substrate a mold or decorative partitions in a programmed pattern, and filling the mold or the decorative partitions with at least one filler material to obtain the decorated element. The filler material may be an epoxy resin and the mold or the partitions are obtained by melting and solidifying a solder paste or powder.
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: October 2, 2018
    Assignee: The Swatch Group Research and Development Ltd
    Inventors: Alban Dubach, Pierry Vuille, Yves Winkler, Stewes Bourban, Jean-Claude Martin
  • Patent number: 10082688
    Abstract: An optical alignment device for a plurality of liquid crystal display panels is disclosed, and has a panel carrying stage, a UV lamp, and a plurality of irradiation masks. The panel carrying stage is used for placing the liquid crystal display panels, the UV lamp is used for applying a UV irradiation to the liquid crystal display panels on the panel carrying stage so that liquid crystals in each of the liquid crystal display panels have pretilt angles, and the irradiation masks are disposed between the UV lamp and the liquid crystal display panels for changing an irradiation intensity of the UV irradiation on the crystal display panels.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: September 25, 2018
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd.
    Inventor: Rentang Zhao
  • Patent number: 10085346
    Abstract: Provided is a method for producing a conductive member including: forming a first silver halide emulsion layer, a light absorption layer, and a second silver halide emulsion layer on a transparent support in this order; performing pattern exposure on the first silver halide emulsion layer; and the second silver halide emulsion layer and applying a development treatment thereto to obtain a conductive layer comprising a thin metal wire, in which the light absorption layer absorbs at least some of the wavelengths of light to which the first silver halide emulsion layer or the second silver halide emulsion layer is exposed.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: September 25, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Kenichi Yamamoto, Naoharu Kiyoto, Kenji Naoi
  • Patent number: 10073302
    Abstract: An alignment film for liquid crystal display device includes a first portion positioned towards to the liquid crystal layer and a second portion positioned away from the liquid crystal layer. The first portion provides improved anchoring force while the second portion exhibits a lower volume resistance than the first portion. Thus, AC image sticking and DC image sticking can be minimized at the same time.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: September 11, 2018
    Assignee: LG Display Co., Ltd.
    Inventors: SeungRyull Park, HyunJin Park, JinPil Kim, Han Jin Ahn, Hanseok Lee, Su-Bin Lee
  • Patent number: 10073292
    Abstract: A method for manufacturing a color filter is provided, including: preparing a photomask comprising a plurality of pixel units, the pixel units each comprising red, green, and blue color resist layers; preparing a first substrate coated with a photosensitive polyester layer; exposing the first substrate by a light source irradiating through the photomask, so that color resist elements of different colors are formed on the first substrate from reaction of light passing respectively through the red, green, and the blue color resist layers with the photosensitive polyester layer; and developing the first substrate and washing part of the first substrate that is not exposed. The method for manufacturing the color filter is simple in technique, thereby effectively reducing the production cost of the color filter.
    Type: Grant
    Filed: August 4, 2015
    Date of Patent: September 11, 2018
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Xialiang Yuan
  • Patent number: 10059844
    Abstract: The novel yellow metal azo pigments based on at least two metal azo compounds which differ at least in the type of metal have both improved dispersion properties and improved color strengths and are of excellent suitability for pigmentation of pigment preparations for a broad field of use.
    Type: Grant
    Filed: March 20, 2017
    Date of Patent: August 28, 2018
    Assignee: LANXESS Deutschland GmbH
    Inventors: Frank Linke, Hans-Ulrich Borst, Sabine Endert
  • Patent number: 10061194
    Abstract: In accordance with some aspects of the present disclosure, a maskless interferomeric lithography system for fabricating a three-dimensional (3D) photonic crystal using a multiple two-beam-exposures is disclosed. The system can comprise an illumination system comprising an optical arrangement operable to receive radiation from a radiation source and provide three or more tilted two-beam interference pattern exposures to be combined into a three-dimensional pattern; and a substrate operable to be supported by a substrate table, wherein the substrate comprises a photoresist formed on a top surface of the substrate and operable to receive the three-dimensional pattern and wherein means are provided to adjust the position of the substrate in all six mechanical degrees of freedom.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: August 28, 2018
    Assignee: STC.UNM
    Inventors: Steven R. J. Brueck, Alexander K. Raub
  • Patent number: 10048412
    Abstract: The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and reduce production cost. The QD CF substrate uses selectively quenched QD layer obtain by UV light irradiation technology to achieve improve the color gamut of display as well as simplifying manufacturing process. Moreover, the QD layer comprises no blue QD material, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency as well as reduce material cost.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: August 14, 2018
    Assignee: SEHNZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Dongze Li
  • Patent number: 10048583
    Abstract: Provided is a method for manufacturing a conductive pattern forming member that is formed on a substrate and that has excellent resistance to ion migration between a conductive pattern and a photosensitive resin layer, while suppressing generation of residues in the dissolution and removal of unexposed portions.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: August 14, 2018
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Tsukuru Mizuguchi, Tomotaka Kawano
  • Patent number: 10048531
    Abstract: A manufacturing method for color filter substrate is disclosed. The method includes: coating and exposing three layers of photoresist materials on a first substrate, and colors of the three layers of the photoresist materials are respectively a red color, a green color and a blue color; in the coating and exposure processes, a red color resist block, a green color resist block and a blue color resist block are formed; forming a light-shielding layer through mixing of two different colors of the photoresist materials in the three layers of the photoresist materials; and forming a spacing layer through stacking of two different colors of the photoresist materials in the three layers of the photoresist materials. A manufacturing method for liquid crystal panel is also disclosed. The present can simplify the manufacturing process of the color filter substrate, reduce the process of the liquid crystal panel and decrease the manufacturing cost.
    Type: Grant
    Filed: May 27, 2016
    Date of Patent: August 14, 2018
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Hui He
  • Patent number: 10042245
    Abstract: A photomask having an exposure correction includes a shading region and an exposure region enclosed by the shading region. The exposure region comprises a correction sub-region and an exposure sub-region. The correction sub-region is arranged along two edges of an acute angle of the exposure region from an acute angle vertex of the exposure region.
    Type: Grant
    Filed: August 3, 2016
    Date of Patent: August 7, 2018
    Assignee: Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Chunqian Zhang, Caiqin Chen, Chao Wang, Qipei Zhang
  • Patent number: 10042254
    Abstract: In the method for forming a protective coat on an electrode for a touch panel according to the invention, a photosensitive layer comprising a photosensitive resin composition containing a binder polymer having a carboxyl group and an acid value of 30 to 120 mgKOH/g, a photopolymerizable compound having at least three ethylenic unsaturated groups, and a photopolymerization initiator, is formed on a base material having an electrode for a touch panel, prescribed sections of the photosensitive layer are cured by irradiation with active light rays and then the sections other than the prescribed sections are removed, to form a protective coat comprising the cured sections of the photosensitive resin composition covering all or a portion of the electrode.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: August 7, 2018
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Ikuo Mukai, Yasuharu Murakami, Naoki Sasahara, Hiroshi Yamazaki
  • Patent number: 10029505
    Abstract: The invention relates to a method for producing a multilayer body (100, 200, 300, 400), as well as a multilayer body (100, 200, 300, 400) produced thereby. A single- or multi-layered first decorative ply (3) is applied to a carrier ply with a first (11) and a second (12) side. A metal layer (5) is applied to the side of the first decorative ply (3) facing away from the carrier ply and structured such that the metal layer (5) is provided with a first layer thickness in one or more first zones (8) and is provided with a second layer thickness different from the first layer thickness in one or more second zones (9), wherein in particular the second layer thickness is equal to zero. A single- or multi-layered second decorative ply (7) is applied to the side of the metal layer (5) facing away from the first decorative ply (3) and structured using the metal layer (5) as mask such that the first (3) or second (7) decorative ply is at least partially removed in the first (8) or second (9) zones.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: July 24, 2018
    Assignee: LEONHARD KURZ STIFTUNG & CO. KG
    Inventors: Ludwig Brehm, Tibor Mannsfeld, Juri Attner, Thorsten Schaller
  • Patent number: 10031417
    Abstract: A compound represented by Chemical Formula 1, a colorant including the compound, a photosensitive resin composition including the colorant, and a color filter manufactured using the photosensitive resin composition (in Chemical Formula 1, each substituent is the same as defined in the detailed description),
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: July 24, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Hyeongmook Kim, Kyuyoung Kim, Young Lee, Myoungyoup Shin, Seungjib Choi