Patents Examined by Paul A. Guss
  • Patent number: 4786806
    Abstract: A retarding field spectrometer has a mounting ring for attachment to the pole piece of a scanning electron microscope or similar beam generator. Supported by the mounting ring are three screen electrodes with their planes positioned normal to the beam axis and adjustable as a unit in a pseudo-orthogonal manner through two worm and gear drives of eccentrics cooperating with an aperture and a slot, respectively, in a plate carrying the electrode closest to the pole piece. Three continuous dynode electron multipliers are arrayed symmetrically about the beam at-rest axis between the last mentioned electrode and the intermediate electrode. The multipliers have cathodes maintained at substantially the same potential as the intermediate electrode.
    Type: Grant
    Filed: June 22, 1987
    Date of Patent: November 22, 1988
    Assignee: GAF Corporation
    Inventors: Carl A. Listl, Henry Seiwatz
  • Patent number: 4786178
    Abstract: An apparatus for detecting the relative position and orientation of a reference beam of light includes first and second detectors for detecting the intersection of the reference beam with first and second spaced and substantially parallel reference planes. The measured horizontal and vertical deviations between the points of intersection on the two reference planes provide an indication of the orientation of the beam with respect to the apparatus.
    Type: Grant
    Filed: December 15, 1986
    Date of Patent: November 22, 1988
    Assignee: Spectra-Physics, Inc.
    Inventor: Ted L. Teach
  • Patent number: 4786814
    Abstract: Disclosed herein is a method of using an apparatus for ion implanation providing a flood of electrons to neutralize the charge on an ion-implanted wafer after implantation to prevent electrostatic sticking attraction between the wafer and the support mechanism.
    Type: Grant
    Filed: September 16, 1983
    Date of Patent: November 22, 1988
    Assignee: General Electric Company
    Inventors: Frank Kolondra, Chung P. Wu
  • Patent number: 4785178
    Abstract: An irradiator, for containment and exposure of a radiation source, that is self-contained and portable. The irradiator provides radiation shielding, physical strength and thermal dissipation to allow transport of a radiation source carried therein without further containment or shielding. A radiator frame carrying a radiation source is lowered below the container for exposure to particularly adapt the device for tunnel irradiation of product from a position thereabove. The radiation preferably source is cesium-137 which provides medium energy gamma radiation adapted particularly for radiation processing and sterilizing of food products with minimal additional shielding requirements.
    Type: Grant
    Filed: May 27, 1986
    Date of Patent: November 15, 1988
    Inventors: Patrick A. Lynch, Douglas Jones, Robert Franklin, James M. Cobb
  • Patent number: 4785189
    Abstract: An electron sensitive surface is patternized treated to a high resolution pattern of low-energy electrons without any need to do focussing by emitting the low-energy electrons from a pointed electrode and positioning the apex of the pointed electron emitting source suitably close to the surface being treated.
    Type: Grant
    Filed: February 19, 1988
    Date of Patent: November 15, 1988
    Assignee: International Business Machines Corporation
    Inventor: Oliver C. Wells
  • Patent number: 4779988
    Abstract: A method of distinguishing between the front and back surfaces of a slide which includes an image on the front surface, comprises reflecting a light beam from each surface of the slide at an acute angle, measuring scattered light around the reflected light beam after the light beam has been reflected repeatedly, and comparing the measurements of the scattered light for the respective surfaces of the slide to detect which of the two measurements is larger. The surface whose measurement is larger is thus determined to be the front surface of the slide.
    Type: Grant
    Filed: October 16, 1986
    Date of Patent: October 25, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masashi Horiguichi
  • Patent number: 4777362
    Abstract: A device to measure the extremely fast electrical waveform generated when atomic or subatomic particles of an identical type strike an electronic circuit or device. The device comprises a trigger element which signals the incidence of a particle on the electronic device and a picosecond sampler which receives the trigger signal and the waveform generated by the electronic device. The sampler obtains a measurement of a discrete point on the generated waveform each time a particle passes through the trigger element to the electronic device. The sampling point on the waveform can be moved by various techniques so that the entire waveform may be measured by the sampler.
    Type: Grant
    Filed: June 4, 1986
    Date of Patent: October 11, 1988
    Assignee: Hypres, Inc.
    Inventor: Sadeg M. Faris
  • Patent number: 4777370
    Abstract: The electron gun comprises an ionization chamber, adjacent to a high voltage chamber. In the wall common the both chambers provision is made for an extraction grid. On the opposite side, the ionization chamber comprises an outlet window for the electrons similar in shape to the extraction grid, and accompanied by a fine metallic foil. The high voltage chamber comprises a cathode brought to a high negative voltage. By giving the two grids the shape of similar parallel strips, a masking effect and a focusing effect are obtained at one and the same time which allows the efficiency of the electron gun to be increased.
    Type: Grant
    Filed: November 18, 1986
    Date of Patent: October 11, 1988
    Assignee: Office National d'Etudes et de Recherche Aerospatiales (ONERA)
    Inventors: Daniel Pigache, Francois Danel
  • Patent number: 4775789
    Abstract: A method and apparatus for producing a neutral beam of oxygen or other gas for use in testing of materials and for heavy particle etching is disclosed. A beam of positively ionized gas is accelerated and filtered to produce a beam having ions of a selected energy. The beam is decelerated to an energy of the level required and directed toward a photo emissive surface at a grazing incidence angle causing electrons to be contributed to the beam thereby neutralizing part of the ionized atoms and molecules of the beam. The beam is directed through electrostatic deflection plates which separate out remaining ionized particles producing a neutral beam.
    Type: Grant
    Filed: March 19, 1986
    Date of Patent: October 4, 1988
    Inventors: Royal G. Albridge, Jr., Richard F. Haglund, Jr., Kenneth J. Snowdon, Norman H. Tolk
  • Patent number: 4775790
    Abstract: A transmission electron microscope for irradiating a sample with an electron beam and for causing an image formation lens system to enlarge the electron beam having passed through the sample so that a magnified image of the sample is formed by the electron beam. The image formation lens system includes a plurality of lens groups each having a plurality of electromagnetic lenses, and the focal length of each of the electromagnetic lenses included in at least one lens group is changed while keeping the resultant focal length of each lens group constant, to rotate the magnified image in a state that the magnification of the image is kept constant.
    Type: Grant
    Filed: June 9, 1986
    Date of Patent: October 4, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Hiroyuki Kobayashi, Shigeto Isakozawa
  • Patent number: 4774415
    Abstract: The device in accordance with the invention for the sterilization of a hose coupling device (in its connected condition) of dialysis apparatus, comprises an opening housing into which the coupling device is placed. The coupling device is subjected to infrared radiation from heating elements in the housing whose heating effect is monitored and automatically controlled by a temperature probe arranged under the coupling device in the housing. Since the temperature probe is designed to have such an infrared absorption characteristic that the temperature increase rate of the probe is substantially the same as that of the coupling device, one may be certain that the coupling device will have reached the desired temperature (which is detected at the temperature probe) with only a slight delay if any. At the same time there is the advantage that the interior of the coupling device is heated to substantially above the minimum necessary sterilization temperature.
    Type: Grant
    Filed: January 20, 1987
    Date of Patent: September 27, 1988
    Assignee: Fresenius AG
    Inventors: Hubert Biegel, Wolfram Weber, Arthur Meisberger, Bernd Mathiew, Wolfram Weber, Arthur Meisberger, Bernd Mathieu
  • Patent number: 4772788
    Abstract: A corona discharge treating system wherein in order that the corona discharge treatment can be performed efficiently and securely on any product of complicated shape having a large number of different faces to be treated, the system is equipped with conveying means for conveyance of the article, a plurality of discharge electrodes are disposed along the conveying direction of the article, each of these discharge electrodes performs activation of a part of the surface to be treated by sharing, the whole surface to be treated can be activated when said article has passed through all these discharge electrodes, thereby enabling the surface treatment to be continuously made, while conveying the article.Complicated shape articles may be subjected to continuous and secure corona discharge treating without stagnation.
    Type: Grant
    Filed: June 10, 1986
    Date of Patent: September 20, 1988
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Koichi Tsutsui, Shoji Ikeda
  • Patent number: 4767931
    Abstract: A thin film manufacturing and processing apparatus by using an ion beam comprises a plasma producing vessel for producing therein a plasma by ionizing a neutral gas, an electrode assembly for extracting ions in the form of an ion beam from the plasma, a vacuum container accomodating therein a target to be worked through irradiation of the ion beam, and permanent magnets disposed on the outer periphery of the plasma generating vessel which is formed of a nonmagnetic material and serves as an anode electrode. An ion beam of high uniformity and a large diameter can be obtained to allow manufacture and processing of large scale magnetic thin films and semiconductors with high precision.
    Type: Grant
    Filed: December 17, 1986
    Date of Patent: August 30, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Tadashi Sato, Tomoe Kurosawa, Shigetaka Fujiwara, Masaru Higaki
  • Patent number: 4767926
    Abstract: Disclosed is an electron beam metrology system for measuring the width of a pattern on a specimen by scanning the specimen with a deflected electron beam, detecting a pattern image signal provided by secondary electrons emitted from the specimen, and measuring the pattern width on the specimen on the basis of the pattern detection signal. The system comprises a signal detecting device including at least one set of two detectors disposed toward the scanning direction of the electron beam in a relation symmetrical with respect to the optical axis of the electron beam for detecting pattern image signals independently of each other, a device for recognizing surface topography of the pattern using an output signal of the signal detecting device, and a device for measuring the pattern width while discriminating as to whether the pattern is a raised-profile pattern or a hollow-profile pattern.
    Type: Grant
    Filed: September 26, 1986
    Date of Patent: August 30, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Hisaya Murakoshi, Mikio Ichihashi, Kenichi Yamamoto
  • Patent number: 4766320
    Abstract: An ion implantation apparatus comprising an ion source, extraction electrode, mass separator, deceleration tube, ion implantation unit, and a suppressor electrode disposed in the deceleration tube in the vicinity of its inlet for suppressing flow of secondary electrons produced in the separator into the deceleration tube. The secondary electrons are inhibited from flowing into the implantation unit along with ions.
    Type: Grant
    Filed: March 4, 1986
    Date of Patent: August 23, 1988
    Assignee: Nissin Electric Company, Ltd.
    Inventors: Masao Naitoh, Tomoji Ogawa
  • Patent number: 4761545
    Abstract: An ion cyclotron resonance cell has applied thereto an excitation which has a time domain waveform which is the inverse Fourier transform of a frequency domain excitation spectrum which has been chosen by the user to yield selective excitation and/or suppression of ranges of ion mass-to-charge ratios. To minimize the dynamic range of the time domain signal resulting from the inverse Fourier transform, the phases of the various discrete frequency components in the frequency domain spectrum which are used in calculating the inverse Fourier transform are not constant but rather are varied as a function of the frequency of the components. The phase of each component is assigned such that the frequency components in the time domain signal are not all in phase at any point in time, thereby avoiding large magnitude spikes in the time domain waveform. The phases of the various frequency components may follow a non-linear function of the frequencies of the components, such as a quadratic function.
    Type: Grant
    Filed: May 23, 1986
    Date of Patent: August 2, 1988
    Assignee: The Ohio State University Research Foundation
    Inventors: Alan G. Marshall, Tom L. Ricca, Tao-Chin L. Wang
  • Patent number: 4761560
    Abstract: A test pattern which is applied to a wafer or mask by electron beam lithophy for measuring proximity effects. The pattern comprises two lines which intersect at a small angle, for example 1.degree. so that the proximity effects of the two lines combine within the angle to displace the angle vertex by an amount much larger than the proximity effect of an isolated line. A calibration scale is provided to measure this enhanced proximity effect by viewing the pattern with an optical microscope.
    Type: Grant
    Filed: January 25, 1984
    Date of Patent: August 2, 1988
    Assignee: The United States of America as represented by the Secretary of the Army
    Inventor: William B. Glendinning
  • Patent number: 4760264
    Abstract: An irradiator which can be incorporated within a packing house and a method of irradiating food in the packing house are disclosed. Food products are placed on spaced baskets and conveyed into an enclosure, through a irradiation chamber, and then outwardly from the enclosure. The food products are conveyed through tortuously arranged ductwork which serves to absorb radiation streaming upwardly. The radiation source is maintained underwater both during operation and shutdown, and no lifting of the radiation source is thus required. A portion of the conveyor is positioned within one or more casings and can be withdrawn, if necessary, to facilitate maintenance and repair.
    Type: Grant
    Filed: January 16, 1986
    Date of Patent: July 26, 1988
    Inventor: Lawrence G. Barrett
  • Patent number: 4755674
    Abstract: An infrared detector has at least one infrared-sensitive detector element and at least one infrared source disposed in a common housing with the detector, with the infrared radiation from the source being directed onto the detector element. A pulse generator is connected to the infrared source for pulsing the infrared radiation therefrom. A recognition circuit is connected to the detector element for identifying the pulse sequence of the detector output so as to continuously check the functioning of the detector. A number of such detector elements can be arranged in the housing, with each detector element having a respective infrared source associated therewith. The infrared source may be a heated wire, a chip resistor, or a light emitting diode.
    Type: Grant
    Filed: September 26, 1986
    Date of Patent: July 5, 1988
    Assignee: Heimann GmbH
    Inventor: Norbert Schaaf
  • Patent number: 4755685
    Abstract: In an ion micro beam apparatus which consists of an ion source, a beam focusing system which accelerates, focuses, mass-separates and deflects the ions emitted from said ion source, and a specimen plate for finely moving the specimen, the improvement comprising a mass separator which is constituted by: at least two stages of focusing lenses in said beam focusing system; four stages of E.times.B deflectors arranged between the two stages of lenses, each of said E.times.B deflectors being comprised of a pair of electrodes and a pair of magnetic pole pieces to generate an electric field and a magnetic field in the directions perpendicular to an ion optical axis, wherein among the four stages of E.times.B deflectors, the electric fields and magnetic fields generated by the E.times.B deflectors of the second and third stages as counted from the side of the ion source are set to be in parallel with, but opposite to, the electric field and magnetic field generated by the E.times.
    Type: Grant
    Filed: October 16, 1986
    Date of Patent: July 5, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Yoshimi Kawanami, Tohru Ishitani, Kaoru Umemura, Hifumi Tamura