Patents Examined by John Kight, III
  • Patent number: 5424387
    Abstract: Di-amines endowed with chain extension activity for formulations such as polyureas and polyurethanes are disclosed, and which have the general formula: ##STR1## wherein n is 0-1000 and m is 0-100; R.sub.1, R.sub.2, R.sub.5, and R.sub.6 are each independently selected from the group consisting of H, --CH.sub.3, --CH.sub.2 CH.sub.3, --CH.sub.2 OH, and --CH.sub.2 --CH.sub.2 --OH; and R.sub.3 and P.sub.4 are each independently selected from the group consisting of --C.sub.2 H.sub.4 --; and --C.sub.3 H.sub.6 --; and the diasteromeric salts thereof.
    Type: Grant
    Filed: July 20, 1994
    Date of Patent: June 13, 1995
    Assignee: Hoechst Celanese Corporation
    Inventors: Michael T. Sheehan, James R. Sounik, Bret F. Hann
  • Patent number: 5424386
    Abstract: Polyaromatic polyisocyanates are modified by reaction with 0.1 to 10 weight %, preferably 2 to 7 weight % (based on polyisocyanate) of a polyether alcohol of molecular weight 206 to 948, obtainable by the reaction of alkylene oxides with C.sub.6 -C.sub.30, preferably C.sub.8 -C.sub.20, hydrocarbons containing 1 to 3 active H atoms, and are used for the production of rigid polyurethane foamed materials.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: June 13, 1995
    Assignee: Bayer Aktiengesellschaft
    Inventors: Herbert Gebauer, Pramod Gupta, Christian Konig
  • Patent number: 5424172
    Abstract: A photosensitive resin composition includes (A) a hydrophobic polymer having a glass transition temperature not greater than 5.degree. C., (B) a hydrophilic polymer, (C) an ethylenically unsaturated compound, (D) a solvent capable of dissolving the component (B) more than the component (A) and (E) a photopolymerization initiator, with the content of component (B) being less than that of component (A). The resin composition can be used to prepare a printing plate having a base, a photosensitive resin layer and a covering layer arranged one over another. The photosensitive resin layer contains a dispersed phase which includes particles having a phase which includes a hydrophobic polymer, surrounded by a phase which includes a hydrophilic polymer. The photosensitive resin layer can be prepared by removing the solvent (D) to a content of 0.001-2% by weight.
    Type: Grant
    Filed: July 20, 1992
    Date of Patent: June 13, 1995
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Masaru Nanpei, Akira Tomita, Keizo Kawahara, Toshihiko Kajima
  • Patent number: 5422416
    Abstract: Described herein is a process for synthesizing polybenzazole polymers comprising: (a) contacting a bis(trihalomethyl) organic compound with a polyphosphoric acid under reaction conditions sufficient to convert at least about 25 mole percent of the trihalomethyl groups present to carboxylic acid or carboxylate groups, forming a reaction mixture thereby; and (b) contacting the reaction mixture with an aromatic compound having two o-amino-basic moieties under reaction conditions sufficient to form a polybenzazole polymer.
    Type: Grant
    Filed: June 28, 1994
    Date of Patent: June 6, 1995
    Assignee: The Dow Chemical Company
    Inventor: Ying H. So
  • Patent number: 5422420
    Abstract: Polyamides and polyamide fibers having a major proportion of hexamethyleneadipamide units and minor proportions of at least two other amide units, one of those other amide units being those of 2-methylpentamethylenediamine are disclosed.
    Type: Grant
    Filed: May 19, 1993
    Date of Patent: June 6, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Ketan G. Shridharani
  • Patent number: 5422414
    Abstract: This invention relates to a polyurea-imide RIM composition, molded articles of a polyurea-imide RIM composition, and a method of forming a polyurea-imide molded article.
    Type: Grant
    Filed: December 3, 1993
    Date of Patent: June 6, 1995
    Assignee: ECP Enichem Polimeri Netherlands B.V.
    Inventor: Stuart B. Smith
  • Patent number: 5422415
    Abstract: Described are compositions protected against thermal and oxidative degradation that compriseA) a polyether polyol or mixtures of such polyols,B) at least one benzofuranone derivative of formula I, ##STR1## wherein L, G, m, R.sub.1 to R.sub.5 and R.sub.21 to R.sub.24 are as defined in claim 1,C) at least one compound from the group of the phenolic anti-oxidants, and/orD) at least one compound from the group of the amino anti-oxidants of the secondary amine type. Also polyurethane(s) (foam(s)) prepared therefrom are protected against thermal and oxidative degradation, especially against core scorching.
    Type: Grant
    Filed: February 3, 1994
    Date of Patent: June 6, 1995
    Assignee: Ciba-Geigy Corporation
    Inventor: Peter Michaelis
  • Patent number: 5422385
    Abstract: An isocyanate-based elastomer containing a filler material, the filler material being present at a level in the range of from about 30% to about 90% by weight of the elastomer and having a specific gravity of less than about 2.0. A process for producing the isocyanate-based elastomer is also disclosed. The process comprises the steps of: providing a first mixture comprising a catalyst and a filler material, the filler material being wetted by the catalyst; providing a second mixture comprising an isocyanate and an active hydrogen-containing compound; mixing the first mixture and the second mixture to provide a reaction mixture; allowing the reaction mixture to react to produce the isocyanate-based elastomer.
    Type: Grant
    Filed: September 17, 1993
    Date of Patent: June 6, 1995
    Assignee: Woodbridge Foam Corporation
    Inventor: Paul V. Farkas
  • Patent number: 5422419
    Abstract: An agent for alignment treatment for a liquid crystal cell, which comprises an organic solvent-soluble polyimide obtained by reacting and polymerizing a tetracarboxylic acid component with a diamine component and a dicarboxylic acid component containing a long chain alkyl group and/or a monoamine component containing a long chain alkyl group, followed by imide-formation.
    Type: Grant
    Filed: September 3, 1993
    Date of Patent: June 6, 1995
    Assignee: Nissan Chemical Indstries Ltd.
    Inventors: Toyohiko Abe, Makoto Mishina
  • Patent number: 5422418
    Abstract: The present invention relates to new polyamides comprising, on a mass basis:(a) 45 to 75% of an x,T unit, x being between 4 and 12 inclusive, the x,T unit being the condensation product of a diamine having x carbon atoms and of terephthalic acid, and(b) 55 to 25% of an aliphatic unit -HN-(CH.sub.2).sub.n -CO, n being between 6 and 14 inclusive. and the terpolyamides obtained by including a monomeric unit (c) such as the unit 6 or 6,I as a replacement for part of the aliphatic unit (b).The polyamide compositions thus obtained exhibit a Tg lower than 130.degree. C., a Tm higher than 230.degree. C. and a good crystallizability.
    Type: Grant
    Filed: December 30, 1992
    Date of Patent: June 6, 1995
    Assignee: Elf Atochem S.A.
    Inventors: Philippe Maj, Jean-Marc Sage, Philippe Blondel, Didier Judas
  • Patent number: 5422417
    Abstract: Substituted phenyl compounds endowed with chain extension activity for formulations such as polyurethanes are disclosed, and which have the general formula: ##STR1## wherein n is 1-1000 and m is 1-100; and R.sub.1 and R.sub.2 are each independently selected from the group --C.sub.2 H.sub.4 -- and --C.sub.3 H.sub.6 --; and R.sub.3 is from the group consisting of: ##STR2## and the diasteromeric salts thereof.
    Type: Grant
    Filed: March 31, 1994
    Date of Patent: June 6, 1995
    Assignee: Hoechst Celanese Corporation
    Inventors: Michael T. Sheehan, James R. Sounik, William W. Wilkison, III
  • Patent number: 5420225
    Abstract: Aramid polymers, e.g., those derived from p-phenylene diamine and terephthaloyl chloride, can have their solubility properties and flame retardancy enhanced by the incorporation therein of a moiety derived from a bis(aminophenoxyphenyl) phosphine oxide, e.g., bis(3-aminophenoxy-4'-phenyl) phenylphosphine oxide.
    Type: Grant
    Filed: July 26, 1991
    Date of Patent: May 30, 1995
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Attila Gungor, James E. McGrath, Yadollah Delaviz, Harry W. Gibson
  • Patent number: 5419989
    Abstract: A mask for forming an image on a photographic print paper includes a mask sheet, a transparent protective layer, and a transparent intermediate layer. The mask sheet includes a transparent base sheet and an opaque pattern layer formed in a shape of the image on the base sheet. The transparent protective layer is disposed on the mask sheet so as to protect the opaque pattern layer. The transparent intermediate layer is disposed between the mask sheet and the protective layer. The intermediate layer has a softening temperature that is not more than 100.degree. C.
    Type: Grant
    Filed: February 3, 1994
    Date of Patent: May 30, 1995
    Assignee: Konica Corporation
    Inventors: Masataka Takimoto, Shigeru Mano, Takahiro Ogawa, Sota Kawakami
  • Patent number: 5420223
    Abstract: Described are several preferred acid salts and complexes of N,N-dimethylpyridine (DMAP) and 4-(4-methyl-1-piperidinyl)pyridine (MPP) which are useful as curing agents or as accelerators in preferred epoxy resin curing processes. Also described are particularly preferred processes for forming cured epoxy resin materials which are advantageously employed in large production line scale operations, and curable coating compositions.
    Type: Grant
    Filed: October 19, 1993
    Date of Patent: May 30, 1995
    Assignee: Reilly Industries, Inc.
    Inventor: John R. Johnson
  • Patent number: 5420235
    Abstract: This invention relates to an improved process for continuously producing catalyzed melt polymerization polymers and apparatus for intimately mixing the components during the process. In particular, this invention relates to the continuous catalytic polymerization of poly(hydroxy acids) using a counter-current impeller mixing system.
    Type: Grant
    Filed: January 21, 1993
    Date of Patent: May 30, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Jerome Hochberg
  • Patent number: 5420206
    Abstract: The invention provides novel blends and processes for producing such blends which include a polyamide, an olefinic acid copolymer or salt thereof, and a maleated ethylene/propylene rubber, wherein such novel blends may be processed by conventional extrusion and molding techniques, do not require a separate curing step or procedure in the overall production process, and which produces articles which have some physical characteristics similar to those exhibited by thermoplastic elastomers. The inventive compositions exhibit feature excellent resistance to zinc chloride solutions and are formable in a single melt blending step.
    Type: Grant
    Filed: April 15, 1994
    Date of Patent: May 30, 1995
    Assignee: AlliedSignal Inc.
    Inventors: Charles D. Mason, Harold W. Tuller, Thomas J. Krollick
  • Patent number: 5420207
    Abstract: Polyisobutylsuccinic anhydrides having an average molar ratio of succinic anhydride groups to polyisobutyl groups of from 1.05:1 to 1.3:1 are prepared by reacting polyisobutene having an average molecular weight M.sub.w of 600-5000 and containing at least 70% of terminal double bonds with maleic anhydride in a molar ratio of maleic anhydride to polyisobutene of from 1.05:1 to 3:1 at 160.degree.-210.degree. C. in the presence of a catalytic amount of a dicarboxylic acid of 2 to 6 carbon atoms.
    Type: Grant
    Filed: June 14, 1994
    Date of Patent: May 30, 1995
    Assignee: BASF Aktiengesellschaft
    Inventors: Norbert Greif, Knut Oppenlaender
  • Patent number: 5420188
    Abstract: The present invention is directed to a mold release, a composition containing the mold release, and a process of using the mold release. The mold release comprises an internal mold release composition comprising(a) a zinc carboxylate containing from 8 to 24 carbon atoms per carboxylate group, and(b) a compatibilizer comprising an amidine group-containing compound of the formula ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are straight or branched, saturated or unsaturated hydrocarbon chains having up to 30 carbon atoms which may be substituted by ether groups, ester groups, amide groups or amidine groups and may also be terminated by isocyanate-reactive groups such as hydroxyl or amino groups, R.sub.4 corresponds to the definition of R.sub.1, R.sub.2 and R.sub.3, but may additionally represent an aromatic substituent having 6 to 15 carbon atoms or may represent the group --NR.sub.2 R.sub.3, with the proviso that when R.sub.4 represents the group --NR.sub.2 R.sub.3, R.sub.1 can be hydrogen, and wherein R.sub.
    Type: Grant
    Filed: December 31, 1992
    Date of Patent: May 30, 1995
    Assignee: Miles Inc.
    Inventor: John E. Dewhurst
  • Patent number: 5420231
    Abstract: Aromatic copolyamides, process for preparing them and their use for the production of shaped structuresAromatic copolyamide which is soluble in organic solvents, and a process for its preparation, which contains the recurring structural units (I), (II) and (III) ##STR1## to the extent of at least 90 mol % and 0 to 5 mol % of end groups of the structural units (IV) ##STR2## The sum of the molar proportions of (II) and (III) is in the ratio of 0.9:1 to 1.1:1 to the molar proportion of (I), and at the same time the molar proportions of (II) and (III) are in a ratio to one another of 60:40 to 10:90.The copolyamides are suitable for the production of shaped articles or for coatings and for the production of fibers, membranes and films.
    Type: Grant
    Filed: August 11, 1993
    Date of Patent: May 30, 1995
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich M. Delius, Willi Kreuder, Matthias Wiesner
  • Patent number: 5420180
    Abstract: A size for yarn which minimizes thread break is described. The size comprises an aqueous solution of (I) a polyvinyl alcohol resin, (II) a modified starch, and a water-soluble cellulose compound (III), wherein the components are related by the following equations:(I)/(II)+(III))=85/15 to 95/5, and(II)/(III)=20/80 to 80/20,while simultaneously satisfying the expressions0.27X-0.7.ltoreq.log.sub.10 Y.ltoreq.0.27X+0.6; and (1)20.ltoreq.Y.ltoreq.300; (2)(A)/(B).ltoreq.0.5 (3)where X is the solid concentration in % by weight, Y is viscosity in centipoise at 90.degree. C. and a shear rate of 10 sec.sup.-1, (A) is viscosity at 60.degree. C. and a shear rate of 10,000 sec.sup.-1 of an adjusted aqueous solution resulting from the adjustment of the viscosity to 100 centipoise at 60.degree. C. and a shear rate of 10 sec.sup.-1 with said compound ratio of each of the components kept constant, and (B) is viscosity of 100 centipoise at 60.degree. C. and a shear rate of 10 sec.sup.-1 of said adjusted aqueous solution.
    Type: Grant
    Filed: October 26, 1993
    Date of Patent: May 30, 1995
    Assignee: Kuraray Co., Ltd.
    Inventors: Tetsuya Katayama, Hirotoshi Miyazaki, Hitoshi Maruyama, Koji Onishi