Abstract: A shield for a syringe containing biohazardous material includes an elongate body comprising a compartment extending longitudinally therethrough from a body cold end to a body hot end, the compartment dimensioned to receive a syringe barrel; a cold end cover dimensioned to receive and enclose a syringe plunger extending beyond the body cold end, the cold end cover attachable at the body cold end for enclosing the compartment and the syringe plunger at the body cold end thereby to shieldingly contain the biohazardous material in the syringe at the body cold end; and a hot end cover attachable at the body hot end for at least enclosing the compartment at the body hot end thereby to shieldingly contain the biohazardous material in the syringe at the body hot end.

Abstract: Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator having a voltage source selectively coupled to an output node, where the output node is configured to be coupled to an electrode disposed within a processing chamber, and where the output node is selectively coupled to a ground node. The waveform generator may also include a radio frequency (RF) signal generator, and a first filter coupled between the RF signal generator and the output node.

Abstract: A laser processing apparatus includes: a stage 2 capable of levitating and transporting a substrate 3 by jetting gas from a front surface; a laser oscillator configured to irradiate a laser beam 20a onto the substrate 3; and a gas jetting port arranged at a position overlapping a focus point position of the laser beam 20a in plan view, and being configured to jet inert gas. The front surface of the stage 2 is constituted by upper structures 5a and 5b, and the upper structures 5a and 5b are arranged so as to be spaced apart from each other and face each other. A gap between the upper structures 5a and 5b overlaps the focus point position of the laser beam 20a in plan view. A filling member 8 is arranged between the upper structures 5a and 5b so as to fill the gap between the upper structures 5a and 5b.

Abstract: The present invention relates to a device for operating at least one bending beam in at least one closed control loop, wherein the device has: (a) at least one first interface designed to receive at least one controlled variable of the at least one control loop; (b) at least one programmable logic circuit designed to process a control error of the at least one control loop using a bit depth greater than the bit depth of the controlled variable; and (c) at least one second interface designed to provide a manipulated variable of the at least one control loop.

Abstract: A method of scanning a sample with a scanning probe system, the scanning probe system comprising a probe comprising a cantilever extending from a base to a free end, and a probe tip carried by the free end of the cantilever, the method comprising using the probe to measure an electrostatic interaction between the sample and the probe; and after measuring the electrostatic interaction between the sample and the probe, scanning the sample with the probe while simultaneously applying a bias voltage to the scanning probe system, the applied bias voltage based on the measured electrostatic interaction between the sample and the probe.

Abstract: A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror.

Abstract: Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.

Abstract: A disinfecting apparatus including a housing to accommodate at least one tray therein, the housing having a first side and a second side, an ultraviolet (UV) light source disposed in the housing and configured to emit UV light towards the tray, and a plurality of doors including a first door and a second door disposed on the first side and the second side of the housing, respectively, in which the first door and the second door are configured to be opened in a direction away from the housing.

Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.

Abstract: A mass spectrometer according to one aspect of the present invention includes an ion source (31), a mass separator (32), and a detector (33), the mass spectrometer further including: a parameter optimization unit (531, 532, 533) configured to optimize a parameter value using a Bayesian optimization method based on a result obtained by making measurements while changing values of device parameters including a plurality of parameters that affects ionization efficiency in the ion source (31), a display processor (536) configured to display a sensitivity model which is a posterior distribution indicating a relationship between a plurality of parameters in all or some of the device parameters and signal strength estimated during the optimization of the device parameters, expressing as a graph like a heat map or an array of a plurality of the graphs on a display unit (7), and to sequentially update the sensitivity model, and a file creation unit (535) configured to a user to designate a position on the displayed gr

Abstract: There is provided a charged particle beam system having a computer system for controlling an acceleration voltage of a charged particle beam emitted from a charged particle source, the system including: a first diaphragm group having first and second diaphragms which are diaphragms that act on the charged particle beam and have different thicknesses; and a first diaphragm switching mechanism for switching the diaphragm in the first diaphragm group, in which the computer system controls the first diaphragm switching mechanism so as to switch from the first diaphragm to the second diaphragm according to an increase or decrease of the acceleration voltage.

Abstract: A plasma generating device includes: a chamber which is equipped with a dielectric wall structure and into which sample gas to be measured flows; an RF supplying mechanism that generates plasma inside the chamber using an electric field and/or a magnetic field through the dielectric wall structure; and a floating potential supplying mechanism that includes a first electrode disposed along an inner surface of the chamber. The RF supplying mechanism may include an RF field forming unit disposed in a first direction with respect to the chamber and the first electrode may include an electrode disposed in a second direction with respect to the chamber.

Abstract: The present invention relates to charged particle, X-ray, gamma ray and or thermal neutron collimators with improved UV, visible and IR blocking on the basis of micro structured semiconductor and method of making the same. In more detail, the present invention is related to three-dimensionally microstructured charged particle, X-ray, gamma ray and or thermal neutron collimators. The collimators of the present invention will improve the performance of telescopes, radiology equipment, nondestructive evaluation equipment and proton therapy equipment.

Abstract: An active vibration isolation system with a magnetic actuator where the magnetic actuator includes a coil carrier with at least one coil which engages in a magnetic actuator without touching it so that it takes the form of a linear motor. The magnetic actuator has a magnetic shield with an opening through which the coil carrier extends into the magnet carrier.

Abstract: A calibration apparatus for a mass analyzer includes an ion source device and a dual-purpose electron beam generating unit. The ion source device ionizes an analyte of a sample, producing analyte ions. The dual-purpose electron beam generating unit is positioned between the ion source device and the mass analyzer. In a first mode, the dual-purpose electron beam generating unit is used to create fragments of analyte ions of unknown mass-to-charge ratio. In a second mode, the dual-purpose electron beam generating unit is used to create ions of calibration compounds of known mass-to-charge ratio. All ions are subsequently transferred to the mass analyzer.

Abstract: In general, radiation shielding systems that shield radiation from multiple directions are described. In one embodiment, a method of shielding radiation is provided, including supporting a shielding device on an object proximate a radiation source, positioning a first shielding portion in a vertical position relative to the object, positioning a second shielding portion to extend away from the first portion, the second shielding portion attached to the first portion, and shielding radiation from the radiation source by the first shielding portion and the second shielding portion such that the first and second shielding portions provide a radiation shielding zone for a healthcare practitioner.

Abstract: Disclosed is a method for pre-detecting a defective porous polymer substrate for a separator, including selecting a porous polymer substrate having a plurality of pores; observing the selected porous polymer substrate with a scanning electron microscope (SEM) to obtain an image of the porous polymer substrate; quantifying the average value of pore distribution index (PDI); correcting the quantified average value of pore distribution index to obtain the corrected average value of pore distribution index; determining whether or not the corrected average value of pore distribution index is 60 a.u. (arbitrary unit) or less; and classifying the porous polymer substrate as a good product, when the corrected average value of pore distribution index is determined to be 60 a.u. or less, and classifying the porous polymer substrate as a defective product, when the corrected average value of pore distribution index is determined to be larger than 60 a.u.

Abstract: An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

Abstract: A sterilizing apparatus is disclosed. A sterilizing apparatus according to one embodiment comprises: a cover main body unit having an accommodation space formed therein so as to accommodate a device to be sterilized, wherein the accommodation space is open toward a bottom surface on which the device to be sterilized is disposed; an ultraviolet light emitting diode provided on a surface facing the bottom surface of the cover main body unit, and turned on so as to emit ultraviolet rays toward the accommodation space; a power supply unit for supplying power to the ultraviolet light emitting diode so as to turn on the ultraviolet light emitting diode; and a control unit for controlling an operation of the power supply unit.

Abstract: A mass spectrometer includes an ionization unit, a mass separation unit, a detection unit, a first measurement control unit configured to control the ionization unit to repeatedly execute a first measurement on a target sample while changing values of a plurality of parameters defined as device parameters, a second measurement control unit configured to control the ionization unit to set a value of each of the plurality of parameters to a predetermined reference value and execute a second measurement on the target sample at two or more time points before, after, or in a middle of repetition of the first measurement, a correction processing unit configured to correct results of the first measurements using results of the second measurements, and a device parameter-related information acquisition unit configured to determine the plurality of parameters using the corrected measurement results or acquire reference information for determining the plurality of parameters.