Abstract: A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.

Abstract: A servo control system to control a position of an object supported by a movable support includes a first measurement system to measure a position of the movable support, a comparative device to provide an error signal based on the comparison between a measured movable support position and a desired movable support position, a controller unit to provide a control signal based on the error signal, and an actuator configured to actuate the movable support based on the control signal. The servo control system further includes a slip compensation device to compensate a slip between the object and the movable support, the slip compensation device including a second measurement system to measure an object position with respect to the movable support, and an addition device to add a slip compensation signal to the measured movable support position or the error signal based on the measured object position.

Abstract: A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.

Abstract: A method for aligning a radiation source with a portable image receiver in a radiographic imaging system generates a magnetic field with a predetermined field pattern and with a time-varying vector direction at a predetermined frequency from an emitter apparatus that is coupled to the radiation source, wherein the generated magnetic field further comprises a synchronization signal. Sensed signals from the magnetic field are obtained from a sensing apparatus that is coupled to the image receiver, wherein the sensing apparatus comprises three or more sensor elements, wherein at least two of the sensor elements are arranged at different angles relative to each other and are disposed outside the imaging area of the image receiver. An output signal is indicative of an alignment adjustment according to the amplitude and phase of the obtained sensed signals relative to the synchronization signal.

Abstract: Tomosynthesis data may be acquired from an ionizing radiation source that substantially continuously emits radiation while its position is varied relative to a photon counting detector. The detector detects photons comprised within the radiation and photon data indicative of the detected photons is generated. The photon data may comprise data related to a detected photon's detection time, detection location on the detector, energy level, and/or trajectory from the radiation source, for example. The photon data of various photons may be compiled into a plurality of bins and, through reconstruction and tomosynthesis techniques, produce synthesized images of various tomography planes of an object under examination. In this way, the tomosynthesis techniques rely on counting photons rather than measuring their energy to create synthesized images.

Abstract: At least one embodiment of the invention relates to a method for the reconstruction of image data from an examined object, using measuring data, wherein the measuring data were first recorded during a relative movement between a radiation source on a computer tomography system and the examined object. In at least one embodiment, the image reconstruction is based on a back projection of the filtered measuring data. During the back projection, a back projection weight that depends on the respective image point is used and the power with which the back projection weight is used is selectable.

Abstract: A plurality of heads configuring an encoder system is arranged on a wafer table, and positional information of a wafer table in the XY plane is measured, based on an output of a head opposed to a scale plate (diffraction grating). And, a relative position (including relative attitude and rotation) of each head with the wafer table is measured herein by a measurement system arranged inside the head. Accordingly, by correcting the positional information based on the information of the relative position which has been measured, a highly precise measurement of the positional information of the wafer table becomes possible even in the case when the position (attitude, rotation) of the head changes with the movement of the wafer table.

Abstract: An immersion lithographic apparatus is disclosed that includes a detector to measure a distance between a substrate support structure and/or a substrate and a fluid handling system and/or to detect when an item is present between the fluid handling system and a top surface of the substrate and/or substrate support structure. The detector may use information of an electrical property of the fluid provided by the fluid handling system to measure the distance. The detector may measure variation in resistance and/or in capacitance between an electrode of the fluid handling system and an electrode of the substrate and/or substrate support structure.

Abstract: An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.

Abstract: Example methods, apparatus and articles of manufacture to track endocardial motion are disclosed. A disclosed example method includes segmenting a plurality of cardiac images of a left ventricle to form respective ones of a plurality of segmented images, updating a plurality of models based on the plurality of segmented images to form respective ones of a plurality of motion estimates for the left ventricle, computing a plurality of probabilities for respective ones of the plurality of models, and computing a weighted sum of the plurality of motion estimates based on the plurality of probabilities, the weighted sum representing a predicted motion of the left ventricle.

Abstract: Methods, systems, and related computer program products for computer-aided detection (CAD) of anatomical abnormalities in digital (or digitized) x-ray mammograms are described. The inventive techniques are based on using a foundational CAD processing algorithm that is characterized by at least one of non-shift-invariance, non-rotational-invariance, and non-inversional-invariance. According to one preferred embodiment, a first x-ray mammogram image of a breast is received, and at least one altered version thereof is generated that differs therefrom by at least one of image shift, image rotation, and image inversion. The first x-ray mammogram image and each of the at least one altered versions thereof are individually processed using the foundational CAD algorithm to generate a respective plurality of individual CAD detection sets. The plurality of CAD detection sets are then compared to generate an overall CAD detection set.

Abstract: The invention is a directed to an apparatus for tomosynthesis imaging, wherein the apparatus comprises an x-ray source configured to irradiate an object with a beam of x-rays and a detector configured to detect the x-ray beam that passes through the object. The apparatus further comprises a computer programmed to perform a scan, wherein the scan comprises a translation of at least one of the x-ray source and the detector along a path, an acquisition of a tomosynthesis image dataset, and a reconstruction of one or more three-dimensional (3D) volumes adapted to one or more predetermined view directions, wherein at least one of the one or more predetermined view directions is aligned outside of a central view direction.

Abstract: An imaging system includes an x-ray source, a detector, a data acquisition system (DAS) operably connected to the detector, and a computer operably connected to the DAS. The computer is programmed to obtain CT scan data with two or more incident energy spectra, decompose the obtained CT scan data into projection CT data of a first basis material and a second basis material, generate a first basis material image and a second basis material image using the decomposed projection CT data, generate a first monochromatic image from the first basis material image and the second basis material image at a first energy that is selected based on an amount of correlated noise at the first energy, noise-reduce the first monochromatic image to generate a noise-reduced first monochromatic image, and generate a final monochromatic image based at least on the noise-reduced first monochromatic image.

Abstract: A method for configuring an illumination source of a lithographic apparatus, the method including dividing the illumination source into pixel groups, each pixel group including one or more illumination source points; selecting an illumination shape to expose a pattern, the illumination shape formed with at least one pixel group; ranking the pixel groups according to how a change in state of a pixel group affects a lithographic metric; and for each pixel group in order of ranking, determining whether to adjust the illumination shape by changing the state of the pixel group based on a calculation of the lithographic metric as a result of a change in state of the pixel group.

Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

Abstract: A method and apparatus for determining the state of the lens transmittance of an optical projection system are described. A lens or imaging objective transmission is determined as a function of exit pupil transverse direction cosine (nx,ny) at multiple field points thereby providing a more complete analysis and correction of a photolithographic exposure system. The entrance pupil of a projection imaging system is uniformly illuminated and the angular dependence of transmission through the imaging system as a function of exit pupil direction cosines is determined. The illumination source includes a light conditioner with an in-situ illumination structure (ISIS), which is an optical structure that can provide uniform illumination of the system's entrance pupil.

Abstract: Disclosed is an X-ray imaging apparatus in which a correction function used to correct scattered X-rays and a correction function used to correct beam hardening can be simply and precisely determined so that the correcting operations are performed in an appropriate sequence using the correction functions thus determined to enhance the precision in the correction and improve the image quality. The scattered X-rays and the beam hardening are corrected sequentially in this order, using the scattered X-ray correction function and the beam hardening correction function, both calculated using measured data for calculating the correction functions. The scattered X-ray correction function approximates as to each transmission distance, the data measured with changes in the transmission distance and with changes in the scattered X-ray amount, and associates the correction value thus obtained with transmittance data.

Abstract: In an exposure apparatus of a liquid immersion exposure method, a liquid immersion area is formed on the upper surface of a wafer by liquid supplied in a space formed with a projection optical system, and on a moving table holding the wafer, a plurality of encoder heads is placed. Of the plurality of encoder heads, a controller measures positional information of the moving table within an XY plane using an encoder head which is outside a liquid immersion area. This allows a highly precise and stable measurement of positional information of the moving table.

Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has, on an undersurface, a liquid supply opening or a plurality of liquid supply openings and a liquid extraction opening or a plurality of liquid extraction openings arranged such that, in use, liquid is provided on and removed from the undersurface of the fluid handling structure.

Abstract: Discharge module which is formed by three circuits, a control and measurement circuit for X-rays, a voltage division circuit between serial switches, which is independent from the previous one, and a third circuit of the charge short circuit, which in turn is formed by a successive or slave trip circuit of the switches and another main discharge circuit through the switches; due to the established configuration, a much improved radiation control is achieved as it is not affected by unforeseen agents, the short circuit current is not restricted to the port current of the switches, and residual voltage of the switches is reduced.