Patents Examined by Johnnie L Smith
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Patent number: 8716658Abstract: The invention provides a mass spectrometer system (10) comprising a mass spectrometer (12) comprising a plurality of mass spectrometer stages (16, 18, 20, 44) in fluid communication from a low vacuum stage (16) to a higher vacuum stage (44). A split flow multi-stage pump (14) evacuates the mass spectrometer stages. The pump comprises a pump envelope (28) in which a plurality of pumping stages (20, 32, 34) are supported for rotation about an axis X generally parallel to the direction of flow in the mass spectrometer stages for pumping fluid from a main pump inlet (36) to a main pump outlet (38). At least part of a higher vacuum stage (44) is located within the pump envelope at the main pump inlet.Type: GrantFiled: September 13, 2010Date of Patent: May 6, 2014Assignee: Edwards LimitedInventor: Ian David Stones
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Patent number: 8710432Abstract: In or for a dual source mass spectrometer system (10) operable in a first mode with an LC source [LC/MS] (12) and in a second mode with a GC source [GC/MS] (18). The GC source input into an ion source chamber (22) for delivering the ionized output from the GC source to the mass spectrometer, a GC source unit (18) comprising a GC interface probe (30). The GC source unit is retractably mounted to take the GC interface probe from a retracted position in which it is disengaged from the mass spectrometer of the system, (whereby the system is operable in said first LC/MS mode) into a deployed position in which the GC interface probe is operatively connected to the ion source chamber of the mass spectrometer (whereby the system is operable in said second GC/MS mode). The GC interface probe has docking means (42, 46, 48) for releasable engagement with complementary docking means provided by a housing of the ion source chamber to allow operation with a GC ion source chamber in the second mode.Type: GrantFiled: March 8, 2010Date of Patent: April 29, 2014Assignee: Micromass UK LimitedInventor: Anthony Newton
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Patent number: 8710431Abstract: A dual source mass spectrometer system (10) is operable in a first mode with an LC source [LC/MS] (12) and in a second mode with a GC source [GC/MS] (18). The GC source inputs into an ion source chamber (22) for delivering the ionized output from the GC source to the mass spectrometer. The GC source comprises a GC interface probe (30) which is retractably connected to the ion source chamber to take the GC interface probe from a retracted position in which it is disengaged from the mass spectrometer (whereby the system is operable in the first LC/MS mode) into a deployed position in which the GC interface probe is operatively connected to the ion source chamber of the mass spectrometer (whereby the system is operable in said second GC/MS mode).Type: GrantFiled: March 8, 2010Date of Patent: April 29, 2014Assignee: Micromass UK LimitedInventor: Anthony Newton
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Patent number: 8710464Abstract: Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.Type: GrantFiled: October 23, 2009Date of Patent: April 29, 2014Assignee: Hitachi High-Technologies CorporationInventors: Yuichi Madokoro, Tsuyoshi Onishi, Megumi Aizawa, Yukio Yoshizawa
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Patent number: 8710453Abstract: A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.Type: GrantFiled: December 30, 2011Date of Patent: April 29, 2014Assignee: FEI CompanyInventor: N. William Parker
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Patent number: 8710454Abstract: Methods and devices enable shaping of a charged particle beam. A dynamically adjustable electric lens includes a series of alternating a series of alternating layers of insulators and conductors with a hollow center. The series of alternating layers when stacked together form a high gradient insulator (HGI) tube to allow propagation of the charged particle beam through the hollow center of the HGI tube. A plurality of transmission lines are connected to a plurality of sections of the HGI tube, and one or more voltage sources are provided to supply an adjustable voltage value to each transmission line of the plurality of transmission lines. By changing the voltage values supplied to each section of the HGI tube, any desired electric field can be established across the HGI tube. This way various functionalities including focusing, defocusing, acceleration, deceleration, intensity modulation and others can be effectuated on a time varying basis.Type: GrantFiled: January 4, 2012Date of Patent: April 29, 2014Assignee: Lawrence Livermore National Security, LLCInventor: Yu-Jiuan Chen
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Patent number: 8698112Abstract: An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.Type: GrantFiled: February 14, 2012Date of Patent: April 15, 2014Assignee: Gigaphoton Inc.Inventors: Takayuki Yabu, Kouji Kakizaki, Takanobu Ishihara, Tamotsu Abe, Osamu Wakabayashi
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Patent number: 8692209Abstract: A UV disinfection system for waste water and drinking water, includes a number of UV radiators arranged in cladding tubes, the cladding tubes being configured essentially symmetrically to a longitudinal axis, as well as a cleaning device for the cladding tubes. The cleaning device includes at least one cleaning ring for each cladding tube, which surrounds the cladding tube, the at least one cleaning ring having a scraper ring resting against the cladding tube, at least one drive for driving the cleaning ring in the direction of the longitudinal axis, and supply provisions for supplying pressurized fluid under elevated pressure from a pressure source to the scraper ring are provided, wherein pressure may be applied onto the scraper ring from the pressure source in the direction of the cladding tube.Type: GrantFiled: September 2, 2010Date of Patent: April 8, 2014Assignee: Xylem IP Holdings, LLCInventors: Friedhelm Krüger, Hans-Joachim Anton, Ralf Fiekens, Ernst Martin Billing
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Patent number: 8692191Abstract: A mass spectrometer having first and second mass analyzers for selecting first and second desired ions and a controller that provides control such that those of the first desired ions which have larger masses have larger kinetic energies in the direction of the optical axis in the first mass analyzer and that those of the second desired ions which have larger masses have larger kinetic energies in the direction of the optical axis in the second mass analyzer.Type: GrantFiled: December 21, 2011Date of Patent: April 8, 2014Assignee: JEOL Ltd.Inventor: Junkei Kou
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Patent number: 8680466Abstract: It is an object of the present invention to provide an electron microscope for properly applying a retarding voltage to a sample which is brought into electrical conduction.Type: GrantFiled: October 15, 2009Date of Patent: March 25, 2014Assignee: Hitachi High-Technologies CoporationInventors: Seiichiro Kanno, Hiroyuki Kitsunai, Masaru Matsushima, Toru Shuto, Kazuyuki Ikenaga
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Patent number: 8658355Abstract: The invention provides general methods for quantifying any conceivable compound including small organic molecules and biological molecules in mass spectrometric measurements. The methods include the use of chemical or biological reporters such as artificial polypeptides containing proteolytic cleavage sites, which provide proteolytic reporter peptides for standardization of mass spectrometric detection efficiency. In addition to mass spectrometry standardization between different samples, the artificial polypeptides also standardize sample preparation amongst different samples undergoing mass spectrometric analysis when using electrophoresis separation prior to mass spectrometric analysis. Methods of the present invention also include methods for designing artificial polypeptides with peak to peak continuous liquid chromatography elution profiles spanning the complete or partial analyte elution profile for organic and biological molecules.Type: GrantFiled: May 17, 2011Date of Patent: February 25, 2014Assignee: The UAB Research FoundationInventor: Michael R Heaven
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Patent number: 8648318Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.Type: GrantFiled: March 24, 2011Date of Patent: February 11, 2014Assignee: Mapper Lithography IP B.V.Inventors: Pieter Kruit, Yanxia Zhang, Martijn J. Van Bruggen, Stijn Willem Herman Karel Steenbrink
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Patent number: 8637325Abstract: A method and apparatus for conducting the rapid pyrolysis of peptides, proteins, polymers, and biological materials. The method can be carried out at atmospheric pressures and takes only about 5 to 30 seconds. The samples are cleaved at the C-terminus of aspartic acid. The apparatus employs a probe on which the sample is heated and digested components analyzed.Type: GrantFiled: February 16, 2009Date of Patent: January 28, 2014Assignee: University of WyomingInventors: Franco Basile, Shaofeng Zhang
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Patent number: 8632246Abstract: The present embodiments relate to a system for irradiating a patient. The system for irradiating the patient includes a horizontal guide and a vertical guide. The vertical guide is connected horizontally-adjustably to the horizontal guide. The system also includes a support element that is attached vertically-adjustably to the horizontal guide and a radiation unit including a radiation source. The radiation unit is arranged on the support element. The irradiation system may be expanded by three further degrees of freedom.Type: GrantFiled: May 2, 2011Date of Patent: January 21, 2014Assignee: Siemens AktiengesellschaftInventors: Franz Dirauf, Franz Fadler, Paul Weidner
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Patent number: 8633436Abstract: Methods, apparatus and systems for acquiring spectrometric data from analyte ions implement a combination of drift-type ion mobility (IM) separation and time-of-flight mass spectrometry (TOF MS). Both separation techniques are carried out in tandem while applying mass filtering with a wide window of ion isolation. One mode of operation entails utilizing a mass filter to limit ion packets to ions in a selected m/z range that remains constant over the entire course of data acquisition. Another mode entails utilizing the mass filter to limit ion packets to an m/z range that varies over the course of data acquisition.Type: GrantFiled: December 22, 2011Date of Patent: January 21, 2014Assignee: Agilent Technologies, Inc.Inventor: Michael Ugarov
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Patent number: 8629394Abstract: An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.Type: GrantFiled: October 23, 2009Date of Patent: January 14, 2014Assignee: Hitachi High-Technologies CorporationInventors: Yuichi Madokoro, Megumi Aizawa, Yukio Yoshizawa
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Patent number: 8618498Abstract: In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor.Type: GrantFiled: August 3, 2011Date of Patent: December 31, 2013Assignee: FEI CompanyInventors: Gerrit Cornelis Van Hoften, Michael Alwin William Stekelenburg, Richard Henderson, Gregory James McMullan, Abdul Raffey Faruqi, Renato Andrea Danilo Turchetta, Nicola Carlo Guerrini, Joeri Lof, Frank Jeroen Pieter Schuurmans
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Patent number: 8610060Abstract: An object of the present invention is related to detecting of a detection signal at an optimum position in such a case that a sample plane is inclined with respect to a charged particle beam. The present invention is related to a charged particle beam apparatus for irradiating a charged particle beam to a sample, in which a detector is moved to a plurality of desirable positions around the sample so as to optimize positions of the detector. In accordance with the present invention, since it is possible to obtain an optimum detection signal in response to an attitude and a shape of the sample, a highly accurate sample observation, for instance, an SEM observation, an STEM observation, and an FIB observation can be carried out. Moreover, in an FIB-SEM apparatus, it is possible to highly accurately detect an end point of an FIB process.Type: GrantFiled: October 23, 2009Date of Patent: December 17, 2013Assignee: Hitachi High-Technologies CorporationInventors: Suyo Asai, Tsuyoshi Onishi, Toshihide Agemura
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Patent number: 8610090Abstract: Disclosed are embodiments of an ion beam shield for use in an ion beam sample preparation apparatus and methods for using the embodiments. The apparatus comprises an ion beam irradiating means in a vacuum chamber that may direct ions toward a sample, a shield blocking a portion of the ions directed toward the sample, and a shield retention stage with shield retention means that replaceably and removably holds the shield in a position. The ion beam shield has datum features which abut complementary datum features on the shield retention stage when the shield is held in the shield retention stage. The shield has features which enable the durable adhering of the sample to the shield for processing the sample with the ion beam. The complementary datum features on both shield and shield retention stage enable accurate and repeatable positioning of the sample in the apparatus for sample processing and reprocessing.Type: GrantFiled: December 29, 2012Date of Patent: December 17, 2013Assignee: Gatan Inc.Inventors: Steven Thomas Coyle, John Andrew Hunt
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Patent number: 8604429Abstract: An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms. To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen.Type: GrantFiled: January 20, 2010Date of Patent: December 10, 2013Assignee: Hitachi High-Technologies CorporationInventors: Toshie Yaguchi, Yasuhira Nagakubo, Takeo Kamino, Akira Watabe