Abstract: A process for the selective removal of a substance from a substrate for etching and/or cleaning applications is disclosed herein. In one embodiment, there is provided a process for removing a substance from a substrate comprising: providing the substrate having the substance deposited thereupon wherein the substance comprises a transition metal ternary compound, a transition metal quaternary compound, and combinations thereof; reacting the substance with a process gas comprising a fluorine-containing gas and optionally an additive gas to form a volatile product; and removing the volatile product from the substrate to thereby remove the substance from the substrate.

Abstract: When etching is performed with respect to a silicon-containing material by using a dry etching apparatus having a dual power source, the application of bias power is initiated before oxidization proceeds at a surface of the silicon-containing material. Specifically, the application of the bias power is initiated before the application of source power is initiated. Alternatively, the source power and the bias power are applied such that the effective value of the source power reaches a second predetermined value after the effective value of the bias power reaches a first predetermined value.

Abstract: Methods of forming solder ball contacts having dimensions of approximately 2.5 microns in diameter for use in C4-type connections. The methods form solder ball contacts using selective deposition of solder on metal contact pads of a device. The metal contact pads have exposed portions at the bottom of through holes. The through holes define the dimensions of the exposed portions of the metal contact pads, and serve to limit the dimensions of the resulting solder contact by limiting the area upon which deposition preferentially occurs. Subsequent reflow of the deposited solder forms a solder ball contact. Various devices, modules, systems and other apparatus utilizing such methods of forming solder ball contacts.

Abstract: A method of providing a substantially planar trench isolation region having substantially rounded corners, said method comprising the steps of: (a) forming a film stack on a surface of a substrate, said film stack comprising an oxide layer, a polysilicon layer and a nitride layer; (b) patterning said film stack to form at least one trench within said substrate, wherein said patterning exposes sidewalls of said oxide layer, polysilicon layer and nitride layer; (c) oxidizing the at least one trench and said exposed sidewalls of said oxide layer and said polysilicon layer so as to thermally grow a conformal oxide layer in said trench and on said exposed sidewalls of said oxide layer and said polysilicon layer; (d) filling said trench with a trench dielectric material; and (e) planarizing to said surface of said substrate.

Abstract: In a semiconductor device, pining regions 105 are disposed along the junction portion of a drain region 102 and a channel forming region 106 locally in a channel width direction. With this structure, because the spread of a depletion layer from a drain side is restrained by the pining regions 105, a short-channel effect can be restrained effectively. Also, because a passage through which carriers move is ensured, high mobility can be maintained.

Abstract: A method for fabricating a field-effect transistor situated within an integrated semiconductor circuit. At least two gate regions each extending between a source region and a drain region and are disposed such that they lie one above the other in a thickness direction of a substrate, thereby reducing the space requirement of the hitherto customary larger field-effect transistors in integrated semiconductor circuits.

Abstract: A first electrode and a doped oxide layer laterally proximate thereof are provided over a substrate. A silicon nitride layer is formed over both the doped oxide layer and the first electrode to a thickness of no greater than 80 Angstroms over at least the first electrode by low pressure chemical vapor deposition using feed gases comprising a silicon hydride, H2 and ammonia. The substrate with silicon nitride layer is exposed to oxidizing conditions comprising at least 700° C. to form a silicon dioxide layer over the silicon nitride layer, with the thickness of silicon nitride over the doped oxide layer being sufficient to shield oxidizable substrate material beneath the doped oxide layer from oxidizing during the exposing. A second electrode is formed over the silicon dioxide layer and the first electrode. In one implementation, the chemical vapor depositing comprises feed gases of a silicon hydride and ammonia, with the depositing comprising increasing internal reactor temperature from below 500° C.

Abstract: A method of planarizing an isolation region. Key elements of the invention include the two chemical-mechanical polish (CMP) steps and the CMP stop structure comprised of a sacrificial oxide layer and the second nitride layer. First a pad oxide layer, a first nitride layer, a sacrificial oxide layer and a second nitride layer are formed over a substrate. A trench is formed through the pad oxide layer, the first nitride layer, the sacrificial oxide layer and the second nitride layer and in the substrate. An oxide layer is deposited filling the trench and over the second nitride layer. The oxide layer is preferably formed by a high density plasma chemical vapor deposition (HDPCVD) deposition. In a first CMP step, we chemical-mechanical polish the oxide layer and the second nitride layer down to a level. The second nitride layer and the sacrificial oxide layer are then removed.

Abstract: A shallow abrupt junction is formed in a single crystal substrate, for example, to form a pn junction in a diode or a source drain extension in a transistor. An amorphous layer is formed at the surface of the substrate by implanting an electrically inactive ion, such as germanium or silicon, into the substrate. The amorphous/crystalline interface between the amorphous layer and the base crystal substrate is located at the depth of the desired junction. A dopant species, such as boron, phosphorus or arsenic is implanted into the substrate so that peak concentration of the dopant is at least partially within the amorphous layer. The amorphous layer can be formed either before or after the implanting of the dopant species. A low temperature anneal is used to recrystallize the amorphous layer through solid phase epitaxy, which also activates the dopant within the amorphous layer. The dopant located beneath the original amorphous/crystalline interface remains inactive.