Abstract: There is disclosed an optical recording medium capable of high-density information recording by photo-thermal converting effect or by effectively absorbing a visible or near-infrared light such as a laser beam and converting the same into thermal energy to enable high-density optical information recording and reproduction with a low-energy laser beam, and a recording method utilizing such optical recording medium.

Abstract: Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.

Abstract: A light- and heat-sensitive composition which contains a photo-hardenable composition and at least one dye, a light- and heat-sensitive recording material which contains a support having the composition provided on at least one side thereof, and an image-forming process using the recording material are disclosed.

Abstract: A methylol-substituted trihydroxybenzophenone of the formula (I): ##STR1## This methylol-substituted trihydroxybenzophenone may be reacted with selected phenolic monomers during or after the formation of a phenolic novolak resin thereby said resin having at least one unit of formula (II): ##STR2## wherein R and R.sub.1 are individually selected from hydrogen, a lower alkyl group having 1 to 4 carbon atoms or a lower alkoxy group having 1 to 4 carbon atoms.

Abstract: A positive type photoresist developer which comprises an aqueous solution of quaternary ammonium hydroxide represented by the general formula; ##STR1## (wherein all the symbols are as defined in the appended claims) and hydrazine or hydrazine and a nonionic surfactant is disclosed.The developer can form a fine pattern having a high degree of resolution and can provide an excellent profile with few irregularities in pattern dimensions.

Abstract: A positive-working photoresist composition is disclosed, which comprises (1) a light-sensitive material obtained by reacting a polyhydroxy compound containing at least one group represented by the following general formula (I) per molecule with at least one of 1,2-naphthoquinonediazido-5-sulfonyl chloride and 1,2-naphthoquinonediazido-4-sulfonyl chloride, and (2) an alkali-soluble novolak resin: ##STR1## wherein R.sub.1 and R.sub.2 each represents a hydrogen atom or a C.sub.1 -C.sub.4 straight or branched alkyl or alkoxy group, provided that R.sub.1 and R.sub.2 do not represent hydrogen atoms at the same time; and X represents a divalent organic group.

Abstract: A photoresist system that is easily structurable and, in particular, is suitable for the deep ultraviolet range is provided. An increased etching resistance to a halogen-containing plasma is produced in a lithographically generated photoresist structure by treatment with a reactant. The reactant comprises predominantly aromatic structures and includes reactive groups that are suitable for chemical reaction with further reactable groups of the photoresist. In an embodiment, the photoresist includes anhydride or epoxy groups that are suitable for structuring with deep ultraviolet light.

Abstract: Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.

Abstract: A compound of the general formula I ##STR1## in which D denotes a 1,2-naphthoquinone-2-diazide-4-sulfonyl or - 5-sulfonyl radical,R.sup.1 denotes an alkylene group andR.sup.2 denotes a hydrogen atom, an alkyl group or a group R.sup.1 --OH,or of the general formula II ##STR2## in which X denotes an alkylene group, an arylene group or a group of the formulaNH--Y--NH,wherein Y is an alkylene group or an arylene group,R.sup.3 denotes an alkylene group, which may be interrupted by ether oxygen atoms,n is a number from 1 to 40 andm is a number from 0 to 50,the ratio m:(m+n) being from 0:100 to 95:100 and R.sup.1 and D having the above-indicated meaning, are disclosed. The compounds may be used in positive-working photosenitive materials for the production of printing plates and photoresists. Compounds according to formula II do not require an addition of polymeric binders.

Abstract: A photoactive compound having formula (I): ##STR1## wherein R is selected from the group consisting of hydrogen or a lower alkyl group having 1-4 carbon atoms and each D is individually selected from the group consisting of a hydrogen or photoactive o-quinonediazide sulfonyl group; subject to the proviso that at least two of the four D's in formula (I) are photoactive o-naphthoquinonediazide sulfonyl moieties.

Abstract: Disclosed is a method of providing a substrate with a layer comprising a polyvinyl base hydrogel and a biochemically active material by photolithograhy, comprising coating the substrate by centrifugal force with an aqueous solution of a photosensitive hydrogel forming polymer, a crosslinking agent and a biochemically active material, drying said coating, exposing the coated substrate through a photomask to ultraviolet radiation and developing said exposed coating, which is characterized by applying to the substrate an aqueous solution comprising as the cross-linking agent a polyazonium compound and glutardialdehyde. Because of this specific combination of cross-linking agents superior properties with respect to the binding of the biochemically active material are obtained.

Abstract: An organic photochromic compound with improved long term preservability, thermal stability, the repetition character of the record and the like and useful as recording-memory materials or photosensitizers, comprising dimers of the compounds selected from the group consisting of pyrido[3,4-g]isoquinoline, pyrido[2,3-g]quinoline, pyrido[3,2-g]quinoline and pyrido[3,2-g]quinoline derivatives.

Abstract: A positive type radiation-sensitive resin composition which comprises a 1,2-quinonediazide compound and an alkali-soluble novolac resin produced by poly-condensing phenols represented by the formulas (I) and (II) in a molar ratio of (I)/(II) of 1/99 to 100/0 with a carbonyl compound: ##STR1## wherein R.sup.1 and R.sup.2, which may be the same or different, represent hydroxyl groups, hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups, ##STR2## wherein R.sup.3, R.sup.4 and R.sup.5, which may be the same or different, represent hydrogen atoms, alkyl groups, aryl groups, aralkyl groups, alkenyl groups, halogen atoms, alkoxy groups, alkoxycarbonyl groups, aroxycarbonyl groups, alkanoyloxy groups, aroyloxy groups, acyl groups, cyano groups or nitro groups.

Abstract: A positive-working, radiation-sensitive mixture and a process for the production of relief images.The radiation-sensitive mixture contains(a) a water-insoluble polymeric binder which is soluble or at least dispersible in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a further group which produces a strong acid on exposure to radiation, the polymeric binder (a) consisting a mixture of a phenolic polymer and a resin of the novolak type.The novel mixture is particularly suitable for the production of photoresists.

Abstract: A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

Abstract: The invention describes a developing solvent for layers which are crosslinkable by photopolymerization and contain a binder based on an elastomeric polymer, a photopolymerizable monomer compatible therewith and a photoinitiator. The developing solvent comprises a phenol ether of the general formula I ##STR1## wherein R.sup.1 denotes (C.sub.1 -C.sub.6)n-alkyl or iso-alkyl, cycloalkyl or (C.sub.6 -C.sub.12)-aryl andR.sup.2 denotes hydrogen, (C.sub.1 -C.sub.6)n-alkyl or iso-alkyl or --OR.sup.1.Compared with solvents of the prior art, the developing solvent of the present invention is non-toxic, can quickly be removed from the layer and has a high capacity for layer components.

Abstract: The invention is a method for preparing a photographic element which comprises imagewise exposing a photographic element, and removing the non-image areas thereof by contacting said element with a composition consisting essentially of in admixture:a) from at least about 5% to about 30% by weight of the developer of benzyl alcohol; andb) from about 1% to about 20% by weight of the developer of one of more compound selected from the group consisting of sodium xylene sulfonate and sodium cumene sulfonate; andc) from about 5% to about 40% by weight of the developer of potassium toluene sulfonate; andd) water in sufficient amount of formulate effective developer for imagewise exposed photographic elements.

Abstract: A photopolymerizable mixture is disclosed that comprises,a) a polymeric binder,b) an acrylate or alkacrylate of a polyhydric alcohol containing one or more urea groups and one or more urethane groups,c) a photoreducible dye as photoinitiator,d) a trihalomethyl compound which can be cleaved by irradiation, ande) an acridine or phenazine compound which is active as a photoinitiator.The mixture is suitable for the production of printing plates and photoresists and is distinguished by an increased shelf life.

Abstract: The radiation-sensitive mixture contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups,the polymeric binder (a) being a copolymer which contains o-nitrobenzyl groups.The novel radiation-sensitive mixture is particularly suitable for the production of photoresists.

Abstract: The present invention relates to an aluminum support for a lithographic plate, whose surface is electrochemically roughened and has the following conditions:a) an arithmetic mean of the pit diameters of the electrolytically etched support is 4 .mu.m or less,b) a difference between an arithmetic mean (D.sub.L) of the maximum pit diameter of the support in the rolling direction and an arithmetic mean (D.sub.LT) of the maximum pit diameter of the support in the direction perpendicular to the rolling direction is larger than 10% of the maximum pit diameter (a larger one of D.sub.L and D.sub.LT),c) the number of pits detected with a surface roughness tester having a profilometer using a stylus having a tip radius of 1 .mu.m is at last 200/mm, andd) an average centerline roughness is 0.2 .mu.m to 1.0 .mu.m.According to the present invention, a lithographic plate having the aluminum support is excellent in both of a printing durability and a stain proofness.