Abstract: Methods of using ozone have been developed which sterilize instruments and medical wastes, oxidize organics found in wastewater, clean laundry, break down contaminants in soil into a form more readily digested by microbes, kill microorganisms present in food products, and destroy toxins present in food products. The preferred methods for killing microorganisms and destroying toxins use pressurized, humidified, and concentrated ozone produced by an electrochemical cell.

Abstract: A machine for cleaning a die by using electrolysis and ultrasonic vibration which has in combination a degreasing processing system, an electrolytic-cleaning system with an electrolyte circulator system, and a rinse system. The die, in a container, is dipped into an electrolytic liquid tank with an ultrasonic vibrator, and it is electrolyzed in a cleaning medium for large sized dies and die components.

Abstract: A method for preparing a semiconductor wafer surface is provided which includes providing a plurality of source inlets and a plurality of source outlets and applying isopropyl alcohol (IPA) vapor gas through the plurality of source inlets to the wafer surface when the plurality of source inlets and outlets are in close proximity to the wafer surface. The method also includes applying a fluid through the plurality of source inlets to the wafer surface while applying the IPA vapor gas, and removing the applied IPA vapor gas and fluid from the wafer surface through the plurality of source outlets.

Abstract: A fine filter assembly for a dishwasher includes a filter body, a filter screen coupled to the body; and a pressure relief tube. The pressure relief tube includes a substantially vertical portion having an open top for regulating pressure conditions in the filter body, thereby forming a standpipe that regulates pressure in the filter body. A column of fluid in the relief tube balances the operating pressure in the fine filter assembly. Pressure may be regulated in the fine filter assembly up to a maximum pressure determined by the height of the vertical portion of the tube.

Abstract: A wet processing device of this invention is comprised of a chemical processing tank to store chemicals for processing the surface of the wafer, a wafer conveyor device to carry the wafer in and out of the interior of the chemical processing tank, and a sensor to determine the amount of air bubbles occurring within the chemical when present within the chemical processing tank and issue a first and a second control signal, and a wash tank to store water for washing the wafer carried out from the chemical processing tank by the wafer conveyor. The rising speed of the wafer conveyor device pulled the wafer up from the chemical processing tank is controlled in response to the first control signal, and the wash tank water fill quantity for supplying water to the wash tank is controlled in response to the second control signal.

Abstract: A dry process for the cleaning of precision surfaces such as of semiconductor wafers, by using process materials such as carbon dioxide and useful additives such as cosolvents and surfactants, where the process materials are applied exclusively in gaseous and supercritical states. Soak and agitation steps are applied to the wafer, including a rapid decompression of the process chamber after a soak period at higher supercritical pressure, to mechanically weaken break up the polymers and other materials sought to be removed, combined with a supercritical fluid flush to carry away the loose debris.

Abstract: A household dishwasher, includes a dishwashing compartment, a circulating pump for delivering liquid to the dishwashing compartment, a flow heater having an inflow connection fluidically connected to the circulating pump and at least two outlet connections, spray devices disposed in the dishwashing compartment and fluidically connected to outlet connections for supplying the liquid to each of the spray devices, and a changeover device for selectively opening and closing the spray devices. The spray devices subject items disposed in the dishwashing compartment and to be cleaned to an action of a liquid delivered by the circulating pump. The changeover device is disposed in a non-restricting location at the flow heater upstream of the outlet connections with respect to a liquid flow direction and opens and/or closes one of the outlet connections or a number of outlet connections or all the outlet connections are alternately one after the other and/or on a permanent basis. A method is also provided.

Abstract: An apparatus for cleaning a semiconductor wafer is disclosed to substantially improve the efficiency of the cleaning process, and reduce the quantity of cleaning solvent used. The apparatus includes a rotating table for supporting the wafer, a rotation device to rotate the rotation table, a movable or stationary curved-slab for scrubbing the surface of the wafer efficiently, a cleaning nozzle for applying a cleaning solvent or stripper on the surface of the wafer, and a resistance wall for preventing the cleaning solvent spun out from the wafer to pollute the cleaning room.

Abstract: A liquid waste disposal and canister flushing system for a medical canister including a press-fit canister lid, features a cabinet with an opening and a sink with a drain positioned therein. A mounting bracket is affixed to the cabinet and includes a shaft connected to the canister bracket for rotating the canister and a shaft connected to the lid removal bracket for removing the canister lid from the canister. The canister is secured within the canister bracket and is rotated from an initial position to a drainage position. The canister lid is positioned on the removal bracket and is rotated from an initial position to a removal position. Once the canister is rotated into the drainage position, the pressurized and diluted cleaning solution source is activated to flush the contents out of the canister and into the sink and drain. After the canister is sanitized it may be removed from the system and reused.

Abstract: A dish washing machine according to the present invention has vertically divided upper and lower doors 16 and 17 for covering an opening of a washing chamber. The upper door 16 is opened through its upward pivotal movement about its shafts 20. The lower door 17 is opened through its downward pivotal movement about its shafts 22. The upper door 16 is fully opened through its pivotal movement substantially through 180 degrees. The lower door 17 is opened to a substantially horizontal position. And when the lower door 17 is in this opened state, a basket 4 contained in the washing chamber 3 can be pulled out onto the lower door 17.

Abstract: A probe wash vessel characterized as having a cylindrical-shaped, outer test tube with at least two vertically aligned faucets, and an inner cannula positioned within the test tube, wherein the inner cannula is characterized by a top funnel opening attached to a stem, the stem characterized as having two arm extensions are attached to the two faucets, wherein washing fluid influent and effluent through the arm extensions washes a probe inserted through the top funnel into the stem.

Abstract: The invention relates to an installation for treating wafers made of materials serving as microelectronics substrates including a tank for containing a treatment bath, a wafer support device capable of receiving at least one wafer of a first size, and an element for grasping and placing each wafer of the first size in the bath and for removing it therefrom. The installation further includes a support for receiving at least one wafer of a second size that is smaller than the first size, the shape of the support allowing it to be grasped by the grasping element and received by the wafer support device in the tank.

Abstract: A disposal method of a waste optical disc is useful when a substrate material is collected from the disc. A space is created between a recording layer and a reflective layer between both of which there exists the smallest mutual adhesion by cutting a surface of a protective layer side of an optical disc. Then, the reflective layer and the protective layer are peeled off and removed from the optical disc by introducing air into the space therebetween. Then, the recorded layer remaining on a substrate layer can be removed by cutting.

Abstract: An ultrasonic cleaning apparatus (10) and method for use with a cleaning solution for cleaning soiled items, such as automobile parts. The cleaning apparatus includes a cleaning tank (11) for containing a quantity of the cleaning solution therein, with the cleaning tank having a bottom and a top. An ultrasonic generator (17, 18, 122) is provided for ultrasonically exciting the cleaning solution contained within the tank. The tank includes an upper drain (32, 33 or weir 200) and a lower drain (21). A coalescing filter (14) is used for filtering the cleaning solution. A sump tank (12) provides an extra quantity of the cleaning solution for at times overfilling the tank to draw off light ends of oils and greases from the top of the tank. At other times, the lower drain is used to draw off heavy ends of greases and oils from the bottom of the tank.

Abstract: An automatic production system includes an automatic washing device usable to wash off swarf left on a workpiece by an NC machine tool. The automatic washing device is used before measuring a portion of a workpiece using a three dimensional measuring device controlled by a measuring part program controlling the three dimensional measuring device. When automating an operation of the washing device, a washing program is produced based on the a measuring part program controlling the three dimensional measuring device to be able to efficiently wash a minimal area of the work piece encompassing the portion of the workpiece to be measured.

Abstract: A machine for the treatment of products made of plastic material of the recyclable type comprises a drum rotating about one of its own axis, at least one inlet for the introduction of the products to the inside of the drum and means for feeding a treatment fluid to the inside of the drum, the latter comprising one or more sections having a perforated side wall and one or mode sections having a discontinuous side wall.

Abstract: A rotor (1) includes a pair of flanges (4, 5), four fixed holding bars (30) fixed to the flanges (4, 5), and two movable holding bars (60) supported for turning on the flanges (4, 5). The holding bars (30, 60) are provided in their surfaces with positioning grooves (32a) for positioning and holding wafers (W). The holding bars (30, 60) are provided with drain grooves (32b) connected to the positioning grooves (32a). The drain grooves (32b) prevent a processing liquid from staying in the positioning grooves (32a).

Abstract: A cleaning method to remove ink from the surface of a semiconductor wafer includes securing the wafer to a spin chuck, submerging the spinning wafer into an N-Methyl-Pyrolidone (NMP) solution to dissolve the ink on the surface of the semiconductor wafer, spraying a cleaning solution onto the surface of the spinning wafer to clean the ink off the surface of the wafer, and blowing gas onto the surface of the spinning wafer so as to remove residue from the surface of the wafer.

Abstract: An improved pump for washing machines provides resistance to roping of filamentary materials through the use of a single vane impeller. A combination of high clearance and elastomeric vane and asymmetry of the impeller serve to prevent or reduce clogging caused by filamentary materials.

Abstract: A cleaning unit (A) includes a movable cart (20) which carries a cleaning system for cleaning baked-on residues from walls (10) of a sterilizer chamber (12). Alkaline and acid cleaning solutions (180, 182), for removing organic and inorganic residues, respectively, from the chamber, are stored in a multi-compartment container carried by the cart and having two storage compartments (52, 54). The alkaline and acid solutions are sequentially sprayed over the chamber walls and returned to their respective compartments. After cleaning is complete, a wall (200) which separates the two compartments is punctured. The two cleaning fluids are thereby mixed together to form a neutral or near neutral solution which is disposable in a sanitary sewer system without further treatment.