Abstract: An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.

Abstract: A method and device for laser-induced marking. The method comprises providing an article having a marking surface including a non-flat area, providing a first laser transfer foil, providing a first laser unit for emitting first laser light, providing a first hard adaptor that is essentially transparent to the first laser light, the first hard adaptor having a contacting surface that essentially is a negative of at least a part of the marking surface of the article, contacting the first laser transfer foil with the marking surface of the article by the first hard adaptor such that the first laser transfer foil is arranged between the marking surface of the article and the contacting surface of the first hard adaptor, and irradiating the first laser light through the first hard adaptor onto the first laser transfer foil.

Abstract: The present invention provides a rubbing alignment method of an alignment layer, comprising steps of: step 1, providing a substrate (10), and coating an alignment layer (4) on the substrate (10); step 2, providing a rubbing roller (5), and employing the rubbing roller (5) to implement a first rubbing alignment to the alignment layer (4) according to a first rubbing direction; step 3, employing the rubbing roller (5) to implement a second rubbing alignment to the alignment layer (4) according to a second rubbing direction, and the second rubbing direction is opposite to the first rubbing direction. The rubbing alignment method of the alignment layer can effectively eliminate the rubbing shadow to prevent the uneven rubbing alignment and the liquid crystal alignment disorientation to make the liquid crystals in an orderly arrangement. Thus, the light leakage phenomenon of the liquid crystal display panel in the dark state can be suppressed and the contrast ratio can be raised.

Abstract: Devices and methods are provided for ejecting a droplet from a reservoir using focused acoustic radiation having a plurality of nonsimultaneous and discrete frequency ranges. Such frequency ranges may be used to control droplet volume and/or velocity. Optionally, satellite fluid ejection from the reservoir is suppressed.

Abstract: The invention relates to a method for generating calibrated color data of a target using color measurement instruments distributed in the network comprising the steps A) generating at least one standard instrument profile for the color measurement instruments distributed in the network to correct photometric and wavelength scale differences, and B) generating at least one geometry instrument profile for the color measurement instruments distributed in the network to correct geometry scale differences. The method can be used in applications where color measurement instrument networks are used, particularly in robotic systems where color measurement instruments are integrated.

Abstract: A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.

Abstract: A method of producing an optical component includes a transfer step of sandwiching a molding material layer of a molding material between a thin glass plate and a mold and transferring an indented pattern on the mold to the molding material layer to form a patterned indented layer on the thin glass plate, and a separation step of separating the mold from the patterned indented layer. During the transfer step, a reinforcing plate is removably attached to the thin glass plate.

Abstract: Provided apparatus and methods for back side passivation of a substrate. The systems comprise an elongate support with an open top surface forming a support ring so that when a substrate is on the support ring, a cavity is formed within the elongate support. A plasma generator is coupled to the cavity to generate a plasma within the cavity to deposit a passivation film on the back side of the substrate.

Abstract: Method for treating antireflection coatings on an optical substrate (17) involves a stage for carrying out the physical vacuum-deposit of a fluorinated polymer-containing layer having a low refractive index and is characterized in that the stage includes in deposing a silicium or magnesium fluoride/fluorinated polymer hybrid layer (21d) by simultaneous vacuum evaporation of silicium or magnesium fluoride and the fluorinated polymer, In a preferred embodiment, the fluorinated polymer is embodied in the form of a polymer or tetrafluorethylen polymer and the components are evaporated by a Joule effect or by electron bombardment. The method is advantageously used for improving the adherence of a low refractive index layer to a subjacent layer of a pile of antireflection coatings which is deposited on any optical substrate or the inventive substrate. The substrate produced by the method and a device for carrying out the method are also disclosed.

Abstract: The present invention provides a coated optical element including an optical substrate and a primer layer that is formed by cationic polymerisation of a coating composition containing an effective amount of an epoxy monomer and a vinyl ether monomer. The optical element may be an ophthalmic lens.

Abstract: Disclosed is a method for preparing structured graphene on a SiC substrate on the basis of Cl2 reaction, the procedures are as follows: firstly, performing standard cleaning to a SiC sample chip; depositing a layer of SiO2 on the surface of the SiC sample chip and engraving a figure window on the SiO2 layer; then arranging the windowed sample chip in a quartz tube, introducing a mixed gas of Ar and Cl2 into the quartz tube, reacting the bare SiC with Cl2 for 3-8 min at 700-1100° C. to generate a carbon film; arranging the generated carbon film in Ar gas, annealing for 10-30 min at 1000-1200° C. to generate the structured graphene on the window on the carbon film. The method is simple and safe; the generated structured graphene has a smooth surface and low porosity and can be used for making microelectronic devices.

Abstract: Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.

Abstract: Monolithic optical structures include a plurality of layer with each layer having an isolated optical pathway confined within a portion of the layer. The monolithic optical structure can be used as an optical fiber preform. Alternatively or additionally, the monolithic optical structure can include integrated optical circuits within one or more layers of the structure. Monolithic optical structures can be formed by performing multiple passes of a substrate through a flowing particle stream. The deposited particles form an optical material following consolidation. Flexible optical fibers include a plurality of independent light channels extending along the length of the optical fiber. The fibers can be pulled from an appropriate preform.

Abstract: Metal silicates or phosphates are deposited on a heated substrate by the reaction of vapors of alkoxysilanols or alkylphosphates along with reactive metal amides, alkyls or alkoxides. For example, vapors of tris(tert-butoxy)silanol react with vapors of tetrakis(ethylmethylamido) hafnium to deposit hafnium silicate on surfaces heated to 300° C. The product film has a very uniform stoichiometry throughout the reactor. Similarly, vapors of diisopropylphosphate react with vapors of lithium bis(ethyldimethylsilyl)amide to deposit lithium phosphate films on substrates heated to 250° C. Supplying the vapors in alternating pulses produces these same compositions with a very uniform distribution of thickness and excellent step coverage.

Abstract: Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

Abstract: A method of treating silicon carbide fibers comprises phosphating heat treatment in a reactive gas so as to form a coating around each fiber for protection against oxidation. The coating comprises a surface layer of silicon pyrophosphate crystals and at least one underlying bilayer system comprising a layer of a phosphosilicate glass and a layer of microporous carbon.

Abstract: A number of variations may include a product that may include a substrate that may include an aluminum-nickel alloy and at least one surface and a coating that may include a metallic material deposited over the at least one surface via laser cladding.

Abstract: A coated article is provided with at least one infrared (IR) reflecting layer. The IR reflecting layer may be of silver or the like. In certain example embodiments, a titanium oxide layer is provided over the IR reflecting layer, and it has been found that this surprisingly results in an IR reflecting layer with a lower specific resistivity (SR) thereby permitting thermal properties of the coated article to be improved.

Abstract: The presently disclosed technology relates to carbon-on-carbon (C/C) manufacturing techniques and the resulting C/C products. One aspect of the manufacturing techniques disclosed herein utilizes two distinct curing operations that occur at different times and/or using different temperatures. The resulting C/C products are substantially non-porous, even though the curing operation(s) substantially gasify a liquid carbon-entrained filler material that saturates a carbon fabric that makes up the C/C products.

Abstract: A process for forming a coating for an RF window which has improved secondary electron emission and reduced multipactor for high power RF waveguides is formed from a substrate with low loss tangent and desirable mechanical characteristics. The substrate has an RPAO deposition layer applied which oxygenates the surface of the substrate to remove carbon impurities, thereafter has an RPAN deposition layer applied to nitrogen activate the surface of the substrate, after which a TiN deposition layer is applied using Titanium tert-butoxide. The TiN deposition layer is capped with a final RPAN deposition layer of nitridation to reduce the bound oxygen in the TiN deposition layer. The resulting RF window has greatly improved titanium layer adhesion, reduced multipactor, and is able to withstand greater RF power levels than provided by the prior art.