Abstract: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. Multiple magnets (one for each target) in the magnetron assembly in the sputtering chamber oscillate over their respective targets for uniform target erosion and uniform deposition on the wafers. An electrically insulated target backing plate between each magnet and a target has a liquid channel running through it for controlling temperature, where the liquid channel has a wider cross-sectional area around the middle portion of the target backing plate to increase cooling of the middle portion of the target. The distance between the magnets and the targets is made very small by a thin aluminum plate fixed to the bottom segment of the target backing plate by a dip brazing process.

Abstract: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm without breaking a vacuum. The wafers are mounted one-by-one onto a rotating pallet in the pre-cleaning chamber and sputtering chamber. The pallet is firmly fixed to a rotatable table in the sputtering chamber. Copper tubing in the table couples RF energy to the wafers, and a liquid running through the copper tubing controls the temperature of the wafers. Multiple targets, of the same or different materials, may concurrently deposit material on the wafers as the pallet is rotating. Multiple magnets (one for each target) in the magnetron assembly in the sputtering chamber oscillate over their respective targets for uniform target erosion and uniform deposition on the wafers.

Abstract: An amperometric sensor for uric acid and a manufacturing method thereof are disclosed, in which polyacrylamide is used to fix catalase, uricase and ferrocenecarboxylic acid on a working electrode. In determining concentration of uric acid, hydrogen peroxide is produced when enzyme and uric acid react with each other and then a reduction current generated from enzyme on the electrode with an external voltage 200 mV applied is detected. In determining concentration of uric acid, a concentration range of 2.5-20 mg/dl is achieved and sensibility of the sensor in a linear portion is 5.17 uAcm?2(mg/dl)?1. In addition, reaction time required for the reaction between enzyme and uric acid is 5.17 uAcm?2(mg/dl)?1.

Abstract: A monitor is disclosed for monitoring an atmosphere for the presence of a target gas. The monitor includes an electrical gas sensor having a working (sensing) electrode and a counter electrode, an operational amplifier connected between the sensor electrodes, a detector, and a circuit. The sensor provides a current between the electrodes that is indicative of the amount of a target gas in the atmosphere. The operational amplifier generates an output signal according to the current flowing between the terminals where the output signal is indicative of the amount of target gas in the atmosphere. The detector detects when the current flowing between the sensor electrodes exceeds a predetermined threshold. The circuit restricts the potential difference between the sensor electrodes when the current between the terminals exceeds the predetermined threshold by supplying additional current or removing current from the working sensor electrode.

Abstract: The present invention concerns an electrochemical pattern replication method, ECPR, and a construction of a conductive electrode for production of applications involving micro and nano structures. An etching or plating pattern, which is defined by a conductive electrode, a master electrode, is replicated on an electrically conductive material, a substrate. The master electrode is put in close contact with the substrate and the etching/plating pattern is directly transferred onto the substrate by using a contact etching/plating process. The contact etching/plating process is performed in local etching/plating cells, that are formed in closed or open cavities between the master electrode and the substrate.

Abstract: In order to provide a high-performance electrophoresis chip and an electrophoresis unit having the same that can restrain the diffusion of sample at an intersection between the electrophoresis groove and the sample introduction groove and prevent decrease in contrast and decrease in resolution, an electrophoresis chip is provided with a sample introduction groove, an electrophoresis groove, and a through hole. The sample introduction groove, the electrophoresis groove, and the through hole are formed on different substrates. In the electrophoresis chip, by combining the substrates, the sample introduction groove and the electrophoresis groove are located in different planes.

Abstract: A sensor element of a gas sensor, which is used for determining the concentration of ammonia and, optionally, at least one further component of a gas mixture, in particular in exhaust gases of combustion engines. The sensor element includes at least one first auxiliary electrode and at least one measuring electrode positioned downstream in the flow direction of the gas mixture, which are in direct contact with the gas mixture, a signal generated by the measuring electrode being used at least intermittently for determining the concentration of ammonia. A potential, at which ammonia contained in the gas mixture is oxidized, is applied at least intermittently to the first auxiliary electrode or the measuring electrode.

Abstract: Low cost methods for fabricating microneedles are disclosed. According to one embodiment, the fabrication method includes the steps of: providing a substrate; forming a metal-containing seed layer on the top surface of the substrate; forming a nonconductive pattern on a portion of the seed layer; plating a first metal on the seed layer and over the edge of the nonconductive pattern to create a micromold with an opening that exposes a portion of the nonconductive pattern; plating a second metal onto the micromold to form a microneedle in the opening; separating the micromold with the microneedle formed therein from the seed layer and the nonconductive pattern; and selectively etching the micromold so as to release the microneedle. In another embodiment, the micromold is not required.

Abstract: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm without breaking a vacuum. The wafers are mounted one-by-one onto a rotating pallet in the pre-cleaning chamber and sputtering chamber. The pallet is firmly fixed to a rotatable table in the sputtering chamber. Copper tubing in the table couples RF energy to the wafers, and a liquid running through the copper tubing controls the temperature of the wafers. Multiple targets, of the same or different materials, may concurrently deposit material on the wafers as the pallet is rotating. Multiple magnets (one for each target) in the magnetron assembly in the sputtering chamber oscillate over their respective targets for uniform target erosion and uniform deposition on the wafers.

Abstract: A sensor element for the determination of the concentration of gas components in a gas mixture, particularly of the concentration of gas components in the exhaust of internal combustion engines, with two electrodes, that together with a solid electrolyte constitute a pumping cell, whose outer pumping electrode is exposed to the gas mixture by way of a porous protective layer, and with a reference electrode, which is disposed on the solid electrolyte and is exposed to a reference gas, and which with a solid electrolyte and a Nernst electrode constitutes a concentration or Nernst cell, is thereby characterized in that at least periodically the Nernst voltage between the outer pumping electrode and the Nernst electrode is tapped and analyzed.

Abstract: Methods of analyzing the electrophoretic mobility distribution of von Willebrand factor (vWF) multimers include providing a sample medium comprising a plurality vWF multimers. The vWF multimers are electrophoretically separated by electrohoretic mobility in the sample medium by subjecting said sample medium to an electric field to provide separated vWF multimers. The separated vWF multimers in the sample medium are exposed to a light source to produce scattered light. The scattered light is detected, and the electrophoretic mobility distribution of the separated vWF multimers is determined from the detected scattered light.

Abstract: The invention concerns an organic photovoltaic component with a novel encapsulation, wherein the invention for the first time discloses packaging for organic solar cells that includes a low-cost film composite comprising a metal portion. The packaging meets high requirements, particularly with respect to high barrier properties against oxygen and water vapor encapsulation without or with only minimal adhesive joints, since the encapsulation can be welded/soldered to the substrate or the bottom electrode, integrated lead-through of electrical connections, including adhesive-bonded, soldered and/or welded connections.

Abstract: The present invention relates to electrolytic recovery of metal, and in particular methods and apparatus for producing cathode plates suitable for such electrolytic recovery. The invention provides a method of providing an electrically conductive coating on a cathode plate comprising inverting and submerging an upper portion of the cathode plate in an electrolytic bath adjacent at least one anode and applying a current to electroplate the upper portion of the cathode plate wherein each anode includes: i) a first base portion adapted to be positioned adjacent to a hanger bar of said cathode plate; ii) a second extended portion connected to and extending from the base portion and adapted to be positioned adjacent a blade of the cathode plate wherein the profile of each anode is shaped such that in use, a consistent thickness of coating is electroplated over said hanger bar and cathode blade.

Abstract: A method for arranging particles according to one aspect of the present invention comprises the steps of: forming a thin film on a surface of a substrate, the thin film being obtained by dispersing first particles made of metal in a material, a surface of the material is to be charged to a first polarity in a predetermined solution; dispersing second particles in the solution, the second particles being charged to a second polarity opposite to the first polarity; immersing the thin film in the solution; and irradiating the thin film with light having a wavelength which causes plasmon resonance with surface plasmons of the metal particles.

Abstract: A cell electrophysiological sensor is provided with: a well having a wall formed by at least one curved face, with opening sections being formed on the two ends thereof; a frame substrate having a through hole and an electrode; a cell electrophysiological sensor chip that is provided with a thin plate having a second through hole; and a void substrate, and in this structure, the frame substrate has a thickness greater than the thickness of the cell electrophysiological sensor chip and the opening diameter of the third opening section is made larger than the opening diameter of the fourth opening section.

Abstract: A gas concentration measuring apparatus for use in air-fuel ratio control of motor vehicle engines is provided which is designed to select or determine a correction factor for an output of an A/F sensor, as produced through a sensor control circuit, for compensating for errors in circuit characteristics of the A/F sensor and/or the sensor control circuit to ensure the accuracy of measurement in the apparatus.

Abstract: An immersion thermocouple is described. The immersion thermocouple includes a heat resistant sheathing, the interior of which is substantially filled with a heat resistant cement, a first U-shaped tube enclosing a thermocouple fixed in the heat resistant cement, and a second U-shaped tube fixed in the heat resistant cement. The second U-shaped tube bridges the first U-shaped tube at an angle of approximately ninety degrees. The immersion thermocouple also includes a shield circumferentially surrounding the first and the second U-shaped tubes proximate to where the first and the second U-shaped tubes are fixed to the heat resistant cement.

Abstract: A composition includes a chemical reaction product defining a first surface and a second surface, characterized in that the chemical reaction product includes a segregated phase domain structure including a plurality of domain structures, wherein at least one of the plurality of domain structures includes at least one domain that extends from a first surface of the chemical reaction product to a second surface of the chemical reaction product.

Abstract: A dual magnetron for plasma sputtering including a source magnetron and an auxiliary magnetron, each of which rotate about the center of the target at respective radii. The positions of the magnetron can be moved in complementary radial directions between sputter deposition and target cleaning. The magnetrons have different characteristics of size, strength, and imbalance. The source magnetron is smaller, stronger, and unbalanced source magnetron and is positioned near the edge of the wafer in sputter deposition and etching. The auxiliary magnetron is larger, weak, and more balanced and used for cleaning the center of the target and guiding sputter ions from the source magnetron in sputter deposition. Each magnetron may have its plasma shorted out in its radially outer position.

Abstract: An electrochemical sensor with at least one ionic liquid (4) as the electrolyte, contains at least one electrode (1), whose active surface is substantially larger than the geometric area covered by said electrode (1). The electrolyte and at least one of the electrodes (1, 2, 3) are in direct contact with the ambient atmosphere.