Patents Examined by Michael Logie
  • Patent number: 9281160
    Abstract: An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: March 8, 2016
    Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
    Inventor: Masateru Sato
  • Patent number: 9267902
    Abstract: Provided is a sample analysis method of irradiating a sample with a primary ion beam to analyze a secondary ion emitted from the sample by mass spectrometry, the sample analysis method including the steps of cooling a sample placed in a chamber; forming an ice layer on a surface of the cooled sample by discharging one of water and an aqueous solution to the chamber; and irradiating the surface of the sample with the primary ion beam with the ice layer being formed thereon, wherein an amount of the water forming the ice layer is 0.1 ng/mm2 or more and 20 ng/mm2 or less.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: February 23, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Manabu Komatsu, Masafumi Kyogaku, Hiroyuki Hashimoto, Naofumi Aoki
  • Patent number: 9269540
    Abstract: An ion implantation apparatus according to an embodiment includes an ion implantation unit, a position detection unit, a charge supply unit, a current value detection unit, and a determination unit. The ion implantation unit scans the surface of a substrate with an ion beam containing positively charged ions and implants the ions into the substrate. The position detection unit detects the scan position of the ion beam on the substrate. The charge supply unit generates a plasma, emits electrons contained in the plasma, and supplies the electrons to the substrate. The current value detection unit detects a current value that changes in accordance with the amount of electrons emitted by the charge supply unit. The determination unit determines the charge build-up state of the substrate based on a change in the current value, the change being accompanied by a change in the scan position.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: February 23, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Jinguuji, Kei Hattori, Keiji Fujita, Takahito Nagamatsu
  • Patent number: 9257206
    Abstract: Methods and apparatus for providing coherent atom population transfer using coherent laser beam pairs in which the frequency difference between the beams of a pair is swept over time. Certain examples include a Raman pulse adiabatic rapid passage sweep regimen configured to be used as a beamsplitter and combiner in conjunction with an adiabatic rapid passage mirror sweep or a standard Raman mirror pulse in a 3-pulse interferometer sequence.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: February 9, 2016
    Assignee: THE CHARLES STARK DRAPER LABORATORY, INC.
    Inventors: Richard E. Stoner, Joseph M. Kinast, Brian P. Timmons
  • Patent number: 9245715
    Abstract: The present invention provides a drawing apparatus for performing drawing on a substrate with a plurality of charged particle beams, comprising a blanker array including first and second groups, each of which includes at least one blanker, a deflector configured to deflect the plurality of charged particle beams to scan the plurality of charged particle beams on the substrate, and a controller configured to respectively supply first and second control signals to the first and second groups at first and second timings, wherein the first and second groups are respectively arranged at such relative positions that a positional difference between respective drawing regions thereof, due to a difference between the first and second timings, in a scanning direction of the deflector is compensated for.
    Type: Grant
    Filed: October 15, 2013
    Date of Patent: January 26, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomoyuki Morita, Masato Muraki
  • Patent number: 9236223
    Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: January 12, 2016
    Assignee: NuFlare Technology, Inc.
    Inventors: Takahito Nakayama, Takanao Touya
  • Patent number: 9230791
    Abstract: An anion generating and electron capture dissociation apparatus using cold electrons, which comprises a cold electron generation module configured to generate a large quantity of cold electrons from ultraviolet photons radiated into a mass spectrometer vacuum chamber which is in a high vacuum state has a plurality of ultraviolet diodes configured to emit the ultraviolet photons in the mass spectrometer vacuum chamber. Micro-channel plate (MCP) electron multiplier plates induce and amplify initial electron emissions of the ultraviolet photons from the ultraviolet diodes, and generate a large quantity of electron beams from a rear plate. An electron focusing lens is configured to focus the electron beams amplified through the MCP electron multiplier plates. A grid is configured to adjust energy and an electric current of the electron beams together with the electron focusing lens.
    Type: Grant
    Filed: November 28, 2011
    Date of Patent: January 5, 2016
    Assignee: KOREA BASIC SCIENCE INSTITUTE
    Inventors: Hyun Sik Kim, Seung Young Kim, Mo Yang
  • Patent number: 9230786
    Abstract: The present invention relates to electrospray ionization (ESI) at atmospheric pressure coupled with a mass spectrometer, in particular to a special kind of micro-electrospray with liquid flows in the range of 0.1 to 100 microliters per minute. The invention describes the use of an off-axis pre-entrance channel in an ESI ion source to prevent particulate matter with higher inertia than the (charged) gas molecules, such as droplets, from entering the mass spectrometer. The elimination of the particulate matter improves the quantitative precision of an LC/MS bioassay, minimizes the contamination of the mass spectrometer and improves the robustness for high throughput assays.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: January 5, 2016
    Inventors: David Kennedy, Kerry Nugent
  • Patent number: 9212979
    Abstract: An automated headspace solid-phase microextraction coupled with gas chromatography-mass spectrometry for the determination of four N-nitrosamines in groundwater samples is developed. Response surface methodology technique was employed to investigate the optimized extraction conditions of headspace solid-phase microextraction using CombiPAL autosampler. The method was applied to determine the N-nitrosamine concentrations in groundwater samples.
    Type: Grant
    Filed: January 15, 2014
    Date of Patent: December 15, 2015
    Assignees: King Fahd University of Petroleum and Minerals, King Abdulaziz City for Science and Technology
    Inventors: Basheer Chanbasha, Mousa Yaser Amayreh
  • Patent number: 9211542
    Abstract: A sample support plate (100) for a variety of possible applications, including MALDI mass spectrometry, is disclosed. A plurality of spatially separated sample recipient sites (101) are arranged on the surface of a substrate. The recipient sites are mutually separated by areas having a different wettability than the recipient sites. They are arranged in a plurality of rows consisting of a plurality of recipient sites whose centers are regularly spaced along a first direction with a predetermined periodicity (D1), the rows being regularly spaced along a second direction perpendicular to the first direction with a predetermined centerline distance (D2). Each recipient site has a maximum lateral dimension that is preferably smaller than the diameter of a beam spot (104) of a desorption laser beam (103).
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: December 15, 2015
    Assignees: EIDGENOSSISCHE TECHNISCHE HOCHSCHULE ZURICH, EMPA EIDG. MATERIALPRUFUNGS—UND FORSCHUNGSANSTALT
    Inventors: Pawel Urban, Renato Zenobi, Konstantins Jefimovs, Andrea Amantonico, Stephan Fagerer, Nils Goedecke
  • Patent number: 9208994
    Abstract: The present invention provides an electron beam apparatus comprising a means for visualizing an axial displacement of a retarding electric field, and a means for adjusting axial displacement. The axial displacement visualizing means includes a reflective plate (6), and an optical system (2, 3) for converging a secondary electron beam (9) on the reflective plate (6), and the axial displacement adjusting means includes an incline rotation mechanism (8) for a sample stage (5). With this configuration, in electron beam apparatuses such as SEM and the like, such problems as visual field displacement caused by displacement of the axial symmetry of the electric field between an objective lens (3) and a sample (4) and inability to measure secondary electrons and reflected electrons that provide desired information can be eliminated.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: December 8, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takashi Ohshima, Michio Hatano, Hideo Morishita
  • Patent number: 9202673
    Abstract: A multi charged particle beam writing method includes performing ON/OFF switching of a beam by an individual blanking system for the beam concerned, for each beam in multi-beams of charged particle beam, with respect to each time irradiation of irradiation of a plurality of times, by using a plurality of individual blanking systems that respectively perform beam ON/OFF control of a corresponding beam in the multi-beams, and performing blanking control, in addition to the performing ON/OFF switching of the beam for the each beam by the individual blanking system, with respect to the each time irradiation of the irradiation of the plurality of times, so that the beam is in an ON state during an irradiation time corresponding to irradiation concerned, by using a common blanking system that collectively performs beam ON/OFF control for a whole of the multi-beams.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: December 1, 2015
    Assignee: NuFlare Technology, Inc.
    Inventors: Hiroshi Matsumoto, Tomohiro Iijima, Munehiro Ogasawara, Hideo Inoue, Ryoichi Yoshikawa
  • Patent number: 9188565
    Abstract: Improved methods and devices for analysis of gas phase ions via ion mobility type analyzers, particularly high field asymmetric waveform ion mobility analyzers (FAIMS), by linking gas composition and/or flow rate with the scanning of compensation voltage or asymmetric waveform amplitude are provided. Linking these parameters results in improvements in resolution, sensitivity, and selectivity. The methods and devices according to the presently disclosed subject matter provide for the improvement in resolution for specific ions without affecting the entire FAIMS spectrum.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: November 17, 2015
    Assignee: The University of North Carolina at Chapel Hill
    Inventors: Gary Glish, Mark Ridgeway, Alice Pilo
  • Patent number: 9179703
    Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a sterilization operating configuration and a preservation operating configuration.
    Type: Grant
    Filed: August 28, 2013
    Date of Patent: November 10, 2015
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Michael Shur, Maxim Shatalov, Timothy James Bettles, Yuri Bilenko, Saulius Smetona, Alexander Dobrinsky, Remigijus Gaska
  • Patent number: 9177765
    Abstract: A method for automatically checking and adjusting a calibration of a mass spectrometer having a first quadrupole (Q1), a fragmentation cell and a mass analyzer comprises: introducing a sample having at least one known chemical entity; decreasing a kinetic energy so as to prevent fragmentation of ions in the fragmentation cell; optionally applying a drag field to the fragmentation cell; ionizing the at least one known chemical entity sample to generate a set of ions; performing a mass scan of the set of ions using Q1; transmitting the scanned ions through Q1 to and through the fragmentation cell; detecting the scanned and transmitted ions by a detector of the mass analyzer; and comparing the results with expected results. Embodiments may include automatic recalibration or notification of possible errors, need for further data processing or an analysis of system performance.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: November 3, 2015
    Assignee: Thermo Finnigan LLC
    Inventor: Terry N. Olney
  • Patent number: 9176400
    Abstract: Various embodiments provide systems and methods for extreme ultraviolet (EUV) lithography light source. An exemplary system can include a laser radiation apparatus configured to provide laser radiation. The system can further include an EUV light excitation source material configured to receive the laser radiation to generate an EUV light. The laser radiation can generate droplets from the EUV light excitation source material. The system can further include a collector configured to collect the EUV light. The collector can include a plurality of reflective mirrors surrounding the EUV light excitation source material. The plurality of reflective mirrors can be movable. The collector can further include a mirror control system synchronized with the laser radiation apparatus and configured to set the plurality of reflective mirrors to be in one of a reflective state for reflecting the EUV light and a non-reflective state for preventing contamination by the droplets.
    Type: Grant
    Filed: May 1, 2014
    Date of Patent: November 3, 2015
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventor: Emily Shu
  • Patent number: 9171725
    Abstract: Isotopically enriched silicon precursor compositions are disclosed, as useful in ion implantation to enhance performance of the ion implantation system, in relation to corresponding ion implantation lacking such isotopic enrichment of the silicon precursor composition. The silicon dopant composition includes at least one silicon compound that is isotopically enriched above natural abundance in at least one of 28Si, 29Si, and 30Si, and may include a supplemental gas including at least one of a co-species gas and a diluent gas. Dopant gas supply apparatus for providing such silicon dopant compositions to an ion implanter are described, as well as ion implantation systems including such dopant gas supply apparatus.
    Type: Grant
    Filed: July 14, 2014
    Date of Patent: October 27, 2015
    Assignee: ENTEGRIS, INC.
    Inventors: James J. Mayer, Richard S. Ray, Robert Kaim, Joseph D. Sweeney
  • Patent number: 9168390
    Abstract: There are provided a leaf row in which a plurality of leaf plates are arranged in the thickness direction of the row in such a way that the respective one end faces of the leaf plates are trued up and a leaf plate drive mechanism that drives each of the plurality of leaf plates in such a way that the one end face approaches or departs from a beam axis. In each of the leaf plates, a facing side facing a leaf plate that is adjacent to that leaf plate in the thickness direction is formed of a plane including a first axis on the beam axis; the leaf plate drive mechanism drives the leaf plate along a circumferential orbit around the second axis, on the beam axis, that is perpendicular to the beam axis and the first axis.
    Type: Grant
    Filed: October 10, 2014
    Date of Patent: October 27, 2015
    Assignee: Mitsubishi Electric Corporation
    Inventor: Takaaki Iwata
  • Patent number: 9171706
    Abstract: Mass analysis is performed on the same sample while changing the cooling gas supply rate to the ion trap, i.e. the gas pressure conditions, and the respective mass spectra are obtained. Under high gas, ion energy will decrease and modifiers such as phosphate groups will not detach readily, while under low gas, ion energy will remain high and so detachment of modifiers will occur readily. Thus, between multiple mass spectra obtained while changing the gas pressure, if the mass difference between a peak for which signal intensity increased and a peak for which it decreased corresponds to the mass of a known modifier or an integer multiple thereof, it can be inferred that those peaks have the same basic structure and differ only in the number of modifiers. Thus, such peaks are selected as precursor ions to perform MS2 analysis and structural analysis.
    Type: Grant
    Filed: November 6, 2014
    Date of Patent: October 27, 2015
    Assignee: SHIMADZU CORPORATION
    Inventors: Shinji Funatsu, Noriyuki Ojima
  • Patent number: 9165755
    Abstract: A method for mass analyzing ions comprising a restricted range mass-to-charge (m/z) ratios comprising (i) performing a survey mass analysis, using a first mass analyzer employing indirect detection of ions by image current detection, to measure a flux of ions having m/z ratios within said range and (ii) performing a dependent mass analysis, using a second mass analyzer, of an optimal quantity of ions having m/z ratios within said range, said optimal quantity collected for a time period determined by the measured ion flux, the method characterized in that: the time period is determined using a corrected ion flux that includes a correction that comprises an estimate of the quantity of ions that are undetected by the first mass analyzer.
    Type: Grant
    Filed: June 5, 2014
    Date of Patent: October 20, 2015
    Assignee: Thermo Finnigan LLC
    Inventors: Philip M. Remes, Michael W. Senko, Justin Blethrow