Patents Examined by Paul A. Guss
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Patent number: 4752692Abstract: U-shaped billet (52) has a slot (54) cut therein for receipt of a slip of insulator material (56). This body is machined on its front end (64) to produce a narrow bridge (66) of controlled cross-sectional area. Emitter needle (78) is positioned in a bore through the bridge to be heated by current through the bridge. The ion emitter body is rigid and strong to hold the emitter needle in the proper location.Type: GrantFiled: April 26, 1985Date of Patent: June 21, 1988Assignee: Hughes Aircraft CompanyInventors: Jerg B. Jergenson, Charles M. McKenna
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Patent number: 4752686Abstract: During line-by-line scanning of a specimen surface by a primary beam of a scanning microscope, a predetermined specimen region is emphasized by comparing deflection voltages of a deflection means of the primary beam to variable comparison voltages and thereby generating a control signal which indicates whether a scanned point on the specimen surface lies within a predetermined region. The control signal is used to vary one or more scan parameters, such as the scan rate, the bandwidth of an evaluation circuit, or the intensity of the primary scan beam. An alternate embodiment includes an analog function network to generate the control signal.Type: GrantFiled: March 21, 1986Date of Patent: June 21, 1988Assignee: Siemens AktiengesellschaftInventor: Hans D. Brust
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Patent number: 4749867Abstract: An exposure apparatus for exposing in a step-and-scan manner a plate-like member to a pattern with radiation so that images of the pattern are transferred onto different regions on the plate-like member. The apparatus includes a mirror imaging optical system for projecting the image of the pattern onto the plate-like member, a carriage for scanningly moving, at the time of exposure, the plate-like member relative to the mirror imaging system, and a stage movably mounted on the carriage for step-feeding the plate-like member at the time of non-exposure so as to sequentially place the different regions of the plate-like member at an exposure station under the mirror imaging system. A locking system is provided to lock the stage relative to the carriage by use of vacuum, at the time of exposure, whereby unwanted displacement of the plate-like member relative to the carriage at the time of scanning exposure is prevented.Type: GrantFiled: April 28, 1986Date of Patent: June 7, 1988Assignee: Canon Kabushiki KaishaInventors: Koichi Matsushita, Junji Isohata, Hironori Yamamoto, Makoto Miyazaki, Kunitaka Ozawa, Hideki Yoshinari
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Patent number: 4746803Abstract: In an apparatus for forming a single crystal semiconductor layer from a non-single-crystalline semiconductor material by scanning a region of the material with an electron beam, a first pair of deflection electrodes and a second pair of deflection electrodes, both pairs being provided in the path of the electron beam. A deflection signal generated by modifying the amplitude of a high-frequency fundamental wave signal with a modulation wave signal having a frequency lower than that of the high-frequency fundamental wave signal is supplied to the deflection electrodes of the first pair. The electrodes rapidly deflect the electron beam in a first direction, while changing the range of deflecting the beam, thereby forming a locus of the beam spot on the sample. Simultaneously, the deflection electrodes of the second pair deflect the beam in a second direction, thereby annealing a region of the material, to form a single crystal semiconductor layer.Type: GrantFiled: September 8, 1986Date of Patent: May 24, 1988Assignee: Agency of Industrial Science and TechnologyInventors: Tomoyasu Inoue, Hiroyuki Tango, Kyoichi Suguro, Iwao Higashinakagawa, Toshihiko Hamasaki
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Patent number: 4746800Abstract: A positioning device for manipulation of objects, provided with an object holder (5) which is rotatable about an axis of rotation (.theta.) by means of a .theta.-manipulator and is displaceable by translation along a Z-axis coinciding with the axis of rotation (.theta.) by means of a Z-manipulator. The two manipulators are coupled to each other by means of a separator (17, 153) in such a manner that the .theta.-movement and the Z-movement are independent of each other. The positioning device is particularly suitable for manipulation of objects in the submicron range, such as takes place, for example, in optical lithographic devices according to the invention.Type: GrantFiled: September 22, 1986Date of Patent: May 24, 1988Assignees: ASM Lithography B.V., U.S. Philips CorporationInventors: Jan Van Eijk, Marinus A. Van Den Brink, Johannes M. M. Van Kimmenade, Hubert A. M. Neilen
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Patent number: 4742224Abstract: An ion energy filter of the type useful in connection with secondary ion mass spectrometry is disclosed. The filter is composed of a stack of 20 thin metal plates, each plate being insulated from the others and having a centrally located hole with a unique radius. A metallic hemisphere is mounted on a base plate, and the 20 thin metal plates are attached to the base plate such that the plate with the smallest central hole is adjacent to the base plate and the radii of the holes in subsequent plates increase with increasing distance from the base plate. The relative potential of each plate is determined by a series string of 20 resistors with each plate being connected to a different junction in the series string. The radii of the centrally located holes are selected such that the voltage on each plate is inversely proportional to the radius of its centrally located hole.Type: GrantFiled: December 22, 1986Date of Patent: May 3, 1988Assignee: American Telephone and Telegraph Company AT&T Bell LaboratoriesInventors: Steven Chu, Aly Dayem, Eric H. Westerwick
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Patent number: 4740693Abstract: Disclosed is an electron beam pattern line width measurement system wherein an electron beam is converged to a fine spot, the electron beam is scanned on a sample formed with a pattern to-be-measured, secondary electrons generated from a surface of the sample by the projection of the electron beam are detected, and the detected signal is processed to determine a line width of the pattern to-be-measured, comprising a secondary electron detector which detects a signal corresponding to an amount of all secondary electrons generated by the scanning, and a secondary electron energy analyzer which selectively detects a signal corresponding to an amount of secondary electrons of specified energy. With the electron beam pattern line width measurement system, it becomes possible to precisely detect a pattern boundary region defined by different sorts of materials in a stepped structure of a small level difference not having been measurable with a prior-art electron beam pattern line width measurement system.Type: GrantFiled: December 11, 1985Date of Patent: April 26, 1988Assignee: Hitachi, Ltd.Inventors: Yoshinori Nakayama, Shinji Okazaki, Hidehito Obayashi, Mikio Ichihashi
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Patent number: 4740705Abstract: An axially compact field emission cathode assembly for use in an electron beam device comprises a field emission tip, an electriclly conductive filament for mechanically supporting said tip and for receiving and conducting to said tip a predetermined electrical potential for exciting said filament to cause electron emission from said tip. Filament support means supports the filament with the tip positioned on an electron beam axis within said device. The cathode assembly is characterized by the filament being supported by said filament support means to extend transversely to the electron beam axis, whereby to reduce the axial length of the device.Type: GrantFiled: August 11, 1986Date of Patent: April 26, 1988Assignee: Electron Beam MemoriesInventor: Albert V. Crewe
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Patent number: 4737647Abstract: A target assembly for an electron linear accelerator (LINAC), comprising a target for converting electron beams of different energies into x-ray beams. The target has a variable thickness which can be set to a predetermined value by adjustment means. In a preferred embodiment, the target is provided with a chamber defined by two parallel plates and a bellows connecting both plates. The chamber is filled with a liquid medium of a high atomic number, such as mercury. In operation the medium is pumped through the chamber, and cooled down in a heat exchanger.Type: GrantFiled: March 31, 1986Date of Patent: April 12, 1988Assignee: Siemens Medical Laboratories, Inc.Inventor: Volker Stieber
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Patent number: 4733086Abstract: A thermal electron source suitable for use in an electron capture detector comprises a source of stable ultra-violet light, an ultra-violet transparent support member (20,31) located in the path of the ultra-violet light (41) and a thin photo-emissive metallic layer (1A, 24, 33) coated over the surface of the support member remote from the source. In one form the source is a cylindrical mercury vapor lamp (1) with the photo-emissive layer coated directly on the lamp. The coated lamp may then be enclosed within a cylindrical anode (8) with a gas flow between them and the electrical current is measured between the anode and cathode. In an alternative arrangement a planar geometrical assembly is provided. Preferably the photo-emissive material is gold and the carrier gas is an argon-methane mixture.Type: GrantFiled: March 7, 1986Date of Patent: March 22, 1988Assignee: The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Northern IrelandInventor: Peter G. Simmonds
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Patent number: 4733074Abstract: A sample surface structure measuring method using a scanning type electron microscope featured by scanning the sample surface by an electron beam incident from above the sample surface; measuring the amount of the secondary electrons discharged according to the three-dimensional structure of the sample surface by the scanning; and determining the three-dimensional structure of the sample surface from the amount of the secondary electrons measured based on a relation existing between the predetermined three-dimensional structure and the amount of the secondary electrons discharged.Type: GrantFiled: April 16, 1986Date of Patent: March 22, 1988Assignee: Hitachi, Ltd.Inventors: Makoto Kato, Tetsuo Yokoyama, Jyuntaro Arima, Shimbu Yamagata, Mikihiko Oi, Toshihiro Furuya
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Patent number: 4733091Abstract: A dual mechanical movement scanning system for ion implantation includes a radial scan arm which is mounted at a fixed pivot point external to the system vacuum chamber and penetrates the chamber and supports the wafer paddle or wheel within the chamber. The fast-scan component is provided by rotation of the paddle on the support arm; the slow-scan component is provided by pivotal movement of the scan arm itself. The drive system which reciprocally pivots the radial scan arm is configured geometrically so that controlled movement of one arm of the drive system is translated as l/r velocity of the rotational axis relative to the beam path. The wafer paddle can be constructed to provide a variable implant angle and to use a component of centrifugal force to hold the wafers in place without clamps or other mechanical means.Type: GrantFiled: September 9, 1985Date of Patent: March 22, 1988Assignee: Applied Materials, Inc.Inventors: Frederick J. L. Robinson, Michael T. Wauk, II
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Patent number: 4731541Abstract: A light system for providing uniform actinic radiation to fingernails while in a predetermined position, including a generally ellipsoidal housing having a circular horizontal cross-section and reflective inner surfaces to concentrate light, the surfaces being so shaped and so dimensioned as to concentrate, in the predetermined position, the light rays from an ultraviolet lamp in the housing, an opening in the housing to receive the hand of a user, and means for guiding the user's hand so as to position the fingernails of the hand in the predetermined position, the guiding means including a handle to be grasped by the user and means interconnecting the handle and housing and controlling the position of the handle as it is moved within the housing. An adjustable timer may be provided to control exposure times.Type: GrantFiled: July 25, 1986Date of Patent: March 15, 1988Assignee: Conair CorporationInventor: Richard E. Shoemaker
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Patent number: 4730930Abstract: A scanner and scanning method for scanning a sheet such as a chart. The scanner includes scanning means and detection means. The scanning means includes means for supporting and mounting the sheet, and illumination means for directing light onto an illuminated area of the sheet, the illuminated area being elongated along a scan direction. The scanning means also includes means for causing the illuminated area to move across the sheet in a movement direction normal the scan direction. The detection means comprises a photodetector array and a coherent fiber optic bundle. The coherent fiber optic is tapered, such that it has a comparatively wide aperture adjacent the illuminated area, and a comparatively small aperture adjacent the photodetector array. In a related aspect, the illuminated area is caused to move in a first direction across the sheet such that the illumination means sequentially directs light onto a series of pixel areas of the sheet.Type: GrantFiled: June 24, 1986Date of Patent: March 15, 1988Assignee: Technical Arts CorporationInventors: Robert J. Thoreson, Steven J. White
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Patent number: 4731533Abstract: Improved methods and apparatus suitable for use in mass spectrometry are provided for dissociating ions by achieving electronic excitation of the ions using electrons. In MS-MS applications, ion dissociation is induced by electron impact on an ion beam after the beam has exited a first mass analyzer, and before the beam enters a second analyzer. An efficient method for dissociating ions is achieved by providing a low velocity ion beam traveling substantially along the axis of an RF excited multipole field, and intersecting sheet electron beams traveling transverse to the axis of the field. When used in the analysis of high molecular weight, nonvolatile molecules, the teachings of the present invention yield the extensive and reproducible fragmentation characteristics generally associated with electron ionization of lower mass, volatile molecules.Type: GrantFiled: October 15, 1986Date of Patent: March 15, 1988Assignee: Vestec CorporationInventor: Marvin L. Vestal
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Patent number: 4730111Abstract: This disclosure is concerned with method and apparatus for vaporizing liquid solutions in order to detect, quantitate, and/or determine physical or chemical properties of samples present in liquid solution. Mixtures may be separated by an on-line liquid chromatographic column and the methods used for detection, quantitation, indentification, and/or determination of chemical and physical properties include mass spectrometry, photoionization, flame ionization, electron capture, optical photemetry, including UV, visible, and IR regions of the spectrum, light scattering, light emission, atomic absorption, and any other technique suitable for detecting or analyzing molecules or particles in a gaseous or vacuum environment. The method and apparatus involves controlled partial vaporization of the solution.Type: GrantFiled: February 24, 1986Date of Patent: March 8, 1988Assignee: Research CorporationInventors: Marvin L. Vestal, Calvin R. Blakley
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Patent number: 4728799Abstract: An improved method of height measurement and correction for a two-stage deflection ("fly's eye" lens) electron beam accessed lithography system is provided which employs a height measuring transducer such as a capacitance gauge or an optical gauge and a two position fiducial calibration grid (LFG) set at positions LFG1 and LFG2 a known distance apart and wherein the electron beam of the electron beam lithography system is sequentially deflected to the two positions for each lenslet being corrected. Measurement signals derived at each position are processed pursuant to a unique algorithm to derive desired height correction output signals and height corrected deflection signals for control of the fine deflector of the electron beam lithography system.Type: GrantFiled: January 5, 1987Date of Patent: March 1, 1988Assignee: Control Data CorporationInventors: James J. Gordon, Kenneth J. Harte, Vijay K. Singhal
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Patent number: 4728796Abstract: A method for the ionization of polymers which comprises forming a thick layer of the polymer on a probe tip and then ionizing the polymer in a vacuum with laser irradiation. In a preferred embodiment, a moiety that readily photoionizes in an IR field is incorporated into the thick layer of polymer and the irradiation of the thus modified polymer is done with a CO.sub.2 IR laser. A method is also disclosed for the fabrication of polymer coatings which comprises accelerating the charged polymer ions generated by the ionization of a thick layer of polymer in a vacuum toward the substrate which has an appropriate charge gradient.Type: GrantFiled: April 10, 1986Date of Patent: March 1, 1988Assignee: Medical College of WisconsinInventor: Charles E. Brown
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Patent number: 4727250Abstract: Apparatus for measuring the angular distribution of charged particles scattered by a sample surface, having a source for the production of a primary particle beam and a deflection system for the deflection of the scattered particles onto the entry orifice of a detector connected to the deflection system, useful, for example, for the study of crystal surfaces by the so-called LEED technique. On the side of the deflection system opposite the sample not only a detector but also a particle source is disposed such that the primary beam also passes through the deflection system. The scannable range of the apparatus for determining the angular distribution of scattered electrons resulting from diffraction is considerably greater than that of the prior art.Type: GrantFiled: January 28, 1987Date of Patent: February 23, 1988Assignee: Leybold-Heraeus GmbHInventor: Martin Henzler
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Patent number: 4724324Abstract: Method and apparatus for locating the centroid along a line section of an ion beam in a vacuum chamber, requiring no moving parts and requiring only two electrical conductors passing through the wall of the vacuum chamber. An array of Faraday cup current sensors is positioned along a line in the path of the beam at predetermined distances from a reference point, so that each sensor intercepts a component of the beam. A first plurality of resistors each has one end connected to one of the beam current sensors, has a value proportional to the distance between the beam current sensor to which it is connected and the reference point, and has its other end connected to a first common point. A second plurality of resistors having values equal to each other each has one end connected to one of the beam current sensors, has a value much greater than the largest of the first plurality of resistors, and has its other end connected to a second common point.Type: GrantFiled: November 24, 1986Date of Patent: February 9, 1988Assignee: Varian Associates, Inc.Inventor: Reuel B. Liebert