Abstract: An apparatus, a method of designing the apparatus, a tool using the apparatus and a method of using the apparatus for optimizing optical photolithography during formation of integrated circuits. The apparatus includes: an asymmetrical complementary dipole element including: first and second openings being equidistant and minor images about a first axis, the first and second openings having essentially a same first area and a same first optical density relative to a selected wavelength of light; third and fourth openings being equidistant and minor images about a second axis, the third and fourth openings having essentially a same second area, and a same second optical density relative to the selected wavelength of light; and wherein the first axis is perpendicular to the second axis and the first and second optical densities are different.

Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.

Abstract: An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

Abstract: Methods and systems are provided for correcting artifacts in iterative reconstruction processes. In certain embodiments, weighting schemes may be applied such that less than all of the available scan or projection data is utilized in the iterative reconstruction. In this manner, inconsistencies in the data undergoing reconstruction may be reduced.

Abstract: An EUV radiation source comprising a fuel supply configured to deliver droplets of fuel to a plasma formation location, and a collector configured to collect EUV radiation emitted by a plasma at the plasma formation location, wherein the collector has a reflective surface that is a modified ellipsoid shape, the modified ellipsoid shape providing improved intensity uniformity of collected EUV radiation in the far field compared with a perfect ellipsoid shape.

Abstract: An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

Abstract: A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(?) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner ? or an outer ?.

Abstract: An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.

Abstract: In the present invention, a number of times the brightness changes detected at the same position while a substrate conveys are added up in the conveying direction, thereby obtaining a plurality of edge count data, and then, a plurality of positions of long sides of patterns parallel to the conveying direction is identified based on the plurality of edge count data exceeding a predetermined threshold value, middle point positions of a plurality of proximity pairs are calculated, and a middle point position close to the target position preset in the imaging device is selected from the plurality of middle point positions of the proximity pairs, an amount of position displacement between the selected middle point position and the target position of imaging device is calculated, and the photomask in the direction substantially perpendicular to the conveying direction so that the amount of position displacement is a predetermined value.

Abstract: A method and an system are disclosed for reconstructing an emission tomography image in a combined MR (magnetic resonance) and emission tomography imaging system. In at least one embodiment, the method includes obtaining an MR image of a subject, the subject being clipped in the MR image; obtaining raw emission tomography scan data of the subject; determining a missing part of the subject clipped in the MR image; using information of the MR image and the determined missing part to obtain a final attenuation model of the subject; and reconstructing the emission tomography image using the raw data and the final attenuation model.

Abstract: An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space and that supports a substrate. Furthermore, the invention is equipped with a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.

Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.

Abstract: The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.

Abstract: A method for the production of a mirror element (10) that has a reflective coating (10a) for the EUV wavelength range and a substrate (10b). The substrate (10b) is pre-compacted by hot isostatic pressing, and the reflective coating (10a) is applied to the pre-compacted substrate (10b). In the method, either the pre-compacting of the substrate (10b) is performed until a saturation value of the compaction of the substrate (10b) by long-term EUV irradiation is reached, or, for further compaction, the pre-compacted substrate (10b) is irradiated, preferably homogeneously, with ions (16) and/or with electrons in a surface region (15) in which the coating (10a) has been or will be applied. A mirror element (10) for the EUV wavelength range associated with the method has a substrate (10b) pre-compacted by hot isostatic pressing. Such a mirror element (10) is suitable to be provided in an EUV projection exposure system.

Abstract: There is provided an optical module for an objective. The optical module includes (a) a first holding device with an inner circumference, which extends in a first circumferential direction, (b) at least one first supporting device for supporting a first optical element and being fixed at said inner circumference of said first holding device, (c) an annular circumferential first assembly space being defined by displacing said first supporting device once in a revolving manner along said first circumferential direction, (d) at least one second supporting device being provided for supporting a second optical element and being fixed at said inner circumference of said first holding device, and (e) an annular circumferential second assembly space being defined by displacing said second supporting device once in a revolving manner along said first circumferential direction. The first assembly space intersects the second assembly space.

Abstract: An embodiment of the invention relates to a method and to a CT device for computer tomographic spiral scanning of a patient in the region of a moving organ, in particular a beating heart, wherein a pitch is adjusted which is less than the maximum pitch, with which 180° image data can still be reconstructed. In at least one embodiment, during the scan the evaluated detector data with respect to its z width and position on the at least one irradiated detector are restricted as a function of the projection angle in such a way that an effective virtual detector with smaller z width and with a z speed profile, which differs from the z speed profile of the real detector, is produced respectively, and the moving organ is reconstructed on the basis of the detector data of the at least one virtual detector.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: There is provided an immersion type lithographic apparatus. The immersion type lithographic apparatus is provided with at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate, and the apparatus is configured to move a substrate holder with respect to a projection system during the rinsing, such that the position of the immersion space changes with respect to the substrate holder during the rinsing.

Abstract: A substrate holder includes a base; a first holding portion which is formed on the base and which attracts and holds a substrate; and a second holding portion which is formed on the base and which attracts and holds a plate member in the vicinity of the substrate attracted and held by the first holding portion. In an exposure apparatus including such a substrate holder, the plate can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.

Abstract: A digital stereo imaging photosensitive device for a grating and a photosensitive material, includes: a photosensitive platform (8), connected with a base via a platform moving mechanism; a compressing mechanism (7) mounted on the photosensitive platform, wherein a grating (5) is positioned on the compressing mechanism; a LCD displayer (2) suspending above the photosensitive platform; and a lens suspending above the photosensitive platform via a lens moving mechanism, wherein the lens is under the LCD displayer. And a method for digital stereo projection is also provided.