Abstract: A quinone diazide sulfonic acid ester of a phenol compound of the general formula (I): ##STR1## wherein Y.sub.1 and Y.sub.2 are each a hydrogen atom, an alkyl group or a hydroxyl group, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group; Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are the same or different and each a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an aryl group or halogen atom, provided that at least two of Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are hydroxyl groups; R.sub.1, R.sub.2 and R.sub.3 are the same or different and each a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group provides a positive resist composition having a high .gamma.-value.

Abstract: Method of forming a positive-positive type image is disclosed, which is characterized in that a photosensitive layer is formed on a substrate using a composition comprising water-soluble photo-crosslinking agent, water-soluble resin and synthetic resin emulsion and further coloring agent, if necessary, said photosensitive layer is exposed to active rays through manuscript, then this is immersed into warm water of 30.degree. to 60.degree. C. for not less than 3 seconds to allow the exposed area to swell and soften sufficiently with warm water and simultaneously to allow almost all water-soluble photo-crosslinking agent in the nonexposed area to dissolve out into warm water, and successively the swollen and softened exposed area is rubbed out to form an image having no coloring originating from water-soluble photo-crosslinking agent without using the development chemicals except water.

Abstract: A method of forming a photosetting film includes the steps of forming a photosensitive film containing(a) 100 parts by weight of a modified resin obtained by reacting an .alpha.,.beta.-unsaturated monocarboxylic acid derivative having an alcoholic hydroxyl group represented by formula: ##STR1## (wherein each of R.sub.1 and R.sub.2 independently represents a hydrogen atom or methyl and R.sub.3 represents a hydrocarbon residue which may contain nitrogen or oxygen) with an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride adduct having a softening point (measured by a ring and ball softening point method of JIS K2531-60) of not less than 70.degree. C. of a conjugated diene polymer or copolymer having a number-average molecular weight of 500 to 5,000, and a vinyl group content of not less than 50 mol % such that at least 10 mol % of an acid anhydride group of the adduct are ring-opened, and(b) 0.

Abstract: A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wehrein m and n are positive integers including 0, respectively, however m+n>0, and X is any of alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.

Abstract: A novel light-sensitive recording element for preparing relief plates or relief printing plates comprises a dimensionally stable base and at least one photopolymerizable recording layer (A) consisting essentially of at least one polymer as binder, at least one photopolymerization initiator, at least one photopolymerizable olefinically unsaturated compound (monomer) which is compatible with the polymeric binder, and/or photopolymerizable olefinically unsaturated radicals which are linked internally and/or terminally to the polymeric binder, and at least one additive, the said additive or at least one of the said additives being selected from the group consisting of the lecithins of the general formulae I and II ##STR1## where R.sup.1 and R.sup.2, which may be identical to or different from each other, are each C.sub.11 -C.sub.18 -alkyl or C.sub.11 -C.sub.18 -alkenyl, with the proviso that at least one of R.sub.1 and R.sub.2 is C.sub.11 -C.sub.

Abstract: A radiation-polymerizable mixture is described which comprisesa) a saturated polyurethane containing carboxyl groups and repeating urea groups as binder,b) a radical-polymerizable compound containing at least one terminal olefinic double bond and having a boiling point above 100.degree. C. at normal pressure, andc) a compound or combination of compounds capable of initiating the polymerization of compound (b) on exposure to actinic radiation.The mixture can be developed with purely aqueous developers and yields lithographic printing plates with high photosensitivity, low stickiness and high print runs.

Abstract: The method and means for carrying out pre-press color proofing processes for color press printing, wherein at least one photosensitive film is laminated onto a sample of the paper intended to be used for the final press printing, which sample has been removably applied to a shape-stable and dimensionally stable support, exposed to light, and colored with a dry toner, characterized in that an interlayer which can be stripped from the support without damage has been applied in advance on the reverse side of the paper intended to be used for the final press printing.

Abstract: A novel, improved continuous process for the production of a photosensitive recording element is described, whose photopolymerizable recording layer (A) consists of two or more individual strata (a.sub.n) lying one on top of the other and firmly bonded to one another. The individual strata (a.sub.n) may be of the same or roughly the same composition or of different compositions. In the novel, improved continuous process, the mixtures (a.sub.n) used for the production of the individual strate (a.sub.n) are prepared separately from one another and melted and, as separate molten material streams (a.sub.n), are combined even before entering the nip of a calender, without the said streams mixing as a result of turbulence. During, before or directly after they have been combined, the molten material streams (a.sub.n) are formed into molten sheet-like structures (a.sub.n) lying one on top of the other, without the said streams mixing as a result of turbulence. Thereafter, the molten sheet-like structures (a.sub.

Abstract: A radiation responsive composition containing a compound represented by the following formula (I) and a photoreducing agent capable of forming a redox couple together with said compound for many uses, e.g., image formation, etching, plating, etc.: ##STR1## wherein N represents a nitrogen atom; X represents an oxygen atom (--O--), a sulfur atom (--S--), or a nitrogen-containing group of formula, ##STR2## R.sup.1, R.sup.2, R.sup.3 and R.sup.4 each represents a mere bond, a substituted or unsubstituted alkyl, aryl, heterocyclic, acyl, aralkyl, alkenyl, alkynyl or carbamoyl group, or a sulfonyl group into which a substituted or unsubstituted alkyl or aryl group has been introduced, provided that at least one of the substituents R.sup.1 to R.sup.3 be a substituted or unsubstituted aryl or heterocyclic group and that two or more of R.sup.1, R.sup.2 and R.sup.3, or of R.sup.1, R.sup.2, R.sup.3 and R.sup.

Abstract: A semi-aqueous developable copper conductive composition which is fireable in a nonoxidizing atmosphere is developable in an aqueous solution containing 0.63 percent by weight sodium borate and 8.7 percent by weight butyl cellusolve.

Abstract: A photosensitive agent comprising an aromatic diazide compound represented by Formula (I) ##STR1## wherein X denotes ##STR2## Y denotes --CH.dbd.CH--, ##STR3## R.sub.1 is --CH.sub.2 CH.sub.2 --, R.sub.2 --CH.sub.2 CH.sub.3, R.sub.3 is hydrogen, m is 1, and n is 1,R.sub.6, R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are individually hydrogen, alkyl, substituted alkyl, aryl, or two of R.sub.6 to R.sub.9 form alkylene groups, provided that R.sub.6 to R.sub.9 are not all hydrogen simultaneouslyand use of the photosensitive agent in a photosensitive composition and in a method forming forming an image.

Abstract: An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) ##STR1## where R.sup.1 to R.sup.5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl.It is suitable for developing positive-working photoresists.

Abstract: An aqueous developing composition including(a) a nontoxic developing vehicle which is a non-solvent for any of the components of the lithographic plate;(b) a first surfactant comprising a sodium, lithium or potassium salt of xylene sulfonic acid;(c) a second surfactant comprising a sodium, lithium or potassium salt of toluene, ethyl benzene, cumene or mesitylene sulfonic acid,(d) a third surfactant comprising a sodium, lithium or potassium salt of an alkyl benzene sulfonic acid, the alkyl group containing at least 10 carbon atoms or an alkyl naphthalene sulfonic acid, the alkyl group containing from 1 to 4 carbon atoms;(e) a cold water soluble film forming agent;(f) an alkanol amine desensitizing agent; and(g) an acid to control the pH of the developing composition.

Abstract: A photosensitive aqueous developable photosensitive gold conductive composition is disclosed which is fireable in a nonoxidizing atmosphere is developable in an aqueous solution containing 0.8 percent by weight sodium carbonate.

Abstract: A photosensitive aqueous developable photosensitive copper conductive composition is disclosed which is fireable in a nonoxidizing atmosphere is developable in an aqueous solution containing 0.8 percent by weight sodium carbonate.

Abstract: A photo-polymerizable composition is disclosed, which comprisesa thermoplastic polymeric binder;a non-gaseous ethylenically unsaturated compound;a photo-polymerization initiator system composed of 4,4'-bis(dialkylamino)benzophenone, aromatic ketone and lophine dimer;an organic halogen compound; and a leuco dye.

Abstract: A phenolic resin composition comprising units of formula (I): ##STR1## wherein R.sub.1 is a halogen and R.sub.2 is a lower alkyl group having 1 to 4 carbon atoms and said units of formula (I) are made by condensing the corresponding halogen-substituted resorcinol of formula (A): ##STR2## wherein R.sub.1 is defined above, with the corresponding para-lower alkyl-substituted 2,6-bis(hydroxymethyl)-phenol of formula (B): ##STR3## wherein R.sub.2 is defined above, and wherein the mole ratio of A:B is from about 0.5:1 to 1.7:1. This phenolic resin may be mixed with photoactive compounds (e.g. 1,2-napthoquinone diazide sensitizers) to prepare a light-sensitive composition useful in a method for forming a positive photoresist image.

Abstract: This invention relates to a process for forming a pattern using a photosensitive composition comprising a polymeric azide and a high-molecular weight copolymer or polymer. The photosensitive composition comprises a copolymer containing at least a water-soluble non-photosensitive monomeric unit having an electrolytic functional group, a monomeric unit having an azido group and an electrolytic functional group and a high-soluble high molecular weight copolymer or polymer which exhibits reciprocity law failure characteristic.

Abstract: Organometal-containing polymers having side chains of the formula I ##STR1## in which, for example, M is Si, X is O, R.sup.1 and R.sup.2 are hydrogen and R.sup.4 to R.sup.6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.

Abstract: The present invention here disclosed is directed to a photosensitive polymer having an inherent viscosity of 0.1 to 5 dl/g and represented by the general formula ##STR1## wherein R.sup.1 is independently a trivalent or tetravalent carbon cyclic aromatic group or heterocyclic group; R.sub.2 is independently an aliphatic group having at least 2 carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbon cyclic aromatic group, a heterocyclic group or a polysiloxane group; R.sub.3 and R.sub.4 are CH.sub.2 --CH.dbd.CH.sub.2 ; m is 1 or 2; n is 0 or 1; and m and n satisfy 1.ltoreq.m+n.ltoreq.2.The photosensitive polymer of the present invention is applicable as electronic materials such as passivation films of semiconductors and print circuits.