Abstract: A method of testing an IC generates a test design list of test patterns and produces an arc usage string for each test pattern. The arc usage strings are ranked according to the number of untested arcs in each successive test pattern by comparing each of the remaining arc usage strings against an already-tested arc file to identify the arc usage string (test pattern) having the greatest number of untested arcs. A test sequence list of test patterns ranked in order of the most number of untested arcs to the least number of untested arcs is provided to a tester and the IC is tested in order of the test patterns on the test sequence list.

Abstract: A wiring information generating apparatus includes an input unit that inputs a wiring layer number indicating a wiring layer, a via layer number indicating a next via layer to connect the wiring layer, and spacing information based on wiring rules. A storage unit stores a terminal figure table providing terminal figures, a logic element device wire protected area table, and a wire protected area table. A wire protected area creation unit adds an area of a terminal figure and a logic element device wire protected area obtained by searching the terminal figure table and the logic element device wire protected area table based on the input wiring layer number and/or via layer number and acquires wire layer-via layer spacing information. A wiring information generating unit generates wiring information in the wiring layer based on connection information and arrangement information of the semiconductor logic circuit, and wire protected area information.

Abstract: A design structure embodied in a non-transitory machine readable medium used in a design process includes an apparatus for implementing speculative clock gating of digital logic circuits, including operation valid logic configured to generate, in a first pipeline stage n, a valid control signal input to a first register in a second pipeline stage n+1, the valid control signal indicative of when an operation is qualified to be performed by the second pipeline stage n+1; and speculative valid logic configured to generate, in the first pipeline stage, a speculative valid control signal used to gate a clock signal to a plurality of additional registers in the second pipeline stage, wherein the speculative valid control signal is generated using only a subset of a total number of control inputs used in generating the valid control signal, and wherein the clock signal is sent directly to the first register.

Abstract: A method of decomposing a target pattern having features to be imaged on a substrate so as to allow said features to be imaged in a multi-exposure process. The method includes the steps of: (a) segmenting a plurality of the features into a plurality of polygons; (b) determining the image log slope (ILS) value for each of the plurality of polygons; (c) determining the polygon having the minimum ILS value, and defining a mask containing the polygon; (d) convolving the mask defined in step (c) with an eigen function of a transmission cross coefficient so as to generate an interference map, where the transmission cross coefficient defines the illumination system to be utilized to image the target pattern; and (e) assigning a phase to the polygon based on the value of the interference map at a location corresponding to the polygon, where the phase defines which exposure in said multiexposure process the polygon is assigned.

Abstract: An integrated circuit design apparatus is provided with a power supply voltage variation analysis tool calculating variations of power supply voltages of respective instances integrated within a target circuit; a determination module comparing the variations of the power supply voltages with first and second reference levels, the second reference level being smaller than the first reference level; a redesign module adapted to redesign the target circuit when at least one of the variations of the power supply voltages is larger than the first reference level; a delay variation calculation module adapted to correct circuit delay data of the respective instances based on the variations of the power supply voltages of the respective instances; a static timing analysis tool performing timing verification of the target integrated circuit.

Abstract: A method of designing a semiconductor integrated circuit includes: generating a layout data indicating a layout; and generating a mask data based on the layout data. The generating the mask data includes: referring to the layout data to extract a parameter that specifies a layout pattern around a target transistor included in the semiconductor integrated circuit, wherein the parameter includes at least a width of a device isolation structure around the target transistor; correcting a gate length and a gate width of the target transistor to offset a variation of a characteristic of the target transistor from a design value, the variation depending on the extracted parameter; and generating the mask data from the layout data in which the gate length and the gate width are corrected.

Abstract: A yield evaluating apparatus and a method thereof are provided. The yield evaluating apparatus includes a spatial correlation module. The spatial correlation module receives at least one process-related data and a plurality of circuit layouts and obtains a correlation coefficient between unit elements in the circuit layouts according to the process-related data. The spatial correlation module calculates a spatial correlation between elements in each of the circuit layouts according to the correlation coefficient and selects one of the circuit layouts according to the spatial correlations.

Abstract: A computer implemented method for correcting a mask pattern includes: predicting a displacement of a device pattern by using a mask pattern to form the device pattern and a variation of a process condition; determinating an optical proximity correction value so that the displacement falls within a displacement tolerance of the device pattern; and correcting the mask pattern using the optical proximity correction value.

Abstract: A method for processing optical proximity correction includes preparing a chemical mechanical polishing (CMP) map; extracting calibration data depending on a focus degree with the CMP map; and correcting optical proximity with the calibration data.

Abstract: According to a circuit board creation program presented herein, a simulation assuming a case in which an addition of a bypass capacitor near a another bypass capacitor provided between a pin and via of an LSI part can be performed, simply by adding a bypass capacitor property model and changing the value of a coefficient parameter by which the property value of an element of a line part is to be multiplied or divided.

Abstract: A computerized method for automatically generating a grid-based derivative of a non-gridded cell library of an integrated circuit design comprises the step of determining at least one valid position of at least one wiring element of a circuit of the first cell library, wherein the at least one valid position fulfills all technological design rules and wherein the at least one valid position fits into the second grid format. The method can also be used for automatically transforming a first cell library of an integrated circuit design having a first grid format into a second cell library having a second grid format or for automatically analyzing a grid-based cell library of an integrated circuit design in view of the circuit quality regarding technical design rules.

Abstract: Various methods and apparatuses are described for generating a model of hardware components making up an interconnect that facilitates communications between Intellectual Property blocks in an integrated circuit coded in a software programming language at a high level of abstraction that is cycle accurate to a corresponding lower level of abstraction description of the hardware components making up the interconnect. The sub-components of the model at the high level of abstraction are tested in a simulation environment in parallel with the same sub-components of a model coded in a hardware description language at the low level of abstraction in order to verify the functional accuracy and cycle timing between the two models. After the sub-components are tested, the sub-components of the model at the high level of abstraction may be aggregated into a single model at the high level of abstraction that is functionally accurate and cycle accurate to the model at the low level of abstraction.

Abstract: A method of measuring overlay between a first structure and a second structure on a substrate is provided. The structures include equidistant elements, such as parallel lines, wherein the equidistant elements of the first and second structure alternate. A design width CD1 of the elements of the first structure is different from a design width CD2 of the elements of the second structure. The difference in design width can be used to identify measurement points having incorrectly measured overlay errors.

Abstract: A method for verifying a path coverage of a circuit design. The method generally comprises the steps of implementing a hardware description language to include a plurality of monitors for a plurality of nodes of the circuit design, monitoring the nodes of a programmable circuit implementing the circuit design in real-time to capture node data, and assessing the node data to determine the path coverage.

Abstract: The present invention uses an instance based (IB) representation to reduce the time required for verifying a transformed layout that was generated from a reference layout. Specifically, an IB based representation is generated from the reference layout. The IB based representation includes sets of instance cells that include a master instance cell and slave instance cells. Only a subset of each set of instance cell needs to be simulated to verify the transformed layout.

Abstract: A method for producing a computer readable definition of photolithographic mask used to define a target pattern is provided. The phase shift mask patterns include phase shift windows, and the trim mask patterns include trim shapes, which have boundaries defined by such sets of line segments. For a particular pair of phase shift windows used to define a target feature in a target pattern, each of the phase shift windows in the pair can be considered to have a boundary that includes at least one line segment that abuts the target feature. Likewise, a complementary trim shape used in definition of the target feature, for example by including a transmissive region used to clear an unwanted phase transition between the particular pair of phase shift windows, includes at least one line segment that can be considered to abut the target feature.

Abstract: A system and method for generating a boundary-scan description language file is disclosed. In a simplified embodiment of the invention, the system utilizes a memory; software stored within the memory defining functions to be performed by the system; and a processor.

Abstract: The present invention provides a solution for converting a boundary scan description language (BSDL) file to a hardware verification language (HVL) test program file. The BSDL file is scanned for header information and the header information is stored in a header object. The BSDL file is then scanned for pin information, the pin information corresponding to at least one pin in the BSDL file having a pin location, and stored in a pin object. At least one variable for the HVL test program file is created and bound to one of the pin locations resulting in a binding relationship for each variable. The binding relationships are then stored in a bind object. The present invention is designed to overcome the disadvantages of the prior art.

Abstract: The present invention relates to an estimation system that can provide a highly reliable estimation result when the estimation system estimates person-hours required to prepare a film pattern for a circuit to be printed on a board. Upon receiving design conditions from a cline machine, a reference pin calculator of the estimation system calculates a number of reference pins on the basis of a total number of pins extending from parts to be integrated on the printed circuit board and a special specification requirement to be applied to the printed circuit. An additional pin calculator calculates a number of additional pins on the basis of a signal line wiring method. A total estimated pin calculator corrects a sum of the reference pins and the additional pins on the basis of design difficulty, which is determined from a number of signal layers to be made in the printed circuit, a number of signal lines arrangeable between adjacent pins and a pin density, to calculate a total estimated number of pins.

Abstract: A change, such as an ECO, is transformed to a gate-level netlist. The change is incorporated in cells of a synthesizable source design. A domain is defined in the netlist that contains cells that are equivalent to the cells of the source design that incorporate the change. The cells of the synthesizable source design that incorporate the change are substituted for the domain in the netlist. The substituted synthesizable source design domain is resynthesized into the gate-level netlist that includes the change.