Abstract: A device for cleaning carboys, kegs, and similar containers is disclosed. The device includes a pair of cleaning pads pivotally attached to a rod. Each pad has a fabric exterior, a stiffening insert, and the absorbent sponge. The insert and sponge are placed on one side of the fabric exterior. The opposite side of the fabric exterior is folded over the stiffening insert and the sponge and then sewn together.

Abstract: A method for cleaning a component comprises a first stage including the steps of: (i) loading a component into the cleaning chamber of a flush station, (ii) directing a deionized water stream through first filter means, (iii) introducing carbon dioxide into the filtered water stream, (iv) directing the carbonated water stream into a fluid passage to be cleaned in the component, and (v) collecting the dirty water stream after it passes through the component and directing the collected dirty water stream through second filter means for reuse. The method can further include a second stage including the steps of: (vi) loading the component into a testing chamber of a testing station, (vii) directing a deionized water stream through third filter means, (viii) directing the filtered water stream into the fluid passage in the component, and (ix) collecting the water stream after it passes through the component and directing the collected water stream into a particle counter.

Abstract: A method for cleaning a gassing manifold includes providing a gassing module and a complementary clean in place module for coupling to the gassing module. Cleaning solution is pumped from the clean in place module to the gassing module above a minimum flow rate and velocity for effective cleaning.

Abstract: A conveyor warewasher (1) which having at least one washing zone (6, 7, 8, 9), at least one rinsing zone (10) and at least one drying zone (26) and also a control device (36). In order to achieve an effective cleaning and drying of the washware, along with as low a consumption as possible of resources in terms of water, chemicals and, in particular, energy, there is provision for the control device (36) to be designed for selecting a previously defined or definable program sequence at least in the at least one drying zone (26) and for setting the process parameters associated with the selected program sequence automatically as a function of the conveying speed at which the washware is conveyed through the treatment zones (6, 7, 8, 9, 10, 26) of the conveyor warewasher (1).

Abstract: A pickling process for descaling metal includes a two-stage filtering process to remove pickling liquor fog, mist, and/or vapors from a gas collected during the descaling process. The process includes a two-stage filtering arrangement that includes a first stage filter, which is arranged to remove a liquid phase of the pickling liquor from the gas, and a second stage filter, which is arranged to remove a gaseous phase of the pickling liquor the said gas. The recovered pickling liquor can advantageously be recycled for reuse because it is recovered in a relatively higher concentration that has heretofore been possible.

Abstract: The invention relates to a method of cleaning the surface of a material that is coated with an organic substance. The inventive method is characterized in that it comprises the following steps, consisting in: introducing the material into a treatment chamber, having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode in order to break down the organic substance under the action of the free radicals O thus produces. The invention also relates to an installation that is used to carry out said method.

Abstract: A sonication cleaning system is provided. The sonication cleaning system includes a cleaning tank configured to contain a liquid and a flow control system configured to cause a gradient cross flow of the liquid through the cleaning tank. The system further includes a sonication generator configured to agitate the liquid in the cleaning tank and a controller configured to vary a power applied to the sonication generator to agitate the liquid in the cleaning tank based on an oscillation position of a workpiece within the cleaning tank.

Abstract: A process of cleaning resin out of an electrical generator parallel ring is provided. The process includes inserting a cleaning ball mounted on a shaft into the parallel ring; verifying a location of the cleaning ball; rotating the shaft; measuring a rotational speed of the cleaning ball with a tachometer; and removing resin with the cleaning ball.

Abstract: Process and system for removing printing in metallic packages used in drinks, food and other applications in general, comprising the removal of ink before the cure thereof, by means of spray with ink remover liquid and non abrasive friction. Preferably, said liquid is an alkaline aqueous solution, which is sprayed onto the package surface simultaneously with the friction thereof with a soft and non abrasive element. In a preferred embodiment, said friction results in the rotation of the package around the longitudinal axis thereof, which is mounted on a rotative support, and the soft non abrasive element in contact with the surface thereof keeps motionless.

Abstract: Methods of cleaning workpieces are described. One method includes performing both a sonication cleaning operation and a rinse cleaning operation within a single cleaning tank. Another cleaning method described includes the use of cross flow of cleaning liquid within a cleaning tank while performing a rinse clean. The cleaning method includes the oscillation of one or more workpieces in the cleaning tank to perform the rinse clean.

Abstract: Disclosed herein are a washing machine and a sound control method thereof that are capable of canceling noise generated during an operation of the washing machine and, at the same time, informing a user of information related to the operation of the washing machine using a sound. The sound control method includes operating the washing machine according to an inputted operation command, sensing noise generated during the operation of the washing machine, reading a sound to cancel the sensed noise, and outputting the read sound in a state in which the read sound is mapped with the noise. Consequently, it is possible mask the noise, thereby minimizing the noise. Also, it is possible to sense a start and an end of each operation and a change of the operation based on the noise pattern, sense a user's access to the washing machine, and output a feedback sound, thereby informing of the progress information of the washing machine.

Abstract: A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.

Abstract: In embodiments of the present invention, a gutter-cleaning device comprises a housing containing an impeller drive facility, the housing configured to fit into a gutter, an impeller, disposed at an end of the housing and driven by the impeller drive facility, and a transport facility for transporting the housing along the gutter.

Abstract: A cleaning device (1) performs a cleaning of an article by blowing a cleaning medium (5) by an air stream onto the article (4). The cleaning device (1) includes a cleaning tank (6) that forms a space for the cleaning medium (5) to be blown, which includes an opening; a holding unit (3) that holds the article (4) at the opening; a pool member (19) that is arranged on an outer edge of the opening with a clearance between the pool member (19) and the article (4); and a cleaning-medium collecting unit (8) that brings the cleaning medium (5) leaked out of the outer edge and accumulated in the clearance back into the cleaning tank (6).

Abstract: A control method of a dishwasher is provided in which a filter is cleaned by controlling an operation of a washing pump. In this control method, washing fluid pumped by the washing pump back flows and is directed to the filter so as to remove foreign materials accumulated in the filter from the filter.

Abstract: A portable vacuum wand for use with a surface maintenance machine, for collection of debris remote from the machine. The vacuum wand is detachable from a rear squeegee assembly of the surface maintenance machine, and includes a handle and a wand head. A vacuum conduit of the vacuum wand is adapted to be coupled to the rear squeegee assembly when not in use so as to provide vacuum to the rear squeegee assembly. A method of cleaning a floor surface with a surface maintenance machine and a portable vacuum wand is also provided.

Abstract: An apparatus and method are disclosed in which a semiconductor substrate having a surface containing contaminants is cleaned or otherwise subjected to chemical treatment using a foam. The semiconductor wafer is supported either on a stiff support (or a layer of foam) and foam is provided on the opposite surface of the semiconductor wafer while the semiconductor wafer is supported. The foam contacting the semiconductor wafer is pressurized using a form to produce a jammed foam. Relative movement between the form and the semiconductor wafer. such as oscillation parallel and/or perpendicular to the top surface of the semiconductor wafer. is then induced while the jammed foam is in contact with the semiconductor wafer to remove the undesired contaminants and/or otherwise chemically treat the surface of the semiconductor wafer using the foam.

Abstract: A method for cleaning casino chips includes the step of providing a chip-cleaning system having an ultrasonic cleaning station with ultrasonic cleaning means. The method proceeds by taking a batch of chips to be cleaned out of service and cleaning the batch of chips at the ultrasonic cleaning station with the ultrasonic cleaning means. Preferably, the chip-cleaning system also includes a rinsing station, a coating station, and a drying station, and the method further comprises rinsing the batch of chips at the rinsing station, coating the batch of chips at the coating station, and drying the batch of chips at the drying station. A preferred chip-cleaning system includes a console with four tanks providing the above features, together with two foldable table-top extensions providing a chip staging area wing and a chip re-stacking area wing, and a counterbalancing arm for assisting an operator move the batch of chips between stations.

Abstract: A device for cleaning and storing a mouthguard, including two main chambers shaped for receiving and holding a mouthguard. One of the main chambers has a sealable lid for retaining disinfecting liquid and the other main chamber has vents to allow water to drain away, and to allow air flow for drying the mouthguard.

Abstract: A cleaning sheet including a cleaning layer which has a microasperity shape having an arithmetic average roughness Ra of 0.05 ?m or less and a maximum height Rz of 1.0 ?m or less. Preferably, a substantial surface area of the cleaning layer per a flat surface of 1 mm2 is 150% or more of a substantial surface area of a silicon wafer mirror surface per a flat area of 1 mm2. The cleaning sheet may be provided on at least one surface of a transfer member so that the transfer member has a cleaning function. When the cleaning sheet or the transfer member having a cleaning function is transferred in a substrate processing apparatus in place of a substrate to be processed therein, the cleaning sheet contacts and cleans a site of the substrate processing apparatus.