Patents Examined by Nicole Ippolito Rausch
  • Patent number: 7777202
    Abstract: An electron beam exposure apparatus includes: an electron gun for generating an electron beam; a deflector for deflecting the electron beam; a wafer stage; a stage position detector for detecting a position of the wafer stage; and a stage position computing unit for calculating a movement velocity of the wafer stage. On a basis of the movement velocity, the stage position computing unit calculates an amount of positional change of the wafer stage with respect to an interpolation time, and subsequently calculates an amount of positional movement of the wafer stage by sequentially adding the amount of positional change to the position of the wafer stage in synchronism with the interpolation time. Thus, the stage position computing unit calculates an amount of deflection of the electron beam corresponding to the amount of the positional movement of the wafer stage.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: August 17, 2010
    Assignee: Advantest Corp.
    Inventors: Takamasa Satoh, Yoshihisa Ooae
  • Patent number: 7777203
    Abstract: A substrate holding apparatus for use in ion implanters includes two or more substrate holders that can adopt interchangeable positions, thereby allowing one substrate holder to scan a substrate through an ion beam while substrates can be swapped on the other substrate holder. The substrate holder assembly includes a base rotatable about a first axis and at least two support arms extending from the base to ends provided with substrate holders. Rotating the base allows the substrate holders to move between designated positions. One designated position may correspond to a position for implanting a substrate and another designated position may correspond to a loading/unloading station.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: August 17, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Keith Relleen, Tristan Holtam
  • Patent number: 7772550
    Abstract: The present invention discloses an mixed signal RF drive electronics board that offers small, low power, reliable, and customizable method for driving and generating mass spectra from a mass spectrometer, and for control of other functions such as electron ionizer, ion focusing, single-ion detection, multi-channel data accumulation and, if desired, front-end interfaces such as pumps, valves, heaters, and columns.
    Type: Grant
    Filed: May 3, 2007
    Date of Patent: August 10, 2010
    Assignee: California Institute of Technology
    Inventors: Rembrandt Thomas Schaefer, Mohammad Mojarradi, Ara Chutjian, Murray R. Darrach, John MacAskill, Tuan Tran, Gary R. Burke, Stojan M. Madzunkov, Brent R. Blaes, John L. Thomas, Ryan A. Stern, David Q. Zhu
  • Patent number: 7767984
    Abstract: A method, tool, and machine for hardening a photoresist image while the photoresist image is immersed in a liquid.
    Type: Grant
    Filed: May 1, 2008
    Date of Patent: August 3, 2010
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Burn-Jeng Lin, Ching-Yu Chang
  • Patent number: 7763850
    Abstract: The invention relates to a method of determining the consumption of oil from an oil separation system (2) in the blow by gas recycling circuit of an internal combustion engine.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: July 27, 2010
    Assignees: Total Raffinage Marketing, Delta Services Industriels S.P.R.L.
    Inventor: François Martin
  • Patent number: 7765607
    Abstract: Probes and methods of making probes are provided, particularly probes or nano-tools having tip active areas of extremely small dimensions, e.g., on the order of one angstrom to a few nanometers. One method of making a nano-tool includes forming a composite including a tool layer less than 10 nm thick on a substrate layer, subtracting a region of the substrate layer at least partially through the thickness of the substrate layer, thereby exposing a well surface, and folding the composite so that portions of the tool layer surface diverge and portions of the well surface converge, wherein an outer crease of the folded tool layer is a nanotool active area.
    Type: Grant
    Filed: June 15, 2006
    Date of Patent: July 27, 2010
    Inventor: Sadeg M. Faris
  • Patent number: 7763846
    Abstract: The present invention provides a method and an apparatus for analyzing mass analysis data for easily deducing the structure of an unknown substance, based on data obtained by an MSn analysis. First, the structural formula of a precursor ion of the unknown substance is deduced based on the mass-to-charge ratio of the precursor ion (Step S12), and candidate structures which have the same compositional formula as the compositional formula deduced in Step S12, by combining the structure of the known substance and known structural change patterns (Step S14). Next, fragment ion peaks expected to appear from the candidate structures are deduced (Step S15), and based on the expected fragment ion peaks, the candidate structures are ranked in the order of probability (Step S16). Then, by comparing a mass spectrum of the known substance and that of the unknown substance, a common fragment ion peak is searched. (Step S19).
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: July 27, 2010
    Assignee: Shimadzu Corporation
    Inventors: Shinichi Yamaguchi, Yusuke Inohana
  • Patent number: 7763869
    Abstract: A UV light irradiating apparatus for irradiating a semiconductor substrate with UV light includes: a reactor in which a substrate-supporting table is provided; a UV light irradiation unit connected to the reactor for irradiating a semiconductor substrate placed on the substrate-supporting table with UV light through a light transmission window; and a liquid layer forming channel disposed between the light transmission window and at least one UV lamp for forming a liquid layer through which the UV light is transmitted. The liquid layer is formed by a liquid flowing through the liquid layer forming channel.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: July 27, 2010
    Assignee: ASM Japan K.K.
    Inventors: Kiyohiro Matsushita, Kenichi Kagami
  • Patent number: 7759641
    Abstract: In a mass spectrometer in which a high ion dissociation efficiency is possible, inserted electrodes are arranged with a form divided into two or more in the axial direction of the ion trap, an electric static harmonic potential is formed from a DC voltage applied to the inserted electrodes, and with an Supplemental AC voltage applied, ions in the ion trap are oscillated between the divided inserted electrodes in the axial direction of the ion trap by resonance excitation, and the ion with a mass/charge ratio within a specific range is mass-selectively dissociated. Thus, a high ion dissociation efficiency is realized by the use of ion trap of the present invention.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: July 20, 2010
    Assignee: Hitachi, Ltd.
    Inventors: Hideki Hasegawa, Yuichiro Hashimoto, Izumi Waki
  • Patent number: 7759661
    Abstract: An electron beam emitter including a vacuum chamber having a width. An electron generator can be positioned within the vacuum chamber for generating electrons. An elongate nozzle can extend from the vacuum chamber along a longitudinal axis and have an exit window at a distal end of the nozzle. The nozzle can have a width that is less than the width of the vacuum chamber. The electron generator can be shaped and dimensioned, and positioned with the vacuum chamber to form and direct a narrow electron beam that enters and travels through the nozzle, and exits out the exit window.
    Type: Grant
    Filed: February 13, 2007
    Date of Patent: July 20, 2010
    Assignee: Advanced Electron Beams, Inc.
    Inventor: Tzvi Avnery
  • Patent number: 7759662
    Abstract: In an electron emission method, a voltage is applied to a field electron emission element that has a boron nitride material containing crystal, formed on an element substrate to show a conical projection of the boron nitride material and shows a stable electron emitting property in an atmosphere when a voltage is applied thereto to emit electrons. An electron emission threshold of the field electron emission element falls due to formation of a surface electric dipolar layer by bringing it into contact with an operating atmosphere containing polar solvent gas when applying a voltage to the field electron emission element so as to emit electrons.
    Type: Grant
    Filed: December 13, 2005
    Date of Patent: July 20, 2010
    Assignee: National Institute For Materials Science
    Inventors: Shojiro Komatsu, Toyohiro Chikyo, Katsuyuki Okada, Yusuke Moriyoshi
  • Patent number: 7759656
    Abstract: An assembly for holding a microscopy sample for storage, observation, manipulation, characterization and/or study of the sample using a microscopy instrument is provided. The assembly includes mating first and second parts having faces between which a microscopy sample, including a TEM grid mounted sample, is secured. A spring is used to provide compression between the faces. A rotatable member such as a threaded screw is operable to draw the parts apart from one another. An annular wall functions to protect microscopy samples held in the assembly from damage.
    Type: Grant
    Filed: February 28, 2007
    Date of Patent: July 20, 2010
    Assignee: South Bay Technology, Inc.
    Inventors: Scott D. Walck, David J. Henriks
  • Patent number: 7759664
    Abstract: An embodiment of the present method may comprise: heating up at least one structural element beyond a change state temperature thereof; changing the configuration of the structural element from an extended configuration to a reduced size configuration; cooling the structural element to below the change state temperature thereof; covering the structural element with a thermal protection device; removing the thermal protection device to expose the structural element to heat radiation; and heating, via the heat radiation, at least a portion of the structural element to thereby cause the structural element to change from the reduced size configuration to the extended configuration. In one embodiment each of the structural elements is formed from a thin elastic memory composite material.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: July 20, 2010
    Assignee: Northrop Grumman Systems Corporation
    Inventors: Geoffrey William Marks, James Trevor Renshall
  • Patent number: 7755071
    Abstract: A cover for a syringe includes an elongated flexible envelope and an absorbent material. The elongated flexible envelope includes a body portion and a needle-receiving portion. The body portion has a first end that defines an opening and an opposite second end. The needle-receiving portion extends from the second end of the body portion and terminates in a distal end. The body portion and the needle-receiving portion define a cavity of sufficient size to allow the syringe to be placed therein. The cavity is in communication with the opening. The envelope is made of a material that is impervious to liquid. The absorbent material is disposed in the distal end of the needle-receiving portion.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: July 13, 2010
    Inventor: Perry Polsinelli
  • Patent number: 7755068
    Abstract: Compact particle selection and collimation devices are disclosed for delivering beams of ions with desired energy spectra. These devices are useful with laser-accelerated ion therapy systems, in which the initial ions have broad energy and angular distributions. Superconducting electromagnet systems produce a desired magnetic field configuration to spread the ions with different energies and emitting angles for particle selection. The simulation of ion transport in the presence of the magnetic field shows that the selected ions are successfully refocused on the beam axis after passing through the magnetic field. Dose distributions are also provided using Monte Carlo simulations of the laser-accelerated ion beams for radiation therapy applications.
    Type: Grant
    Filed: December 21, 2005
    Date of Patent: July 13, 2010
    Assignee: Fox Chase Cancer Center
    Inventors: Chang Ming Ma, Eugene S Fourkal, Jinsheng Li, Wei Luo
  • Patent number: 7755060
    Abstract: There is disclosed a multipole lens that can be machined with improved accuracy. A method of fabricating this lens is also disclosed. The multipole lens has a blank material from which polar elements will be fabricated. The blank material is sandwiched vertically between two layers of film-like insulator. The blank material and the two layers of film-like insulator are sandwiched vertically between an upper ring and a lower ring. These members are provided with injection holes for injecting a curing agent. The injection holes of these members are aligned. The curing agent is injected into the holes and cured. Then, the blank material is machined by electric discharge machining to form the polar elements.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: July 13, 2010
    Assignee: JEOL Ltd.
    Inventor: Eiji Kawai
  • Patent number: 7755069
    Abstract: A high-brightness pulsed electron source, which has the potential for many useful applications in electron microscopy, inverse photo-emission, low energy electron scattering experiments, and electron holography has been described. The source makes use of Cs atoms in an atomic beam. The source is cycled beginning with a laser pulse that excites a single Cs atom on average to a band of high-lying Rydberg nP states. The resulting valence electron Rydberg wave packet evolves in a nearly classical Kepler orbit. When the electron reaches apogee, an electric field pulse is applied that ionizes the atom and accelerates the electron away from its parent ion. The collection of electron wave packets thus generated in a series of cycles can occupy a phase volume near the quantum limit and it can possess very high brightness. Each wave packet can exhibit a considerable degree of coherence.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: July 13, 2010
    Assignee: The Regents of the University of California
    Inventor: Max Zolotorev
  • Patent number: 7750290
    Abstract: The invention relates to an integrated system for microfluidic analysis of a liquid sample comprising a liquid sample preparing means (100) which is provided with a displacement means (101) for introducing the sample and reagents and for transmitting said sample and reagents to a second means (200) for chemically or biochemically treating the liquid sample drops, wherein said treating means comprises also means (201) for displacing sample drops to means (300) for drop analysis. Said invention is particularly suitable for a laser radiation desorption device comprising a system for manipulating the sample and reagents in the form of drops, which is provided with one or several loading posts, one or several transport paths consisting of interdigitated electrodes, one or several chemical or biochemical treatment areas and at least one system for switching to a conductive post on which a laser radiation desorption can be carried out.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: July 6, 2010
    Assignees: Universite des Sciences et Technologies de Lille, Centre National de la Recherche Scientifique (CNRS)
    Inventors: Jean-Christophe Fourrier, François Caron, Pierre Tabourier, Christian Druon, Denis J-P Loyaux, Jean-Pierre Antoine Lepesant, Christian Rolando
  • Patent number: 7750297
    Abstract: Apparatus, methods, systems and devices for fabricating individual CNT collimators. Micron size fiber coated CNT samples are synthesized with chemical vapor deposition method and then the individual CNT collimators are fabricated with focused ion beam technique. Unfocused electron beams are successfully propagated through the CNT collimators. The CNT nano-collimators are used for applications including single ion implantation and in high-energy physics, and allow rapid, reliable testing of the transmission of CNT arrays for transport of molecules.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: July 6, 2010
    Assignees: University of Central Florida Research Foundation, Inc., The Regents of the University of California
    Inventors: Lee Chow, Guangyu Chai, Thomas Schenkel
  • Patent number: 7750319
    Abstract: A method and system for measuring contamination of a lithographic element is disclosed. In one aspect, the method comprises providing a first lithographical element in a process chamber. The method further comprises providing a second lithographical element in the process chamber. The method further comprises covering part of the first lithographical element providing a reference region. The method further comprises providing a contaminant in the process chamber. The method further comprises redirecting an exposure beam via the test region of the first lithographical element towards the second lithographical element whereby at least one of the lithographical elements gets contaminated by the contaminant. The method further comprises measuring the level of contamination of the at least one contaminated lithographical element in the process chamber.
    Type: Grant
    Filed: August 28, 2007
    Date of Patent: July 6, 2010
    Assignee: IMEC
    Inventors: Gian Francesco Lorusso, Rik Jonckheere, Anne-Marie Goethals, Jan Hermans