Patents Examined by Nicole M Ippolito
  • Patent number: 10674590
    Abstract: A tank may include: a tank main body having a space and an opening; a lid body covering the opening and a peripheral portion of the opening; a bolt for fixing the tank main body and the lid body in the peripheral portion; a first support portion arranged to surround the opening in a region on a side of the opening with respect to the bolt to support the lid body; a second support portion arranged to surround the opening in a region on the opening side with respect to the first support portion and having a height lower than a height of the first support portion; and a sealing member arranged to surround the opening in the region on the opening side with respect to the first support portion.
    Type: Grant
    Filed: September 10, 2018
    Date of Patent: June 2, 2020
    Assignee: Gigaphoton Inc.
    Inventors: Toshiyuki Hirashita, Toshihiro Nishisaka
  • Patent number: 10674591
    Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: June 2, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jason Riggs, Robert Jay Rafac
  • Patent number: 10670561
    Abstract: Disclosed herein are embodiments of a system for selectively ionizing samples that may comprise a plurality of different analytes that are not normally detectable using the same ionization technique. The disclosed system comprises a unique split flow tube that can be coupled with a plurality of ionization sources to facilitate using different ionization techniques for the same sample. Also disclosed herein are embodiments of a method for determining the presence of analytes in a sample, wherein the number and type of detectable analytes that can be identified is increased and sensitivity and selectivity are not sacrificed.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: June 2, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Robert Ewing, Blandina Valenzuela, Eric Freeburg
  • Patent number: 10672634
    Abstract: The present disclosure describes a method and apparatus for determining whether components in a semiconductor manufacturing system are authorized for use in that system. By embedding an identification feature in the component, it is possible for a controller to determine whether that component is qualified for use in the system. Upon detection of an unauthorized component, the system may alert the user or, in certain embodiments, stop operating of the system. This identification feature is embedded in a component by using an additive manufacturing process that allows the identification feature to be embedded in the component without subjecting the identification feature to extreme temperatures.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: June 2, 2020
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Adam M. McLaughlin
  • Patent number: 10672586
    Abstract: A beamline device includes a deflection device deflecting an ion beam in a first direction perpendicular to a beam traveling direction by applying at least one of an electric field and a magnetic field to the ion beam. A slit is disposed such that the first direction coincides with a slit width direction. A beam current measurement device is configured to be capable of measuring a beam current at a plurality of measurement positions to be different positions in the first direction. A control device calculates angle information in the first direction on the ion beam by acquiring a plurality of beam current values measured at the plurality of measurement positions to be the different positions in the first direction by the beam current measurement device while changing a deflection amount of the ion beam in the first direction with the deflection device.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: June 2, 2020
    Assignee: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
    Inventors: Sho Kawatsu, Noriyasu Ido
  • Patent number: 10670393
    Abstract: The methods and systems disclosed here leverage currently available reliable top down imaging techniques used by SEMs and use computational methods to synthesize accurate 3D profiles of features of high aspect ratio structures in a device. Radial cross-sectional profiles obtained from different locations along the lateral direction at different heights/depths are stitched together to create one composite 3D profile of the HAR feature.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: June 2, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Pradeep Subrahmanyan
  • Patent number: 10670625
    Abstract: Disclosed here is a scanning probe microscope system and method for operating the same for producing scanning probe microscope images at fast scan rates and reducing oscillation artifacts. In some embodiments, an inverse consistent image registration method is used to align forward and backward scan traces for each line of the scanning microscope image. In some embodiments, the aligned forward and backward scan traces are combined using a weighting factor favoring the scan trace with higher smoothness. In some embodiments, the scanning probe microscope image is a potentiometry map and a method is provided to extract from the potentiometry map a conductivity map.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: June 2, 2020
    Assignee: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INCORPORATED
    Inventors: Xiaoguang Zhang, Xianqi Li, An-Ping Li, Hao Zhang, Yunmei Chen
  • Patent number: 10672600
    Abstract: Provided are methods for determining the amount of reverse T3 in a sample using mass spectrometry. The methods generally involve ionizing reverse T3 in a sample and detecting and quantifying the amount of the ion to determine the amount of reverse T3 in the sample.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: June 2, 2020
    Assignee: Quest Diagnostics Investments Incorporated
    Inventors: J. Fred Banks, Peter P. Chou, Noriya M. Matt
  • Patent number: 10672583
    Abstract: Electron gun. The electron gun includes a circular cathode. The circular cathode comprises a spherical surface. The electron gun further includes a focus electrode. The focus electrode has four quadrants. The focus electrode is disposed about the circular cathode. The focus electrode includes four primary focus angle points. At least two of the four, adjacent, primary focus angle points have different angle values. Each of the four primary focus angle points is in a different quadrant. Focus angles on the focus electrode between any two primary focus angle points vary from one primary focus angle point to another primary focus angle point.
    Type: Grant
    Filed: April 5, 2019
    Date of Patent: June 2, 2020
    Assignee: L3 Electron Devices, Ind.
    Inventors: David R. Whaley, Andrew P. Zubyk
  • Patent number: 10670970
    Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: June 2, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Shin Cheng, Hsin-Feng Chen, Cheng-Hao Lai, Shao-Hua Wang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10661246
    Abstract: A light irradiation device includes a protective tube, which has a wire insertion path therein, a light source unit facing and disposed along an upper part of the protective tube, and a gutter-shaped concave reflection mirror facing the light source unit and provided below the protective tube. The concave reflection mirror is received in a gutter-shaped concave accommodating part provided in a holding body, and has flange portions extending from the outer surface in the horizontal direction. The convex reflection mirror is detachably affixed to the holding body with the flange portions.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: May 26, 2020
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventor: Yasushi Omae
  • Patent number: 10667377
    Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: May 26, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Jay Rafac, Richard L. Sandstrom, Daniel John William Brown, Kai-Chung Hou
  • Patent number: 10664955
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method includes generating, using an imaging device, a set of one or more images, each including an instance of a feature within a respective pattern structure. The method also includes detecting edges of the features within the pattern structure of each image using an inverse linescan model, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure provided as part of a training data set to a machine learning model.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: May 26, 2020
    Assignee: FRACTILIA, LLC
    Inventor: Chris Mack
  • Patent number: 10662078
    Abstract: A UV sterilization tube includes a hollow tube, a hydroelectric power module and a UV sterilization module. The hollow tube includes an inlet end and an outlet end communicating with each other. The hydroelectric power module is positioned in the hollow tube, and communicates with the inlet end and the outlet end of the hollow tube, wherein the hydroelectric power module generates electric power by a water flow. The UV sterilization module is positioned in the hollow tube, and is electrically connected to the hydroelectric power module. The UV sterilization module includes a UV source and a reflector, wherein the UV source has a light-emitting surface facing to the reflector. A sterilization channel, which communicates with the inlet end and the outlet end of the hollow tube, is between the UV source and the reflector.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: May 26, 2020
    Assignee: PURITY (XIAMEN) SANITARY WARE CO., LTD.
    Inventors: James Wu, Alex Wu, Ce-Wen Yang
  • Patent number: 10662079
    Abstract: A water purification device utilizing ultraviolet lights and a nebulizer is provided. The device includes a tube that receives bacteria laden water at an intake end. The tube includes one or more baffles for causing turbulent flow of the water, and one or more ultrasonic nebulizers for converting the water stream into a mist. The device further includes one or more sources of germicidal ultraviolet light which may be located either inside or outside of the tube.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: May 26, 2020
    Inventor: Robert Wachtl
  • Patent number: 10665422
    Abstract: An electron beam image acquisition apparatus includes a deflector to deflect an electron beam, a deflection control system to control the deflector, a measurement circuitry to measure, while moving a stage for placing thereon a substrate on which a figure pattern is formed, an edge position of a mark pattern arranged on the stage by scanning the mark pattern with an electron beam, a delay time calculation circuitry to calculate, using information on the edge position, a deflection control delay time which is a delay time to start deflection control occurring in the deflection control system, a correction circuitry to correct, using the deflection control delay time, a deflection position of the electron beam, and an image acquisition mechanism to include the deflector and acquire an image of the figure pattern at a corrected deflection position on the substrate.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: May 26, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventor: Hidekazu Takekoshi
  • Patent number: 10665416
    Abstract: A substrate processing apparatus includes a chamber, a pedestal provided in the chamber and having a substrate holding region to hold a substrate thereon, and a gas supply part to supply a gas into the chamber. A plurality of electron gun arrays two-dimensionally arranged so as to cover the substrate holding region is provided and configured to emit electrons toward the gas to cause interactions between the emitted electrons and the gas. A plurality of electron energy control parts is correspondingly provided at each of the electron gun arrays and configured to control energy of the electrons emitted from each of the electron gun arrays independently of each other.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: May 26, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Shinji Kubota, Naohiko Okunishi, Yosuke Tamuro, Shota Kaneko
  • Patent number: 10665444
    Abstract: Slide analysis a gripper with three sensors for controlling a slide grip sequence and at least one rotatable carousel with a slide receiving channel. The systems also include a robot with a robot arm that holds a slide gripper residing inside the housing in communication with the rotatable carousel. The systems also include a load lock chamber and a door sealably coupled to the second end portion and an acquisition vacuum chamber with an X-Y stage and a slide holder with a vacuum seal.
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: May 26, 2020
    Assignee: bioMérieux, Inc.
    Inventors: Jared Bullock, Scott Collins, Ian MacGregor, Mark Talmer
  • Patent number: 10665418
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: May 26, 2020
    Assignee: FRACTILIA, LLC
    Inventor: Chris Mack
  • Patent number: 10665420
    Abstract: Provided is a charged particle beam apparatus, aiming at obtaining an image and the like focused on the sample surface and the bottom while preventing the visual field deviation occurred when focusing on the sample surface and the bottom respectively. The charged particle beam apparatus forms a first image (301), which is based on detection of the first energy charged particles, based on an irradiation with a beam whose focus is adjusted on a sample surface side, forms a second image (304) which is based on detection of second energy charged particles having a relatively higher energy than the first energy and a third image (303) which is based on the detection of the first energy charged particles, based on the irradiation with a beam whose focus is adjusted on a bottom side of a pattern included in the sample, acquires a deviation between the first image and the third image, and composes the first image and the second image so as to correct the deviation.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: May 26, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasunori Takasugi, Satoru Yamaguchi, Kei Sakai, Hideki Itai, Yoshinori Momonoi, Toshimasa Kameda, Yoshihiro Kimura