Abstract: Imaging by cryo-electron microscopy (cryo-EM) requires that a sample be encased in an amorphous solid, such as amorphous ice. In current cryo-EM preparation systems, once the sample has been deposited on an EM grid and coated in the amorphous solid, the EM grid must be removed from vacuum and then transferred into the vacuum of the cryo-EM system. As a result, samples deposited on the grid are exposed to damage and contamination. The present invention provides improved EM grid handling systems and devices compatible with advanced cryo-EM sample preparation techniques and which reduce or eliminate exposure of the sample on the grid to atmosphere and elevated temperatures. These methods and devices will also significantly reduce handling time and complexities associated with cryo-EM sample preparation.

Abstract: A dissociation device fragments a precursor ion, producing at least two different product ions with overlapping m/z values in the dissociation device. The dissociation device applies an AC voltage and a DC voltage creating a pseudopotential that traps ions below a threshold m/z including the at least two product ions. The dissociation device receives a charge reducing reagent that causes the trapped at least two product ions to be charge reduced until their m/z values increase above the threshold m/z set by the AC voltage. The increase in the m/z values of the at least two product ions decreases their overlap. The at least two product ions with increased m/z values are transmitted to another device for subsequent mass analysis by applying the DC voltage to the dissociation device relative to a DC voltage applied to the other device.

Abstract: An apparatus for generating extreme ultraviolet (EUV) light includes a raw material supply unit supplying a plasma source for generating EUV light. An EUV light source unit uses a laser to generate plasma from the plasma source. A filter is configured to extract EUV light from the light. A first protective layer is disposed on a front surface of the filter. A frame having a first region exposing at least a portion of the filter or the first protective layer is disposed on the first protective layer. A width of the first region is smaller than a width of the first protective layer and smaller than or equal to a width of the filter.

Abstract: A carrier grid with integrated gas delivery system for use in a charged particle beam system (CPB). The carrier grid has a body with an internal reservoir for storing a gas. A post extends from the body with an end for supporting a sample to be operated upon, and an outlet tip extends from the end of the post. A channel extends from the reservoir, through the post and ends in the outlet tip, where the outlet tip seals the stored gas in the body. Cutting the outlet tip near its base, with a focused ion beam (FIB) by example, will open the channel to the CPB chamber, allowing the prestored gas within the reservoir to escape. A FIB or electron beam directed at the junction of the sample positioned near the post will cause deposition and subsequent attachment of the sample to the post in presence of the gas.

Abstract: An ion detection current conversion circuit includes a conversion amplifier coupled with a conversion resistor assembly for converting an ion detection current produced by an ion detector into an ion detection voltage, the conversion resistor assembly comprising a resistor having a high resistance and a capacitive compensation element, and a compensation voltage circuit for deriving a compensation voltage from the ion detection voltage and feeding the compensation voltage to the capacitive compensation element, the compensation voltage circuit comprising a variable resistor for adjusting the compensation voltage.

Abstract: A metrology method for use in determining one or more parameters of a three-dimensional patterned structure, the method including performing a fitting procedure between measured TEM image data of the patterned structure and simulated TEM image data of the patterned structure, determining a measured Lamellae position of at least one measured TEM image in the TEM image data from a best fit condition between the measured and simulated data, and generating output data indicative of the simulated TEM image data corresponding to the best fit condition to thereby enable determination therefrom of the one or more parameters of the structure.

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Abstract: A method comprising the irradiation of a wafer by an ion beam that passes through an implantation filter. The wafer is heated to a temperature of more than 200° C. The wafer is a semiconductor wafer including SiC, and the ion beam includes aluminum ions.

Abstract: Certain configurations of plasma discharge chambers and plasma ionization sources comprising a plasma discharge chamber are described. In some examples, the discharge chamber comprises a conductive area and is configured to sustain a plasma discharge within the discharge chamber. In other examples, the discharge chamber comprises at least one inlet configured to receive a plasma gas and at least one outlet configured to provide ionized analyte from the discharge chamber. Systems and methods using the discharge chambers are also described.

Abstract: A radiation source apparatus includes a vessel, a laser source, a collector, and a reflective mirror. The vessel has an exit aperture. The laser source is at one end of the vessel and configured to excite a target material to form a plasma. The collector is disposed in the vessel and configured to collect a radiation emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The reflective mirror is in the vessel and configured to reflect the laser beam toward an edge of the vessel.

Abstract: A pulse shaping circuit for a spectrometer comprises a circuit input terminal for receiving detector pulses from an analog ion detector, a flip-flop for receiving detector pulses from the circuit input terminal, a delay unit for receiving output pulses from the flip-flop and feeding delayed output pulses to a reset input terminal of said flip-flop, and a circuit output terminal for supplying the output pulses or the delayed output pulses to a counter. The duration of the output pulses and the minimum duration of the interval between the output pulses is determined by the delay unit. The pulse shaping circuit may comprise at least one Schmitt trigger.

Abstract: The present disclosure concerns an electron microscopy method, including the emission of a precessing electron beam and the acquisition, at least partly simultaneous, of an electron diffraction pattern and of intensity values of X rays.

Abstract: A method of mass spectrometry for analyzing a sample within a mass range of interest includes the steps: ionizing the sample to produce a plurality of precursor ions; performing an MS1 scan of the precursor ions comprising mass analyzing the precursor ions across the mass range of interest, to obtain an MS1 mass spectrum of the precursor ions; determining ion intensity values within the MS1 mass spectrum; selecting precursor mass segments within the mass range of interest, and for each precursor mass segment: fragmenting the precursor ions within that precursor mass segment; and performing an MS2 scan of the fragmented ions by: controlling an amount of fragmented ions for that precursor mass segment, based on an intensity value for that precursor mass segment derived from the MS1 spectrum; and mass analyzing the amount of fragmented ions.

Abstract: A method and a system for producing a change in a medium. The method places in a vicinity of the medium an energy modulation agent. The method applies an initiation energy to the medium. The initiation energy interacts with the energy modulation agent to directly or indirectly produce the change in the medium. The energy modulation agent has a normal predominant emission of radiation in a first wavelength range outside of a second wavelength range (WR2) known to produce the change, but under exposure to the applied initiation energy produces the change. The system includes an initiation energy source configured to apply an initiation energy to the medium to activate the energy modulation agent.

Abstract: An ion mobility separator comprises an RF-device for transversely confining ions in an ion region using: (a) a first set of electrodes arranged parallel to one another along a direction of ion travel to define a first transverse boundary of the ion region, and that are supplied with a first RF-voltage such that different phases of the first RF-voltage are applied to adjacent electrodes of the first set; and (b) a second set of electrodes arranged parallel to one another along said direction of ion travel to define a second transverse boundary of the ion region, and that are supplied with a second RF-voltage such that different phases of the second RF-voltage are applied to adjacent electrodes of the second set, the first and second transverse boundaries being substantially opposite each other in a transverse direction of the ion region and the first and second RF voltages having different frequencies.

Abstract: Spectrums are measured by irradiating an electron beam on a sample while varying an accelerating potential and by detecting X-rays emitted from the sample. A normalizer unit normalizes the spectrums and thereby calculates normalized spectrums. A difference calculator unit calculates difference spectrums based on the normalized spectrums. A search unit performs a search in a database for each comparison difference spectrum, and identifies compounds contained in the sample.

Abstract: Characteristic X-rays (soft X-rays) from a sample are detected using a spectroscope to thereby generate a plurality of intensity spectrums arranged in order of time sequence. A contour map creation unit creates a contour map by converting, in accordance with a color conversion condition, the plurality of intensity spectrums into a plurality of one-dimensional maps, and arranging the plurality of one-dimensional maps in order of time sequence. When displaying the contour map, a waveform array and a difference contour map may also be displayed. Based on the contour map, a timepoint at which a state change occurs in the sample is determined.

Abstract: A lighting system includes a light source configured to generate light to inactivate one or more pathogens. The light includes an inactivating portion. In one embodiment, a method for inactivating one or more pathogens and optionally concurrently illuminating a room having one or more human occupants while the pathogens are inactivated is also provided. The method includes generating light from a light source to inactivate the one or more pathogens. The light is generated with an inactivating portion of the light.

Abstract: The present disclosure provides a method for simultaneously measuring the value of forsterite and trace elements in olivine, comprising the following steps: Step S1: selecting samples, wherein the samples are olivine samples; Step S2: placing the samples in a sample chamber of LA-ICP-MS, and adjusting the position of the samples in the optical axis direction so that the laser beam is well focused; Step S3: optimizing the instrument to make the signal-to-noise ratio of 57Fe be the best; Step S4: adopting LA-ICP-MS peak hopping mode and receiving all the mass peaks of the samples by single electron multiplier (SEM). The present disclosure overcomes the disadvantages of long test cycle and high test cost in the prior art.

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus for detecting a thin device structure defect is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source to direct charged particles to a location of a wafer under inspection over a time sequence. The improved charged particle beam apparatus may further include a controller configured to sample multiple images of the area of the wafer at difference times over the time sequence. The multiple images may be compared to detect a voltage contrast difference or changes to identify a thin device structure defect.