Abstract: The present disclosure relates to a method for fabricating a scanning probe microscope (SPM) nanoneedle probe using an ion beam, a SPM nanoneedle probe, a method of fabricating a critical dimension scanning probe microscope (CD-SPM) nanoneedle probe using an ion beam, a CD-SPM nanoneedle probe, and uses thereof. A disclosed method can comprise: positioning the probe so that a tip of the probe on which the nanoneedle is attached faces toward a direction in which the ion beam is irradiated; and aligning the nanoneedle attached on the tip of the probe with the ion beam in parallel by irradiating the ion beam toward the tip of the probe on which the nanoneedle is attached.

Abstract: Briefly described, embodiments of this disclosure include methods of calibrating a mass spectrometry system, and the like.

Abstract: Apparatuses, systems and methods for generating, dispersing and delivering chemical compounds utilizing desorption electrospray ionization. Embodiments include an airflow channel into which an airflow is directed, a solvent reservoir containing a volume of solvent, at least one charged droplet source for producing a plurality of charged liquid droplets in the channel, and at least one grounded counter electrode positioned within the channel with the electrodes having at least one surface containing one or more chemical compounds that include releasable ions. In operation, the charged droplets are directed onto the surface or surfaces so that the impact of the charged particles on said surface produces gaseous ions of at least one chemical compound on said surface, after which the gaseous ions are dispersed into the airflow.

Abstract: A charged beam drawing apparatus deflects, by an electrostatic deflector, a charged beam generated from a charged beam source, and applies the charged beam to a desired position on a sample to draw a pattern. The electrostatic deflector includes a plurality of deflecting electrodes arranged symmetrically with respect to a point around an optical axis of the charged beam, a ground external cylinder which is disposed coaxially with the optical axis and which is provided to enclose the deflecting electrodes, a resistive film provided on an inner surface of the ground external cylinder, and a conductive film provided on a surface of the resistive film. A capacitance is formed between the deflecting electrodes and the conductive film, and a resistance is formed between the ground conductor and the conductive film.

Abstract: A beam deflection scanner performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes, while a correction voltage is constantly applied to the pair of correction electrodes. A correction electric field produced by the pair of correction electrodes is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes at the time of switching between the positive and negative potentials.

Abstract: An interface for mass spectrometers. The interface uses non coaxial sampling pathways of the analyte ion beam prior to entering the entrance of a mass spectrometer for decreasing chemical background, and can be done in such a way as to permit multiple sprayers, increasing sample throughput and sensitivity for LC/MS (liquid chromatography/MS). The interface includes an ion source having an exit from which a beam of analyte ions are emitted, a curtain plate and an aperture in the curtain plate member, an orifice plate having an orifice therein. The orifice plate is being spaced from the curtain plate member defining a flow passageway therebetween, and the aperture in the orifice plate is aligned with a sample entrance to a first vacuum stage of a mass spectrometer maintained substantially lower than atmospheric pressure.

Abstract: A treatment system or treatment reactor (1) comprising at least one dielectric barrier discharge lamp (2) with a first electrode (20) and a housing (10) for containing a medium (3) like a fluid and/or a gas and/or a solid material which is to be treated by means of the radiation generated by the lamp (2) is disclosed which is especially characterized in that at least one second electrode of at least one lamp (2) is provided in the form of at least one intermediate counter electrode (3, 4) which is positioned within a volume (31) between at least one dielectric barrier discharge lamp (2) and the housing (10). By this, influences of the treated medium on the electrical behavior of the treatment system or reactor (1) and especially power losses in the medium can be avoided or considerably be decreased. Furthermore, losses of the lamp light due to absorption and/or shadowing at an outer electrode surrounding the lamp are avoided as well.

Abstract: An electron beam writing data creating method for creating writing data used for electron beam lithography includes judging whether a resizing process needs to be performed to a figure cell in device pattern data by cell based design or not, the figure cell including a cell layout frame and a pattern in the cell layout frame; performing the resizing process to the figure cell based on a relationship between the cell layout frame and the pattern, and resizing quantity of the resize process in a case where the resizing process is judged as needed to be performed; creating a character pattern cutting frame from the cell layout frame; and extracting a figure in the character pattern cutting frame as a character pattern.

Abstract: A method for optimizing alignment performance in a fleet of exposure systems involves characterizing each exposure system in a fleet of exposure systems to generate a set of distinctive distortion profiles associated with each exposure system. The set of distinctive distortion profiles are stored in a database. A wafer having reference pattern formed thereon is provided for further pattern fabrication and an exposure system is selected from the fleet to fabricate a next layer on the wafer. Linear and higher order parameters of the selected exposure system are adjusted using the distinctive distortion profiles to model the distortion of the reference pattern. Once the exposure system is adjusted, it is used to form a lithographic pattern on the wafer.

Abstract: A method of obtaining a deflection aberration correcting voltage. The method includes writing predetermined patterns at a plurality of focus height positions such that a dose is used as a variable. Dimensional variations of width sizes of the predetermined patterns written at the plurality of focus height positions such that the dose is used as the variable are measured. Further, effective resolutions of the written predetermined patterns are calculated by using the dimensional variations. The method further includes, on the basis of a focus height position at which a minimum effective resolution of the predetermined patterns is obtained, calculating a correcting voltage to correct deflection aberration and outputting the correcting voltage. The correcting voltage is used when a charged particle beam is deflected.

Abstract: A coating is applied to a work piece in a charged particle beam system without directing the beam to work piece. The coating is applied by sputtering, either within the charged particle beam vacuum chamber or outside the charged particle beam vacuum chamber. In one embodiment, the sputtering is performed by directing the charged particle beam to a sputter material source, such as a needle from a gas injection system. Material is sputtered from the sputter material source onto the work piece to form, for example, a protective or conductive coating, without requiring the beam to be directed to the work piece, thereby reducing or eliminating damage to the work piece.

Abstract: The invention comprises apparatus and methods for rapidly and accurately determining mass-to-charge ratios of molecular ions produced by a pulsed ionization source, and for fragmenting all of the molecular ions produced and rapidly and accurately determining the intensities and mass-to-charge ratios of the fragments produced from each molecular ion.

Abstract: A personalized mass spectrometer system is described. By fabricating analyzer components on a module and including with that module an identifier for that module, it is possible to uniquely associate a user or task with one or more modules. The module is removably receivable within a housing and can be replaced with another module if so required.

Abstract: A recording device including a beam deflection section for relatively moving an irradiation position of an exposure beam with respect to a substrate on which a resist layer is formed; a substrate velocity adjustment section for adjusting a moving velocity of the substrate based on a deflection amount of the exposure beam; and a deflection control section for controlling to change a deflection velocity of the exposure beam during exposure of the recording signals according to the moving velocity of the substrate.

Abstract: A gas monitoring apparatus capable of real-time detection of a kind of chemical warfare agent, namely diphenylcyanoarsine (DC) and/or diphenylchloroarsine (DA). Atmospheric pressure chemical ionization mass spectrometry is carried out in the positive ionization mode, the total amount of DC and DA is determined from the intensity of an ion common to DC and DA, the DC concentration is determined from the intensity of an ion specific to DC, and the difference between them is regarded as the DA concentration.

Abstract: It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.

Abstract: An apparatus and method of attenuating radiation includes oscillating at least one fluid having a radiation attenuating property between at least two chambers, incident to applied radiation. The radiation attenuating device includes at least two communicating adjacent chambers, at least one fluid having radiation attenuating properties moveable between the at least two chambers, and a control circuit configured to oscillate the at least one fluid between the chambers.

Abstract: Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.

Abstract: Analysis of biological small molecules such as toxins, spores or cells is achieved by miniature mass spectrometer apparatus and apparatus attached thereto for vaporizing and ionizing a liquid sample fed into an evacuated vaporization chamber as an electrospray. The mass spectrometer apparatus includes: a collimation chamber, a repeller assembly, an internal ionization chamber, a mass filter and ion separation chamber, a drift space region, and a multi-channel ion detection array so as to permit the collection and analysis of ions formed over a wide mass range simultaneously. The vaporization chamber includes an output port adjacent the input to the collimation chamber so as to maximize the amount of vaporized material being fed into the mass spectrometer apparatus.

Abstract: Systems and methods that provide multi-attribute light effects, including one or more channels for each light effect, preferably both channels being provided in an array of solid state light emitters.