Abstract: A unitary fluid additive dispenser includes a mixing bowl, an inlet conduit and a plurality of nozzles. The inlet conduit and the plurality of nozzles are mounted to the mixing bowl. Each nozzle of the plurality of nozzles is in fluid communication with the inlet conduit and is positioned and oriented for directing a flow of fluid from the inlet conduit into a mixing chamber of the mixing bowl. A related method for forming a unitary fluid additive dispenser is also provided.

Abstract: A dishwasher includes a rack provided with interior and exterior corner nozzles to direct washing fluid onto interior and exterior surface portions of an object placed in a corner of the rack.

Abstract: A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.

Abstract: The application describes several methods and an apparatus for treatment of a substrate. In those methods, at least one liquid is applied thereto and electromagnetic radiation is generated in the liquid by means of radiation before applying the liquid to the substrate. Electromagnetic radiation is introduced into the film such that at least a portion of the radiation reaches the substrate surface. In another method for changing the surface characteristics of a substrate having an at least partially hydrophobic substrate surface such that at least a portion of said surface gets a hydrophilic surface characteristic, a liquid is applied to at least the partial area of the surface of the substrate, and UV radiation of a predetermined wavelength is guided onto at least the partial area of the surface of said substrate.

Abstract: A bi-directional pig apparatus for removing wax and hydrate deposits in subsea hydrocarbon production flowlines including a pig arranged for movement inside a pipe, the pig having a tubular body and one or more magnets arranged in a circumferential wall of said body, each of the one or more magnets includes an elongated bar having a succession of teeth and slots, arranged such that the succession of teeth are facing radially outwards. The apparatus having a through-going opening between opposite ends of said tubular body to allow fluids (F) in the pipe to flow through and propulsion means arranged and configured for imparting a motive force to the pig, whereby the pig is movable inside the pipe.

Abstract: A dishwasher includes an independent presoak system which may be activated by a user of the dishwasher. The dishwasher presoak system utilizes a storage tank, supply tubes, and set of nozzles which are independent from components used in a washing cycle such that a presoak detergent is applied to items placed within a washing compartment of the dishwasher without being diluted by a standard wash cycle. As part of the presoak system, the dishwasher features a detection system which allows the user to select an automatic presoak operating state whereby the dishwasher utilizes a sensor to determine if items placed into the washing compartment are sufficiently dirty to need a presoak cycle prior to a washing cycle. The dishwasher further relies on a control system to analyze samples taken of the dirtiness levels of items placed within the washing compartment and determine whether a presoak option is necessary or suggested.

Abstract: Labor saving and automatization of cleaning work of a conveyance face for articles or materials are intended to reliably and quickly execute the cleaning work. A cleaning apparatus has a cleaning implement (10) located on the upper side of a conveyance element (R). The cleaning implement includes a cleaning face (11) to be in contact with a conveyance face (S). The cleaning apparatus also has a traction device (6,7) which applies a tractive force (T) to the cleaning implement, in a direction (E) opposite to a conveyance direction (D) of a conveyance passage. The cleaning implement has a weight (P) for keeping the cleaning face in contact with the conveyance element in operation of the conveyor device, and cleans the conveyance face by means of contact and separation of the cleaning face and the conveyance face, and relative displacement therebetween (V1, V2, V3).

Abstract: A plasma etching apparatus includes an electrostatic chuck and an etching gas supply unit for supplying an etching gas to a processing space between a first and a second electrode to perform a dry etching process on the target object. The apparatus further includes a cleaning gas supply unit for supplying a cleaning gas to a processing space; a first high frequency power supply unit for supplying a first high frequency power to the first electrode; and a controller for controlling the first high frequency power supply unit such that a first period during which the first high frequency power has a first amplitude that generates the plasma and a second period during which the first high frequency power has a second amplitude that generates substantially no plasma are alternately repeated at a specific cycle when the plasma cleaning is performed in the processing chamber without the target object.

Abstract: A method and device for controlling a domestic appliance connected to an electric grid so as to allow smart metering, wherein electric power consumed according to different consumption tariffs is measured and the domestic appliance receives information about the availability of a currently applicable consumption tariff or a switch-off condition for preventing peak loads in the grid. The domestic appliance is operated as follows: a) when an inexpensive consumption tariff is available, the appliance is put into operation as intended, and the history of the cleaning process is continuously recorded; b) when an inexpensive consumption tariff is not available or the switch-off condition is met, the appliance is not put into operation or a previously started operation is interrupted; and c) when information about an inexpensive consumption tariff is available, the domestic appliance resumes operation, and a component of a detergent is added based on the recorded history.

Abstract: Embodiments of the invention generally relate to methods of removing and/or cleaning a substrate surface having different material layers disposed thereon using water vapor plasma treatment. In one embodiment, a method for cleaning a surface of a substrate includes positioning a substrate into a processing chamber, the substrate having a dielectric layer disposed thereon forming openings on the substrate, exposing the dielectric layer disposed on the substrate to water vapor supplied into the chamber to form a plasma in the water vapor, maintaining a process pressure in the chamber at between about 1 Torr and about 120 Torr, and cleaning the contact structure formed on the substrate.

Abstract: A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system, a liquid recirculation circuit, and a liquid filtering system where the liquid filtering system includes a rotating filter and where a granular agent contacts the rotating filter to clean the filter. Methods of cleaning a rotating filter provided within a liquid flow by scouring the filter with a granular agent.

Abstract: Described herein is a method for removing coke deposits in radiant tubes of an olefin cracking furnace and removing accumulated spalled coke from one or more outlet elbows of the olefin cracking furnace without performing a cold shutdown of the furnace.

Abstract: Blockages of turbomachine cooling circuit cooling holes resulting from coating processes can be removed by introducing a cleaning agent into the cooling circuit. The cooling circuit can be connected to a cleaning agent supply under pressure, adding force on the blockage to chemical action by the cleaning agent. The cleaning agent is chemically reactive with the coating material and substantially chemically non-reactive with the underlying material of the cooling circuit and other parts of the turbomachine. A neutralization agent can also be introduced to reduce toxicity and/or action of the cleaning agent. A turbomachine cooling hole cleaning method includes introducing a cleaning agent into a cooling circuit of a turbomachine part, pressurizing the cleaning agent in the cooling circuit until a first defined condition is met, and introducing a neutralization agent to the turbomachine part while the cleaning agent is applied to the cooling circuit.

Abstract: A method of manufacturing a vitreous silica crucible includes: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a cross-sectional shape of an inverse trapezoid and a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line. The groove line is formed by repeating shifting a focal point of a laser.

Abstract: A clean-in-place system for piping systems uses a pig train having a dry ice and glycol section. The pig train is moved through the piping system as part of a cleaning sequence. The system and method of the disclosure provide an alternative, effective clean-in-place system that significantly reduces water, chemical and energy usage as well as significantly reducing the related environmental impact.

Abstract: A substrate cleaning apparatus includes: a substrate holder configured to hold and rotate a substrate; an ultrasonic cleaning unit configured to impart an ultrasonic vibration energy to deaerated pure water and then supply the deaerated pure water onto a surface of the substrate; a pure water spray nozzle configured to spray deaerated pure water onto the surface of the substrate; a chamber surrounding the substrate holder and the pure water spray nozzle; and an inert gas supply line configured to supply an inert gas into the chamber.

Abstract: Methods of making electrically conductive, doped zinc oxide nanowires and nanowire films are provided. The methods comprises the steps of forming an aqueous solution comprising a dopant-containing precursor salt, a zinc-containing precursor salt and a pH buffering agent and heating the aqueous solution to a temperature below its boiling point in the presence of seed crystals, whereby doped zinc oxide nanowires are grown in situ from the seed crystals in the aqueous solution.

Abstract: A system for capturing dust during the movement of sand between a container and a fracing blender includes a conveyor system having a lateral portion for transporting sand discharged from the container, a lifting portion for lifting sand received from the lateral portion, and a spout for discharging sand received from the lifting portion into a bin of the fracing blender. An enclosure encloses a substantial length of the lateral portion of the conveyor, with portions of the enclosure disposed above and along opposing sides of a belt of the lateral portion of the conveyor system. A manifold is supported on the ground and is coupled in fluid communication with a flexible conduit, which has an inlet disposed in an area proximate a discharge end of the spout. An air system is coupled in fluid communication with the manifold and the flexible conduit for drawing air through the inlet of flexible hose to capture dust around the discharge end of the spout.

Abstract: A device for cleaning ionizing electrodes includes a coil spring fixedly mounted at opposite ends, and an ionizing electrode operable by an actuator plunger for reciprocating movement relative to an axis of the coil spring along a line that extends from an outer periphery of the spring toward an inner periphery thereof, whereby during each reciprocating movement a tip of the electrode penetrates a complete cross-section of the coil spring so as to intersect the adjacent coils at opposing extremities thereof each of which is thereby able to collect dust and other waste deposits from the electrode.

Abstract: An apparatus includes a wafer stage configured to secure a wafer; and a cleaning module including a tank adjacent to the wafer stage, and is positioned outside the region occupied by the wafer. The cleaning module is configured to receive de-ionized (DI) water into the tank and extract the DI water out of the tank. The tank is configured to hold DI water with a top surface of the DI water substantially level with a top surface of the wafer.