Patents Examined by Toan Ton
  • Patent number: 10379429
    Abstract: A method and apparatus for mounting a projector holder to or placing a projector holder on an object for displaying an image onto a surface is disclosed. The projector holder includes a body within which a projector is at least partially disposed. The body includes one or more pliable appendages that are adapted to be manipulated and deformed from a first configuration to a second configuration. In some embodiments, the body is formed in the shape of an animal.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: August 13, 2019
    Assignee: Mimono LLC
    Inventor: Joseph Christian Rossell
  • Patent number: 10187621
    Abstract: Implementations described herein generally relate to scanning beam display systems and more specifically, to systems and methods for improved image alignment of such scanning beam display systems. The method comprises providing a display system comprising a display screen having a plurality of display screen region each with a corresponding light engine module having a servo laser beam and an excitation laser beam, scanning the servo laser beam of a light engine module in an outer scanning region outside of the light engine module's corresponding display screen region, detecting servo laser beam feedback light to measure an alignment error of the light engine module relative to the light engine module's corresponding display screen region, and adjusting alignment of the excitation laser beam based on the measured alignment error.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: January 22, 2019
    Assignee: PRYSM, INC.
    Inventor: Roger A. Hajjar
  • Patent number: 10180575
    Abstract: An image display apparatus includes a projection unit configured to project an image and a plurality of concave reflectors in which contact surfaces with optical axes of the concave reflectors with respect to the optical axis of the projection unit are disposed at different angles from one another. A first concave reflector of the plurality of concave reflectors reflects at least a portion of an image projected by the projection unit to form a first image based on the image. A second concave reflector of the plurality of concave reflectors transmits a portion of an image projected by the projection unit and reflects a portion of the image to form a second image based on the image.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: January 15, 2019
    Assignees: HONDA MOTOR CO., LTD., TOHOKU UNIVERSITY
    Inventors: Tohru Kawakami, Mutsumi Sasai, Yoshito Suzuki, Toshiyuki Araki, Masaru Ohira
  • Patent number: 10168609
    Abstract: A first holding member holds a first optical system and a first mirror, and has a first junction surface. A second holding member holds a second optical system and a second mirror, and has a second junction surface. A junction portion is configured such that, in a state where the first junction surface and the second junction surface are aligned with each other, the second holding member is capable of being shifted in a direction of both the junction surfaces and rotated around an optical axis, and makes it possible to perform optical axis alignment. An emission-side optical axis of the first optical system and an incidence-side optical axis of the second optical system are aligned with each other, and thus a U-shaped optical path is formed by the first and second optical systems.
    Type: Grant
    Filed: March 28, 2018
    Date of Patent: January 1, 2019
    Assignee: FUJIFILM Corporation
    Inventor: Yasuto Kuroda
  • Patent number: 10146118
    Abstract: A first illumination device includes a light source that emits light having directivity, and a uniform illumination optical system including a first fly-eye lens that includes a plurality of lenses two-dimensionally arranged and allows light based on emitted light from the light source to pass through the first fly-eye lens. An illumination target region has a planar shape having a side extending along a direction substantially parallel to a long-axis direction or a short-axis direction of an intensity distribution shape of emitted light from the light source, and a periodic direction of an array of the lenses in the first fly-eye lens is inclined with respect to the long-axis direction or the short-axis direction.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: December 4, 2018
    Assignee: Sony Corporation
    Inventor: Koji Miura
  • Patent number: 10133163
    Abstract: A light source unit, includes: a semiconductor laser device that emits laser light; a wheel substrate that has a light entering surface and a light exiting surface, and includes one or more phosphor-containing regions each contains one or more kinds of phosphor converts the laser light into light having a wavelength different from a wavelength of the laser light; a motor that faces the light entering surface of the wheel substrate, wherein the motor has a rotational shaft that supports a center of the wheel substrate, and is configured to rotate the wheel substrate; and a condensing optical system that faces the light exiting surface of the wheel substrate, and condenses light that has exited from the light exiting surface of the wheel substrate, the condensing optical system comprising a lens having an optical axis that substantially coincides with a reference axis of the light that has exited from the light exiting surface of the wheel substrate, wherein the lens is sized to cover the center of the wheel su
    Type: Grant
    Filed: July 31, 2014
    Date of Patent: November 20, 2018
    Assignee: NICHIA CORPORATION
    Inventor: Seiji Nagahara
  • Patent number: 10126638
    Abstract: A projector with inbuilt heat-dispersing properties includes a shell, an illuminating device mounted in the shell, and a cooling module mounted in the shell. The cooling module includes two heat conducting members in close contact with the illuminating device, and a heat insulator in close contact with the bottom end of the shell. Heat generated from the illuminating device is transmitted to the heat conducting member, the heat transmitted to the heat conducting member is transmitted to the bottom end of the shell and the heat is uniformly dispersed on the bottom end of the shell. The heat transmitted to the shell is uniformly transmitted to the heat insulator to be discharged from the projector.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: November 13, 2018
    Assignees: HONG FU JIN PRECISION INDUSTRY (WuHan) CO., LTD., HON HAI PRECISION INDUSTRY CO., LTD.
    Inventor: Chin-Wen Yeh
  • Patent number: 10101644
    Abstract: An illumination system includes a light source assembly including a first excitation light source, a second excitation light source, a dichroic element, a wavelength conversion element, a first collimating element and a second collimating element. The first and second excitation light sources provide first and second excitation beams, respectively. The dichroic element is disposed between the first excitation light source and the second excitation light source. The second excitation beam is transmitted toward the first excitation light source through the dichroic element. The wavelength conversion element is disposed between the first excitation light source and the dichroic element. The wavelength conversion element converts the first and second excitation beams into a wavelength conversion beam and transmits it toward the dichroic element.
    Type: Grant
    Filed: June 7, 2016
    Date of Patent: October 16, 2018
    Assignee: Coretronic Corporation
    Inventors: Chuan-Te Cheng, Meng-Hsuan Lin
  • Patent number: 9740014
    Abstract: A projection display apparatus includes: a laser light source which emits a blue light; a wheel which includes a light emitting body provided on a reflection surface of a substrate, the light emitting body emitting an emission light when the emitting body is irradiated with the blue light; a bandpass filter which is disposed on an optical path on which the emission light of the light emitting body travels; a plurality of optical modulating elements which modulate the blue light and the emission light from the light emitting body; and a projection unit which projects the light modulated by the plurality of optical modulating elements. The bandpass filter allows transmission of part of lights whose wavelength bands are 560 nm to 590 nm in the emission light of the light emitting body, and reflects other lights.
    Type: Grant
    Filed: January 22, 2016
    Date of Patent: August 22, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventor: Michihiro Okuda
  • Patent number: 9715183
    Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: July 25, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling
  • Patent number: 9690180
    Abstract: A prism group including a first, a second, and a third prisms is provided. The first prism has a first light incidence surface, a first light emitting surface, and a first connecting surface. The second prism has a second light incidence surface, a second light emitting surface, and a second connecting surface. The second light incidence surface is located between the first light emitting surface and the second light emitting surface. A first air gap is between the second light incidence surface and the first light emitting surface. The third prism has a third light incidence surface, a third light emitting surface, and a third connecting surface. The third light incidence surface is located between the second light emitting surface and the third light emitting surface. A second air gap is between the third light incidence surface and the second light emitting surface. A projection apparatus is also provided.
    Type: Grant
    Filed: July 3, 2015
    Date of Patent: June 27, 2017
    Assignee: National Chiao Tung University
    Inventors: Jui-Wen Pan, Yung-Chih Huang, Ping-Chun Lin, Che-Wen Chiang
  • Patent number: 9664900
    Abstract: A projection apparatus including a micro-electro-mechanical system (MEMS) mirror module and a control unit is provided. The MEMS mirror module drives an image beam to scan along a first direction and a second direction on an imaging region. The control unit is electrically connected to the MEMS mirror module and outputs a driving signal with a corresponding pulse width according to a projection position of the image beam in the second direction of the imaging region. A projection method is also provided.
    Type: Grant
    Filed: January 12, 2015
    Date of Patent: May 30, 2017
    Assignees: LITE-ON ELECTRONICS (GUANGZHOU) LIMITED, Lite-On Technology Corporation
    Inventors: Wen-Lung Lin, Chia-Hao Hsu, De-Jian Ou
  • Patent number: 9575421
    Abstract: An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.
    Type: Grant
    Filed: April 22, 2015
    Date of Patent: February 21, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Myung-soo Hwang, Joo-on Park, Chang-min Park
  • Patent number: 9575416
    Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.
    Type: Grant
    Filed: August 2, 2013
    Date of Patent: February 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Ruud Antonius Catharina Maria Beerens, Martinus Agnes Willem Cuijpers, Christiaan Alexander Hoogendam, Fransiscus Mathijs Jacobs, Willem Herman Gertruda Anna Koenen, Erik Roelof Loopstra
  • Patent number: 9568840
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: December 1, 2015
    Date of Patent: February 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • Patent number: 9568729
    Abstract: The present invention provides an optical apparatus for deforming a reflecting surface of a mirror, comprising a base plate, a plurality of first actuators each configured to apply a force to the surface opposite to the reflecting surface, a plurality of second actuators each having rigidity lower than that of the first actuator, and configured to apply a force to the surface opposite to the reflecting surface, a sensor configured to detect information indicating a driving status of each of the plurality of first actuators, and a control unit configured to control, based on an output of the sensor, driving of each of the plurality of first actuators and driving of each of the plurality of second actuators so that a shape of the reflecting surface is changed to a target shape.
    Type: Grant
    Filed: September 22, 2014
    Date of Patent: February 14, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Choshoku Sai, Kohei Imoto
  • Patent number: 9568832
    Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.
    Type: Grant
    Filed: May 16, 2016
    Date of Patent: February 14, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Patent number: 9563132
    Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: February 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: David Bessems, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Rogier Hendrikus Magdalena Cortie, Adrianes Johannes Baeten, Cornelius Maria Rops
  • Patent number: 9550326
    Abstract: Stereolithography machine (1) comprising: a container (2) for a fluid substance (14); a source (3) of predefined radiation (3a) suited to solidify the fluid substance (14); an optical unit (4) suited to direct the radiation (3a) towards a reference surface (5) in the fluid substance (14); a logic control unit (6) configured to control the optical unit (4) and/or the source (3) so as to expose a predefined portion of the reference surface (5). The optical unit (4) comprises a micro-opto-electro-mechanical system (MOEMS) (7) provided with a mirror (8) associated with actuator means (7a) for the rotation around at least two rotation axes (X, Y) incident on and independent of each other, arranged so that it can direct the radiation (3a) towards each point of the reference surface (5) through a corresponding combination of the rotations around the two axes (X, Y).
    Type: Grant
    Filed: December 24, 2012
    Date of Patent: January 24, 2017
    Inventor: Ettore Maurizio Costabeber
  • Patent number: 9529281
    Abstract: A mask-mounting apparatus for an exposure machine, which comprises: a mask frame (8) for securing a mask (9); a gas cell (6, 7) provided beneath the mask frame (8), for supporting the mask frame (8); and a gas-supply unit communicating through a gas-supply pipeline with the gas cell (6, 7); the gas-supply pipeline is provided thereon with a pneumatic switch valve (10, 11). In the event of interruption of supply from the gas-supply unit, the pneumatic switch valve shuts off the gas-supply pipeline to prevent the gas cell from being deflated. With provision of a pneumatic switch valve on the gas-supply pipeline connected with the gas cell, it can be achieved that, after an interruption of the supply from the gas-supply unit, the pneumatic switch valve automatically switches to a non-energized state, thus sealing the gas in the gas cell, and avoiding the detachment of the mask frame caused by deflation of the gas cell.
    Type: Grant
    Filed: April 28, 2013
    Date of Patent: December 27, 2016
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Run Chen, Jintao Xiao, Zhenyuan Zhou