Patents Examined by Michael Kornakov
  • Patent number: 9561337
    Abstract: A device for removing secretions from an artificial tube is provided. The device may include a clearing catheter and a driving mechanism that may apply repetitive motion to the clearing catheter. In another version of the device, the clearing catheter may dispense irrigation fluid and aspirate the irrigation fluid. The clearing catheter may have an irrigation and an aspiration lumen that may both reciprocate with the clearing catheter. In another version a compliant member into which irrigation fluid is located may be present.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: February 7, 2017
    Assignee: Actuated Medical, Inc.
    Inventors: Ryan S Clement, Roger B Bagwell, Katherine M Erdley, Brian M Park, Casey A Scruggs, Maureen L Mulvihill, Gabriela Hernandez Meza
  • Patent number: 9554688
    Abstract: A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system, a liquid recirculation circuit, and a liquid filtering system where the liquid filtering system includes a rotating filter and where a granular agent contacts the rotating filter to clean the filter. Methods of cleaning a rotating filter provided within a liquid flow by scouring the filter with a granular agent.
    Type: Grant
    Filed: October 23, 2012
    Date of Patent: January 31, 2017
    Assignee: Whirlpool Corporation
    Inventors: Jacquelyn R. Geda, Antony M. Rappette
  • Patent number: 9553004
    Abstract: To provide a cleaning method which makes it possible to reduce alkaline component mixing in an ozone cleaning solution, thereby preventing impairment of cleaning ability of ozone. In the cleaning method, before chuck members retain another workpiece having previously been dipped in an ozone cleaning solution in an ozone cleaning tank, alkaline component attached to part of transfer arms and the chuck members is removed by cleaning, thereby preventing the alkaline component from mixing into the ozone cleaning solution.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: January 24, 2017
    Assignee: SUMCO Corporation
    Inventors: Makoto Takemura, Keiichiro Mori
  • Patent number: 9553221
    Abstract: Disclosed is an electromagnetic casting method of polycrystalline silicon which is characterized in that polycrystalline silicon is continuously cast by charging silicon raw materials into a bottomless cold mold, melting the silicon raw materials using electromagnetic induction heating, and pulling down the molten silicon to solidify it, wherein the depth of solid-liquid interface before the start of the final solidification process is decreased by reducing a pull down rate of ingot in a final phase of steady-state casting. By adopting the method, the region of precipitation of foreign substances in the finally solidified portion of ingot can be reduced and cracking generation can be prevented upon production of a polycrystalline silicon as a substrate material for a solar cell.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: January 24, 2017
    Assignee: SUMCO CORPORATION
    Inventors: Koichi Maegawa, Tomohiro Onizuka, Mitsuo Yoshihara
  • Patent number: 9546416
    Abstract: An oxide semiconductor film with excellent crystallinity is formed. At the time when an oxide semiconductor film is formed, as a substrate is heated to a temperature of higher than or equal to a first temperature and lower than a second temperature, a part of the substrate having a typical length of 1 nm to 1 ?m is heated to a temperature higher than or equal to the second temperature. Here, the first temperature means a temperature at which crystallization occurs with some stimulation, and the second temperature means a temperature at which crystallization occurs spontaneously without any stimulation. Further, the typical length is defined as the square root of a value obtained in such a manner that the area of the part is divided by the circular constant.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: January 17, 2017
    Assignee: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
    Inventor: Shunpei Yamazaki
  • Patent number: 9548223
    Abstract: A device and method for processing wafer-shaped articles comprises a process chamber and a rotary chuck located within the process chamber. The rotary chuck is adapted to be driven without physical contact through a magnetic bearing. The rotary chuck comprises a series of gripping pins adapted to hold a wafer shaped article in a position depending downwardly from the rotary chuck. The rotary chuck further comprises a plate that rotates together with the rotary chuck. The plate is positioned above an area occupied by the wafer-shaped article, and shields upper surfaces of the process chamber from liquids flung off of a wafer-shaped article during use of the rotary chuck.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: January 17, 2017
    Assignee: LAM RESEARCH AG
    Inventors: Dieter Frank, Robert Rogatschnig, Andreas Gleissner
  • Patent number: 9539624
    Abstract: A hole cleaning apparatus includes a member, a brush, and a vacuum source. The brush rotates around a longitudinal axis of the member, or translates in a direction which is substantially parallel to the longitudinal axis of the member. The vacuum source provides vacuum suction within the member.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: January 10, 2017
    Assignee: The Boeing Company
    Inventors: Eric Whinnem, Gary A. Lipczynski, Wesley E. Holleman, Daniel W. Barnett
  • Patent number: 9539061
    Abstract: A wire made up of a plurality of wire strands is wound around a tubular body coupled to a distal end working unit. A fixing pin has a through hole through which the wire is inserted. The fixing pin is fitted into a recess disposed in a side surface of the tubular body. The fixing pin is welded to the tubular body and the wire. The melting point of the wire is higher than the melting point of the fixing pin. In a state where material of the fixing pin flows in between the wire strands, the fixing pin and the wire are joined together.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: January 10, 2017
    Assignee: Karl Storz GmbH & Co. KG
    Inventor: Shuji Imuta
  • Patent number: 9534315
    Abstract: Diamond is grown on a substrate (S) from a mixture of a carbon-containing gas and hydrogen gas, by a DC plasma enhanced CVD process of applying a DC voltage between a stage electrode (12) for holding the substrate (S) and a voltage-applying electrode (13). During the step of growing diamond by applying a DC voltage, a single pulse voltage of opposite polarity to the DC voltage for diamond growth is applied between the stage electrode and the voltage-applying electrode at a predetermined timing. Diamond of quality is produced at a stable growth rate.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: January 3, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Hitoshi Noguchi
  • Patent number: 9533332
    Abstract: Embodiments of the invention include methods for in-situ chamber dry cleaning a plasma processing chamber utilized for gate structure fabrication process in semiconductor devices. In one embodiment, a method for in-situ chamber dry clean includes supplying a first cleaning gas including at least a boron containing gas into a processing chamber in absence of a substrate disposed therein, supplying a second cleaning gas including at least a halogen containing gas into the processing chamber in absence of the substrate, and supplying a third cleaning gas including at least an oxygen containing gas into the processing chamber in absence of the substrate.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: January 3, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Noel Sun, Meihua Shen, Nicolas Gani, Chung Nang Liu, Radhika C. Mani
  • Patent number: 9534318
    Abstract: The present invention provides a method of manufacturing a vitreous silica crucible including: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: January 3, 2017
    Assignee: SUMCO CORPORATION
    Inventors: Toshiaki Sudo, Taira Sato, Shuichi Ikehata, Manabu Shonai, Takuji Nishi, Takaya Satou, Shinsuke Yamazaki
  • Patent number: 9523287
    Abstract: Blockages of turbomachine cooling circuit cooling holes resulting from coating processes can be removed by introducing a cleaning agent into the cooling circuit. The cooling circuit can be connected to a cleaning agent supply under pressure, adding force on the blockage to chemical action by the cleaning agent. The cleaning agent is chemically reactive with the coating material and substantially chemically non-reactive with the underlying material of the cooling circuit and other parts of the turbomachine. A neutralization agent can also be introduced to reduce toxicity and/or action of the cleaning agent.
    Type: Grant
    Filed: January 18, 2013
    Date of Patent: December 20, 2016
    Assignee: General Electric Company
    Inventors: Mark Carmine Bellino, Mark Lawrence Hunt
  • Patent number: 9518760
    Abstract: A method and an apparatus for detaching limescale deposits within a water heater of a beverage dispensing machine, by powering an ultrasonic generator discontinuously to scan frequencies within a range of 20 kHz to 100 kHz so as to induce ultrasonic vibrations. Advantageously the step of inducing ultrasonic vibrations is implemented discontinuously at high energy levels.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: December 13, 2016
    Assignee: RHEAVENDORS SERVICES S.P.A.
    Inventor: Luca Doglioni Majer
  • Patent number: 9518340
    Abstract: The present invention provides a method of growing an ingot of group III nitride. Group III nitride crystals such as GaN are grown by the ammonothermal method on both sides of a seed to form an ingot and the ingot is sliced into wafers. The wafer including the first-generation seed is sliced thicker than the other wafers so that the wafer including the first-generation seed does not break. The wafer including the first-generation seed crystal can be used as a seed for the next ammonothermal growth.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: December 13, 2016
    Assignees: SixPoint Materials, Inc., Seoul Semiconductor Co., Ltd.
    Inventors: Tadao Hashimoto, Edward Letts, Sierra Hoff
  • Patent number: 9512554
    Abstract: A device that has a component within a process air circuit of a washer dryer or tumble dryer; a condensate water trough in which condensate water is collected that is formed in the process air circuit as a result of drying damp laundry; and a first lever arm rotatably fastened to a rinse tank above the component. The component is to be cleaned and the condensate water is conducted from the condensate water trough to the rinse tank. Further, the condensate water is dispensed from an outlet opening of the rinse tank to the component. The rinse tank has a closure to selectively open and close the outlet opening and an actuator to actuate the closure. Also, the closure has a sealing head that is connected to the first lever arm and that closes the outlet opening.
    Type: Grant
    Filed: July 9, 2009
    Date of Patent: December 6, 2016
    Assignee: BSH HAUSGERÄTE GMBH
    Inventors: Martin Baurmann, Frank Kohlrusch, Günter Steffens, Oliver Wuttge
  • Patent number: 9511476
    Abstract: The present invention provides a cleaning brush and a cleaning apparatus that can effectively discharge dust, removed from a dresser disk of a CMP apparatus upon cleaning the dresser disk, to the outside of the cleaning system in order to prevent the dust from being again deposited on the dresser disk. A cleaning brush includes a large number of brushes formed to protrude on its top surface, vertical through-holes and into which a nozzle for ejecting a cleaning fluid is inserted, and a recessed groove formed on a lower surface that lower ends of the through-holes and face. It is configured such that dust deposited onto the brushes upon cleaning the dresser disk is discharged to outside from the recessed groove through a gap between the surrounding of the nozzle and the inner surface of the through-holes and together with the cleaning fluid.
    Type: Grant
    Filed: July 3, 2013
    Date of Patent: December 6, 2016
    Assignee: EBARA CORPORATION
    Inventor: Hiroyuki Shinozaki
  • Patent number: 9506145
    Abstract: A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF3 and O2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: November 29, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Sanjeev Baluja, Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit Kangude, Inna Turevsky, Mahendra Chhabra, Thomas Nowak, Daping Yao, Bo Xie, Daemian Raj
  • Patent number: 9498801
    Abstract: A coating removing device includes a coating thickness gauge configured for detecting a thickness of a coating layer formed on a surface of a article. A controller configured for determining an intensity of a laser beam needed to be emitted according to the thickness of the coating layer detected by the coating thickness gauge. In addition, a laser emitter emits the laser beam to the coating layer to remove the coating layer, the laser beam having the intensity determined according to the thickness of the coating layer. The intensity and energy of the laser beam arrived the surface of the article is changed over the coating thickness on the surface, the coated adhesive layer of the PCB is removed, and the appearance of the PCB will not be damaged.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: November 22, 2016
    Assignees: Fu Tai Hua Industry (Shenzhen) Co., Ltd., HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Guang-Hui Xue, Yan-Zheng Liang
  • Patent number: 9498803
    Abstract: A pipeline cleaning system can include a pipeline cleaning apparatus with at least one fluid director that causes fluid which flows through the fluid director to repeatedly change direction. A method of cleaning a pipeline can include inserting a pipeline cleaning apparatus into the pipeline, flowing a fluid, thereby causing the fluid to be discharged from the pipeline cleaning apparatus into the pipeline, and a fluid director of the pipeline cleaning apparatus repeatedly changing a direction of discharge of the fluid from the pipeline cleaning apparatus. A pipeline cleaning apparatus can include a housing adapted for insertion into a pipeline, and at least one fluid director that repeatedly changes a direction of discharge of fluid from the pipeline cleaning apparatus, in response to flow of the fluid through the apparatus.
    Type: Grant
    Filed: June 10, 2013
    Date of Patent: November 22, 2016
    Assignee: Halliburton Energy Services, Inc.
    Inventor: Timothy H. Hunter
  • Patent number: 9492057
    Abstract: A device (5), arranged for fluid communication with a washing chamber (2) of a dishwasher (1), the device further being arranged to allow a passage of air (9) between the washing chamber and the device, the device comprising a drying material (10) arranged in a bed (11), the drying material being able to withdraw moisture from the air passing through the bed during a withdrawal step, and release moisture to the air during a regeneration step, a heating element (13) arranged in the bed arranged to heat the drying material during the regeneration step such that moisture is released from the drying material, and a fan (14), arranged to circulate the air between the device and the washing chamber such that the air flow rate during the withdrawal step is higher than the air flow rate during the regeneration step by altering the fan speed.
    Type: Grant
    Filed: May 13, 2011
    Date of Patent: November 15, 2016
    Assignee: Electrolux Home Products Corporation N.V.
    Inventors: Giuseppe Dreossi, Anders Haegermarck, Bernd Krische, Petter Svanbom