Patents Examined by Meenakshi S Sahu
  • Patent number: 7954166
    Abstract: An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: May 31, 2011
    Assignee: Northwestern University
    Inventors: Chad A. Mirkin, Yuhuang Wang, Louise R. Giam, Matthew Park
  • Patent number: 7935945
    Abstract: Using a beam current of an ion beam, and a dose amount to a substrate, and an initial value of a scan number of the substrate set to 1, a scan speed of the substrate is calculated. If the scan speed is within the range, the current scan number and the current scan speed are set as a practical scan number and a practical scan speed, respectively. If the scan speed is higher than the upper limit of the range, the calculation process is aborted. If the scan speed is lower than the lower limit of the range, the scan number is incremented by one to calculate a corrected scan number. A corrected scan speed is calculated by using the corrected scan number, etc. The above steps are repeated until the corrected scan speed is within the allowable scan speed range.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: May 3, 2011
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventor: Masayoshi Hino
  • Patent number: 7935946
    Abstract: Using a beam current of an ion beam, a dose amount to a substrate, and a reference scan speed, a scan number of the substrate is calculated as an integer value in which digits after a decimal point are truncated. If the scan number is smaller than 2, the process is aborted. If the scan number is equal to or larger than 2, it is determined whether the scan number is even or odd. If the scan number is even, the current scan number is set as a practical scan number. If the scan number is odd, an even scan number which is smaller by 1 than the odd scan number is obtained, and the obtained even scan number is set as a practical scan number. A practical scan speed of the substrate is calculated by using the practical scan number, the beam current, and the dose amount.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: May 3, 2011
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventor: Masayoshi Hino
  • Patent number: 7932491
    Abstract: A mass spectrometer includes a pulsed ion source that generates an ion beam comprising a plurality of ions. A first timed ion selector passes a first group of ions. A first ion mirror generates a reflected ion beam comprising the first group of ions that at least partially compensates for an initial kinetic energy distribution of the first group of ions. A second timed ion selector passes a second group of ions. A second ion mirror generates a reflected ion beam comprising the second group of ions that at least partially compensates for an initial kinetic energy distribution of the second group of ions. A timed ion deflector deflects the second group of ions to a detector assembly comprising at least two ion detectors which detects the deflected ion beam.
    Type: Grant
    Filed: February 4, 2009
    Date of Patent: April 26, 2011
    Assignee: Virgin Instruments Corporation
    Inventor: Marvin L. Vestal
  • Patent number: 7928418
    Abstract: In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.
    Type: Grant
    Filed: April 13, 2009
    Date of Patent: April 19, 2011
    Assignees: Gigahoton Inc., Osaka University
    Inventors: Georg Soumagne, Yoshifumi Ueno, Hiroshi Komori, Akira Sumitani, Katsunobu Nishihara, Young Gwang Kang, Masanori Nunami
  • Patent number: 7928382
    Abstract: An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12 for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.
    Type: Grant
    Filed: August 10, 2006
    Date of Patent: April 19, 2011
    Assignee: Ebara Corporation
    Inventors: Masahiro Hatakeyama, Shoji Yoshikawa, Kenichi Suematsu, Tsutomu Karimata, Nobuharu Noji
  • Patent number: 7923705
    Abstract: An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: April 12, 2011
    Assignee: Gigaphoton Inc.
    Inventors: Masato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu, Akira Sumitani, Osamu Wakabayashi
  • Patent number: 7910899
    Abstract: A flat UV light source has a tight packing of UV light-emitting diodes (56) that are arranged in a matrix. These light-emitting diodes are cooled by cooling air flows (66) or by cooling water flows.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: March 22, 2011
    Assignee: Platsch GmbH & Co. KG
    Inventor: Hans G. Platsch
  • Patent number: 7906769
    Abstract: The invention relates to a particle accelerator for radiotherapy by means of ion beams (150). The particle accelerator comprises a sixfold synchrotron ring (100) having six rectilinear beam sections (1 to 6) and six curved beam sections (7 to 12). Injection means (43) for introducing a linearly accelerated ion beam into the synchrotron ring (100) are arranged on a first rectilinear beam section (1) of the six rectilinear beam sections (1-6). Along the course of a second rectilinear beam section (5) there is at least one acceleration means (44) for the ion beam. Extraction means (45) for extracting the internal beam highly accelerated after several circulations are provided on a third rectilinear beam section (4). Each curved beam section (7 to 12) comprises a pair of dipole magnets (13/14, 15/16, 17/18, 19/20, 21/22, 23/24).
    Type: Grant
    Filed: June 16, 2005
    Date of Patent: March 15, 2011
    Assignee: Gesellschaft fuer Schwerionenforschung mbH
    Inventors: Klaus Blasche, Bernhard Franczak
  • Patent number: 7902497
    Abstract: The invention relates to a method for determining the lubrication oil content in an exhaust gas mixture comprising the steps of ionizing the exhaust gas mixture by means of an ion source (3), feeding the ions of the exhaust gas mixture to a filter unit (5) which is embodied as a multipole with a connected voltage source, setting a transmission range of the filter unit (5) according to a lubrication oil fraction to be measured, filtering out ions with a specific mass outside the transmission range and feeding the other ions to a measuring device (8) as well as measuring the intensity of the transmitted ions. According to the invention there is provision for the determination of the proportion of the lubrication oil fraction to be measured to be carried out as a global measurement of the intensity of the ions in a step over the transmission range. The invention also relates to a device for carrying out the method. The invention provides an improvement both in the measuring quality and in the measuring speed.
    Type: Grant
    Filed: January 10, 2005
    Date of Patent: March 8, 2011
    Inventors: Marcus Gohl, Gerhard Matz
  • Patent number: 7888638
    Abstract: In the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), in order to make it possible to automatically image desired evaluation points (EPs) on a sample, and automatically measure the circuit pattern formed at the evaluation points, according to the present invention, in the dimension measurement of a circuit pattern using a scanning electron microscope (SEM), it is arranged that coordinate data of the EP and design data of the circuit pattern including the EP are used as an input, creation of a dimension measurement cursor for measuring the pattern existing in the EP and selection or setting of the dimension measurement method are automatically performed based on the EP coordinate data and the design data to automatically create a recipe, and automatic imaging/measurement is performed using the recipe.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: February 15, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Atsushi Miyamoto, Tomofumi Nishiura
  • Patent number: 7888634
    Abstract: In accordance with an aspect of an embodiment of the present invention, there is provided a method for fragmenting ions in an ion trap of a mass spectrometer.
    Type: Grant
    Filed: January 26, 2009
    Date of Patent: February 15, 2011
    Assignee: DH Technologies Development Pte. Ltd.
    Inventors: Mircea Guna, Yves Le Blanc
  • Patent number: 7884336
    Abstract: Sponge sanitizing enclosure with a front cover, a rear cover, an inner back plate, a base housing, a push plate, a push button, a UV lamp, electronics to support the UV lamp, a battery power supply, a translucent sponge, and a hinge member. The front and rear cover each being dish shaped and forming a hollow housing and being joined at their base by the hinge member. The inner back plate forms a bisection of the front cover and the rear cover. The UV light is located between the rear cover and the inner back plate. The front cover includes a centrally located aperture that accepts the push button which is fixedly attached to the push plate. The space between the push plate and the inner back plate accommodates the translucent sponge. The base housing encloses the electronics and the battery power supply that support the UV lamp.
    Type: Grant
    Filed: July 1, 2008
    Date of Patent: February 8, 2011
    Inventor: Brent Gibson
  • Patent number: 7884325
    Abstract: The present invention provides an electron beam measurement technique for measuring the shapes or sizes of portions of patterns on a sample, or detecting a defect or the like. An electron beam measurement apparatus has a unit for irradiating the patterns delineated on a substrate by a multi-exposure method, and classifying the patterns in an acquired image into multiple groups according to an exposure history record. The exposure history record is obtained based on brightness of the patterns and a difference between white bands of the patterns.
    Type: Grant
    Filed: December 4, 2008
    Date of Patent: February 8, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasunari Sohda, Shoji Hotta, Shinji Okazaki, Muneyuki Fukuda
  • Patent number: 7884334
    Abstract: The method includes scanning a sample in at least one first scan line using a first charged particle beam probe; scanning the sample in at least one second scan line using a second charged particle beam probe, and scanning the sample in at least one third scan line using the first charged particle beam probe. The first or second charged particle beam probe is defocused by a control module of the imaging system through adjusting a condenser lens module, an objective lens module, a sample stage of the imaging system, or their combination. An image of the sample is selectively formed from the first, second and third scan lines. The first and the second charged particle beams induce a first charging condition and a second charging condition on the sample surface respectively. The second charging condition can enhance, mitigate, eliminate, reverse or have no effect on the first charging condition.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: February 8, 2011
    Assignee: Hermes Microvision, Inc.
    Inventors: Yan Zhao, Jack Jau
  • Patent number: 7886366
    Abstract: The amplitude control of a cantilever based on the van der Pol model is performed through feedback using measurement data on a deflection of the cantilever. A self-oscillating circuit integrates a deflection angle signal of a cantilever detected by a deflection angle measuring mechanism using an integrator, multiplies a resulting integral value by linear feedback gain generated by a gain generator, and an output corresponding to the linear feedback signal is generated. Also, the self-oscillating circuit cubes the deflection angle signal using analog multipliers, integrates the resulting values using integrators, multiplies the resulting integral values by a nonlinear feedback gain generated by a gain generator, and an output corresponding to the nonlinear feedback signal is generated. Furthermore, the self-oscillating circuit adds the outputs together using an adder, and a voltage signal for a piezo element is generated.
    Type: Grant
    Filed: November 20, 2008
    Date of Patent: February 8, 2011
    Assignees: National Institute of Advanced Industrial Science and Technology, University of Tsukuba
    Inventors: Masaharu Kuroda, Kentaro Nishimura, Takashi Someya, Hiroshi Yabuno
  • Patent number: 7884318
    Abstract: Systems, methods, and computer-readable media for determining composition of chemical constituents in a complex mixture are disclosed. According to one aspect, a method for determining composition of chemical constituents in a complex mixture includes generating, using a separation tool and a mass spectrometer, separation and mass spectrometry data of a sample, wherein the separation data includes peak information and wherein the mass spectrometry data includes primary and secondary mass spectrometry data. The analysis results, including the generated separation and mass spectrometry data, are collected and stored. A chemical constituent of the sample is determined by comparing the analysis results to a library of information indicating characteristics of chemical entities, where the comparison is based on the separation and mass spectrometry information.
    Type: Grant
    Filed: December 3, 2008
    Date of Patent: February 8, 2011
    Assignee: Metabolon, Inc.
    Inventors: K. Eric Milgram, Thomas Barrett, Anne M Evans
  • Patent number: 7880152
    Abstract: The invention relates to a device and a method for producing resist profiled elements. According to the invention, an electron beam lithography system is used to produce an electron beam, the axis of the beam being essentially perpendicular to a resist layer in which the resist profiled element is to be produced. The electron beam can be adjusted in terms of the electron surface dose in such a way that a non-orthogonal resist profiled element can be produced as a result of the irradiation by the electron beam.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: February 1, 2011
    Assignees: Giesecke & Devrient GmbH, Vistec Electron Beam GmbH
    Inventors: Wittich Kaule, Rainer Plontke, Ines Stolberg, Andreas Schubert, Marius Dichtl
  • Patent number: 7877816
    Abstract: Microscope, in particular a scanning probe microscope, comprising a programmable logic device.
    Type: Grant
    Filed: October 23, 2006
    Date of Patent: January 25, 2011
    Assignee: Witec Wissenschaftliche Instrumente und Technologie GmbH
    Inventors: Peter Spizig, Detlef Sanchen, Jörg Förstner, Joachim Koenen, Othmar Marti, Gerhard Volswinkler
  • Patent number: 7872241
    Abstract: An electron beam production and control assembly includes a vacuum chamber, a beam source, and a target. The target has an active section and an inactive section. The active section is adapted to generate x-rays when the beam impinges on the x-ray producing section. The electron beam production and control assembly also includes a focusing unit positioned along the chamber at a location intermediate the rearward end and the forward end. The focusing unit directs the beam towards the target in a converging manner to impinge on the target. The focusing unit sweeps the beam along a scanning path over the active section of the target. The focusing unit moves the beam to a retrace path on the inactive section of the target between sweeps of the scanning path to maintain ion accumulation in the beam between sweeps over the active section.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: January 18, 2011
    Assignee: Telesecurity Sciences, Inc.
    Inventor: Roy E. Rand