Abstract: A silicon oxide layer is formed by oxidation or decomposition of a silicon precursor gas in an oxygen-rich environment followed by annealing. The silicon oxide layer may be formed with slightly compressive stress to yield, following annealing, an oxide layer having very low stress. The silicon oxide layer thus formed is readily etched without resulting residue using HF-vapor.

Abstract: An apparatus for enabling the uniform application of a layer of a coating composition to a tubular substrate includes a shaft, and upper and lower circular rim members of equal diameter that are concentrically attached to the shaft. A pneumatically inflatable tube disposed on each circular rim member has an outer diameter that is variable with changes in its internal pressure. A first flexible cylindrical sheet in contact with the inflatable tubes has parallel edges that form a first slit sufficiently wide to permit movement of the first sheet in response to pressure variation in the tubes. A second flexible cylindrical sheet surrounding the first cylindrical sheet has parallel edges that form a second slit sufficiently wide to permit movement of the second sheet also in response to pressure variation. The second slit is laterally displaced from the first slit, and the second cylindrical sheet has a diameter nearly equal to the specified diameter of the substrate.

Abstract: Container for the storage and/or transportation of liquids or powders, in particular inflammables, suitable for preventing the formation of electrostatic charge, comprising a tank supported by a pallet, housed in a metallic cage and having an outer surface in contact with said metallic cage. The tank comprises a base layer of plastic material, a layer modified through plasma and a layer of metallic material deposited with vacuum PVD (Physical Vapor Deposition )technique. The metallic layer is in contact with the cage. The metallization of a plastic tank is carried out by generating in a chamber a plasma which activates the outer surface of said tank so as to form a surface layer and carrying out, with vacuum PVD technique, the deposition of a layer of conductive metallic material superposing said surface layer to obtain a tank metallized on the outside.