Abstract: A wet cleaning apparatus can remove trace heavy metals, colloidal matter or other impurities contained in ultra-pure water to be used as rinse water in semiconductor cleaning processes and suppress deposit of trace impurities such as heavy metals or other particles that would otherwise cause characteristics of such devices to deteriorate. A wet cleaning apparatus for rinsing with ultra-pure water as a rinse liquid by supplying ultra-pure water through a piping to a rinse location inside the apparatus. The rinse location is a point of use of the ultra-pure water. The wet cleaning apparatus includes a module filled with porous film in which polymer chains having at least one of an anion exchange group, a cation exchange group, and a chelating group are held in the middle of the piping positioned inside the apparatus. The wet cleaning apparatus further includes a means for adding hydrogen gas to the rinse liquid.

Abstract: A drawer dishwasher includes a drawer which is movable from a closed to an open position. A lid is separate from the drawer and is adapted to seal over the top of the drawer when the drawer is in its closed position and to move upwardly and away from the drawer in response to movement of the drawer from its closed to its open position. Recirculation plumbing and draining plumbing are connected to the drawer dishwasher and lead to a remote pump and reservoir for receiving drained fluid from the drawer and for recirculating drained fluid back into the spray assembly within the drawer.

Abstract: The present invention provides a vertical batch type wafer cleaning apparatus comprising a wafer bearing apparatus in a cleaning tank. The wafer bearing apparatus comprises three parallel upstanding racks and a plurality of wafer shelves arranged up and down between the three racks. Three deflections are uniformly formed at edge of each of the wafer shelves. The three racks have two cover bodies at two ends thereof to connect two rotators. The wafer bearing apparatus is driven to rotate by synchronous rotation of the two rotators. A flow distributor is provided in the cleaning tank to connect an output pipe of the cleaning solution supply tank so that cleaning solution can be distributed and transferred to between the wafer shelves. Two filter pipes are provided between the cleaning tank and the cleaning solution supply tank to let cleaning solution be used in recirculating way. The present invention has advantages of enhanced cleaning efficiency and reduced cost.

Abstract: A wafer cleaner and dryer to be used in wafer manufacturing operations is provided. The wafer cleaner and dryer has a proximity head which moves toward a wafer surface to complete either a cleaning or a drying operation. The proximity head includes a plurality of source inlets where the plurality of source inlets generates a first pressure on a fluid film present on the wafer surface when the proximity head is in a first position that is close to the wafer surface. The proximity head also contains a plurality of source outlets which introduces a second pressure on the fluid film present on the wafer surface when the proximity head is in the first position. The first pressure generated by the plurality of source inlets is greater than the second pressure created by the plurality of source outlets so as to create a pressure difference where the pressure difference causes removal of the fluid film from the wafer surface.

Abstract: A washing and recycling unit for on-site washing of heavy machinery. The unit has a supporting frame onto which is mounted a washing liquid storage tank. A washing hose arrangement connected to the tank injects washing liquid over the heavy machinery. A drainage receptacle positioned under the heavy machinery collects used liquid mixture falling from the heavy machinery. The used liquid mixture is sucked up with a suction hose connected to a cyclone which separates rough solids from liquids. A pump and filtering arrangement recycles liquid from a settling tank under the cyclone by pumping it out, filtering it and transferring it into the washing liquid storage tank. A hoisting system mounted onto the supporting frame is used to movably support an operator directing the washing liquid around the heavy machinery.

Abstract: A dispensing device of detergents and/or additives for washing machines is described, of the type having at least a space for containing a liquid, such as a rinse aid, the body of the device including at least a first part and a second part, the parts being made integral with each other by welding, wherein a portion of the body is intended to be inserted through an opening of a wall, a surface of the wall facing on a washing tank while the opposite surface of the wall faces on a space which has to be sealed from the tank. According to the invention, a seal is provided, in order to prevent leakage of the liquid from the welding into the space.

Abstract: An apparatus for cleaning dirty roller bearings having inner and outer rings finds particular applicability for on the spot washing of bearings used on sports and leisure equipment such as, for example, skateboards and inline skates, after being dismantled from the equipment. A circular head plate is receivable on a container for containing a volume of cleaning fluid. Accommodating axes are disposed circularly on the head plate for accommodating the roller bearings that arc to be cleaned, with the inner rings of the roller bearings in frictional contact therewith. A drive shaft including an external hand wheel is rotatably connected through the head plate to permit rotation of the drive shaft relative to the head plate and the accommodating axes when the hand wheel is turned.

Abstract: A utility grill pail for cleaning barbecue grills. The pail includes an open top container with a raised rib bottom. A perforated front lip extends inward from a front portion of the container sidewall. Side hand grip openings and a rear hand grip opening are formed in the sidewall near its upper edge. The rear hand grip opening carries two removable hooks that hold the barbecue grill while rinsing and draining. The pail holds a quantity of cleaning solution into which the grill may be placed to soak before scrubbing and cleaning.

Abstract: A dual dishwasher construction includes an upper drawer dishwasher and a lower dishwasher of conventional construction. The upper drawer has a lid which moves upwardly and downwardly in response to the opening and closing of the drawer. A fluid reservoir is positioned remote from the upper drawer dishwasher and conduits interconnect the fluid reservoir with the drawer dishwasher.

Abstract: A dispensing device for dispensing liquid detergent in dishwashers is provided in which the detergent is fed into the wash area of the dishwasher only after the second actuation of the actuating member. This is achieved by providing: a barrier on the discharge side for the detergent in the operating position, which barrier is sequenced to follow a supply chamber. A return opening is provided to return the retained detergent in the fill position.

Abstract: A semiconductor processing system has a liquid chemical metering and delivery system including a process tank and a metering vessel. Fluid level detectors detect the fluid level in the process tank and metering vessel. A two stage fill valve fills the metering vessel from bottom to top. A dispense valve dispenses the metered contents of the vessel into a process tank via gravity, to form a chemical solution in the process tank, with high mixing accuracy. The volumes of the metering vessel and process tank and the inflow and outflow rates are set to provide 100% up time to a process chamber which uses the chemical solution to process semiconductor wafers or other flat media.

Abstract: A cassette holder is positioned within cleaning equipment. The cleaning equipment includes a solution tank, at least one pipe positioned on an internal wall of the solution tank, and a cassette in which at least one semiconductor wafer is placed. The cassette holder has a loading plate in the solution tank for holding the cassette. Pluralities of guide blocks mounted on the loading plate prevent movement of the cassette. A side-frame is positioned at an end of the loading plate proximate to the pipe. The bottom of the loading plate has a plurality of neck feet, and each neck foot is covered by a first tube that enhances support strength of the neck foot. The cassette holder further includes at least one weight to overcome buoyancy.

Abstract: An exhaust apparatus for a treatment unit of electrical components, preferably wafers, particularly for a spray tool to clean electrical components, is described. To ensure that particles of a size greater than or equal to 0.16 &mgr;m in diameter can be reliably removed from the treatment unit, which particles would otherwise cause contamination of the electrical components, the exhaust apparatus is provided with a main exhaust pipe and a side pipe. The main exhaust pipe has an outside pipe and an inside pipe, whereby the inside pipe is equipped with a number of nozzles. The side pipe connects the treatment unit with the main exhaust pipe and which has an outside pipe and an inside pipe, whereby the inside pipe is equipped with a number of nozzles. The inside pipes are connected with a source of a cleaning fluid such that the cleaning fluid at least intermittently flows through the inside pipes for the purpose of rinsing.

Abstract: The present invention 10 discloses a portable apparatus for rotatably maintaining a length of conduit 12 on an incline to allow an operator 16 to easily and thoroughly clean the conduit as he sprays a jet stream of liquid 24 into the conduit and rotates it manually to ensure the circumferential cleansing of the interior of the conduit. A pair of rows of rollers 14 are mounted on the top surface of the platform 36 surface upon which the conduit 12 revolves. The platform 36 is hingedly pivoted 42 at its midsection for folding. Multiple legs support the platform 36 on an incline, having a longer leg 26 having an A-frame shape and a shorter leg 58. Both legs 26, 58 are foldable and leg 26 is height adjustable. A rotatable pylon stop member 44 is positioned on the lower end of the platform 36 to retain conduit 12 on the platform 36. A slidable tray 46 is disposed on platform 36 for accepting longer conduits 12. A drive system 78 may also be provided to mechanically turn the rollers 14 and thereby the conduit 12.

Abstract: An enhanced gradient dragout system conserves plating chemicals, including precious metals by providing a series of tanks with cascading rinse solutions having a flow rate controlled by heating the first tank to increase the evaporation rate. A portion of the concentrated solution in the heated tank is returned to the process tank. The system minimizes the requirements for clean rinse water, and the need for emptying contaminated rinse tanks with associated recovery and disposal environmental and cost issues. The low cost system is flexible and the process is adapted to the material and process requirements of the plating line.

Abstract: A washer includes driving and scrubbing rollers that press against the opposing surfaces of a substrate, which may be, e.g., a small form factor disk. The driving rollers and scrubbing rollers are approximately aligned along two different radii of the substrate that are separated by 180 degrees. The driving rollers rotate in opposite directions as do the scrubbing rollers. During the scrub cycle, the driving rollers cause the substrate to rotate, while the scrubbing rollers scrub the opposing surfaces of the substrate. Outside diameter rollers that are orthogonally positioned relative to the driving rollers and the scrubbing rollers, and which may be free spinning, contact the outside diameter of the substrate and hold the substrate in position during the scrub cycle. The substrate is loaded into the washer by lifting the substrate, via a lifting arm, to the driving and scrubbing rollers.

Abstract: The invention relates to a process for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and around this edge onto the second surface, the liquid wetting a defined section near the edge on the second surface and thereupon being removed from the wafer-shaped article. Furthermore the invention relates to a device for executing this process.

Abstract: A dishwasher having a wash chamber or tub including a sump and a side wall. A pump is fluidly connected with the sump and a supply tube is supported adjacent the tub side wall and receives wash liquid from the pump, the supply tube has a manifold portion including a plurality of outlet openings. A coupling retainer is connected to the supply tube and has a plurality of funnel shaped coupling ports corresponding in number and spacing to the outlet openings of the supply tube. Each of the coupling ports includes a center opening which is provided with a sealing surface. A valve member supports a plurality of valve elements for sealing the outlet openings and is captured between the coupling retainer and the supply tube such that the valve elements generally align with the coupling ports. At least one adjustable height basket is supported within the tub and a spray arm is associated with the adjustable height basket and has a feed tube extending toward the supply tube.

Abstract: An automated acid etching machine for glass and ceramic items includes a plurality of horizontal arms rotatable about a central hub, a vertically translatable arm attached to each of the horizontal arms, a carrier head attached to each of the vertically translatable arms, and item gripping means located on the carrier head. Treatment stations are circumferentially located about the hub. After the items are secured by a gripper, the horizontal arm indexes to the first treatment station, and the vertically translatable arm inserts and then retracts the items into the treatment station. The items are indexed among the plurality of stations until the etching process is complete. The stations have slotted roofs allowing the carrier heads to index from station to station without completely exiting the structure. Items secured to each of the carrier heads are treated in the various different treatment stations simultaneously.

Abstract: A rinsing tank for rinsing with ultra clean liquid comprises a rinsing chamber confined by an enclosure equipped at the bottom part with a diffusing device with a perforated base plate connected to a first pressurized cleaning liquid supply system, and with an overflow spout at the upper part. The periphery of the perforated base plate of the diffusing device is equipped with a plurality of projection nozzles or injectors connected to a second pressurized liquid supply system. The rising flow coming from the injectors causes a downward circulation of liquid designed to remove the contaminants and particles present at the surface of the substrates. The hydraulic piston effect generated by the first supply system of the base plate forces the rinsing liquid upwards towards the overflow spout. The tank may be used for rinsing of silicon, quartz, germanium, glass, etc. substrates commonly used in the semi-conductors, micro-systems and flat screen industries.