Abstract: A barbeque grill scraper and related methods of use that utilize a scraping end formed of a heat-responsive material to remove char and other debris from the grilling surface. The grill scraper includes a conformable scraping edge formed of the heat-responsive material. As the conformable scraping edge is drawn back and forth along the heated grilling surface, a combination of pressure applied by a user as well as the heat of the grill surface results in the formation of individual grooves along the conformable scraping edge, wherein each groove is formed to match an upper profile of the grilling surface. Over time, the grooves fully conform to the upper profile of the grilling surface such that an entire cooking surface can be scraped clean of char and debris.

Abstract: A loading device is attachable to the front of a front-loading laundry machine comprising a drum, a drum port and a drum port door for selectively closing the drum port. The loading device comprises a deformable chute mounted on a collapsible frame, and a pair of brackets for mounting the collapsible frame to the laundry machine such that the loading device is configurable between: a use condition in which he collapsible frame is open and the deformable chute is taut for directing laundry through the drum port into the laundry machine, and a storage condition in which the collapsible frame is closed for allowing the drum port door of the laundry machine to be closed. A front-loading laundry machine provided with the loading device located adjacent the drum port. The front-loading laundry machine may be a washing machine or a tumble dryer.

Abstract: A substrate processing method using a cleaning liquid containing a foaming agent that foams due to application of foaming energy, and including a foaming energy supplying step of applying the foaming energy to the cleaning liquid in contact with the substrate to clean the substrate.

Abstract: A cleaning device for cleaning items to be cleaned is proposed. The cleaning device includes at least one nozzle system for acting on the items to be cleaned with at least one cleaning fluid. Additionally the cleaning device includes at least one pump for conveying the cleaning fluid to the nozzle system, wherein the nozzle system comprises at least one high pressure nozzle and at least one low pressure nozzle. The high pressure nozzle and the low pressure nozzle are connected fluidically to the pump, wherein at least one fluidic switching element for adjusting an inflow of the cleaning fluid to the low pressure nozzle is connected upstream of the low pressure nozzle.

Abstract: A throughput in processing a substrate can be improved and a running cost thereof can be reduced. A substrate processing apparatus 1 that processes a substrate 3 with a processing liquid and dries the substrate 3 includes a substrate rotating device 22 configured to rotate the substrate 3; a processing liquid discharging unit 13 configured to discharge the processing liquid toward the substrate 3; a substitution liquid discharging unit 14 configured to discharge a substitution liquid, which is substituted with the processing liquid on the substrate 3, toward the substrate 3 while relatively moving with respect to the substrate 3; and an inert gas discharging unit 15 configured to discharge an inert gas toward a peripheral portion of the substrate 3 in an inclined direction from above the substrate 3 while moving in a direction different from a direction in which the substitution liquid discharging unit 14 is moved.

Abstract: A package for delivering a cleaning solution to a surface to be cleaned includes a sealed packet having a cleaning solution therein with at least a portion of an outer lower surface thereof having at least one weakened, frangible area that is adapted to rupture when a predetermined pressure is applied to an upper surface of the packet. The cleaning solution in the packet can be discharged through the frangible areas when the packet is positioned on a surface and the predetermined pressure is applied to the packet to rupture the packet.

Abstract: Methods for growing microstructured and nanostructured graphene by growing the microstructured and nanostructured graphene from the bottom-up directly in the desired pattern are provided. The graphene structures can be grown via chemical vapor deposition (CVD) on substrates that are partially covered by a patterned graphene growth barrier which guides the growth of the graphene.

Abstract: A spray device assembly for a dishwasher appliance is provided including an outer tube and an inner tube. The outer tube extends along an axial direction and defines an outer tube orifice extending along a length of the outer tube. The inner tube also extends along the axial direction and is rotatably positioned at least partially within an opening of the outer tube. Moreover, the inner tube defines an inner tube orifice extending along a length of the inner tube. The outer tube orifice and inner tube orifice together define a nozzle where the outer tube orifice and the inner tube orifice overlap, the nozzle configured to move along the outer tube orifice as the inner tube and the outer tube are rotated relative to one another.

Abstract: A laundry treating machine is provided. The laundry treating machine may include a tub to receive wash water, a drum rotatably provided in the tub, an air supply device to supply air to the tub, a lint filter to filter lint from the air circulated by the air supply device, a filter cleaning device to supply cleaning water to the lint filter to remove the lint from the lint filter, and a cooling water supply device to supply cooling water to an inner surface of the tub such that moisture contained in air is condensed at the inner surface of the tub.

Abstract: A breakdown voltage measuring method includes the steps of measuring a breakdown voltage of a semiconductor element in a state where a surface of the semiconductor element formed in a semiconductor substrate is covered with a high boiling point fluorine fluid having a boiling point of 90° C. or higher, and cleaning the semiconductor substrate, including the semiconductor element for which the breakdown voltage is measured, with a low boiling point fluorine inert fluid having a boiling point of 80° C. or lower. Accordingly, a breakdown voltage measuring method capable of suppressing generation of an electric discharge during the measurement of the breakdown voltage and suppressing a residue of a foreign object on the cleaned semiconductor substrate, and a semiconductor device to which the breakdown voltage measuring method is implemented are provided.

Abstract: A crystal can be formed using vapor deposition. In one set of embodiments, the crystal can be grown such that the crystal selectively grown along a particular surface at a relatively faster rate as compared to another surface. In another embodiment, the assist material may aid in transporting or depositing the vapor species of a constituent to surfaces of the crystal. In a further set of embodiments, the crystal can be vapor grown in the presence of an assist material that is attracted to or repelled from a particular location of the crystal to increase or reduce crystal growth rate at a region adjacent to the location. The position of the relatively locally greater net charge within the assist material may affect the crystal plane to which the assist material is attracted or repelled. An as-grown crystal may be achieved that has a predetermined geometric shape.

Abstract: An apparatus for cleaning flat objects such as semiconductor wafers with a pulsed liquid jet emitted from a group of nozzles that may be installed on one or on both sides of the wafer installed in a vertically arranged rotating chuck. The apparatus is comprised of a series of individual processing units, such as a loading unit, cleaning units, drying unit, and an unloading unit arranged circumferentially around a universal industrial robot capable of reaching any of the units and transferring the wafers between the units. Drying is carried out in a horizontal position of the wafer and may combine spin-dry with chemical treatment for accelerating the drying process and for improving quality of the drying process. All units are located in a sealed enclosure with a controlled purity of the atmosphere inside the enclosure. Method of cleaning is also disclosed.

Abstract: A dishwasher (100) for pot washing, comprising a detector (160) for automatically detecting what type of washing basket (140) has been placed in the dishwasher (100). This enables automatic selection of water pressure and granule control, such that more sensitive crockery and plates are not damaged. The detector can be an inductive sensor (160) that detects an indicating member (141) of the washing basket. The washing basket can comprise one or several indicating members, for enabling a more reliable detection. A method of operating such a dishwasher (100) comprises the steps of automatically detecting what type of washing basket (140) is placed in the dishwasher, and then controlling the water pressure and granule addition according to what washing basket was detected. A system comprises an above dishwasher and an above washing basket.

Abstract: Provided is a substrate processing apparatus which can efficiently transfer substrates using a conveying mechanism including a plurality of substrate holding members. The substrate processing apparatus transfers a processed substrate to an intermediate conveying unit using a transport mechanism when the processed substrate returns to a substrate receiving unit.

Abstract: A liquid processing method for liquid-processing a substrate includes setting a substrate on a substrate holding device which rotates the substrate such that the substrate is held in horizontal position, supplying processing liquid to center portion of the substrate such that the center portion positioned center side with respect to peripheral portion of the substrate is liquid-processed, positioning a discharge port of a processing liquid nozzle toward downstream side in rotation direction such that the liquid is discharged to the peripheral portion obliquely to surface of the substrate and along tangential direction of the substrate while the substrate is rotated, and discharging gas from a gas nozzle perpendicularly to the surface of the substrate toward position that is adjacent to liquid landing position of the liquid on the surface of the substrate and is on the center side of the substrate, while the liquid is discharged to the peripheral portion.

Abstract: Described herein is a method for growing indium nitride (InN) materials by growing hexagonal and/or cubic InN using a pulsed growth method at a temperature lower than 300° C. Also described is a material comprising InN in a face-centered cubic lattice crystalline structure having an NaCl type phase.

Abstract: An apparatus and a method of operating a laundry treating appliance treating laundry according to a cycle of operation having by determining a parameter indicative of a change in packing density of the laundry in a treating chamber and taking an operating action based on the determined parameter.

Abstract: A warewash machine arm mechanism includes a liquid supply shaft assembly including a rotatable sleeve bearing mounted thereon, and an arm assembly including an elongated interior liquid flow space along an arm body and one or more liquid ejection orifices. The arm assembly is releasably mounted to the supply shaft assembly via a latch mechanism of the arm assembly that engages the rotatable sleeve bearing such that the arm assembly rotates with the rotatable sleeve bearing during ejection of liquid from the liquid ejection orifices.

Abstract: A movable wafer probe may include: an immersion hood including a top body portion and a bottom foot portion, the top body portion having first inner sidewalls surrounding a top opening, the bottom foot portion having second inner sidewalls surrounding a bottom opening; a transducer disposed above the bottom opening and within the top opening, the transducer spaced apart from the first inner sidewalls of the top body portion by a first spacing, the first spacing forming a fluid exhaust port; and a fluid input port extending through the transducer, a bottom end of the fluid input port opening to the bottom opening.

Abstract: The present invention is related to a breech thread protector for cleaning bore of a firearm from breech area of the barrel to the muzzle of the barrel. The breech thread protector includes an elongated tubular member having a proximal open end and a distal open end. The invention is also related to an assembly including the breech thread protector, a kit for cleaning the bore of the barrel, and a method for cleaning bore of the barrel.