Abstract: A projection display apparatus includes: a laser light source which emits a blue light; a wheel which includes a light emitting body provided on a reflection surface of a substrate, the light emitting body emitting an emission light when the emitting body is irradiated with the blue light; a bandpass filter which is disposed on an optical path on which the emission light of the light emitting body travels; a plurality of optical modulating elements which modulate the blue light and the emission light from the light emitting body; and a projection unit which projects the light modulated by the plurality of optical modulating elements. The bandpass filter allows transmission of part of lights whose wavelength bands are 560 nm to 590 nm in the emission light of the light emitting body, and reflects other lights.

Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.

Abstract: A prism group including a first, a second, and a third prisms is provided. The first prism has a first light incidence surface, a first light emitting surface, and a first connecting surface. The second prism has a second light incidence surface, a second light emitting surface, and a second connecting surface. The second light incidence surface is located between the first light emitting surface and the second light emitting surface. A first air gap is between the second light incidence surface and the first light emitting surface. The third prism has a third light incidence surface, a third light emitting surface, and a third connecting surface. The third light incidence surface is located between the second light emitting surface and the third light emitting surface. A second air gap is between the third light incidence surface and the second light emitting surface. A projection apparatus is also provided.

Abstract: A projection apparatus including a micro-electro-mechanical system (MEMS) mirror module and a control unit is provided. The MEMS mirror module drives an image beam to scan along a first direction and a second direction on an imaging region. The control unit is electrically connected to the MEMS mirror module and outputs a driving signal with a corresponding pulse width according to a projection position of the image beam in the second direction of the imaging region. A projection method is also provided.

Abstract: An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle.

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract: An imaging optical system for a projection exposure system has at least one anamorphically imaging optical element. This allows a complete illumination of an image field in a first direction with a large object-side numerical aperture in this direction, without the extent of the reticle to be imaged having to be enlarged and without a reduction in the throughput of the projection exposure system occurring.

Abstract: The present invention provides an optical apparatus for deforming a reflecting surface of a mirror, comprising a base plate, a plurality of first actuators each configured to apply a force to the surface opposite to the reflecting surface, a plurality of second actuators each having rigidity lower than that of the first actuator, and configured to apply a force to the surface opposite to the reflecting surface, a sensor configured to detect information indicating a driving status of each of the plurality of first actuators, and a control unit configured to control, based on an output of the sensor, driving of each of the plurality of first actuators and driving of each of the plurality of second actuators so that a shape of the reflecting surface is changed to a target shape.

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening at least partly surrounding and radially outward of the meniscus pinning feature; and optionally a gas recovery opening radially outward of the gas supply opening, wherein the gas supply opening, or the gas recovery opening, or both the gas supply opening and the gas recovery opening, has an open area per meter length which has a variation peripherally around the space.

Abstract: Stereolithography machine (1) comprising: a container (2) for a fluid substance (14); a source (3) of predefined radiation (3a) suited to solidify the fluid substance (14); an optical unit (4) suited to direct the radiation (3a) towards a reference surface (5) in the fluid substance (14); a logic control unit (6) configured to control the optical unit (4) and/or the source (3) so as to expose a predefined portion of the reference surface (5). The optical unit (4) comprises a micro-opto-electro-mechanical system (MOEMS) (7) provided with a mirror (8) associated with actuator means (7a) for the rotation around at least two rotation axes (X, Y) incident on and independent of each other, arranged so that it can direct the radiation (3a) towards each point of the reference surface (5) through a corresponding combination of the rotations around the two axes (X, Y).

Abstract: A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data.

Abstract: A mask-mounting apparatus for an exposure machine, which comprises: a mask frame (8) for securing a mask (9); a gas cell (6, 7) provided beneath the mask frame (8), for supporting the mask frame (8); and a gas-supply unit communicating through a gas-supply pipeline with the gas cell (6, 7); the gas-supply pipeline is provided thereon with a pneumatic switch valve (10, 11). In the event of interruption of supply from the gas-supply unit, the pneumatic switch valve shuts off the gas-supply pipeline to prevent the gas cell from being deflated. With provision of a pneumatic switch valve on the gas-supply pipeline connected with the gas cell, it can be achieved that, after an interruption of the supply from the gas-supply unit, the pneumatic switch valve automatically switches to a non-energized state, thus sealing the gas in the gas cell, and avoiding the detachment of the mask frame caused by deflation of the gas cell.

Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.

Abstract: A system and method to perform image acquisition of a subject is provided. The system includes a mobile device to move an imaging system across a floor, and a brake system that restrains movement of the mobile device. A controller includes a memory having program instructions to instruct a processor to perform the steps of: instructing movement of the mobile device in support of the imaging system to a first position for image acquisition of the subject; receiving feedback that the mobile device is located at the first position; and applying a brake force to restrain movement of the mobile device. The step of applying the brake force includes generating a vacuum in restraint of movement of the mobile device with respect to the floor.

Abstract: According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam bac

Abstract: A two-beam interference apparatus may include a wafer stage on which a wafer may be set, a beam splitter to split first laser light into second and third laser light having a beam intensity distribution elongated in a first direction within a surface of the wafer, and an optical system to guide the second and third laser light onto the wafer. The wafer is irradiated with the second laser light from a second direction perpendicular to the first direction, and the third laser light from a third direction perpendicular to the first direction but different from the second direction, to thereby cause interference of the second and third laser light on the wafer. This apparatus increases the accuracy of the two-beam interference exposure.

Abstract: An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.

Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.

Abstract: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.