Abstract: The present invention provides a chemically-amplified negative resist composition including a sulfonium salt capable of providing a pattern having an extremely high resolution with reduced line edge roughness, and also provides a resist patterning process using the same. The present invention was accomplished by a chemically-amplified negative resist composition including (A) a salt represented by the following general formula (1) and (B) a resin containing one or more kinds of repeating unit represented by the following general formulae (UN-1) and (UN-2) and a resist patterning process using the same.

Abstract: Provided are a composition for forming a resist protection film for lithography and a method for forming a pattern of a semiconductor device using the same. The composition comprises a repeat unit having a fluorine-containing functional group on a side chain thereof and contains a polymer having a weight average molecular weight of 2,000-100,000 and a solvent. The solvent containing 10-100 parts by weight of a material has a Hildebrand solubility parameter of 12.5-22.0, based on 100 parts by weight of the total weight thereof.

Abstract: The invention relates to an optical storage medium comprising below an entrance face (EF) a higher recording stack (ST0) comprising a higher recording layer (L0) and at least a lower recording stack (ST1), said lower recording stack (ST1) being recorded or read back by a radiation beam (4) entering into the optical storage medium through the entrance face (EF) with a wavelength (?), focused on said lower recording stack (ST1) and transmitted through the higher recording stack (ST0), a recording of the higher recording layer (L0) causing an optical thickness variation between recorded and unrecorded areas of said first recording layer (L0), which is included into the range [0.03?, 0.125?].

Abstract: A resist pattern formation method with enhanced resolution and process margin in forming a resist pattern. The method includes using a resist composition containing a high-molecular weight compound having a constituent unit represented by the general formula (a0-1) and conducting patterning by negative type development with a developing solution containing an organic solvent to forma resist pattern in which R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Va0 represents a divalent hydrocarbon group; na0 is an integer of 0 to 2; R1 represents a chain or cyclic aliphatic hydrocarbon group; R2 represents a group for forming a monocyclic group together with the carbon atom to which R1 is bonded; and R3 represents an optionally substituted cyclic group.

Abstract: The present invention relates to a photo-curable and thermo-curable resin composition that can provide a dry film solder resist having a higher glass transition temperature and improved heat resistance reliability, and the dry film solder resist. Said resin composition may include an acid-modified oligomer including an iminocarbonate-based compound having a carboxy group (—COOH) and a photo-curable unsaturated functional group, a photo-polymerizable monomer having two or more photo-curable unsaturated functional groups, a thermo-curable binder having a thermo-curable functional group, and a photo-initiator.

Abstract: The improvement of the performance of holographic glasses with recorded holograms as measured by a figure of merit of the holographic glasses is disclosed. The improvement in the figure of merit of the holographic glasses is obtained at least in part with the addition of arsenic in the formation of the holographic glasses. The presence of arsenic increases the figure of merit as measured at a wavelength of interest of a holographic glass with a recorded hologram as compared to a holographic glass with a recorded hologram that does not contain arsenic.

Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,

Abstract: A negative photosensitive resin composition including an alkali-soluble resin (A), a photoacid generator (B), a basic compound (C), a cross-linking agent (D), and a solvent (E) is provided. The alkali-soluble resin (A) includes an acrylate resin (A-1) and a novolac resin (A-2). The acrylate resin (A-1) is synthesized by polymerizing a monomer for polymerization, wherein the monomer for polymerization includes an unsaturated carboxylic acid or unsaturated carboxylic acid anhydride monomer (a-1-1) and a monomer (a-1-2). The monomer (a-1-2) includes a compound (a-1-2-1) with a tricyclodecane or dicyclopentadiene structure, a compound (a-1-2-2) represented by formula (1), or a combination of both. The novolac resin (A-2) is synthesized by polymerizing an aldehyde compound with an aromatic hydroxy compound, wherein the aromatic hydroxy compound includes a xylenol compound.

Abstract: The invention relates to a photopolymer formulation comprising polyurethane matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where R1, R2, R3 independent of each other are each a halogen atom or an organic radical, wherein at least one of the radicals is an organic radical comprising a radiation hardening group. The invention further relates to the use of the photopolymer formulation for producing holographic media.

Abstract: A reversible recording medium based on optical storage of at least one item of information within a support material, includes at least one layer of support material having: base molecules able to take, in a local zone, a first collective state of molecules able to generate a first signal of second harmonic characteristic of this first collective state of molecules when excited by electromagnetic reading radiation; the base molecules having the first collective state of molecules able to transform, at least in part, into transformed molecules so as to pass to a second collective state of molecules when excited by electromagnetic writing radiation, the molecules having the second collective state of molecules able to generate a second signal of second harmonic characteristic of this second collective state of molecules when excited by the electromagnetic reading radiation. The molecules exhibit a molecular structure based on a coumarin skeleton of Formula (I).

Abstract: A container suitable for storing biological material which is laser etched with a two-dimensional bar code and methods for producing the same. The container can be in the form of a straw having a thickness between about 0.1 mm and about 0.3 mm or can be in the form of another container that holds multiple straws. The laser etched mark can be in the form of a two-dimensional bar code may be located on an exterior surface of the container, and when the container is a straw, it remains unwarped and impermeable to fluids.

Abstract: Generally, polymeric members and laser marking methods for producing visible marks on polymeric members, such as on thin and/or curved surfaces. The laser marking methods can include methods of laser marking straws with the step of matching laser source properties to the properties of straws being marked or with the step of laser marking straws having photochromic dyes.

Abstract: There is provided a photosensitive resin composition. A photosensitive resin composition including a component (A), a component (B); and a solvent, wherein the component (A) is a copolymer having a structural unit of Formula (1) and a structural unit of Formula (2): (where R0 is a hydroxy group or a carboxy group; R1 is a hydrogen atom or a methyl group; R2 is a single bond or a C1-5 alkylene group; R3 is a thermally cross-linkable monovalent organic group; and in a plurality of structural units of Formula (2), R1 are optionally different from each other), and the component (B) is a photosensitizer.

Abstract: A chemically amplified positive-type photosensitive resin composition including a compound represented by the following formula (1), having a melting point of 40° C. or lower at 1 atm, a resin whose solubility in alkali increases under the action of an acid, and a photoacid generator. In the formula, R1 represents a hydrogen atom or an organic group; and R2, R3, and R4 independently represent a monovalent hydrocarbon group which may have a substituent, and at least two of R2, R3, and R4 may be bonded to each other to form a cyclic structure.

Abstract: The present invention relates to novel photopolymer formulation comprising a polyol component, a polyisocyanate component, a writing monomer and a photoinitiator comprising a dye of formula (I). The present invention further relates to a holographic medium which contains a photopolymer formulation of the present invention or is obtainable by using same, to the use of a photopolymer formulation of the present invention for producing holographic media and also to a process for producing a holographic medium by using a photopolymer formulation of the present invention.

Abstract: The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying colloid spheres into this region, a colloid sphere monolayer is formed. The thus applied colloid sphere monolayer exhibits a certain geometrical symmetry. Said colloid sphere monolayer is then illuminated with a beam of spatially modulated intensity distribution synchronized to said monolayer, thereby performing mechanical structuring in said region in conformity with a desired pattern through concentrating beam intensity via near-field effect behind said colloid sphere monolayer in the propagation direction of light.

Abstract: The present invention relates to a photopolymer formulation containing chemically crosslinked matrix polymers, writing monomers and a photoinitiator system, wherein the photoinitiator system contains a HABI, a dye attuned to the HABI and having an absorption maximum in the range of 400-800 nm and a hydrogen donor. The present invention further relates to a process for producing exposed holographic media with the above photopolymer formulation.

Abstract: An optical information storage medium includes a multilayer film that includes a plurality of extruded alternating active data storage layers and buffer layers, which separate the active data storage layers. The active data storage layers and buffer layers have thicknesses that allow the active data storage layers to be writable by permanent or reversible one- or multiphoton, linear, nonlinear, or threshold optical writing processes to define data voxels within the active data storage layers that are readable by an optical reading device.

Abstract: The present invention relates to a layer composite comprising an exposed photopolymer film and an adhesive layer which is connected to the photopolymer film at least in certain regions, wherein the photopolymer film comprises crosslinked polyurethane matrix polymers A), crosslinked writing monomers B) and a monomeric fluoroethane additive C), wherein the adhesive layer is in the form of a diffusion barrier for the fluoroethane additive C). The invention also relates to the use of the layer composite for producing chip cards, ID documents or 3D images, as a product protective label, as a label, in banknotes in the form of a strip or window or as holographically optical elements in displays.

Abstract: Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a porous carbon structure using optical light interference lithography includes: forming a photoresist layer on a substrate; irradiating a three-dimensional optical interference pattern onto the photoresist formed using three-dimensional optical interference lithography to form a three-dimensional porous photoresist pattern; coating the formed three-dimensional porous photoresist pattern with an inorganic material; heating the photoresist pattern on which the inorganic material is coated to carbonize the pattern; and removing the coated inorganic material.