Abstract: In an ion implantation apparatus according to the present invention, ions are extracted from an ion source with the aid of extraction electrodes. The ions thus extracted are analyzed in mass by means of a mass analysis magnet apparatus and a mass analysis slit, so that the required ions are implanted in a substrate. Magnets for generating cusp magnetic fields are serially disposed along an ion beam line extending from the front part to the rear part of the mass analysis magnet apparatus.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a guide base (12), a stage (14), a stage bearing assembly (18), a control system (22), and a Y mover (68). The stage (14) retains the device (26). The stage bearing assembly (18) supports the stage (14) spaced apart from the guide base (12). More specifically, the stage bearing assembly (18) generates an electrostatic force that urges the stage (14) towards the guide base (12). The housing mover (68) moves the stage (14) relative to the guide base (12). The Y mover (68) includes a plurality of magnets and a conductor. The magnets have a magnet length (86) and the conductors have a conductor length (88). Preferably, the magnet length (86) is at least as long as the conductor length (88) plus an X stroke (87) of the stage assembly (10). This design allows the Y mover (68) to provide a force along the Y axis over the range of the positions of the Y mover (68).

Abstract: A magnetic shunt assembly (12) for an exposure apparatus (10) includes a magnetic shunt assembly (12). The apparatus (10) includes an optical assembly (24)(26), a stage (44), a first mover assembly (16) that moves the stage (44) in a first gap (37). The first mover assembly (16) is surrounded by a magnetic field. The magnetic shunt assembly (12) is positioned near the optical assembly (24)(26) approximately between the optical assembly (24)(26) and the mover assembly (16). The magnetic shunt assembly (12) is made of a material having a relatively high magnetic permeability. The magnetic shunt assembly (12) can provide a low magnetic reluctance path that redirects at least a portion of the magnetic field from the first mover assembly (16) away from the gap (37).

Abstract: A method for enhancing the dynamic range of a mass spectrometer by first passing a sample of ions through the mass spectrometer having a quadrupole ion filter, whereupon the intensities of the mass spectrum of the sample are measured. From the mass spectrum, ions within this sample are then identified for subsequent ejection. As further sampling introduces more ions into the mass spectrometer, the appropriate rf voltages are applied to a quadrupole ion filter, thereby selectively ejecting the undesired ions previously identified. In this manner, the desired ions may be collected for longer periods of time in an ion trap, thus allowing better collection and subsequent analysis of the desired ions. The ion trap used for accumulation may be the same ion trap used for mass analysis, in which case the mass analysis is performed directly, or it may be an intermediate trap.

Abstract: The present invention relates to radiation sources and a method for producing radiation sources. Embodiments of the present invention are directed to radiation sources that can be used to calibrate nuclear imaging equipment, such as flood sources. According to embodiments of the invention, the radiation source includes a outer housing that contains a substrate upon which a radioactive pattern is deposited. The radioactive deposit may be placed on the surface of the substrate in the form of a deposited solution and may be fixed to the surface of the substrate by, for example, a binding agent and/or a sealing layer. The deposited solution may also include a colorant to visually indicate the activity distribution of the radioactive deposit.

Abstract: The present invention pertains to a technique of electron spectroscopic imaging that is easy to perform and cost effective. This technique allows for spatial resolution enhancement of electron beam semiconductor inspection systems (for example a critical dimension scanning electron microscope CD-SEM) as well as to obtain useful physical or chemical information on the investigated specimen. The technique involves a high pass energy filter that is alternately set, or multiplexed, at two energies. For an inspected area on a specimen, the detected intensity level at the higher energy setting is subtracted from the intensity level at the lower energy setting. The obtained differential value corresponds to electrons having energy within the range of the first and second filter settings. This obtained differential value is used to generate an image of the specimen for inspection purposes.

Abstract: A time-of-flight mass spectrometer, for example, a MALDI-TOF spectrometer, measures the characteristics of the charge to mass ratio of ionized particles by measuring the time taken for the particles to travel a pre-determined distance. The spectrometer comprises an accelerator (14) which accelerates the particles along at least two paths, which may be contained in a single beam of charged particles. Two detectors (26 and 30) mark the ends of the paths and are operable to detect the particles travelling therealong. The length of the path leading to the first detector (26) differs from that of the path leading to the second detector (30) to a sufficient extent to enable the difference in detection times of corresponding particles at the two detectors to be used to provide a measurement of said characteristics.

Abstract: A positioning stage system for precise and accurate movement of an article in an electron beam lithography system. The positioning stage system includes a support platform for supporting the article, an X-direction linear motor coupled to an X-member, a Y-direction linear motor coupled a Y-member, and a slide attached to the support platform and slidably engaged to the X-member and the Y-member. The X-member and Y-member, upon actuation of the X-direction and Y-direction linear motors, cause the support platform to move in an X-direction and a Y-direction, respectively.

Abstract: Apparatus for analysis of a thin film formed over an underlying layer on a surface of a sample, the thin film including first elements, while the underlying layer includes second elements. The apparatus includes an electron gun, which directs a beam of electrons to impinge on a point on the surface of the sample at which the thin film is formed. An electron detector receives Auger electrons emitted by the first and second elements responsive to the impinging beam of electrons, and to output a signal indicative of a distribution of energies of the emitted electrons. A controller receives the signal and analyzes the distribution of the energies so as to determine a composition of the first elements in the thin film and a thickness of the thin film.

Abstract: The present invention provides an increased degree of uniformity of radiation dose distribution for the interior of a diseased part. A particle beam therapy system includes a charged particle beam generation apparatus and an irradiation apparatus. An ion beam is generated by the charged particle beam generation apparatus. The irradiation apparatus exposes a diseased part to the generated ion beam. A scattering device, a range adjustment device, and a Bragg peak spreading device are installed upstream of a first scanning magnet and a second scanning magnet. The scattering device and the range adjustment device are combined together and moved along a beam axis, whereas the Bragg peak spreading device is moved independently along the beam axis. The scattering device moves to adjust the degree of ion beam scattering. The range adjustment device moves to adjust ion beam scatter changes caused by an absorber thickness adjustment.

Abstract: An optical detector 1 wherein detection elements 11, 12, 13 and 14 are provided in a sealed case 4 whose opening portion 3 is blocked with a window material 2 for transmitting light such as an infrared and an ultraviolet ray therethrough, the detection elements being formed opposite to the window material; and optical filters 21, 22, 23 and 34 are disposed between the window material 2 and the detection elements 11, 12, 13 and 14 and used for selecting and causing only light composed of a predetermined band of wavelengths to be transmitted by thin optical films in connection with the detection elements 11, 12, 13 and 14.

Abstract: A method and an apparatus is disclosed for selectively transmitting ions with a FAIMS analyzer in which a flow of carrier gas of a mixed composition is provided. Ions that are transmitted at a same combination of applied potentials when a first carrier gas is provided are in certain cases transmitted at different combinations of applied potentials when a second other carrier gas having a different composition is provided.

Abstract: A system for irradiating articles is disclosed. The system has multiple beam paths and is capable of irradiating articles with x-rays or electron beams (e-beams). The system is comprised of a single radiation source producing multiple beam paths. At least one of the beam paths is configured to irradiate articles with x-rays and at least one other beam path is configured to irradiate articles with e-beams. The beam paths are each positioned to scan product carried on conveyors. The x-ray beam paths and e-beam have separate conveyor systems that operates independently from each other.

Abstract: A method of recalibrating to compensate for thermal drift between a micro-imaging system and a sample integrated circuit (IC) under investigation determines a planar drift using a cross-correlation between a reference calibration image and a recalibration image, and further determines a focus drift from a difference between a reference focus setting and a recalibration focus setting. The recalibration is performed on detection of a recalibration trigger event, such as expiry of a recalibration time interval. The recalibration time interval can be adaptively adjusted based on a magnitude of the thermal drift. Tile images captured since a last recalibration are recaptured if the thermal drift is too great for reliable image compensation. The system ensures seamless assembly of tile images into image photo-mosaics and increases image photo mosaic throughput.

Abstract: The invention relates to an exposure apparatus, in particular for wavelength-dependent light outcoupling, in which at least one preferably wavelength-dependent mirror layer is located within an exposure beam path of a lamp, which mirror layer is used to divide the beam path into a spectral portion used for exposure, and into an unused spectral portion. The object of the invention is to provide an exposure apparatus and a method with which the quality of exposure can be optimized using simple means. The object on which the invention is based is attained according to the invention by locating a mirror in the beam path of the unused region of the spectrum that reflects the unused spectral range in the direction of a mirror layer, and a portion of this is projected onto a viewing screen for adjustment purposes.

Abstract: An electron beam system is based on a plasma generator in a plasma ion source with an accelerator column. The electrons are extracted from a plasma cathode in a plasma ion source, e.g. a multicusp plasma ion source. The beam can be scanned in both the x and y directions, and the system can be operated with multiple beamlets. A compact focused ion or electron beam system has a plasma ion source and an all-electrostatic beam acceleration and focusing column. The ion source is a small chamber with the plasma produced by radio-frequency (RF) induction discharge. The RF antenna is wound outside the chamber and connected to an RF supply. Ions or electrons can be extracted from the source. A multi-beam system has several sources of different species and an electron beam source.

Abstract: On a sample base 1 disposed within a vacuum container is provided a scale S(1). . . S(N), where in an actual distance of the sample base is monitored by observing the scale trough an optical system for exclusive use thereof, which can catch it within a field of view. With this, it is possible to position a foreign body, as a target of analysis, which is analyzed or observed by a first analysis/observation device, so that it necessarily falls within a field of view of a second analysis/observation device, thereby realizing quick and automatic delivery of the samples when observing the foreign body on the sample by plural numbers of the devices.

Abstract: A system for irradiating articles is disclosed. The system has multiple beam paths and is capable of irradiating articles with x-rays or electron beams (e-beams). The system is comprised of a single radiation source producing multiple beam paths. At least one of the beam paths is configured to irradiate articles with x-rays and at least one other beam path is configured to irradiate articles with e-beams. The beam paths are each positioned to scan product carried on conveyors. The x-ray beam paths and e-beam have separate conveyor systems that operates independently from each other.

Abstract: A portable mass spectrometer for underwater use includes a watertight case having an inlet and means for transforming an analyte gas molecule from a solution phase into a gas phase positioned within the case. Means for directing a fluid to the transforming means from the inlet and means for analyzing the gas-phase analyte molecule to determine an identity thereof are also positioned within the case.

Abstract: Radiation image information is read from a stimulable phosphor sheet by line sensors and corrected for shading by a shading corrector. Thereafter, the radiation image information is corrected for sharpness independently in main and auxiliary directions by a sharpness corrector using spatial filters which are selected from a spatial filter memory by a spatial filter selector according to recording or reading conditions.