Patents Examined by Nicole M Ippolito
  • Patent number: 11989622
    Abstract: A quantum register can be read out using under-resolved emissions mapping (e.g., imaging). Regions of the quantum register are illuminated concurrently, one array site per region at a time, typically until all sites of each region have been illuminated. A photodetector system then detects for each region whether or not an EMR emission (e.g., due to fluorescence) has occurred in response to illumination of a respective site in that region. The result of the photo detections is a series of emissions maps, e.g., images. The number of emissions maps in the series corresponds to a number of sites per region, while the number of pixels in each image corresponds to a number of regions. A readout result can be based on a time-multiplexed combination of these emissions maps. The emissions maps are under-resolved since the resolution corresponds to the region size rather than the sizes of individual array sites.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: May 21, 2024
    Assignee: ColdQuanta, Inc.
    Inventors: Matthew Ebert, Martin Tom Lichtman
  • Patent number: 11990328
    Abstract: A mass spectrometer 1 includes a vacuum container 5 divided into a first chamber 51 containing an ion trap 3 and a second chamber 52 containing a time-of-flight mass spectrometer 4. The ion trap 3 is held within an ion-trap-holding space 610 surrounded by a wall 61. In this wall 61, a cooling-gas discharge port 64 is formed in addition to an introduction-side ion passage port 62 and an ejection-side ion passage port 63. A cooling gas supplied into an ion-capturing space 315 of the ion trap 3 is discharged from the ion-trap-holding space 610 through the three ports. The provision of the cooling-gas discharge port 64 reduces the amount of cooling gas flowing into the ejection-side ion passage port 63 and interfering with the ejection of ions from the ion trap 3 into the time-of-flight mass spectrometer 4. Consequently, the detection intensity of the ions is improved.
    Type: Grant
    Filed: April 19, 2022
    Date of Patent: May 21, 2024
    Assignee: SHIMADZU CORPORATION
    Inventors: Hiroyuki Miura, Hideaki Izumi
  • Patent number: 11988670
    Abstract: An integrated sample processing system including an analyzer and a mass spectrometer is disclosed. The integrated sample processing system can perform multiple different types of detection, thereby providing improved flexibility and better accuracy in processing samples. The detection systems in the sample processing system may include an optical detection system and a mass spectrometer.
    Type: Grant
    Filed: July 25, 2022
    Date of Patent: May 21, 2024
    Assignees: Beckman Coulter, Inc., DH Technologies Development Pte. Ltd.
    Inventors: Aaron Hudson, Takayuki Mizutani, Subhasish Purkayastha, Thomas W. Roscoe
  • Patent number: 11988967
    Abstract: An apparatus for supplying a target material includes a reservoir system, a priming system, and a transport system that extends from the priming system to the reservoir system. The reservoir system includes a reservoir in fluid communication with a nozzle supply system. The priming system includes a priming chamber defining a primary cavity; and a removable carrier configured to be received in the primary cavity. The removable carrier defines a secondary cavity configured to receive a solid matter that includes the target material. The transport system is configured to provide a fluid flow path between the priming system and the reservoir system.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: May 21, 2024
    Assignee: ASML Netherlands B.V.
    Inventor: Jon David Tedrow
  • Patent number: 11986826
    Abstract: Systems and methods are provided for high-efficiency transport of single particles for inductively coupled plasma mass spectrometry. Single particles may be delivered to the mass spectrometer for quantification of trace elements. The systems may include droplet generation, conveyance module, capillary tubing, and/or an integrated inductively coupled plasma (ICP) torch, which may allow for the sequential transportation of single particles.
    Type: Grant
    Filed: November 10, 2021
    Date of Patent: May 21, 2024
    Assignee: SHANGHAI POLARIS BIOLOGY CO., LTD.
    Inventors: Yuchong Wang, Shuangwu Sun, Ran Wei, Yupeng Cheng
  • Patent number: 11988618
    Abstract: Molecular structure of a crystal may be solved based on at least two diffraction tilt series acquired from a sample. The two diffraction tilt series include multiple diffraction patterns of at least one crystal of the sample acquired at different electron doses. In some examples, the two diffraction tilt series are acquired at different magnifications.
    Type: Grant
    Filed: March 31, 2021
    Date of Patent: May 21, 2024
    Assignee: FEI Company
    Inventors: Bart Buijsse, Hans Raaijmakers, Peter Christiaan Tiemeijer
  • Patent number: 11980704
    Abstract: A flexible ion generator device that includes a dielectric layer having a first end, a second end, a first side, a second side, a top side, and a bottom side, at least one trace positioned on the dielectric layer and having a plurality of emitters engaged to the at least one trace. A plurality of lights disposed on the dielectric layer.
    Type: Grant
    Filed: November 1, 2022
    Date of Patent: May 14, 2024
    Assignee: GLOBAL PLASMA SOLUTIONS, INC.
    Inventor: Charles Houston Waddell
  • Patent number: 11982948
    Abstract: A method for determining a center of a radiation spot irradiated on a surface by a sensor, the sensor including a radiation source and a detector. The method includes: emitting, with the radiation source, a first emitted radiation beam onto the surface to create the radiation spot on the surface, wherein at least a part of a target arranged at the surface is irradiated by the radiation spot; receiving, with the detector, a first reflected radiation beam at least including radiation from the radiation spot reflected by the target; detecting the presence of the target based on the first reflected radiation beam; determining a first measured position of the target based on the first reflected radiation beam; and determining a center of the radiation spot as projected on the surface in at least a first direction based on the first measured position of the target.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: May 14, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Mihaita Popinciuc
  • Patent number: 11978619
    Abstract: An ion shuttling system includes a plurality of first electrodes connected to a system configured to selectively provide an ion movement control voltage to each electrode of the plurality of first electrodes, a voltage source configured to provide one or more compensation voltages, a plurality of compensation electrodes comprising a plurality of compensation electrode pairs, where each compensation electrode pair of the plurality of compensation electrode pairs is associated with one or more different first electrodes of the plurality of first electrodes, and a plurality of switches, where each switch of the plurality of switches is connected at a respective first node to a compensation electrode of the plurality of compensation electrodes and is configured to selectively connect the respective compensation electrode to the voltage source.
    Type: Grant
    Filed: July 20, 2022
    Date of Patent: May 7, 2024
    Assignee: INFINEON TECHNOLOGIES AUSTRIA AG
    Inventor: Matthias Brandl
  • Patent number: 11970392
    Abstract: The present disclosure discloses a self-packing three-arm thermal scanning probe for micro-nano manufacturing, comprising: a three-arm cantilever beam, metal contact pads, a nichrome heating electrode for printing, a nichrome heating electrode for transportation, and a polymer storage area. The present disclosure is manufactured by conventional micro-nano machining processes such as lithography and wet etching. In the present disclosure, a gradient density design of heating electrodes is used to generated continuous change of temperature gradients, thus realizing continuous transportation of a printing material from a storage area to a tip area, which realizes self-packing.
    Type: Grant
    Filed: June 18, 2021
    Date of Patent: April 30, 2024
    Assignee: ZHEJIANG UNIVERSITY
    Inventors: Huan Hu, Renwei Mao
  • Patent number: 11972322
    Abstract: Various embodiments provide methods, apparatuses, systems, or computer program products for performing decreased crosstalk atomic object reading/detection. A controller is operatively connected to components of a system comprising a confinement apparatus comprising RF electrodes defining an RF null axis and a plurality of longitudinal electrodes. The components comprise voltage sources and manipulation sources. The controller is configured to cause an atomic object being read and neighboring atomic object(s) to be confined by the confinement apparatus; and cause the voltage sources to provide first control signals to longitudinal electrodes. The first control signals cause the longitudinal electrodes to generate a push field configured to cause one of the atomic object being read or the neighboring atomic object(s) to move off the RF null axis.
    Type: Grant
    Filed: August 3, 2021
    Date of Patent: April 30, 2024
    Assignee: Quantinuum LLC
    Inventors: John Gaebler, Brian Neyenhuis
  • Patent number: 11964342
    Abstract: A laser processing apparatus includes: a stage 2 capable of levitating and transporting a substrate 3 by jetting gas from a front surface; a laser oscillator configured to irradiate a laser beam 20a onto the substrate 3; and a gas jetting port arranged at a position overlapping a focus point position of the laser beam 20a in plan view, and being configured to jet inert gas. The front surface of the stage 2 is constituted by upper structures 5a and 5b, and the upper structures 5a and 5b are arranged so as to be spaced apart from each other and face each other. A gap between the upper structures 5a and 5b overlaps the focus point position of the laser beam 20a in plan view. A filling member 8 is arranged between the upper structures 5a and 5b so as to fill the gap between the upper structures 5a and 5b.
    Type: Grant
    Filed: November 29, 2019
    Date of Patent: April 23, 2024
    Assignee: JSW AKTINA SYSTEM CO., LTD.
    Inventors: Teruaki Shimoji, Daisuke Ito, Tatsuro Matsushima, Ryo Shimizu
  • Patent number: 11964131
    Abstract: A shield for a syringe containing biohazardous material includes an elongate body comprising a compartment extending longitudinally therethrough from a body cold end to a body hot end, the compartment dimensioned to receive a syringe barrel; a cold end cover dimensioned to receive and enclose a syringe plunger extending beyond the body cold end, the cold end cover attachable at the body cold end for enclosing the compartment and the syringe plunger at the body cold end thereby to shieldingly contain the biohazardous material in the syringe at the body cold end; and a hot end cover attachable at the body hot end for at least enclosing the compartment at the body hot end thereby to shieldingly contain the biohazardous material in the syringe at the body hot end.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: April 23, 2024
    Inventor: Robert Kamen
  • Patent number: 11965910
    Abstract: The present invention relates to a device for operating at least one bending beam in at least one closed control loop, wherein the device has: (a) at least one first interface designed to receive at least one controlled variable of the at least one control loop; (b) at least one programmable logic circuit designed to process a control error of the at least one control loop using a bit depth greater than the bit depth of the controlled variable; and (c) at least one second interface designed to provide a manipulated variable of the at least one control loop.
    Type: Grant
    Filed: March 30, 2023
    Date of Patent: April 23, 2024
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Christof Baur, Florian Demski
  • Patent number: 11967483
    Abstract: Embodiments provided herein generally include apparatus, plasma processing systems and methods for generation of a waveform for plasma processing of a substrate in a processing chamber. One embodiment includes a waveform generator having a voltage source selectively coupled to an output node, where the output node is configured to be coupled to an electrode disposed within a processing chamber, and where the output node is selectively coupled to a ground node. The waveform generator may also include a radio frequency (RF) signal generator, and a first filter coupled between the RF signal generator and the output node.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: April 23, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Yang Yang, Yue Guo, Kartik Ramaswamy
  • Patent number: 11961700
    Abstract: Embodiments consistent with the disclosure herein include methods for image enhancement for a multi-beam charged-particle inspection system. Systems and methods consistent with the present disclosure include analyzing signal information representative of first and second images, wherein the first image is associated with a first beam of a set of beams and the second image is associated with a second beam of the set of beams; detecting, based on the analysis, disturbances in positioning of the first and second beams in relation to a sample; obtaining an image of the sample using the signal information of the first and second beams; and correcting the image of the sample using the identified disturbances.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: April 16, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Maikel Robert Goosen, Albertus Victor Gerardus Mangnus, Lucas Kuindersma
  • Patent number: 11959936
    Abstract: A method of scanning a sample with a scanning probe system, the scanning probe system comprising a probe comprising a cantilever extending from a base to a free end, and a probe tip carried by the free end of the cantilever, the method comprising using the probe to measure an electrostatic interaction between the sample and the probe; and after measuring the electrostatic interaction between the sample and the probe, scanning the sample with the probe while simultaneously applying a bias voltage to the scanning probe system, the applied bias voltage based on the measured electrostatic interaction between the sample and the probe.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: April 16, 2024
    Assignee: INFINITESIMA LIMITED
    Inventor: Andrew Humphris
  • Patent number: 11957803
    Abstract: A disinfecting apparatus including a housing to accommodate at least one tray therein, the housing having a first side and a second side, an ultraviolet (UV) light source disposed in the housing and configured to emit UV light towards the tray, and a plurality of doors including a first door and a second door disposed on the first side and the second side of the housing, respectively, in which the first door and the second door are configured to be opened in a direction away from the housing.
    Type: Grant
    Filed: April 29, 2021
    Date of Patent: April 16, 2024
    Inventors: Jiyoon Lee, Sungyeon Kim, Taeyeon Kim
  • Patent number: 11961728
    Abstract: A surface-assisted laser desorption/ionization method according to an aspect includes: a first process of preparing a sample support (2) having a substrate (21) in which a plurality of through-holes (S) passing from one surface (21a) thereof to the other surface (21b) thereof are provided and a conductive layer (23) that covers at least the one surface (21a); a second process of placing a sample (10) on a sample stage (1) and arranging the sample support (2) on the sample (10) such that the other surface (21b) faces the sample (10); and a third process of applying a laser beam (L) to the one surface (21a) and ionizing the sample (10) moved from the other surface (21b) side to the one surface (21a) side via the through-holes (S) due to a capillary phenomenon.
    Type: Grant
    Filed: March 6, 2023
    Date of Patent: April 16, 2024
    Assignee: HAMAMATSU PHOTONICS K.K.
    Inventors: Yasuhide Naito, Masahiro Kotani, Takayuki Ohmura
  • Patent number: 11960210
    Abstract: A method for generating an extreme ultraviolet (EUV) radiation includes simultaneously irradiating two or more target droplets with laser light in an EUV radiation source apparatus to produce EUV radiation and collecting and directing the EUV radiation produced from the two or more target droplet by an imaging mirror.
    Type: Grant
    Filed: February 27, 2023
    Date of Patent: April 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chansyun David Yang, Keh-Jeng Chang, Chan-Lon Yang