Patents Examined by John S. Y. Chu
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Patent number: 5573445Abstract: A process for producing an electrophotographic photoreceptor having a roughened substrate surface by wet honing the substrate surface with a composition including deionized water and substantially spherical glass beads. The process produces a photoreceptor substrate that eliminates interference fringe effects caused by reflection of coherent light without creating other printing defects such as white or black spots. A wet honing composition for producing such photoreceptors is also provided.Type: GrantFiled: August 31, 1994Date of Patent: November 12, 1996Assignee: Xerox CorporationInventors: Yonn K. Rasmussen, Larry Sciarratta, Ronald T. Kosmider
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Patent number: 5573887Abstract: The invention relates to a method of transferring an image of a master pattern by an intermediate carrier being a laser copy of the master pattern onto a carrier, for example a plate of metal. The surface of the carrier is provided on one side with a layer of a couch or with a layer of a lacquer or with a layer of a thermoplastic or elastomeric material or with a powder coating which is dried at an increased temperature. The material forming the image penetrates under the action of heat and pressure into the layer or the powder coating thus softened which is subsequently after-baked. A weather-resistant and scratch-resistant copy of the master pattern is provided.Type: GrantFiled: October 31, 1994Date of Patent: November 12, 1996Assignee: Intron Ingenieur-Unternehmung AGInventor: Karl Genz
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Patent number: 5573888Abstract: An image transfer method which can prevent poor registering and gives an esthetically fine multi-color prepress proof and a multi-color print with excellent registering, the method comprising imagewise exposing an image-forming material consisting essentially of a substrate, a photosensitive layer formed on the substrate and a protection film attached to the photosensitive layer, peeling off the protection film, and introducing the image-forming material into a nip formed so that the photosensitive layer of the image-forming material and an image receptor come into contact with each other to selectively transfer part of the photosensitive layer to the image receptor and obtain a transfer image,the method using the image forming material prepared by attaching the protection film to the photosensitive layer under a tension at right angles with the axial direction of the rolls.Type: GrantFiled: November 22, 1993Date of Patent: November 12, 1996Assignee: Toyo Ink Manufacturing Co., Ltd.Inventors: Arata Imabayashi, Yasuhiro Tanaka
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Patent number: 5573886Abstract: A photosensitive resin composition which comprises (A) a polyimide resin precursor of recurring units of a specific type, (B) at least one member selected from the group consisting of photosensitive diazoquinone compounds of the following formulas ##STR1## wherein R.sup.2 represents an organic group having from 1 to 50 carbon atoms, i is an integer of from 1 to 7, and i is an integer of from 1 to 7, and (C) a phenolic novolac resin. A method for forming a polyimide film pattern on various types of substrates is also described wherein a composition film is alkali-developed after imagewise exposure and cured to provide a heat-resistant polyimide film pattern suitable for protecting the substrate.Type: GrantFiled: January 20, 1995Date of Patent: November 12, 1996Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hideto Kato, Satoshi Toyoda
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Patent number: 5567568Abstract: A photosensitive composition comprising (A) an ethylenically unsaturated addition-polymerizable compound, (B) an aqueous alkali-soluble or swelling polymer which is capable of forming a film, (C) a photopolymerization initiator, (D) a negative-working diazo resin, and (E) a component which is soluble in a photosensitive solution, but floats on a surface of a photosensitive layer and is capable of forming an oxygen-intercepting layer during coating and drying is described. A photosensitive lithographic printing plate comprising a support coated with the above-described photosensitive composition and a matting layer provided thereon, wherein the surface of the matting layer has a micro pattern comprising (i) a portion which is coated with a composition comprising a copolymer containing at least one monomer unit having a sulfonic acid group and (ii) a portion which is uncoated with the composition is also descried.Type: GrantFiled: December 14, 1994Date of Patent: October 22, 1996Assignee: Fuji Photo Film Co., Ltd.Inventor: Akira Nishioka
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Patent number: 5567572Abstract: A support sheet for a photographic printing sheet having enhanced anti-fogging and anti-yellowing properties comprises a pulp paper substrate sheet, a front coating layer formed on a front surface of the substrate sheet and comprising a cured resinous material produced from electron beam-curable unsaturated organic compound by an electron beam irradiation thereto and mixed with a white pigment, and a back coating layer formed on a back surface of the substrate sheet and comprising a film-forming synthetic resinous material, in which a magnesium compound is contained, as an anti-fogging agent, in the substrate sheet and/or the front coating layer.Type: GrantFiled: September 26, 1994Date of Patent: October 22, 1996Assignee: New Oji Paper Co., Ltd.Inventors: Takaharu Miura, Masataka Itoh, Chieko Tanaka
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Patent number: 5565300Abstract: A photoresist composition is disclosed containing an alkali-soluble resin and a photosensitive substance obtained by reaction of a polyhydroxy compound and (a) a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride(s), said photosensitive substance being a mixture of photosensitive compounds (1) to (3):(1) a photosensitive compound having at least one hydroxyl group per molecule and having a number ratio of 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonyl chloride sulfonate groups to hydroxyl groups within the range of from 3 to 20, contained in the photosensitive substance in an amount of 50 wt % or more;(2) a photosensitive compound where all the hydroxyl groups in the polyhydroxy compound have been 1,2-naphthoquinonediazidosulfonyl-esterified, contained in the photosensitive substance in an amount of 30 wt % to 0 wt %; and(3) a photosensitive compound having three or more hydroxyl groups which have not been 1,2-naphthoquinonediazidosulfonyl-esterified per molecule, contained in the photosensitive subsType: GrantFiled: January 30, 1991Date of Patent: October 15, 1996Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Shinji Sakaguchi, Tadayoshi Kokubo
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Patent number: 5565301Abstract: A process for forming a colored image comprising, in order:(A) imagewise exposing to actinic radiation a photosensitive element comprising a carrier support, a carrier surface, a first adhesive layer and a first photosensitive layer,(B) developing the exposed first photosensitive layer,(C) laminating to the element a transfer element comprising a transfer support, and a transfer surface layer which is adjacent to a colored pattern in the element of step (A) with the proviso that the transfer element does not have an adhesive layer which transfers to the colored pattern,(D) removing said carrier support and said carrier surface, revealing said first adhesive layer,(E) laminating the element the element from step (D) to a permanent support wherein the first adhesive layer is adjacent to the permanent support; and(F) removing said transfer support and said transfer surface layer.Type: GrantFiled: August 2, 1993Date of Patent: October 15, 1996Assignee: E. I. Du Pont de Nemours and CompanyInventor: Gregory A. Bodager
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Patent number: 5565304Abstract: A chemically amplified-type radiation-sensitive composition comprising:(a) an alkali-soluble binder resin made by a condensation reaction of:(i) hydroxystyrene moiety having formula [1] or [2]: ##STR1## wherein x is an integer from 2 to 300; with (ii) a monomethylolated phenolic compound having a formula [8]: ##STR2## wherein R.sub.1 and R.sub.2 are individually selected from the group consisting of lower alkyl group having 1-4 carbon atoms, lower alkoxy group having 1-4 carbon atoms, amino group, and carboxylic acid group; wherein R.sub.3 and R.sub.Type: GrantFiled: June 5, 1995Date of Patent: October 15, 1996Assignee: OCG Microelectronic Materials, Inc.Inventor: Kenji Honda
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Patent number: 5563018Abstract: The invention relates to 2,3,4-trihydroxy-3'-methyl-, -ethyl-, -propyl- or -isopropylbenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4-sulfonic acid and/or (7-methoxy-1,2-naphthoquinone 2-diazide)-4-sulfonic acid, a radiation-sensitive mixture prepared therewith, and a radiation-sensitive recording material comprising a substrate and a radiation-sensitive layer which is composed of the mixture according to the invention.Type: GrantFiled: March 17, 1993Date of Patent: October 8, 1996Assignee: Hoechst AktiengesellschaftInventors: Gerhard Buhr, Wolfgang Zahn, Fritz Erdmann, Siegfried Scheler
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Patent number: 5561026Abstract: A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a photosensitive material which is obtained by combining the fullerene with a photosensitive agent is provided. The photosensitive material according to the present invention has excellent properties as a new resist which is a photosensitive material suitable as a photolithographic resist for the production of semiconductors utilizing such light source as ultraviolet light, deep ultraviolet light, X-ray or electron beam and which meets the requirements for realization of a higher level of resolution and sensitivity.Type: GrantFiled: June 21, 1993Date of Patent: October 1, 1996Assignee: Nippon Oil Co., Ltd.Inventor: Nobuo Aoki
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Patent number: 5558976Abstract: A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.Type: GrantFiled: November 29, 1995Date of Patent: September 24, 1996Assignees: Wako Pure Chemical Industries, LTD., Matsushita Electric Industrial Co., LTD.Inventors: Fumiyoshi Urano, Takaaki Negishi, Akiko Katsuyama, Masayuki Endo
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Patent number: 5558971Abstract: A resist material comprising (a) a terpolymer, (b) a photoacid generator, and (c) a solvent has high light sensitivity, heat resistance, adhesiveness, resolution, etc., and is suitable for forming a pattern of rectangular shape.Type: GrantFiled: March 21, 1995Date of Patent: September 24, 1996Assignees: Wako Pure Chemical Industries, Ltd., Matsushita Electric Industrial Co., Ltd.Inventors: Fumiyoshi Urano, Takaai Negishi, Akiko Katsuyama, Masayuki Endo
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Patent number: 5556733Abstract: A thermal development diazo copying material is composed of a support, a diazo layer which contains a diazo compound, and a coupler layer which contains a coupling component, an alkali-soluble resin and a thermofusible material, which are overlaid on the support.Type: GrantFiled: March 4, 1994Date of Patent: September 17, 1996Assignee: Ricoh Company, Ltd.Inventors: Shigeru Kusakata, Masanori Rimoto
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Patent number: 5556739Abstract: A support for photographic use comprised of at least two polyester layers is disclosed, which comprises a first layer containing a first polyester and a second layer containing a second polyester adjacent to the first layer, the first polyester comprising a first monomer unit from a polyalkylene glycol and a second monomer unit from an aromatic dicarboxylic acid having a metal sulfonate group, wherein the difference between the second monomer unit content of the first polyester and that of the second polyester, .DELTA.SIP is not more than 5.5 mol %, the second monomer unit content being expressed based on the total content of monomer units from dicarboxylic acids contained in the polymer.Type: GrantFiled: March 14, 1994Date of Patent: September 17, 1996Assignee: Konica CorporationInventors: Kenji Nakanishi, Takatoshi Yajima, Hiromitsu Araki, Hideyuki Kobayashi, Yoshioki Ohkubo, Tetsutaro Hashimura, Hiroshi Naito
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Patent number: 5554481Abstract: A positive working photoresist composition sensitive to radiation, having high resolving power, high sensitivity, and excellent storage stability, and further forming a pattern capable of accurately reproducing a mask size in a wide range of photomask line width. The present invention has been obtained by a composition containing at least one of a 1,2-napthoquinonediazido-5-sulfonic acid ester of a polyhydroxy compound and a 1,2-napthoquinonediazido-4-sulfonic acid ester of a polyhydroxy compound in combination with at least one alkali-soluble resin.Type: GrantFiled: December 22, 1994Date of Patent: September 10, 1996Assignee: Fuji Photo Film Co., Ltd.Inventors: Yasumasa Kawabe, Kenichiro Satoh, Toshiaki Aoai
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Patent number: 5552259Abstract: A laminar thermal imaging medium is prepared from a first element comprising a first sheet transparent to image-forming radiation and having at least a surface zone or layer of polymeric material heat-activatable upon subjection of the thermal imaging medium to brief and intense radiation, the first element carrying a layer of porous or particulate image-forming substance having cohesivity in excess of its adhesivity for the polymeric heat-activatable layer, and, on the opposed side of the layer of porous or particulate image-forming substance from the surface zone or layer, a first layer of adhesive, and a second element comprising a second sheet carrying a second layer of adhesive. The second layer of adhesive comprises a polymeric hardenable adhesive comprising a macromolecular organic binder having acidic groups, and a photopolymerizable monomer.Type: GrantFiled: September 23, 1993Date of Patent: September 3, 1996Assignee: Polaroid CorporationInventors: Iris B. K. Bloom, Richard A. Minns, Cynthia L. Zahka
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Patent number: 5552260Abstract: Acid-sensitive polymers and imageable articles employing them are disclosed. In particular, photosensitive compositions are disclosed comprising: (a) a photoinitiator which generates an acid upon exposure to radiation; and (b) a polymer having acid labile groups pendant from the polymer backbone, said acid labile pendant groups comprising at least one each of A and B wherein A has the formula --T-(C.dbd.O)OCR.sup.1 R.sup.2 OR.sup.3, and B has the formula --T-(C.dbd.O)OR.sup.4 Si(R.sup.5).sub.3, wherein R.sup.1 and R.sup.2 each represent H or an alkyl group with the proviso that at least one of R.sup.1 and R.sup.2 must be hydrogen; R.sup.3 represents an alkyl group; or any two of R.sup.1, R.sup.2, and R.sup.3 may together form a ring group having from 3 to 36 carbon atoms; R.sup.5 represents an alkyl group, aryl group, an alkoxy group, an aryloxy group, an acyloxy group, or a trialkylsiloxy group; and R.sup.4 and T represents a divalent linking group wherein T is bonded to the polymer backbone and R.sup.Type: GrantFiled: November 16, 1994Date of Patent: September 3, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: Dennis E. Vogel, Leonard J. Stulc
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Patent number: 5549845Abstract: An emulsion or dispersion in which the continuous phase is aqueous and comprises gelatin wherein its viscosity has been reduced by addition thereto of a water-soluble protein or a surfactant which is an ester of a polyalkoxylate.Type: GrantFiled: January 21, 1993Date of Patent: August 27, 1996Assignee: Eastman Kodak CompanyInventor: David J. Young
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Patent number: 5550004Abstract: A chemically amplified-type radiation-sensitive composition comprising:(a) an alkali-soluble binder resin made by a condensation reaction of:(i) hydroxystyrene moiety having formula [1] or [2]: ##STR1## wherein x is an integer from 2 to 300; with (ii) a monomethylolated phenolic compound having a formula [8]: ##STR2## wherein R.sub.1 and R.sub.2 are individually selected from the group consisting of lower alkyl group having 1-4 carbon atoms, lower alkoxy group having 1-4 carbon atoms, amino group, and carboxylic acid group; wherein R.sub.3 and R.sub.Type: GrantFiled: August 19, 1994Date of Patent: August 27, 1996Assignee: OCG Microelectronic Materials, Inc.Inventor: Kenji Honda