Abstract: Devices, systems, and methods for ion trapping with integrated electromagnets are described herein. One device includes a plurality of electrodes configured to trap an ion above a surface of the device, a medial coil and a plurality of peripheral coils, each positioned at a respective radial angle associated with the medial coil, wherein the medial coil is configured to generate a first magnetic field having a first orientation, and wherein the peripheral coils are configured to generate a second magnetic field having a second orientation that opposes the first orientation.

Abstract: A method for analyzing ions according to their mass-to-charge ratio and mass spectrometer for performing the method, comprising directing a collimated ion beam along an ion path from an ion source to an ion detector, causing a portion of the ion beam to contact one or more surfaces prior to reaching the ion detector, wherein the method comprises providing a coating on and/or heating the one or more surfaces to reduce variation in their surface patch potentials. The method is applicable to multi-reflection time-of-flight (MR TOF) mass spectrometry.

Abstract: A functional water concentration sensor includes: a container used to contain functional water; a light source that emits ultraviolet light; a phosphor that emits fluorescence when excited by ultraviolet light emitted from the light source and transmitted through the container; and a light-receiving element that receives the fluorescence, wherein a peak wavelength of the ultraviolet light emitted from the light source is in a predetermined range that includes an absorption peak specific to the functional water.

Abstract: The disclosure relates to systems and method for processing images. The method includes selecting a predetermined reference structure, the predetermined reference structure having a known feature size/shape. The method also includes obtaining a reference image of the predetermined reference structure, and capturing a calibration image of the predetermined reference structure using an observation device. The calibration image includes a plurality of features. Additionally, the method includes identifying at least one portion of the plurality of features of the calibration image that include a feature size/shape substantially similar to the known feature size and shape of the predetermined reference structure. Finally, the method includes combining the identified portion of the plurality of features of the calibration image to form a stacked feature image, and determining a point spread function (PSF) of the observation device by comparing the obtained reference image with the stacked feature image.

Abstract: A sample vessel retention mechanism for an inverted microscope having an optical objective and a scanning probe microscope (SPM) head. The inverted microscope includes a platform for supporting a sample vessel, in which is formed an aperture sized to provide a passage for the objective of the inverted microscope to approach the sample vessel from below. The retention mechanism provides a vacuum region formed in the platform, with the vacuum region being barometrically coupled with a vacuum generator. Establishment of a vacuum in the vacuum region prevents or substantially reduces oscillation of the sample vessel floor in an operating frequency range of the SPM head.

Abstract: The invention relates to a protection system (10) and a method for protecting a staff member (6) against X-ray scatter radiation, an X-ray system and a computer readable medium having stored a computer program element for controlling such system. The protection system (10) comprises a location unit (20), and a determination unit (30). The location unit (20) is configured to detect the position of a shielding device (3) and the position of the staff member (6) to be protected. The determination unit (30) is configured to determine an origin (5) of potential X-ray scatter radiation and to determine if the shielding device (3) is positioned to protect the staff member (6) to be protected based on the origin (5) of potential X-ray scatter radiation, the position of the shielding device (3) and the position of the staff member (6).

Abstract: A data display processing device for a scanning probe microscope includes: a group information storage unit for managing and storing a plurality of measurement data sets; specified data acquisition means for acquiring, from the storage unit, a specified measurement data set; display controlling means for displaying the specified data set as an image; preliminary image generation means for, triggered by determination of the specified data set, acquiring other measurement data set or sets belonging to a group including the specified data set from the group information storage unit, and generating a preliminary image which is an image or images which will be used when displaying the other measurement data set or sets; and first display switching means for switching to display the preliminary image within a predetermined region in response to a first predetermined input operation by the user performed while the specified data set is displayed.

Abstract: An edge detection system is provided that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection. The edge detection system includes an inverse linescan model tool that receives measured linescan information for the feature from the SEM. In response, the inverse linescan model tool provides feature geometry information that includes the position of the detected edges of the feature.

Abstract: A control system for controlling a magnet of a magnetic sector mass spectrometer comprises a magnetic field sensor for sensing the magnetic field of the magnet and generating an output representative thereof; a set point generator configured to generate an output representative of, or related to, a desired magnetic field of the magnet; and a digital controller configured to receive a variable digital input signal from the output of the magnetic field sensor and a set point digital input signal from the output of the set point generator, and to generate a digital output from which is derived a control signal for controlling a current to the magnet so as to control the magnetic field thereof. The control system is arranged to apply to the digital controller a selected one of a plurality of different controller settings, in accordance with the desired magnetic field of the magnet.

Abstract: An extreme ultraviolet light generation apparatus may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target supplied into the chamber with a laser beam; a target generator that supplies the target into the chamber as a droplet; a droplet measurement unit that measures the droplet supplied from the target generator into the chamber; and a shielding member that shields the droplet measurement unit from electromagnetic waves emitted from the plasma, the droplet measurement unit including: a light source that emits continuous light to the droplet; a window provided in the chamber to allow the continuous light to transmit therethrough; and an optical sensor that receives the continuous light via the window. The shielding member includes a shielding body provided on the chamber side with respect to the window and configured to cover an optical path of the continuous light.

Abstract: An electron beam shaping unit for use in electron beam column and a method for designing thereof is presented. The electron beam shaping unit is configured for affecting electron beams of high density or strong electron-electron repulsion. These 5 beams can always be modeled with multi electron wave function. The electron beam shaping unit comprises a mask unit configured for affecting propagation of electrons therethrough to thereby form a propagating electron beam having, at far field, radial shape as determined by multi-electron non-linear function being an eigen function determined by a multi-electron Hartree-Fock Hamiltonian.

Abstract: An apparatus for on-line monitoring particle contamination in special gas includes a single particle inductively coupled plasma mass spectrometry (sp-ICPMS) and a gas exchange device (GED). The gas exchange device is coupled to the sp-ICPMS. The gas exchange device includes a corrosion resistant outer tube and a polytetrafluoroethylene (PTFE) inner tube. A gap is formed between the corrosion resistant outer tube and the PTFE inner tube. The length of the PTFE inner tube is 1 meter or more. The argon gas flows in the gap, and the special gas flow in the PTFE inner tube.

Abstract: In a scheme for analyzing low magnification defect images and determining whether or not a defect detection method using cell comparison is applicable, if a defect detection method using cell comparison cannot be applied and the proportion transitioning to a defect detection method using die comparison increases, throughput may decrease even more than starting out with defect detection by a defect detection method using die comparison. The purpose of present invention is to carry out high precision defect detection with a stable throughput. In the present invention, the defect detection processing mode applied for detecting defects from the defect image is determined using a reference image, and defects are detected from the defect image by the defect detection processing mode that has been determined.

Abstract: Surface modification of a cryogenic specimen can be obtained using a charged particle microscope. A specimen is situated in a vacuum chamber on a specimen holder and maintained at a cryogenic temperature. The vacuum chamber is evacuated and a charged-particle beam is directed to a portion of the specimen so as to modify a surface thereof. A thin film monitor is situated in the vacuum chamber and has at least a detection surface maintained at a cryogenic temperature. A precipitation rate of frozen condensate in the vacuum chamber is measured using the thin film monitor, and based on the measured precipitation rate, the surface modification is initiated when the precipitation rate is less than a first pre-defined threshold, or interrupted if the precipitation rate rises above a second pre-defined threshold.

Abstract: The invention provides methods of detecting an analyte by multi-stage mass spectrometry with improved S/N ratio. An analyte is labeled with a positively-charged mass tag to form a precursor ion that leads by anchimeric assistance to a greatly enhanced, analyte-characteristic first product ion that can, in turn, lead to a greatly enhanced, analyte-characteristic second product ion in a mass spectrometer. Either a three stage mass spectrometer (true MS3) or a two-stage mass spectrometer (MS2) operated in a pseudo MS3 mode can be used. The precursor ion is split via an anchimeric-assisted reaction to form a first product ion, which in turn can be fragmented to form the second product ion. The methods offer extreme ultrasensitivity, at the low amol level. The invention also provides anchimeric mass tags for use in the methods. A wide variety of previously undetectable analytes of biological or environmental origin can be detected and quantified.

Abstract: The invention proposes a mass spectrometry apparatus for ultraviolet light ionization of neutral lost molecules, and a method for operating same. The mass spectrometry apparatus for ultraviolet light ionization of neutral lost molecules includes a quadrupole tandem special linear ion trap mass analyzer, a vacuum ultraviolet lamp, a lamp front shutter, a gradient vacuum system and other necessary components for the mass spectrometry apparatus. In addition, the invention also proposes a method for operating the apparatus to efficiently store ions, fragment and analyze the ions, perform ultraviolet efficient ionization on lost neutral molecules, and then analyze the ions.

Abstract: Some embodiments of the present invention provide a 2D position-sensitive detector assembly comprising at least three substantially planar detector portions arranged in overlapping relationship as viewed normal to a plane of the detector portions, each detector portion comprising an array of substantially parallel, linear detector elements, the detector elements of respective detector portions being mutually non-parallel, the detector elements each being configured to generate one or more electrical signals in response to interaction of a particle of radiation therewith.

Abstract: Provided herein are non-invasive methods of nanoscale imaging of a sample using an illumination layer and an electron beam. For example, the electron may activate the illumination layer without activating the sample, and the illumination layer may emit cathodoluminescence to produce a nanoscale image of the sample.

Abstract: An ion implanter comprises a dissociation chamber in the ion implanter. The dissociation chamber has an input port for receiving a gas and an output port for outputting ions. A vacuum chamber surrounds the dissociation chamber. A plurality of rods or plates of magnetic material are located adjacent to the dissociation chamber on at least two sides of the dissociation chamber. A magnet is magnetically coupled to the plurality of rods or plates of magnetic material. A microwave source is provided for supplying microwaves to the dissociation chamber, so as to cause electron cyclotron resonance in the dissociation chamber to ionize the gas.

Abstract: Sterilization units and systems and related assemblies, devices, and methods are disclosed. The sterilization units may be mobile and used in a variety of locations. The sterilization units and systems use germicidal ultraviolet-C light to kill or render non-viable bacteria and viruses. The various sterilization units and systems disclosed herein may have improved ultraviolet light distribution and/or improved ability to direct and focus the ultraviolet light in a desired area. The sterilization units and systems may optionally be made of non-magnetic materials such that the sterilization units and systems may be used in the vicinity of MRI equipment without causing complications or damage to the MRI equipment.