Abstract: A target delivery system for an extreme ultraviolet (EUV) light source is disclosed. The system includes: a conduit including an orifice configured to fluidly couple to a reservoir; an actuator configured to mechanically couple to the conduit such that motion of the actuator is transferred to the conduit; and a control system coupled to the actuator, the control system being configured to: determine an indication of pressure applied to target material in the reservoir, and control the motion of the actuator based on the determined indication of applied pressure. Moreover, techniques for operating a supply system are disclosed. For example, one or more characteristics of the supply system are determined, and an actuator that is mechanically coupled to the supply system is controlled based on the one or more determined characteristics such that an orifice of the supply system remains substantially free of material damage during operational use.

Abstract: There is provided a scanning electron microscope which has a sample chamber capable of being evacuated to a low vacuum. The scanning electron microscope includes an electron gun for emitting an electron beam, an objective lens for focusing the emitted beam onto a sample, and a sample chamber in which the sample is housed. The objective lens includes an inner polepiece, an outer polepiece disposed outside the inner polepiece and facing the sample chamber, at least one through-hole extending through the inner and outer polepieces, and at least one cover member that closes off the through-hole. An opening is formed between the inner polepiece and the outer polepiece. The objective lens causes leakage of magnetic field from the opening toward the sample. The sample chamber has a degree of vacuum lower than that in an inner space that forms an electron beam path inside the inner polepiece.

Abstract: Prior to execution of primary correction, a first centering process, an in-advance correction of a particular aberration, and a second centering process are executed stepwise. In the first centering process and the second centering process, a ronchigram center is identified based on a ronchigram variation image, and is matched with an imaging center. In the in-advance correction and the post correction of the particular aberration, a particular aberration value is estimated based on a ronchigram, and the particular aberration is corrected based on the particular aberration value.

Abstract: A method of examining a sample in an atomic force microscope including at least one probe, each probe including at least one cantilever and at least one tip includes carrying out a negative setpoint setting procedure, wherein the negative setpoint SCD is set as a negative real number, an approaching procedure including: above at least one point of the sample, performing an approach including reducing the tip-to-sample distance and recording cantilever deflection as a function of the tip-to-sample distance, while applying the standard sign convention with cantilever deflection considered negative for attractive forces and positive for repulsive forces, until at least one of critical criteria is achieved, and pausing or stopping of the approach after performing the approaching procedures.

Abstract: A method of examining a sample (1) in a microscope equipped with at least one scanning tunneling tip (4), wherein tunneling current TC can be detected and wherein relative tip-to-sample planar coordinates xrel=xtip?xsample and yrel=ytip?ysample are differences between corresponding tip and sample coordinates, wherein the following steps are performed above at least two surface points of the sample (1): placing the tip (4) successively above said surface points of the sample (1); above each of said surface points of the sample, performing a distance varying step (33) comprising varying the tip-to-sample distance D, and performing a time dependencies recording step (35), comprising recording time dependencies TC(t), xrel(t), yrel(t), D(t). Based on these time dependencies, four maps can be created from a single measurement: constant current map, constant height map, Local Density of States Topography map and potential barrier map.

Abstract: An ultraviolet light array module has a substrate, multiple ultraviolet light chips, and an amorphous silicon concentrator. The substrate has a concave. The ultraviolet light chips are arranged in an array in the concave of the substrate. The amorphous silicon concentrator covers on the concave and includes a light-transmitting base and multiple continuous light-concentrating protrusions. The optical axis of each light-concentrating protrusion aligns with the light-emitting axis of the corresponding ultraviolet light chip to generate ultraviolet light with a specific light-emitting angle. Since the light-concentrating protrusions are integrally formed on the light-transmitting base, the optical axes of the light-concentrating protrusions are close to each other and align with the light-emitting axes of the ultraviolet light chips underneath.

Abstract: A scattering-type scanning near-field optical microscope at cryogenic temperatures (cryo-SNOM) configured with Akiyama probes for studying low energy excitations in quantum materials present in high magnetic fields. The s-SNOM is provided with atomic force microscopy (AFM) control, which predominantly utilizes a laser-based detection scheme for determining the cantilever tapping motion of metal-coated Akiyama probes, where the cantilever tapping motion is detected through a piezoelectric signal. The Akiyama-based cryo-SNOM attains high spatial resolution, good near-field contrast, and is able to perform imaging with a significantly more compact system capable of handling simultaneous demands of vibration isolation, low base temperature, precise nano-positioning, and optical access. Results establish the potential of s-SNOM based on self-sensing piezo-probes, which can easily accommodate near-IR and far-infrared wavelengths and high magnetic fields.

Abstract: A surface analysis method according to an embodiment includes: acquiring a force curve corresponding to measurement of a sample surface by a scanning probe microscope; calculating a physical quantity of an organic material forming the sample surface based on the force curve, for each of an observation point group; and outputting analysis data indicating the physical quantity of each of the observation point group. The acquiring the force curve includes acquiring the force curve at each of a plurality of observation points on a Y-column extending along a X-direction (a direction along which the probe reciprocates with respect to a stage). The calculating the physical quantity includes: generating a force curve matrix indicating the force curve at each of the plurality of observation points; and calculating the physical quantity at each of the plurality of observation points using the force curve matrix.

Abstract: An UV disinfection system (200) may feature a chamber (207) with internal spherical reflective surfaces (208) to evenly reflect UV radiation from all angles to direct the UV radiation to all surface area of the object inside the chamber to disinfect object utilizing UV radiation under controlled time. An object (215) to be disinfected may reside within the chamber (207) on a UV transparent rack or shelf (214). The spherical reflective surfaces may be fashioned by placing such surfaces on a polyhedral internal structure or making the internal chamber spherical in and of itself (208). Multiple UV sources (209a), (209b) may also be utilized.

Abstract: An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

Abstract: It is provided a method for checking quality of a treatment plan, wherein a treatment plan specifies a distribution of radiation to thereby provide radiation to a planning target volume. The method is performed by a quality assurance device and comprises the steps of: obtaining a treatment plan and a corresponding first dose, the treatment plan having been calculated in a treatment planning system, the first dose being a predicted dose to be deposited in the patient using the treatment plan; initiating a calculation of a secondary dose, being a dose deposited by the treatment plan, using a secondary dose calculation algorithm; repeatedly calculating a confidence interval of a comparative statistical measurement by comparing the first dose and the secondary dose over a defined geometric volume; and interrupting the calculation of the secondary dose when the confidence interval is better than at least one predefined criterion.

Abstract: The current disclosure is directed to a repellent electrode used in a source arc chamber of an ion implanter. The repellent electrode includes a shaft and a repellent body having a repellent surface. The repellent surface has a surface shape that substantially fits the shape of the inner chamber space of the source arc chamber where the repellent body is positioned. A gap between the edge of the repellent body and the inner sidewall of the source arc chamber is minimized to a threshold level that is maintained to avoid a short between the conductive repellent body and the conductive inner sidewall of the source arc chamber.

Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include one or more detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.

Abstract: An ion generator includes an arc chamber defining a plasma generation space, and a cathode which emits thermoelectrons toward the plasma generation space. The arc chamber includes a box-shaped main body having an opening, and a slit member mounted to cover the opening and provided with a front slit. An inner surface of the main body is exposed to the plasma generation space made of a refractory metal material. The slit member includes an inner member made of graphite and an outer member made of another refractory metal material. The outer member includes an outer surface exposed to an outside of the arc chamber. The inner member includes an inner surface exposed to the plasma generation space, and an opening portion which forms the front slit extending from the inner surface of the inner member to the outer surface of the outer member.

Abstract: Systems and methods are provided for the analysis of single particles with inductively coupled plasma-time of flight mass spectrometry. An ion compression device is operated in combination with an image current detector to improve a duty cycle of particle analysis. The image current detection device is used to determine a start time and an end time of a separate ion cloud which is derived from a single particle. The ion compression device stores and compresses each ion cloud based on instructions from the image current detector. The duty cycle of the particle analysis can be improved up to nearly 100%. The ion compression device is additionally operated with an ion filtration device to achieve a lower detection limit and a higher signal-to-noise ratio.

Abstract: An imaging unit includes a MCP, a fluorescent body, and an imager. The MCP is provided on a flight route of an ionized sample that is a component of a sample ionized and emits electrons in accordance with the ionized sample. The fluorescent body is disposed in a subsequent stage of the MCP and emits fluorescent light in accordance with the electrons emitted from the MCP. The imager is disposed in a subsequent stage of the fluorescent body and has a shutter mechanism configured to be capable of switching an open state in which the fluorescent light is imaged by allowing the fluorescent light from the fluorescent body to pass through and a close state in which the fluorescent light is not imaged by blocking the fluorescent light from the fluorescent body. An afterglow time of the fluorescent body is 12 ns or shorter.

Abstract: A method, an apparatus, and a program for more appropriately determining a condition for appropriately recognizing a semiconductor pattern are provided. A method for determining a condition related to a captured image of a charged particle beam apparatus including: acquiring, by a processor, a plurality of captured images, each of the captured images being an image generated by irradiating a pattern formed on a wafer with a charged particle beam, and detecting electrons emitted from the pattern, each of the captured images being an image captured according to one or more imaging conditions, the method further including: acquiring teaching information for each of the captured images; acquiring, by the processor, one or more feature determination conditions; calculating, by the processor, a feature for each of the captured images based on each of the feature determination conditions, at least one of the imaging condition and the feature determination condition being plural.

Abstract: In various aspects, methods and systems disclosed herein are capable of operating a Fourier Transform Mass Spectrometry (FTMS) quadrupole mass analyzer in two operational modes: transmitting mode and trapping mode. In the trapping mode, ions are first trapped and cooled within the FTMS quadrupole mass analyzer prior to being subjected to an excitation pulse and ejected from the FTMS quadrupole mass analyzer for detection. However, in transmitting mode, the FTMS quadrupole mass analyzer may provide more rapid analysis because the excitation pulse is applied to the ions of an ion beam that is being continuously transmitted through the FTMS quadrupole mass analyzer.

Abstract: A method for analyzing charged particles may include generating, in or into an ion source region, charged particles from a sample of particles, causing the charged particles to enter a mass spectrometer from the ion source region at each of a plurality of differing physical and/or chemical conditions in a range of physical and/or chemical conditions in which the sample particles undergo structural changes, controlling the mass spectrometer to measure at least the charge magnitudes of the generated charged particles at each of the plurality of differing physical and/or chemical conditions, determining, with a processor, an average charge magnitude of the generated charged particles at each of the plurality of differing physical and/or chemical conditions based on the measured charge magnitudes, and determining, with the processor, an average charge magnitude profile over the range of physical and/or chemical conditions based on the determined average charge magnitudes.

Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.