Abstract: Provided is a coloring composition with which a film capable of allowing transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, also provided are a film, a color filter, a pattern forming method, a method for manufacturing a color filter, a solid image pickup element, and an infrared sensor in which the coloring composition is used. The coloring composition includes a coloring material that shields light in a visible range; and an infrared absorber. It is preferable that the coloring material that shields light in the visible range includes two or more chromatic colorants and that a combination of the two or more chromatic colorants forms black. Alternatively, it is preferable that the coloring material that shields light in the visible range includes an organic black colorant. It is preferable that the organic black colorant is at least one selected from the group consisting of a perylene compound and a bisbenzofuranone compound.

Abstract: An exemplary embodiment of the present invention provides a display device including: a thin film transistor array panel; an anti-reflective layer overlapping the thin film transistor array panel; and a color conversion display panel positioned between the thin film transistor array panel and the anti-reflective layer, wherein: the color conversion display panel may include a color conversion layer including a semiconductor nanocrystal and a transmissive layer; the anti-reflective layer may include an adhesive layer positioned on the color conversion display panel, a low-reflective layer overlapping the adhesive layer, and a base film positioned between the adhesive layer and the low-reflective layer. A dye is present in one of the layers of the anti-reflective layer.

Abstract: A resist composition comprising a base polymer and a sulfonium and/or iodonium salt of brominated benzene-containing carboxylic acid offers a high sensitivity and minimal LWR or improved CDU independent of whether it is of positive or negative tone.

Abstract: A salt represented by the formula (I). wherein Q1, Q2, R1, R2, R3, R4, R5, z, and Z+ are defined in the specification.

Abstract: A manufacturing method of a color filter substrate includes Step S1: providing a base and forming an antireflection layer on the base; and Step S2: forming a color resist layer on the antireflection layer, in which the color resist layer is formed through a photolithographic process including operations of coating photoresist, exposure, and development.

Abstract: A resist composition comprising a polymer-bound acid generator, i.e., a polymer comprising recurring units derived from a sulfonium or iodonium salt having a brominated linker between a polymerizable unsaturated bond and a fluorosulfonic acid offers a high sensitivity and reduced LWR or improved CDU independent of whether it is of positive or negative tone.

Abstract: An object of the present invention is to provide a curable composition satisfying both of excellent low reflectivity and excellent developability, a method for producing a cured film, an infrared color filter provided with a light-shielding film, and a solid-state imaging device. The curable composition of the present invention includes a fluorine-containing polymer including a repeating unit represented by Formula (A) and a repeating unit represented by Formula (B), a polymerizable compound, and a coloring agent. In Formula (A), R1 represents a hydrogen atom or an alkyl group, and L1 represents a divalent chained linking group having 3 or more carbon atoms in total, which may include an ester bond. In Formula (B), R2 represents a hydrogen atom or an alkyl group, L2 represents a single bond or a divalent linking group, and Rf represents a monovalent organic group including an fluorine atom.

Abstract: Compounds of the formulae (I) or (II) wherein X is A is O, S, NR5 or CR16R17; R1 is for example hydrogen or C1-C20alkyl R2 is for example hydrogen, C1-C20alkyl or C6-C20aryl R5 for example is C1-C20alkyl; R7, R8, R9, R10 and R11 for example independently of each other are hydrogen. C1-C20alkyl, halogen, CN or NO2; Ar1 is for example unsubstituted or substituted C6-C20aryl, C3-C20heteroaryl, C6-C20aroyl, C3-C20heteroarylcarbonyl or or Ar1 is Ar2 is for example phenylene, all of which are unsubstituted or substituted M is for example unsubstituted or substituted C1-C20alkylene Y is a direct bond, O, S, NR5 or CO; Z1 is for example O or S; Z2 is a direct bond, O, S or NR5; and Q is CO or a direct bond.

Abstract: A photosensitive composition, a quantum dot polymer composite pattern prepared therefrom, and a layered structure and an electronic device including the same. The photosensitive composition includes plurality of quantum dots; a luminescent material other than a quantum dot; a carboxylic acid group containing binder; a photopolymerizable monomer having a carbon-carbon double bond; and a photoinitiator, and the luminescent material comprises a fluorophore, a nanosized inorganic phosphor, or a combination thereof.

Abstract: A compound represented by the formula (I): wherein the values of R1, R2, R3, Ar and X1 in formula (I) are defined in the specification.

Abstract: A photosensitive resin composition according to an exemplary embodiment of the present invention includes: a nanophosphor; a photo-polymerization initiator including an acetophenone-based initiator; and a photo-polymerization compound, wherein the photo-polymerization initiator further includes at least one among a thioxanthone-based initiator, an oxime-based initiator, and a benzophenone-based initiator.

Abstract: A pattern article comprising a copolymer having polymerized units derived from a cleavable crosslinking monomer, to which a pattern is imparted by the release of incipient acid from a thermal acid generator or photoacid generator. The selective release of the acid provides a pattern of high crosslink density and low crosslink density as result of the incipient acid cleaving a portion of the crosslinks.

Abstract: A pellicle film for photolithography that is a pellicle film to be stretched over one end face of a pellicle frame, and is characterized by including a polymer film, and a gas impermeable layer formed on one side or both sides of the polymer film, and a pellicle for photolithography provided with the pellicle film.

Abstract: Provided are a resin film which exhibits an excellent low reflectivity, a coloring photosensitive composition capable of forming a resin film which exhibits an excellent low reflectivity, a resin film production method, a color filter, a light shielding film, a solid-state imaging element, and an image display device. The resin film of the present invention includes at least two or more resins, a coloring agent, and a photoacid generator, in which the resin film has a peak at which the value of A1/A2 is greater than 0.1 and 2.5 or less in a light scattering measurement of the resin film, in the case where a half-width of the peak is A1 and a scattering angle of a maximum light intensity of the peak is A2 in a spectrum in which a scattering angle is plotted on the horizontal axis and a scattered light intensity is plotted on the vertical axis.

Abstract: Extreme ultraviolet (EUV) mask blanks, methods for their manufacture and production systems therefor are disclosed. The EUV mask blanks comprise a multilayer stack of absorber layers on the capping layer, the multilayer stack of absorber layers including a plurality of absorber layer pairs.

Abstract: The present invention relates to a colored photosensitive resin composition that prevents the generation of uneven wrinkles when a cured film is formed, to thereby prevent spots that may be generated on the edges of a display upon the formation thereof, and has a short development time. Accordingly, the colored photosensitive resin composition can be advantageously used as a material for forming a protective film, an interlayer insulating film, a light shielding spacer such as a black column spacer, and the like to be employed in various electronic parts inclusive of a liquid crystal display (LCD) panel and an organic light emitting diode (OLED) display panel.

Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface, to thereby minimize spots on the display screen that may be generated by a defect in the gap between the upper and lower plates during their assembly, with the formation of an excellent step difference and a pattern in a high resolution; and to a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.

Abstract: A substrate for a liquid crystal display device includes: a substrate; and an alignment film on the substrate, the alignment film including an alignment material of a photo alignment material and a conductive particle.

Abstract: A method of manufacturing a substrate of a display device is provided. The method includes: providing a substrate body; coating a photoresist layer on the substrate body; exposing the photoresist layer by using a plurality lenses of an exposure machine through a mask, wherein the mask includes a light incident region and a light overlap region, the light overlap region includes a transparent zone and a non-transparent zone, and the light incident region includes a transparent zone and a non-transparent zone, and wherein an area of each transparent zone of the light overlap region is larger or smaller than an area of each transparent zone of the light incident region; and developing the photoresist layer after exposing to obtain a photoresist pattern. The embodiment of the disclosure also provides a mask applied to the method.

Abstract: The present invention provides a system for conservation and efficient use of energy through controlling and monitoring of devices. At least one processing controller connected to a sensor and a device, the processing controller configured to receive the ambient data from the sensor and operating parameters from the device; a user module configured to IO receive input parameters from a plurality of users; a central processing module, connected to the structure, the user module, and the admin module through wired and/or wireless connection, the central processing module configured to process the data received from the processing controller adapted in the zone of the structure and generate the optimum parameters for operating the device adapted in the zone to the structure.