Patents Examined by Mesfin T Asfaw
  • Patent number: 10809636
    Abstract: An optical arrangement, in particular a lithography system, includes: a movable component, in particular a mirror; at least one actuator for moving the component; and at least one stop having a stop face for delimiting the movement of the component. The optical arrangement further includes, on a stop or on a plurality of stops, at least two stop faces for delimiting the movement of the movable component in one and the same movement direction.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: October 20, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Bernhard Gellrich, Ralf Zweering, Charles Seviour, Michael Erath, Jens Prochnau, Marwène Nefzi, Viktor Kulitzki, Axel Lorenz, Stefan Schaff
  • Patent number: 10801969
    Abstract: A testing device for bottom-emitting or bottom-detecting optical devices may comprise a support structure to support a lower transparent chuck and an upper transparent chuck that includes a set of vacuum holes. In some implementations, a vacuum may be formed in a space between the lower transparent chuck and the upper transparent chuck when a vacuum pump is applied to an opening in a sidewall of the support structure. For example, the vacuum may create suction to cause an optical device under test to be mechanically secured on a top surface of the upper transparent chuck. The testing device may further comprise a photodetector disposed below the lower transparent chuck to detect light that travels through the upper transparent chuck and the lower transparent chuck when one or more probes complete an electrical path that causes the optical device under test to emit the light.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: October 13, 2020
    Assignee: Lumentum Operations LLC
    Inventor: Albert Yuen
  • Patent number: 10790125
    Abstract: [Object] To predict the damage distribution of a workpiece caused by ions and light from plasma more accurately within a practical computation time. [Solution] Provided is a damage prediction method including: using an operation apparatus to calculate, from fluxes of ions and light generated by plasma, fluxes of ions and light propagated through a pattern of a workpiece including a processing object, on the basis of the pattern; calculating, from the fluxes of ions and light propagated through the pattern, fluxes of ions and light arriving at a surface of the processing object, by ray tracing; and calculating, from the fluxes of ions and light arriving at the surface of the processing object, a damage distribution of the processing object.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: September 29, 2020
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventor: Nobuyuki Kuboi
  • Patent number: 10788716
    Abstract: A photo-alignment control method and a photo-alignment apparatus are disclosed. In the photo-alignment control method, a yaw angle of a motion stage (130) relative to a polarizing illumination device (110) is detected to derive a weighted dynamic polarization angle deviation of a substrate (200), so that a rotational angle of a rotary table (120) for rotating a substrate (200) is controlled, thereby effectively improving a control accuracy of a polarization angle in the photo-alignment process and further to ensure an accuracy of an alignment angle formed in an alignment film.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: September 29, 2020
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Chang Zhou, Wen Luo, Shucun Zhu
  • Patent number: 10775319
    Abstract: A system includes a visual sensor provided in an industrial machine or in the vicinity thereof to acquire a plurality of image data, a calculation unit that calculates a contamination degree of a lens or a lens cover of the visual sensor on the basis of the image data acquired by the visual sensor, and a prediction unit that calculates information on a predicted cleaning timing to be performed in the future, of the lens or the lens cover on the basis of the calculated contamination degree of the lens or the lens cover.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: September 15, 2020
    Assignee: FANUC CORPORATION
    Inventors: Miho Niikura, Yasuhiko Kurosumi, Yoshihiko Tarui
  • Patent number: 10768531
    Abstract: A system that contains a semi-ellipsoidal SLM holder supporting a plurality of flat rectangular SLMs, which are placed onto the semi-ellipsoidal surface of the holder in the most surface-covering way. The system contains a coherent light source placed in the first focal point of the ellipsoid. The second focal point of the ellipsoid defines the area in which an image-receiving object is to be placed. All the SLMs are illuminated by a diverging light beam emitted from the coherent light source. In each SLM, the light is subjected to phase-amplitude modulation and is converted into an image-carrying beam, which convergently fells onto the object on which the target image is to be produced. Thus, a pattern is formed on the object by a maskless method in which a plurality of SLMs are combined into a common image-forming holographic unit.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: September 8, 2020
    Inventors: Vadim Rakhovsky, Vitaly Chernik, Mikhail Borisov, Aleksey Shamaev, Dmitry Chelyubeev
  • Patent number: 10768538
    Abstract: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: September 8, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Helmar Van Santen, Aleksey Yurievich Kolesnychenko
  • Patent number: 10760897
    Abstract: An optical sensor includes an optical fiber disposed in such a way that an end surface thereof is exposed in a distal end surface (10a) of a sensor head (10). The optical sensor includes: a first plate material (first metal plate) (20) in close parallel contact with the distal end surface of the sensor head, and in which a through-hole is formed in a position corresponding to the end surface of the optical fiber; and a second plate material (second metal plate) (30) disposed parallel to the first plate material (first metal plate) and toward the front thereof in a measuring direction, and in which a through-hole is formed at a point of intersection with a virtual straight line perpendicular to the end surface of the optical fiber. With this optical sensor, it is possible for clearance measurement to be performed even if the optical fiber becomes opaque or worn.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: September 1, 2020
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Akio Kondou, Tomoyuki Onishi, Takahiro Miyamoto
  • Patent number: 10754147
    Abstract: A projector including a light source, a light valve, a projection lens and a displacement module is provided. The light source generates an illumination light. The light valve converts the illumination light into a multi-pixel area image light. The projection lens is disposed in a transmission path of the multi-pixel area image light. The image displacement module includes a carrier, an optical element, a frame and a base. The carrier, the frame and the base are substantially coplanar with each other, and the multi-pixel area image light provided is configured to be moved by the optical element and being moved along a third direction in response to the spinning of the carrier, and the first direction is different from the second direction. Furthermore, a three-dimensional printing apparatus is also provided.
    Type: Grant
    Filed: May 6, 2019
    Date of Patent: August 25, 2020
    Assignee: Young Optics Inc.
    Inventors: Wei-Szu Lin, Chao-Shun Chen, Chia-Chen Liao, Yu-Chen Chang, Chien-Hsing Tsai
  • Patent number: 10754258
    Abstract: A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor includes an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes the pixel data as a light-field image to extract the position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: August 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventor: Erik Willem Bogaart
  • Patent number: 10746533
    Abstract: Example position detection means and displacement detection devices are described. A relative position detection means optically detects a relative position of displacement of an object to be measured in a measuring direction, including a target mounted on the object to be measured and irradiated with light from a light source; a light receiver for detection of relative position for receiving light by changing polarization state of reflected light at the target with respect to the light; and a relative position information output unit for outputting relative position information based on displacement of the target in the measuring direction based on change of polarization state of the reflected light. The target includes a reflector mounted on the object to be measured and a birefringent member on the reflector and having a thickness changing from a tip to a base end along the measuring direction.
    Type: Grant
    Filed: August 2, 2018
    Date of Patent: August 18, 2020
    Assignee: DMG MORI CO., LTD.
    Inventors: Shun Okuyama, Akinori Suzuki
  • Patent number: 10747116
    Abstract: There is provided a pattern forming apparatus including a holding unit configured to suction and hold a substrate, and an optical system configured to detect, from a suction surface side of the substrate, an alignment mark formed on the substrate held by the holding unit. The pattern forming apparatus is provided with a wavelength separation element for performing wavelength separation between pattern forming light for forming a pattern on the substrate and alignment mark detection light for detecting the alignment mark.
    Type: Grant
    Filed: March 5, 2019
    Date of Patent: August 18, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hironobu Fujishima
  • Patent number: 10732517
    Abstract: In an exposure apparatus, on a substrate holder, a plurality of grating areas is arranged mutually apart in the X-axis direction, and a plurality of heads that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: August 4, 2020
    Assignee: NIKON CORPORATION
    Inventors: Akinori Shirato, Takashi Shibuya
  • Patent number: 10732510
    Abstract: A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: August 4, 2020
    Assignee: NIKON CORPORATION
    Inventors: Akinori Shirato, Takashi Shibuya
  • Patent number: 10732514
    Abstract: Disclosed is method of optimizing bandwidth of measurement illumination for a measurement application, and an associated metrology apparatus. The method comprises performing a reference measurement with reference measurement illumination having a reference bandwidth and performing one or more optimization measurements, each of said one or more optimization measurements being performed with measurement illumination having a varied candidate bandwidth. The one or more optimization measurements are compared with the reference measurement; and an optimal bandwidth for the measurement application is selected based on the comparison.
    Type: Grant
    Filed: February 1, 2019
    Date of Patent: August 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hugo Augustinus Joseph Cramer, Seyed Iman Mossavat, Paul Christiaan Hinnen
  • Patent number: 10724848
    Abstract: A method and an apparatus for processing three-dimensional vision measurement data are provided.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: July 28, 2020
    Assignee: BEIJING QINGYING MACHINE VISUAL TECHNOLOGY CO., LTD.
    Inventors: Liang Cao, Xing Yin
  • Patent number: 10725386
    Abstract: Disclosed is a method of measuring a parameter of a lithographic process, and associated inspection apparatus. The method comprises measuring at least two target structures on a substrate using a plurality of different illumination conditions, the target structures having deliberate overlay biases; to obtain for each target structure an asymmetry measurement representing an overall asymmetry that includes contributions due to (i) the deliberate overlay biases, (ii) an overlay error during forming of the target structure and (iii) any feature asymmetry. A regression analysis is performed on the asymmetry measurement data by fitting a linear regression model to a planar representation of asymmetry measurements for one target structure against asymmetry measurements for another target structure, the linear regression model not necessarily being fitted through an origin of the planar representation. The overlay error can then be determined from a gradient described by the linear regression model.
    Type: Grant
    Filed: May 24, 2019
    Date of Patent: July 28, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Maurits Van Der Schaar, Markus Gerardus Martinus Maria Van Kraaij
  • Patent number: 10719019
    Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: July 21, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Mehmet Ali Akbas, Pavlo Antonov, Jeroen Bouwknegt, Joost Wilhelmus Maria Frenken, Evelyn Wallis Pacitti, Nicolaas Ten Kate, Bruce Tirri, Jan Verhoeven
  • Patent number: 10719010
    Abstract: Provided are a pellicle for a photomask, which protects the photomask from external contamination and an exposure apparatus including the pellicle for the photomask. The pellicle for the photomask includes a pellicle membrane provided spaced apart from the photomask. The pellicle membrane includes a semiconductor having a two-dimensional (2D) crystalline structure.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: July 21, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyunjae Song, Hyeonjin Shin
  • Patent number: 10714366
    Abstract: Methods and systems for shape metric based scoring of wafer locations are provided. One method includes selecting shape based grouping (SBG) rules for at least two locations on a wafer. For one of the wafer locations, the selecting step includes modifying distances between geometric primitives in a design for the wafer with metrology data for the one location and determining metrical complexity (MC) scores for SBG rules associated with the geometric primitives in a field of view centered on the one location based on the distances. The selecting step also includes selecting one of the SBG rules for the one location based on the MC scores. The method also includes sorting the at least two locations on the wafer based on the SBG rule selected for the at least two locations.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: July 14, 2020
    Assignee: KLA-Tencor Corp.
    Inventors: Saibal Banerjee, Jagdish Chandra Saraswatula