Abstract: A semiconductor device with large memory capacity is provided. A semiconductor device includes first to fourth insulators, a first conductor, a second conductor, and a first semiconductor, and the first semiconductor includes a first surface and a second surface. A first side surface of the first conductor is included on the first surface of the first semiconductor, and a first side surface of the first insulator is included on a second side surface of the first conductor. The second insulator is included in a region including a second side surface and a top surface of the first insulator, a top surface of the first conductor, and the second surface of the first semiconductor. The third insulator is included on a formation surface of the second insulator, and the fourth insulator is included on a formation surface of the third insulator. The second conductor is included in a region overlapping the second surface of the first semiconductor in a region where the fourth insulator is formed.

Abstract: A semiconductor device includes conductive pillars on a semiconductor substrate, a first support pattern that contacts first portions of lateral surfaces of the conductive pillars and connects the conductive pillars to each other, the first support pattern including first support holes that expose second portions of the lateral surfaces of the conductive pillars, a capping conductive pattern that contacts the second portions of the lateral surfaces of the conductive pillars and exposes the first support pattern, the second portions of the lateral surfaces of the conductive pillars being in no contact with the first support pattern, and a dielectric layer that covers the first support pattern and the capping conductive pattern, the dielectric layer being spaced apart from the conductive pillars.

Abstract: An active region has first and second cell regions respectively disposed in a main IGBT and a sensing IGBT. The second cell region has a detecting region in which the sensing IGBT is disposed and an extracting region that surrounds a periphery of the detecting region. A resistance region containing polysilicon and connected to the sensing IGBT is provided on the semiconductor substrate, in the extracting region. The resistance region connected to the sensing IGBT has a first portion connected to the gate electrodes of the sensing IGBT and a second portion connecting the first portion to the gate runner, and configures a built-in resistance of the second portion having a resistance value in a range from 10? to 5000?. As a result, a trade-off relationship between enhancing ESD tolerance of a current sensing region that includes the sensing IGBT and reducing transient sensing voltage may be improved.

Abstract: Wafers including a diamond layer and a semiconductor layer having III-Nitride compounds and methods for fabricating the wafers are provided. A nucleation layer, at least one semiconductor layer having III-Nitride compound and a protection layer are formed on a silicon substrate. Then, a silicon carrier wafer is glass bonded to the protection layer. Subsequently the silicon substrate, nucleation layer and a portion of the semiconductor layer are removed. Then, an intermediate layer, a seed layer and a first diamond layer are sequentially deposited on the III-Nitride layer. Next, the silicon carrier wafer and the protection layer are removed. Then, a silicon substrate wafer that includes a protection layer, silicon substrate and a diamond layer is prepared and glass bonded to the first diamond layer.

Abstract: An apparatus is provided which comprises: a first set of one or more metal pads on a first substrate surface, the first set of one or more metal pads to couple with contacts of an integrated circuit die, a second set of one or more metal pads on the first substrate surface, the second set of one or more metal pads to couple with semiconductor surfaces of the integrated circuit die, one or more thermal regions below the first substrate surface, wherein the one or more thermal regions comprise thermally conductive material and are coupled with the second set of one or more metal pads, dielectric material adjacent the one or more thermal regions, and one or more conductive contacts on a second substrate surface, opposite the first substrate surface, the one or more conductive contacts coupled with the first set of one or more metal pads, and the one or more conductive contacts to couple with contacts of a printed circuit board. Other embodiments are also disclosed and claimed.

Abstract: A vertical-type nonvolatile memory device including: a substrate including a cell array area and an extension area, the extension area extending in a first direction from the cell array area and including contacts; a channel structure extending in a vertical direction from the substrate; a first stack structure including gate electrode layers and interlayer insulating layers alternately stacked along sidewalls of the channel structure; a plurality of division areas extending in the first direction and dividing the cell array area and the extension area in a second direction perpendicular to the first direction; in the extension area, two insulating layer dams are arranged between two division areas adjacent to each other; a second stack structure including sacrificial layers and interlayer insulating layers alternately stacked on the substrate between the two insulating layer dams; and an electrode pad connected to a first gate electrode layer in the extension area.

Abstract: Methods and architectures for forming metal line plugs that define separations between two metal line ends, and for forming vias that interconnect the metal lines to an underlying contact. The line plugs are present in-plane with the metal lines while vias connecting the lines are in an underlying plane. One lithographic plate or reticle that prints lines at a given pitch (P) may be employed multiple times, for example each time with a pitch halving (P/2), or pitch quartering (P/4) patterning technique, to define both metal line ends and metal line vias. A one-dimensional (1D) grating mask may be employed in conjunction with cross-grating (orthogonal) masking structures that are likewise amenable to pitch splitting techniques.

Abstract: A manufacturing method of a low temperature poly-silicon (LTPS) array substrate is described. The LTPS array substrate includes a metal light-shielding layer, a buffer layer, a polycrystalline silicon layer, a gate insulating and interlayer insulating layer, a gate line layer, and a source and drain electrode layer. The method adopts a one-time chemical vapor deposition process to form a gate insulator and interlayer insulating layer. A gate line trench is formed in the gate insulating layer and the interlayer insulating layer, thereby reducing the thickness of the LTPS array substrate film layer and the process steps.

Abstract: A semiconductor structure includes a substrate, at least one first gate structure, at least one first spacer, at least one source drain structure, at least one conductor, and at least one protection layer. The first gate structure is present on the substrate. The first spacer is present on at least one sidewall of the first gate structure. The source drain structure is present adjacent to the first spacer. The conductor is electrically connected to the source drain structure. The protection layer is present between the conductor and the first spacer and on a top surface of the first gate structure.

Abstract: A semiconductor device package includes a redistribution layer, a plurality of conductive pillars, a reinforcing layer and an encapsulant. The conductive pillars are in direct contact with the first redistribution layer. The reinforcing layer surrounds a lateral surface of the conductive pillars. The encapsulant encapsulates the first redistribution layer and the reinforcing layer. The conductive pillars are separated from each other by the reinforcing layer.

Abstract: An integrated circuit device includes: a substrate including active regions; a device isolation film defining the active regions; a word line arranged over the active regions and the device isolation film and extending in a first horizontal direction; and a gate dielectric film arranged between the substrate and the word line and between the device isolation film and the word line, in which, in a second horizontal direction orthogonal to the first horizontal direction, a width of a second portion of the word line over the device isolation film is greater than a width of a first portion of the word line over the active regions. To manufacture the integrated circuit device, an impurity region is formed in the substrate and the device isolation film by implanting dopant ions into the substrate and the device isolation film, and a thickness of a portion of the impurity region is reduced.

Abstract: A semiconductor package includes a first integrated circuit structure, a first encapsulation material laterally encapsulating the first integrated circuit structure, a first redistribution structure, a solder layer, a second integrated circuit structure, a second encapsulation material second laterally encapsulating the second integrated circuit structure and a second redistribution structure. The first integrated circuit structure includes a first metallization layer. The first redistribution structure is disposed over the first integrated circuit structure and first encapsulation material. The first metallization layer faces away from the first redistribution structure and thermally coupled to the first redistribution structure. The solder layer is dispose over the first redistribution structure. The second integrated circuit structure is disposed on the first redistribution structure and includes a second metallization layer in contact with the solder layer.

Abstract: A semiconductor device includes a landing pad on a substrate, a lower electrode on the landing pad, the lower electrode being electrically connected to the landing pad, a dielectric layer on the lower electrode, the dielectric layer extending along a profile of the lower electrode, an upper electrode on the dielectric layer, and an upper plate electrode on the upper electrode and including first fluorine (F) therein, wherein the upper plate electrode includes an interface facing the upper electrode, and wherein the upper plate electrode includes a portion in which a concentration of the first fluorine decreases as a distance from the interface of the upper plate electrode increases.

Abstract: A semiconductor package includes a buffer, a chip stack mounted on the buffer, an adhesive layer disposed between the buffer and the chip stack, and a molding material surrounding the chip stack. The buffer includes a plurality of trenches disposed adjacent to a plurality of edges of the buffer. Each of the trenches is shorter than a corresponding adjacent edge of a chip area of the buffer.

Abstract: A semiconductor device is provided. The semiconductor device includes a substrate a bit line structure disposed on the substrate, a trench adjacent to at least one side of the bit line structure, a storage contact structure disposed within the trench, and comprising a storage contact, a silicide layer, and a storage pad which are stacked sequentially. A spacer structure is disposed between the bit line structure and the storage contact structure.

Abstract: A semiconductor device package includes a first semiconductor device; a second semiconductor device; and a first redistribution layer disposed on the first semiconductor device and having a side wall defining an opening that exposes the first semiconductor device. The side wall of the first redistribution layer has an average surface roughness (Ra) in a range up to 2 micrometers (?m).

Abstract: A package structure includes a first die, a second die, an insulation structure, a through via, a dielectric layer and a redistribution layer. The second die is electrically bonded to the first die. The insulation structure is disposed on the first die and laterally surrounds the second die. The through via penetrates through the insulation structure to electrically connect to the first die. The through via includes a first barrier layer and a conductive post on the first barrier layer. The dielectric layer is on the second die and the insulation structure. The redistribution layer is embedded in the dielectric layer and electrically connected to the through via. The redistribution layer includes a second barrier layer and a conductive layer on the second barrier layer. The conductive layer of the redistribution layer is in contact with the conductive post of the through via.

Abstract: A semiconductor device includes a memory cell storing data. The memory cell capacitor includes a plurality of bottom electrodes on a substrate and extending in a vertical direction with respect to a top surface of the substrate, the plurality of bottom electrodes being spaced apart from each other in a first direction parallel to the top surface of the substrate, an upper support pattern on upper lateral surfaces of the plurality of bottom electrodes, and a lower support pattern on lower lateral surfaces of the plurality of bottom electrodes. The lower support pattern is disposed between the substrate and the upper support pattern, and a first bottom electrode of the plurality of bottom electrodes includes a first recess adjacent to a bottom surface of the lower support pattern.