Abstract: A method evaluating an imaging performance of a projection optical system according to a polarization state of light in a pupil of an illumination optical system for an exposure apparatus, comprises a representation step of numerically representing the polarization state in the pupil of the illumination optical system, an assumption step of virtually dividing the pupil of the illumination optical system into a plurality of partial regions, each of which includes a light incident region and a light non-incident region, and assuming individual polarization states for the plurality of partial regions so that one polarization state is assumed for the whole of each partial region based on the polarization state numerically represented in the representation step; and a calculation step of calculating the imaging performance of the projection optical system under a condition in which the plurality of partial regions have the polarization states individually assumed in the assumption step.

Abstract: In an immersion lithography apparatus, the immersion liquid is supplied and removed by a liquid supply system. The immersion lithography apparatus includes a resistivity sensor configured to monitor the electrical resistivity of the immersion liquid to monitor a potential contamination within the liquid supply system and may include a cleaner supply system configured to supply a cleaning fluid to the liquid supply system to clean at least the liquid supply system.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck configured to hold and position an object, for example, the patterning device onto the support or the substrate onto the substrate table, the chuck including a base and a constraining layer. A damping layer including a viscoelastic material is provided between the base and the constraining layer.

Abstract: A lithographic apparatus includes a support to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus includes a projection transfer measurement system to measure an optical projection transfer information of the projection system. The projection transfer measurement arrangement includes: an optical device to direct a measurement beam into the projection system during a scanning movement, a detector to detect the measurement beam having passed through the projection system during the scanning movement, and a measurement processor to determine the optical projection transfer information from the detected measurement beam.

Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

Abstract: A medical imaging device capable of determining the number of projections in which at least one point located above or at the level of the object support surface is present.

Abstract: A method of calibrating an inspection apparatus. Obtaining a surface level measurements (LS) at respective level sensing locations LS(x,y). Determining focus settings (LPA, LPB) for exposure field regions (EFA, EFB) in accordance with surface level measurements (LSA, LSB) having level sensing locations corresponding to the respective exposure field region. Exposing exposure field regions (EFA, EFB) with focus offsets (FO1, FO2) defined with reference to the respective focus settings (LPA, LPB) to produce target patterns at respective target locations. Obtaining focus-dependent property measurements, such as Critical Dimension (CD) and/or side wall angle (SWA) of the target patterns measured using the inspection apparatus; and calibrating the inspection apparatus using the focus-dependent property measurements (CD/SWA) and the respective focus offsets (FO1, FO2). The calibration uses surface level measurements (e.g., LSB(3)) having a level sensing location (e.g.

Abstract: A lithography method is proposed employing a projection exposure system having a catoptric imaging optics comprising a mirror formed as phase mask in the imaging beam path, wherein the mirror formed as phase mask exhibits continuous regions having dielectric layers provided thereon. Optionally, the regions of the mirror formed as phase mask are configured such that an axial extension of an image of a point (DOF) of the imaging is increased or/and a lateral extension of an image of a point of the imaging is decreased. Preferably multiple exposures of a same radiation sensitive substrate are performed in order to achieve an increase in resolution and scaling down of the manufacturing trace structures (61, 61?), respectively.

Abstract: There is provided a surface microstructure measurement method, a surface microstructure measurement data analysis method, and an X-ray scattering measurement device which can accurately measure a microstructure on a surface and which can evaluate a three-dimensional structural feature. In the surface microstructure measurement method, the specimen surface is irradiated with X-ray at a grazing incident angle and a scattering intensity is measured; a specimen model with a microstructure on a surface in which one or more layers is formed in a direction perpendicular to the surface and unit structures are periodically arranged in a direction parallel to the surface within the layers is assumed; a scattering intensity of X-ray scattered by the microstructure is calculated in consideration of effects of refraction and reflection caused by the layer; and the scattering intensity of X-ray calculated by the specimen model is fitted to the measured scattering intensity.

Abstract: A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.

Abstract: A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N>?2 successive sections A1 to AN of the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section Aj, j=1 . . . N and a second optical element is arranged in another section Ak, k=1 . . . N, the magnitude difference |k?j| being an odd number.

Abstract: An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.

Abstract: In order to improve the tiling workability in manufacturing an X-ray detector and provide a technology for acquiring high-quality reconstruction images, when aligning a plurality of detector blocks (or detector modules) in a slice direction, a distance between adjacent X-ray detection elements between detector blocks (inter-block distance) is not matched with a distance between adjacent detector elements within a detector block (intra-block distance). Instead, between reference positions when manufacturing each detector block, output values at the positions, the number of which is the same as the number of X-ray detection elements between the reference positions and which are spaced at equal intervals, are estimated from the acquired raw data. Projection data is generated from the position and the raw data.

Abstract: A controller uses two Z heads, which are positioned above a reflection surface installed on the ±X ends of the upper surface of a wafer table, to measure the height and tilt of the wafer table. The Z head to be used is switched according to XY positions of the wafer table. On the switching of the heads, the controller applies a coordinate linkage method to set an initial value of the Z head which is to be newly used. Accordingly, although the Z head to be used is sequentially switched according the XY position of the wafer table, measurement results of the height and the tilt of the wafer table are stored before and after the switching, and it becomes possible to drive the wafer table with high precision.

Abstract: A controller inclines a movable body with respect to an XY plane at an angle ? in a periodic direction of a grating, based on a measurement value of an interferometer which measures an angle of inclination of the movable body to the XY plane, and based on a measurement value of an encoder system and information of angle ? before and after the inclination, and computes an Abbe offset quantity of the grating surface with respect to a reference surface (e.g., an image plane of a projection optical system) which serves as a reference for position control of the movable body in the XY plane. Then, the controller drives the movable body, based on positional information of the movable body in the XY plane measured by the encoder system and a measurement error of the encoder system corresponding to an angle of inclination of the movable body to the XY plane due to the Abbe offset quantity of the grating surface.

Abstract: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.

Abstract: A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.

Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.

Abstract: Smoothing processing appropriate for a subject is performed and a CT image in which artifacts are reduced is acquired. At least a part of the X-ray detecting data 171 and the projection data 174 is used to generate boundary data 175, and at least one of the X-ray detecting data and the projection data is subjected to smoothing processing, by using the boundary data as a threshold. With this configuration, it is possible to perform smoothing processing by using as the threshold, the boundary data generated from the X-ray detecting data that passed through the subject or its projection data, enabling the smoothing processing adapted to the subject, and accordingly, the artifacts are removed while suppressing deterioration of spatial resolution.