Patents Examined by Roy M. Punnoose
  • Patent number: 11396385
    Abstract: Systems and methods for optically measuring a position of a measurement surface relative to a reference position. The system is a wireless network comprising a centrally located data acquisition computer and a multiplicity of remotely located sensor modules mounted at different locations within wireless communication range of a central receiver. Each sensor module is mounted to a clamp that is made specific to a control surface location and embedded with an RFID tag to denote clamp location. The optical components of the sensor modules are selected to enable indication of the linear position of a measurement surface relative to a reference position and then broadcast the measurement results. The broadcast results are received by the central receiver and processed by the data acquisition computer, which hosts human interface software that displays measurement data.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: July 26, 2022
    Assignee: The Boeing Company
    Inventors: David M. Konyndyk, Mark Douglas Fuller, Jerry A. James, Timothy P. Huang
  • Patent number: 11391666
    Abstract: A snapshot ellipsometer or polarimeter which does not require temporally modulated element(s) to measure a sample, but instead uses one or more spatially varying compensators, (eg. microretarder arrays and compound prisms), to vary the polarization state within a measurement beam of electromagnetic radiation. Analysis of an intensity profile of the beam after interaction with the spatially varying compensator(s) and the sample, and after having source beam wavelength content determined using a digital light processor, and/or being directed by a digital light processor elements toward elements in the detector, allows sample parameters to be characterized.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: July 19, 2022
    Assignee: J.A. WOOLLAM CO., INC.
    Inventors: Griffin A. P. Hovorka, Jeremy A. Van Derslice, Martin M. Liphardt
  • Patent number: 11391660
    Abstract: A system and a method for the batch sorting of particles are provided. An example of a batch sorting system includes a microfluidic ejector, a flow channel fluidically coupled to the microfluidic ejector at one end, and a reservoir coupled to an opposite end of the flow channel from the microfluidic ejector. A counter is disposed in the flow channel upstream of the microfluidic ejector to count particles prior to ejection from the microfluidic ejector. An optical sensor is to image the flow channel. A controller is configured to locate a target particle in the flow channel based, at least in part, on the image and capture the target particle in a collection vessel based, at least in part, on a count from the counter.
    Type: Grant
    Filed: October 1, 2018
    Date of Patent: July 19, 2022
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Fausto D'Apuzzo, Viktor Shkolnikov, Yang Lei
  • Patent number: 11393118
    Abstract: Using data about the geometry of the wafer, the geometry of the wafer is measured along at least three diameters originating at different points along a circumference of the wafer. A characterization of the geometry of the wafer is determined using the three diameters. A probability of wafer clamping failure for the wafer can be determined based on the characterization.
    Type: Grant
    Filed: June 9, 2020
    Date of Patent: July 19, 2022
    Assignee: KLA CORPORATION
    Inventors: Shivam Agarwal, Priyank Jain, Yuan Zhong, Chiou Shoei Chee
  • Patent number: 11385156
    Abstract: A particle size measuring apparatus capable of measuring a smaller particle size includes: a first light source configured to emit parallel beam to a sample containing particles; a first image capturing apparatus disposed to approximately face the first light source with the sample disposed therebetween and configured to capture an image of the sample; and an image analyzing unit configured to analyze the image captured by the first image capturing apparatus. The first image capturing apparatus and the first light source are disposed so as to approximately face each other so that an image of scattered light of the parallel beam incident on particles and scattered at a prescribed angle ?th or smaller is captured by the first image capturing apparatus. The image analyzing unit is configured to calculate a particle size on the basis of a scattered light image captured by the first image capturing apparatus.
    Type: Grant
    Filed: April 9, 2020
    Date of Patent: July 12, 2022
    Assignee: HITACHI, LTD.
    Inventor: Tomonari Misawa
  • Patent number: 11385104
    Abstract: A polarization sensor is described. It includes a quarter-wave plate to convert circularly polarized light into linearly polarized light. The quarter-wave plate is realized as a metasurface. The sensor also includes a linear polarizer to analyze the light generated by the quarter-wave plate, and a photodetector to receive the analyzed light. The sensor may be combined with other linear polarization sensors to form a sensor capable of complete measurement of the polarization state of incident light. An array of these sensors can be integrated directly onto image sensors to form a polarimetric imager.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: July 12, 2022
    Assignee: ARIZONA BOARD OF REGENTS ON BEHALF OF ARIZONA STATE UNIVERSITY
    Inventors: Yu Yao, Chao Wang, Chu Wang, Jing Bai, Ali Basiri, Xiahui Chen
  • Patent number: 11378513
    Abstract: Apparatus (100) for determining presence of a gas (103) is provided, the apparatus (100) comprising: one or more retarders (109) to spectrally modulate polarisation of received radiation in accordance with a plurality of polarised spectral modulation profiles which are offset in phase from each other, the radiation output from the one or more retarders (109) comprising radiation having polarisation spectrally modulated in accordance with the said plurality of polarised spectral modulation profiles in a common beam of radiation; one or more polarisers (147, 148); and radiation detectors (142, 144) to detect radiation output from the one or more retarders (109) filtered for respective polarisation states by the one or more polarisers (147, 148), the detectors (142, 144) selectively and separately detecting on different detectors at the same time polarised radiation conforming to each of at least first and second of the said polarised spectral modulation profiles to thereby provide at least respective first and
    Type: Grant
    Filed: May 3, 2019
    Date of Patent: July 5, 2022
    Assignee: UNIVERSITEIT LEIDEN
    Inventors: Frans Snik, Christoph Ulrich Keller
  • Patent number: 11371928
    Abstract: A sensor arrangement characterizes particles. The arrangement has an emitter with a laser source that generates a laser beam; a mode converter that generates a field distribution of the laser beam, which at each position has a different combination of a local intensity and a local polarization direction of the laser beam; and focusing optics that focus the field distribution of the laser beam onto at least one measurement region, through which the particles pass, in a focal plane. A receiver is also provided with analyzer optics configured to determine polarization-dependent intensity signals of the field distribution of the laser beam in the at least one measurement region; and an evaluator configured to characterize the particles, including the particle position, the particle velocity, the particle acceleration, or the particle size, using the polarization-dependent intensity signals.
    Type: Grant
    Filed: December 17, 2021
    Date of Patent: June 28, 2022
    Assignee: Q.ANT GMBH
    Inventors: Michael Foertsch, Stefan Hengesbach
  • Patent number: 11360031
    Abstract: The present disclosure proposes an inspection apparatus. The inspection apparatus may include: a structured-light source configured to sequentially radiate a plurality of structured lights having one phase range; a lens configured to adjust, for each of the plurality of structured lights, optical paths of light beams corresponding to phases of the phase range such that a light beam corresponding to one phase of the phase range arrives at each point of a partial region on an object; an image sensor configured to capture a plurality of reflected lights generated by the structured lights being reflected from the partial region; and a processor configured to acquire a light quantity value of the reflected lights; and derive an angle of the surface by deriving phase values of the reflected lights based on the light quantity value for the reflected lights.
    Type: Grant
    Filed: December 16, 2020
    Date of Patent: June 14, 2022
    Assignee: KOH YOUNG TECHNOLOGY INC
    Inventors: Chan Kwon Lee, Moon Young Jeon, Jung Hur, Deok Hwa Hong, Eun Ha Jo
  • Patent number: 11353389
    Abstract: Examples disclosed herein relate to system and method for detecting the size of a particle in a fluid. The system includes a conduit for transporting a fluid and a sample area. Some of the fluid passes through the sample area. A first imaging device has an optical lens and a digital detector. A laser source emits a first laser beam. The digital detector generates a metric of an initial intensity of a scattered light that passes through the optical lens. The scattered light is scattered from particles passing through the sample area, and includes light from the first laser beam, which passes through the sample area. A controller outputs a corrected particle intensity based upon a comparison of the initial intensity to data representative of intensity of a focused and defocused particle. The corrected particle intensity generates a corrected metric corresponding to an actual size of the particles.
    Type: Grant
    Filed: September 25, 2020
    Date of Patent: June 7, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Mehdi Vaez-Iravani, Avishek Ghosh
  • Patent number: 11346769
    Abstract: An ellipsometer uses a broadband light source and a Fresnel cone to produce a simultaneous broadband polarization state generator with no moving parts. The detector of the ellipsometer includes a diffractive element to spatially separate the wavelengths of the light from the sample. The wavelengths may be spatially separated sufficiently that there is no overlap of bands of wavelengths when imaged by a two-dimensional sensor or may be temporally separated. Additionally, the detector separates and simultaneously analyzes the polarizations states of the light from the sample so there is no overlap of polarization states when imaged by a two-dimensional sensor and no moving parts are used. The resulting image with separated wavelengths and polarization states may be used to determine at least a partial Mueller matrix for the sample.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: May 31, 2022
    Assignee: Onto Innovation Inc.
    Inventor: Alexander George Boosalis
  • Patent number: 11346790
    Abstract: The light from an optical metrology device is focused into a measurement spot on a sample using a focusing system. The focusing system uses an image of the light reflected from the measurement spot to determine a best focal position at a desired position of the sample. The focusing system selects a characteristic of reflected light, such as polarization state or wavelengths, to use for focusing. The characteristic of the reflected light that is selected for use in determining focal position is affected different by different portions of the sample. For example, light reflected from a top surface of a sample may have a different characteristic than light reflected by an underlying layer. The selected characteristic of the reflected light is used by the focusing system to focus the measurement spot at the top surface or an underlying layer of the sample.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: May 31, 2022
    Assignee: Onto Innovation Inc.
    Inventors: Amit Shachaf, Daniel Thompson, John F. Lesoine
  • Patent number: 11348221
    Abstract: A wafer testing method adapted to test a thin wafer. The thin wafer is combined with a vacuum-release substrate to form a wafer-assembly, and the wafer-assembly is placed in a wafer cassette. The vacuum-release substrate is attached to a front surface of the wafer with an attaching force which is sensitive to air pressure. The method includes the following steps. First, taking out the wafer-assembly from the wafer cassette, then transferring the wafer-assembly to a warpage-detection-device and placing the wafer-assembly on a first stage of the warpage-detection-device. Then, detecting warpage of the wafer. If the warpage of the wafer is less than a warpage threshold, the wafer-assembly is taken out from the first stage, and the wafer-assembly is turned over to place the wafer-assembly on a second stage. Then, applying negative pressure to the vacuum-release substrate to eliminate the attaching force. Then, removing the vacuum-release substrate.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: May 31, 2022
    Assignee: MPI CORPORATION
    Inventors: Chien-Yu Chen, Han-Yu Chuang, Po-Han Peng
  • Patent number: 11346763
    Abstract: The disclosure discloses an apparatus and a method for microbial cell counting, and belongs to the field of cell counting. In the present application, by converting a traditional automated intermittent counting process into a continuous counting process, the cell sap fixed in a blood cell plate in a traditional counter becomes the cell sap flowing in a microchannel, so as to prolong the cell detection time and distance. The size of the microchannel is slightly greater than the diameter of microbial cells, so as to ensure that the cells flow through the cross section of the microchannel one by one. At the same time, since the diameter of the counterbores communicated by the microchannel is slightly greater than the width of the microchannel, the flow rate of the cell sap slows down when the cell sap flows to the counterbores.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: May 31, 2022
    Assignee: JIANGNAN UNIVERSITY
    Inventors: Gongxin Li, Fei Liu, Xiaoli Luan, Zhiguo Wang, Jun Chen
  • Patent number: 11328380
    Abstract: The present disclosure generally relates to machine vision systems, illumination sources for use in machine vision systems, and components for use in the illumination sources. More specifically, the present disclosure relates to machine vision systems incorporating multi-function illumination sources, multi-function illumination sources, and components for use in multi-function illumination sources.
    Type: Grant
    Filed: October 26, 2019
    Date of Patent: May 10, 2022
    Inventors: Gilbert Pinter, Edward Brandel, Jeremy Brodersen
  • Patent number: 11326999
    Abstract: A device and a method for detecting fluid particle characteristics. The device comprises a fluid composition sensor configured to receive a volume of fluid and a controller. The fluid composition sensor comprises a collection media configured to receive one or more particles of a plurality of particles within the fluid; and an imaging device configured to capture an image of one or more particles of the plurality of particles received by the collection media. The controller is configured to determine a particle impaction depth of each of the one or more particles of the plurality of particles within the collection media; and, based at least in part on the particle impaction depth of each of the one or more particles of the plurality of particles, determine a particulate matter mass concentration within the volume of fluid.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: May 10, 2022
    Assignee: HONEYWELL INTERNATIONAL INC.
    Inventors: Andy Walker Brown, Adam D. McBrady, Stephan Michael Bork
  • Patent number: 11328411
    Abstract: Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) configured for performing at least one repeater defect detection step in front-end processing during an inspection process performed on a wafer having features printed in a lithography process using a reticle. The at least one repeater defect detection step performed in the front-end processing includes identifying any defects detected at corresponding locations in two or more test images by double detection and any defects detected by stacked defect detection as first repeater defect candidates. One or more additional repeater defect detections may be performed on the first repeater defect candidates to generate final repeater defect candidates and identify defects on the reticle from the final repeater defect candidates.
    Type: Grant
    Filed: April 30, 2021
    Date of Patent: May 10, 2022
    Assignee: KLA Corp.
    Inventors: Hong Chen, Kenong Wu, Xiaochun Li, James A. Smith, Eugene Shifrin, Qing Luo, Michael Cook, Wei Si, Leon Yu, Bjorn Brauer, Nurmohammed Patwary, Ramon Ynzunza, Neil Troy
  • Patent number: 11320367
    Abstract: A testing system includes a production-type laser having optical modes of a production laser that interfaces with an optical path of a heat-assisted magnetic recording (HAMR) slider. A far-field light illumination path delivers excitation light from the production-type laser to the optical path of the HAMR slider, the excitation light being emitted from an air bearing surface (ABS) of the HAMR slider. Optics receive the emitted light from the ABS and distribute the emitted light to one or more sensors. The system determines, based on signals received from the one or more sensors, a depolarization of the emitted light and a coupling efficiency of the HAMR slider. The system may also measure light reflecting out of the optical path and Fourier transform these measurements to determine locations of reflections within the optical path.
    Type: Grant
    Filed: October 9, 2020
    Date of Patent: May 3, 2022
    Assignee: Seagate Technology LLC
    Inventors: Raghu Ambekar Ramachandra Rao, Aaron Edward Patz, Tae-Woo Lee
  • Patent number: 11313780
    Abstract: Methods of analyzing and filtering light scattering data from a sample potentially containing a non-target compound, for example a contaminant. The presence of contaminants result in outliers in the scattering intensity data that increase both symmetry and width of photon counts obtained via analysis. After identification, various outliers are discarded to account for the non-target compounds and thereafter the remaining light scattering data is analyzed. Preferably, analyzing the light scattering data or photon counts involves determining a level to discard an outlier. In particular, the method includes the steps of identifying and quantifying the mode of photon count distribution and using the peak of the mode of distribution to eliminate outliers.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: April 26, 2022
    Assignee: ADOLPHE MERKLE INSTITUTE, UNIVERSITY OF FRIBOURG
    Inventor: Sandor Balog
  • Patent number: 11313779
    Abstract: A debris detection system includes a chamber configured to permit particles to pass through the chamber; an optical fiber or fiber optic cable providing a light path; a collimator configured to channel light from the light path into the chamber; and a reflector configured to reflect light back to the collimator for signal detection. In embodiments, the reflector may include a mirror. Methods for detecting particles and information and/or parameters associated with particles, including that associated with reflected light, are disclosed.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: April 26, 2022
    Assignee: Eaton Intelligent Power Limited
    Inventors: Gregory Kopansky, George P. Birch, Xin Pu, John Zielinski