Patents Examined by Mesfin T Asfaw
  • Patent number: 11327403
    Abstract: An illumination optical system for projection lithography includes a pupil facet mirror having pupil facets. For at least some of the pupil facets which are designed as selectively reflecting pupil facets, the selectively reflecting pupil facet has a reflective coating for the illumination light, wherein a first coating area on a first part of the selectively reflecting pupil facet has a first reflectivity, a second coating area on a second part of the selectively reflecting pupil facet has a second reflectivity, the first coating area is different from the second coating area, and the first reflectivity is different from the second reflectivity. In combination or as an alternative, for at least some of the pupil facets which are designed as broadbands reflecting pupil facets, the broadband reflecting facets have a broadband reflective coating for the illumination light.
    Type: Grant
    Filed: May 11, 2021
    Date of Patent: May 10, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Tian Gang, Jan Van Schoot
  • Patent number: 11327407
    Abstract: A method of determining a correction for a process parameter related to a lithographic process, wherein the lithographic process includes a plurality of runs during each one of which a pattern is applied to one or more substrates. The method of determining includes obtaining pre-exposure metrology data describing a property of a substrate; obtaining post-exposure metrology data comprising one or more measurements of the process parameter having been performed on one or more previously exposed substrates; assigning, based on the pre-exposure metrology data, a group membership status from one or more groups to the substrate; and determining the correction for the process parameter based on the group membership status and the post-exposure metrology data.
    Type: Grant
    Filed: November 24, 2020
    Date of Patent: May 10, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Weitian Kou, Alexander Ypma, Marc Hauptmann, Michiel Kupers, Lydia Marianna Vergaij-Huizer, Erik Johannes Maria Wallerbos, Erik Henri Adriaan Delvigne, Willem Seine Christian Roelofs, Hakki Ergün Cekli, Stefan Cornelis Theodorus Van Der Sanden, Cédric Désiré Grouwstra, David Frans Simon Deckers, Manuel Giollo, Iryna Dovbush
  • Patent number: 11320753
    Abstract: A projection exposure apparatus for semiconductor lithography includes at least one component which is provided with a damping arrangement for dissipating mechanical vibration energy. The damping arrangement includes a ferromagnetic element, through which a magnetic field passes at least partly. The magnetic flux density is inhomogeneous at least regionally. The ferromagnetic element is mounted in such a way that it is movable with a movement component in the direction of the inhomogeneity of the magnetic field.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: May 3, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Philipp Meinkuss
  • Patent number: 11320743
    Abstract: A method of grouping data associated with substrates undergoing a process step of a manufacturing process is disclosed. The method includes obtaining first data associated with substrates before being subject to the process step and obtaining a plurality of sets of second data associated with substrates after being subject to the process step, each set of second data being associated with a different value of a characteristic of the first data. A distance metric is determined which describes a measure of distance between the sets of second data, and the second data is grouped based on a property of the distance metric.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: May 3, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Vahid Bastani, Alexander Ypma
  • Patent number: 11320751
    Abstract: An apparatus, which may form part of a lithographic apparatus, comprises a substrate table, a projection system, a gas lock and a gas flow guide. The substrate table is suitable for supporting a substrate. The projection system has a body which defines an interior and an opening. The projection system is configured and arranged to project a radiation beam through the opening onto a substrate supported by the substrate table. The gas lock is suitable for providing a gas flow from the opening away from the interior. The gas flow guide is configured to guide at least a portion of the gas flow away from the substrate supported by the substrate table.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: May 3, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Güneş Nakibo{hacek over (g)}lu, Dries Vaast Paul Hemschoote, Remco Yuri Van de Moesdijk
  • Patent number: 11314171
    Abstract: Certain aspects relate to a method for improving a lithography configuration. In the lithography configuration, a source illuminates a mask to expose resist on a wafer. A processor determines a defect-based focus exposure window (FEW). The defect-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of defects on the wafer. The defect-based FEW is determined based on a predicted probability distribution for occurrence of defects on the wafer. A processor also determines a critical dimension (CD)-based FEW. The CD-based FEW is an area of depth of focus and exposure latitude for the lithography configuration with an acceptable level of CD variation on the wafer. It is determined based on predicted CDs on the wafer. The lithography configuration is modified based on increasing an area of overlap between the defect-based FEW and the CD-based FEW.
    Type: Grant
    Filed: September 25, 2020
    Date of Patent: April 26, 2022
    Assignee: Synopsys, Inc.
    Inventors: Lawrence S. Melvin, III, Yudhishthir Prasad Kandel, Qiliang Yan, Ulrich Karl Klostermann
  • Patent number: 11314078
    Abstract: An optical path adjusting mechanism including a rotating base, an optical element, a coil, a first spring and a second spring is provided. A first area and a second area are diagonally disposed on the rotating base. The optical element is disposed in the rotating base. The coil is disposed around a periphery of the rotating base. One terminal of the first spring is connected to the first area of the rotating base. One terminal of the second spring is connected to the second area of the rotating base.
    Type: Grant
    Filed: August 6, 2020
    Date of Patent: April 26, 2022
    Assignee: Young Optics Inc.
    Inventors: Wei-Szu Lin, Chao-Shun Chen, Chia-Chen Liao, Yu-Chen Chang, Chien-Hsing Tsai
  • Patent number: 11314175
    Abstract: A reticle pod having a positioning member includes a base, a lid and a plurality of positioning members. The lid shuts relative to the base to form a substantially cuboid case. The case has a storing space for receiving a reticle. The positioning members are arranged in a shutting direction and disposed on at least two edges of the lid or at least two edges of the base, respectively. The positioning members each include a connecting portion, a correcting portion and a guiding slope portion. The connecting portion connects the edges of the lid. The correcting portion has one end connected to the connecting portion and extending in a shutting direction and an opposing end connected to the guiding slope portion. The guiding slope portion has a slope extending outward. The reticle pod having a positioning member is error-free, allowing the lid to shut precisely relative to the base.
    Type: Grant
    Filed: September 17, 2020
    Date of Patent: April 26, 2022
    Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD.
    Inventors: Chia-Ho Chuang, Hsing-Min Wen, Yi-Hsuan Lee, Hsin-Min Hsueh, Ming-Chien Chiu
  • Patent number: 11307503
    Abstract: A microlithographic arrangement, for example using light in the extreme UV range, includes a supporting structure for supporting an optical unit, the mass of which can be 4 t to 14 t. The supporting structure includes a number of separate supporting units for supporting the optical unit. Each of the supporting units includes an air bearing unit by way of which a supporting force which counteracts the weight of the optical unit can be generated. The number of supporting units is at least four, at least two of the supporting units being coupled via a coupling device to form a supporting unit pair in such a way that the coupling device counteracts a deviation from a predeterminable ratio of the supporting forces of the two supporting units of the supporting unit pair.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: April 19, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Martin Vogt, Joachim Hartjes
  • Patent number: 11307507
    Abstract: The present invention provides a method to obtain a height map of a substrate having alignment marks, the method comprising the steps: determining a height of one or more locations or areas of the substrate, and determining the height map of the substrate on the basis of the determined height of the one or more locations or areas of the substrate and a shape model of the substrate.
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: April 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Bram Van Hoof, Arjan Hölscher, Alex Pascal Ten Brink, Petrus Franciscus Van Gils
  • Patent number: 11300888
    Abstract: A method and control system for determining stress in a substrate. The method includes determining a measured position difference between a measured position of at least one first feature and a measured position of at least one second feature which have been applied on a substrate, and determining local stress in the substrate from the measured position difference.
    Type: Grant
    Filed: February 7, 2018
    Date of Patent: April 12, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Leon Paul Van Dijk, Ilya Malakhovsky, Ronald Henricus Johannes Otten
  • Patent number: 11300884
    Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: April 12, 2022
    Assignee: Nikon Corporation
    Inventors: Daniel Gene Smith, David M. Williamson, Donis G. Flagello, Michael B. Binnard
  • Patent number: 11287747
    Abstract: A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: March 29, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Nikipelov, Patrick Sebastian Uebel, Amir Abdolvand, Sebastian Thomas Bauerschmidt, Peter Maximilian Götz, Natallia Eduardauna Uzunbajakava
  • Patent number: 11281109
    Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: March 22, 2022
    Assignee: Magic Leap, Inc.
    Inventors: Vikramjit Singh, Michael Nevin Miller, Frank Y. Xu, Shuqiang Yang
  • Patent number: 11271361
    Abstract: An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: March 8, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Keisuke Ishida, Satoshi Komuro, Hiroshi Furusato
  • Patent number: 11269261
    Abstract: A system includes a frame, a projection lens, a wafer table, and a cleaner. The frame has an opening vertically extending through the frame. The projection lens is disposed on the frame. The wafer table is below the frame, in which the wafer table is movable along a horizontal direction. The cleaner is over the frame, in which the cleaner comprises a sticky structure movable along a vertical direction and through the opening of the frame.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: March 8, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Min-Cheng Wu, Chi-Hung Liao
  • Patent number: 11262659
    Abstract: A method of cleaning an extreme ultraviolet lithography collector includes applying a cleaning composition to a surface of the extreme ultraviolet lithography collector having debris on the surface of the collector in an extreme ultraviolet radiation source chamber. The cleaning composition includes: a major solvent having Hansen solubility parameters of 25>?d>15, 25>?p>10, and 30>?h>6; and an acid having an acid dissociation constant, pKa, of ?15<pKa<4. The debris is removed from the surface of the collector and the cleaning composition is removed from the extreme ultraviolet radiation source chamber.
    Type: Grant
    Filed: August 21, 2019
    Date of Patent: March 1, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang
  • Patent number: 11262189
    Abstract: A method and optical detection equipment for monitoring a container transfer device on lowering a container onto or lifting away from a transport platform. The container, its pin holes' position and the position of the lock pins of the transport platform are determined by the optical detection equipment, which includes a group of optical detection devices measuring obliquely from up the container and the transport platform during lowering or lifting of the container such that positions of the container and the lock pins are determined based on the measurement of the same optical detection devices.
    Type: Grant
    Filed: March 14, 2018
    Date of Patent: March 1, 2022
    Assignee: Konecranes Global Oy
    Inventors: Ville Mannari, Teemu Paasikivi
  • Patent number: 11262314
    Abstract: A device for detecting a defect on a surface including an optical device (14) suitable for acquiring an image of the surface in a given optical direction, a lighting device (15) comprising a plurality of light sources (16), the light sources (16) being arranged in a hemisphere (20), each light source (16) having an off and an on state, an electronic calculation device (18). The electronic calculation device (18) is able to control the optical device (14) and the lighting device (15) so that the optical device (14) acquires a plurality of images of the surface, different light sources (16) or different combinations of light sources (16) being switched on for each image, the hemisphere (20) having a diameter D smaller than or equal to 50 mm.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: March 1, 2022
    Assignee: FRAMATOME
    Inventor: Clément Skopinski
  • Patent number: 11262664
    Abstract: A system for mitigating damage to optical elements caused by vacuum ultraviolet (VUV) light exposure is disclosed. The system includes a light source configured to generate VUV and a chamber containing one or more gaseous fluorine-based compounds of a selected partial pressure. The system includes one or more optical elements. The one or more optical elements are located within the chamber and are exposed to the one or more gaseous fluorine-based compounds. The VUV light generated by the light source is of sufficient energy to dissociate the fluorine-based compound within the chamber into a primary product.
    Type: Grant
    Filed: November 16, 2020
    Date of Patent: March 1, 2022
    Assignee: KLA Corporation
    Inventors: Matthew Derstine, John Savee, Evgeniia Butaeva, Serguei Likhanski, Gildardo Delgado