Abstract: A method for operating a projection exposure tool for microlithography is provided. The projection exposure tool includes an optical system which includes a number of optical elements which, during an imaging process, convey electromagnetic radiation. All of the surfaces of the optical elements interact with the electromagnetic radiation during the imaging process to form an overall optical surface of the optical system.

Abstract: A substrate is transported between a first space and a second space, which are separated by a partition wall, through an opening portion formed in the partition wall. A transport apparatus includes a support device having a support portion which supports the substrate, the support device being provided so as to block the opening portion while a clearance between the partition wall and the support device is formed, the support device moving the support portion from a state where the support portion faces the first space to a state where the support portion faces the second space; and an adjustment device which adjusts an amount of the clearance, thereby suppressing the movement of fluid from the first space to the second space.

Abstract: The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing light-transmitting layer and an objective temperature balancing control unit, wherein the temperature sensor is disposed adjacent to the projection objective for sensing the temperature difference of the projection objective in different areas; the heat-absorbing light-transmitting layer is positioned below the projection objective for absorbing radiation energy in the laser beams transmitted from the lithography machine and transmitting the laser beams; and the objective temperature balancing control unit is used for controlling the absorption degree and light transmission degree of the heat-absorbing light-transmitting layer according to the temperature difference sensed by the temperature sensor. The invention also discloses a method for balancing temperature of a projection objective of a lithography machine.

Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.

Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.

Abstract: The present invention relates to projection films and methods of making the same. In particular, the present invention relates to a projection film whereby the microspheres exhibit improved alignment on the light exit surface and have alignment on the light entrance surface that varies according to the individual microsphere diameter. In another embodiment, the present invention relates to a projection film that has the attributes of variable gain within the single projection film. In another embodiment, the present invention relates to an exposed microsphere projection film construction that provides modification of the head-on and angular pattern of light transmission (gain).

Abstract: An embodiment of the present invention provides a fly eye lens which is applied to a proximity exposure machine optical system. The fly lens includes a first lens assembly and a second lens assembly, wherein the first lens assembly includes a plurality of lenses which form a first lens face, and the second lens assembly includes a plurality of lenses which form a second lens face. The first lens face is used to split an incident broad light beam into narrow light beams and then refract the narrow light beams onto the second lens face, and the second lens face is used to dispersively refract the received narrow light beams onto a concave mirror in the optical system. A lens closer to a center of the second lens face has a higher transmittivity, and a lens farther from the center of the second lens face has a lower transmittivity.

Abstract: The disclosure relates to an optical system, such as an illumination system or a projection objective of a microlithographic projection exposure apparatus, including such an optical system having a polarization-influencing optical arrangement which permits enhanced flexibility in affording a desired polarization distribution.

Abstract: An illumination system disposed in a projection apparatus includes a solid-state light source group, a cooling module, and an ion fan. The cooling module is thermally coupled to the solid-state light source group. The cooling module is located on a path of a forced convection air generated by the ion fan. The projection apparatus avails prolonging a life time of the illumination system, and the ion fan does not have a magnetic shearing sound of a motor and a wind shearing sound of fan blades to avail reducing an operation noise of the illumination system.

Abstract: A movable support is configured to hold an exchangeable object. The support includes a movable structure movably arranged with respect to a reference object, an object holder movably arranged with respect to the movable structure and configured to hold the exchangeable object, an actuator configured to move the movable structure with respect to the reference object, and an ultra short stroke actuator configured to move the object holder with respect to the movable structure, wherein a stiffness of the ultra short stroke actuator is substantially larger than a stiffness of the at least one actuator.

Abstract: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

Abstract: A method of treating an object with radiation that includes generating volumetric image data of an area of interest of an object and emitting a therapeutic radiation beam towards the area of interest of the object in accordance with a reference plan. The method further includes evaluating the volumetric image data and at least one parameter of the therapeutic radiation beam to provide a real-time, on-line or off-line evaluation and on-line or off-line modification of the reference plan.

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Abstract: An illumination device includes: a light source section including a laser light source; a first uniformization optical member receiving light from the light source section; a second uniformization optical member receiving light from the first uniformization optical member; an optical device disposed on an optical path of outgoing light from the light source section; and a drive section vibrating the optical device.

Abstract: One pair each of a Y linear motor (a total of four) on the +X side and the ?X side that drive a reticle stage include one pair each of a stator section (a total of four) and three each of a mover section (a total of six) on the +X side and the ?X side. In this case, the three each of the mover sections on the +X side and the ?X side configure one each of a mover. The mover section located in the center in the Z-axis direction of each of the movers is used in common by each pair of the Y linear motors. Therefore, the weight of the mover section (reticle stage) of the reticle stage device is reduced, which allows a higher acceleration. Further, the mover section located in the center in the Z-axis direction of each of the movers coincides with a neutral plane of the reticle stage.

Abstract: A six group projection zoom lens downsized with broadened angle of view while aberrations are satisfactorily corrected over the entire zoom range, including a negative lens group having a negative power, a second lens group having a positive power, a third lens group having a positive power, a fourth lens group having a negative power, a fifth lens group having a positive power, and a sixth lens group having a positive power in this order from the magnification side and is configured telecentric on the reduction side. The first and sixth lens groups are fixed while the second to fifth lens groups are moved independently of each other at the time of zooming. The fifth lens group includes a plurality of lenses and a biconvex lens is disposed on the most magnification side. The projection zoom lens satisfies conditional expressions (1): (R51a+R51b)/(R51a?R51b)?0 and (2): 25.0<?d51<45.0.

Abstract: A portable projection and display system can include a frame assembly having one or more folding trusses, a counterweight bar arranged on a rearward bottom portion of the frame to help provide a stable base, and an adjustable boom. A projector can be mounted on one end of an adjustable boom. The boom can be configured to be capable of adjusting a distance between the projector and the display screen. The boom can be mounted to the frame with a hinged connection to permit it to act as a lever to raise and lower the projector. An adjustable boom bar can further be provided. The adjustable boom bar can be attached to an end of the boom opposite the projector such that adjustment of the boom bar raises and lowers the projector via a lever action about a fulcrum.

Abstract: An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.

Abstract: A cooktop-interface includes at least one display device, a display sign layer with at least one display sign provided in connection with the display device and back illumination lighting for projecting the display sign to the lower side of a cooktop-panel arranged upstream the back illumination lighting and the display sign layer.

Abstract: A processing apparatus of the present invention processes for a wafer. The processing apparatus includes an XY stage which includes a wafer chuck which holds the wafer and an elevating device which rises relative to the wafer chuck to hold the wafer, and a wafer conveying robot hand which conveys the wafer from the XY stage at a wafer transfer position. The XY stage moves to change a direction at an angle between degree and degree via the wafer transfer position in a state where the elevating device rises relative to the wafer chuck. The wafer conveying robot hand has a shape which does not interfere with the XY stage which moves to change the direction at the angle when the wafer conveying hand is positioned at the wafer transfer position.