Abstract: A plasma chamber (11?) for coating a substrate with a polymer layer, the plasma chamber includes a first electrode set (14?) and a second electrode set (14?), the first and second electrode sets are arranged either side of a sample chamber for receiving a substrate, wherein the first and second electrode sets include plural electrode layers (141?, 142?) and wherein each electrode set includes plural radiofrequency electrode layers or plural ground electrode layers for coating polymer to each surface of a substrate.

Abstract: The present disclosure relates to a bioprinter spray head assembly, comprising a mounting block having a passage and a spray head mounted in the passage, wherein a first flow channel is provided in the mounting block, one end of the first flow channel is provided with a port communicating with the passage; the spray head comprises an equal diameter portion away from an outlet of the passage and a reduced diameter portion close to the outlet of the passage, wherein a second flow channel is formed between the reduced diameter portion and the passage, an opening is formed between the reduced diameter portion and the port to communicate the first flow channel and the second flow channel, and the equal diameter portion is configured to occlude the port. The adjustment of the circulation area of the spray head assembly may be achieved by changing the relative positions of the reduced diameter portion and the port, so that the adjustment is convenient and easy to carry out, and there is a favorable implementability.

Abstract: Apparatus and methods for processing a semiconductor wafer in which a sensor (e.g., a contact thermocouple) is positioned in the gas distribution assembly measures temperature and/or a film parameter before, during and/or after deposition are described.

Abstract: A coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall defines a chamber center. A plasma source is positioned at the chamber center. The coating system also includes a sample holder that holds a plurality of substrates to be coated which is rotatable about the chamber center at a first distance from the chamber center. A first isolation shield is positioned about the chamber center at a second distance from the chamber center, the first isolation shield being negatively charged.

Abstract: An arc coating system includes a coating chamber having a peripheral chamber wall, a top wall, and a bottom wall. The peripheral chamber wall, the top wall, and the bottom wall define a coating cavity and a chamber center. A plasma source is positioned at the chamber center wherein the plasma source comprises a central cathode rod and a plurality of cathode rods surrounding the central cathode rod. The coating system also includes a sample holder that holds a plurality of substrates to be coated. Characteristically, the sample holder rotatable about the chamber center at a first distance from the chamber center.

Abstract: In a coating method example, a coating is formed on a part precursor by blasting the part precursor with a blast medium. The blast medium includes blasting beads and a coating agent. The part precursor is formed from a polymeric build material, and a hardness of the blasting beads is greater than a hardness of the polymeric build material.

Abstract: A system includes a transfer device for transferring workpieces in an atmospheric atmosphere, a transfer unit for transferring the workpieces in a vacuum atmosphere, and a vacuum processing unit including vacuum process chambers connected to the transfer unit and for performing a process on the workpieces in each process chamber. The vacuum processing unit simultaneously performs the process on the workpieces in each process chamber. The process chambers are arranged along a first direction. The transfer unit includes first and second common transfer devices installed along the first direction to transfer the workpieces along the first direction. The first common transfer device is connected to each process chamber at a first side in a second direction perpendicular to the first direction, the second common transfer device is connected to each process chamber at a second side in the second direction.

Abstract: The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.

Abstract: A drawing apparatus, which draws carbon nanotubes from a grown form produced by growing carbon nanotubes, includes a holder for holding a part of the grown form by a holding member and a drive unit for causing a relative movement of the grown form and the holder. The holder includes a winding unit for winding a part of the grown form around the holding member.

Abstract: The present disclosure is directed to improved poly(arylene ether ketone) powders for use in laser sintering.

Abstract: A processing apparatus is provided. The processing apparatus includes a processing chamber having a gas outlet. The processing apparatus further includes a pump. The pump communicates with the gas outlet and is configured to exhaust gas from the processing chamber via the gas outlet. The processing apparatus also includes an intersecting module. The intersecting module includes a number of support members and a number of internal ventilating plates. The support members are arranged along a longitudinal direction, and each of the internal ventilating plates has a number of orifices. At least one of the internal ventilating plates is positioned between two of the support members positioned adjacent to each other.

Abstract: Apparatus and method for processing a plurality of substrates in a batch processing chamber are described. The apparatus comprises a susceptor assembly, a lift assembly and a rotation assembly. The susceptor assembly has a top surface and a bottom surface with a plurality of recesses in the top surface. Each of the recesses has a lift pocket in the recess bottom. The lift assembly including a lift plate having a top surface to contact the substrate. The lift plate is connected to a lift shaft that extends through the susceptor assembly and connects to a lift friction pad. The rotation assembly has a rotation friction pad that contacts the lift friction pad. The rotation friction pad is connected to a rotation shaft and can be vertically aligned with the lift friction pad.

Abstract: The invention includes apparatus and methods for instantiating and quantum printing materials, such as elemental metals, in a nanoporous carbon powder.

Abstract: A method of fabricating a friction part out of composite material, the method including densifying a carbon yarn fiber preform with a matrix including at least pyrolytic carbon and a ZrOxCy phase, where 1?x?2 and 0?y?1, the matrix being formed by film-boiling or by chemical vapor infiltration from a first precursor for pyrolytic carbon and a second precursor that includes zirconium, the second precursor being a zirconium complex including an alcoxy or carboxylate ligand bonded to zirconium.

Abstract: The present disclosure generally relates to methods and apparatuses for secondary material deposition and insert deposition during additive manufacturing (AM) processes. Such methods and apparatuses can be used to embed chemical signatures into manufactured objects, and such embedded chemical signatures may find use in anti-counterfeiting operations and in manufacture of objects with multiple materials.

Abstract: Methods for printing a conductive object are provided which may comprise dispensing one of a first ink composition and a second ink composition towards a substrate surface to form a deposition region on the substrate surface or on a previously printed object on the substrate surface, wherein the first ink composition comprises an aqueous solution of a metal compound and the second ink composition comprises an aqueous solution of a stable free radical; dispensing the other of the first and second ink compositions in the deposition region to mix the first and second ink compositions and induce chemical reduction of the metal compound by the stable free radical and precipitation of the metal of the metal compound; and removing solvent from the deposition region, thereby forming a conductive object comprising the precipitated metal.

Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press

Abstract: Protective coatings with one or more additives dispersed therethrough are disclosed. A protective coating may comprise a poly(p-xylylene), or parylene. An additive may be configured to cause the protective coating to contrast (e.g., visibly, etc.) with features or components that are exposed beyond a periphery of the protective coating. Additives that provide other characteristics are also disclosed. In addition, methods for applying protective coatings according to this disclosure are disclosed, as are inspection methods.

Abstract: A vapor deposition device includes: a retaining portion, which is configured to retain a substrate; a basket filament-type heater, which is formed of a linear heat-generating element, which is configured to generate heat through application of a current, and which includes an accommodating portion formed so as to allow a vapor deposition material to be accommodated by bending the linear heat-generating element, the filament-type heater being arranged so that the accommodating portion is positioned at a predetermined distance in a horizontal direction of the basket filament-type heater from the substrate retained on the retaining portion; and a reflective plate, which is arranged on a rear side of the vapor deposition material accommodated in the accommodating portion, when viewed from the substrate retained on the retaining portion, and which is constructed so as to receive heat from the basket filament-type heater.

Abstract: A system and method for providing intermediate reactive species to a reaction chamber are disclosed. The system includes an intermediate reactive species formation chamber fluidly coupled to the reaction chamber to provide intermediate reactive species to the reaction chamber. A pressure control device can be used to control an operating pressure of the intermediate reactive species formation chamber, and a heater can be used to heat the intermediate reactive species formation chamber to a desired temperature.