Abstract: The invention relates to a device for optically inspecting a container that is empty or filled with liquid, comprising an illumination unit and a recording apparatus. The illumination unit comprises an illumination surface, by means of which a two-dimensional light pattern consisting of at least two regions of different light intensities can be produced and the container can be irradiated with light from the light pattern, in particular said light can shine therethrough. According to the invention, a mirror system is further provided which is arranged in the beam path between the illumination unit and the container and comprises at least one concave mirror. The mirror system images the light pattern produced by the illumination unit onto the plane of the entrance pupil of the recording apparatus.

Abstract: A method for inspecting a three dimensional structure of a microscopic scale of a sample, the method may include obtaining an image of the three dimensional structure; obtaining a reference image of a reference three dimensional structure, the reference three dimensional structure and the three dimensional structure are ideally identical to each other; wherein each one of the image and the reference image was generated using optics that includes a phase mask, wherein the phase mask virtually expands a depth of field of the optics by encoding depth information over a depth range that exceeds the depth of field; generating a difference image that represents a difference between the image and the reference image; determining, based on the difference image, whether there is at least one defect in the three dimensional structure; wherein when determining that there is the at least one defect then providing a depth of the at least one defect.

Abstract: A method for detecting lens cleanliness of a lens in a flat-field optical path, the flat-field optical path includes a light source, the lens, a camera, the light source is a narrow-band multispectral uniform surface light source, the camera's light-sensitive surface is disposed perpendicular to an optical axis of the lens and in the light position of the lens, the method including disposing the camera such that the camera's light-sensitive surface is located a distance from the focal plane of the lens and measuring the bright-field image data and the dark-field image data; for each pixel, performing an out-of-focus differential flat field correction to yield a plurality of DiDj out-of-focus differentials; repeating the disposing and performing steps by altering the distance at least two more times; and displaying the out-of-focus differentials in the form of a plurality of images to show uniformity of each of the plurality of images.

Abstract: A columnar object state detection device according to an embodiment is a device for detecting a state of a columnar object including: an acquisition unit configured to acquire central axis data that is an array of coordinate values of center points of the columnar object in a horizontal direction at a plurality of predetermined heights of the columnar object; an approximation equation calculating unit configured to calculate a correction approximation equation for correcting the coordinate values of the central axis data acquired by the acquisition unit through curve fitting for the array of coordinate values of the central axis data acquired by the acquisition unit; and correction unit configured to correct the coordinate values of the acquired central axis data using the correction approximation equation calculated by the approximation equation calculating unit.

Abstract: An appearance inspection device includes: a transparent conveyance body having a surface and a rear face and conveyed in a predetermined direction; an illumination device that irradiates with predetermined light an inspection area through which a plurality of objects pass, wherein the objects are arranged at predetermined intervals on a first face that is one of the surface and the rear face; a plurality of imaging devices each of which takes, along a predetermined direction, an image of part of side faces of the objects located in the inspection area, wherein the predetermined direction is inclined to both the surface and the rear face; and a processor that inspects an appearance of the side faces of the objects based on image data obtained by the imaging device.

Abstract: The present disclosure provides a remote sensing-based detection system for gaseous pollutant from diesel vehicle exhaust, including: a diesel vehicle exhaust emission measuring device, a main control computer, an information display device, a vehicle driving status monitoring device, a weather monitoring device and a vehicle license plate recognizing device; where the diesel vehicle exhaust emission measuring device, the information display device, the vehicle driving status monitoring device, the weather monitoring device and the vehicle license plate recognizing device are in communication connection with the main control computer, the main control computer is connected to a motor vehicle emission monitoring platform via internet, and the vehicle driving status monitoring device includes a speedometer, an accelerometer or a radar speedometer.

Abstract: Described herein are an apparatus and method by which at least one core specimen is obtained from a patient. The specimen is optionally placed on a tray, in a holder, or in another device designed to hold the tissue specimen; images of the specimens are acquired with optical coherence tomography, optical coherence tomography image data and, optionally, data from an additional imaging or analysis method, and when analyzed with the tissue classification process yield information on one or more of: the adequacy of the specimens obtained; the likelihood that they contain abnormal or malignant tissue; the regions and/or specimens most likely to contain diagnostic tissue; the approximate dimensions, area, or volume of the abnormal tissue; and the probable type of abnormality.

Abstract: An eyeglass frame shape measurement device measures a shape of an eyeglass frame. The eyeglass frame shape measurement device includes a light projecting optical system that has a light source and emits measurement light from the light source toward a groove of a rim of an eyeglass frame, a light receiving optical system that has a detector and causes the detector to receive reflected light of the measurement light emitted toward the groove in the rim of the eyeglass frame by the light projecting optical system and reflected by the groove of the rim of the eyeglass frame, an acquisition section that acquires a cross-sectional shape of the groove of the rim of the eyeglass frame on the basis of the reflected light received by the detector, and a luminance control section that controls a luminance level of the reflected light to be received by the detector.

Abstract: Sample cells, light scattering detectors utilizing the sample cells, and methods for using the same are provided. The sample cell may include a body defining a flowpath extending axially therethrough. The flowpath may include a cylindrical inner section interposed between a first outer section and a second outer section. The first outer section may be frustoconical. A first end portion of the first outer section may be in direct fluid communication with the inner section and may have a cross-sectional area relatively smaller than a cross-sectional area at a second end portion thereof. The body may further define an inlet in direct fluid communication with the inner section. The inlet may be configured to direct a sample to the inner section of the flowpath.

Abstract: Methods and systems for determining metrology-like information for a specimen using an inspection tool are provided. One method includes determining first process information for first feature(s) formed in first area(s) on a specimen from output generated by output acquisition subsystem(s) that include an inspection subsystem. The method also includes determining second process information for second feature(s) formed in second area(s) on the specimen from the output and at least a portion of the first process information. At least a portion of the second process information is a different type of information than the first process information. At least a portion of a design for the second feature(s) is different than a design for the first feature(s), and the first area(s) and the second area(s) are mutually exclusive on the specimen.

Abstract: An optical density measuring apparatus and an optical waveguide capable of increasing the degree of design freedom are provided. The optical density measuring apparatus is for measuring density of a gas or a liquid to be measured and includes a light source capable of irradiating light into a core layer, a detector capable of receiving light propagated through the core layer, and an optical waveguide. The optical waveguide includes a substrate and the core layer, which includes a diffraction grating unit and a light propagation unit capable of propagating light in an extending direction of the light propagation unit. The diffraction grating unit and a portion of the core layer are separated in the thickness direction of the optical waveguide.

Abstract: A method for diagnosing the deterioration of a lubricant, and a system and method for monitoring a lubricant of a rotating machine are capable of diagnosing the deterioration of an additive to a lubricant. The concentration of the additive to the lubricant is obtained by using chromaticity data obtained on the basis of measurement data from an optical sensor, and, on the basis thereof, the deterioration of the lubricant is diagnosed. In addition, the system for monitoring the lubricant is provided with an optical sensor, an input device, a processing device, a storage device, and an output device. The storage device stores, in a time series, the concentration of the additive to the lubricant, which is obtained with the optical sensor, and the processing device estimates the time at which the concentration of the additive reaches a threshold value on the basis of concentration data of the additive.

Abstract: A method and an apparatus for analyzing a component of an object are provided. The apparatus includes an image sensor including an optical module, and the optical module includes a light source configured to emit a source light, a first detector configured to detect a first light that is scattered or reflected from the object on which the emitted source light is incident, and a second detector configured to detect a second light that is emitted by the light source but is not incident on the object. The apparatus further includes a processor configured to calculate a scattering coefficient and an absorption coefficient, based on the detected first light and the detected second light, and analyze the component of the object, based on the calculated scattering coefficient and the calculated absorption coefficient.

Abstract: Provided is an apparatus for measuring particulate matter, the apparatus including an air inflow device configured to receive air including particulate matter particles, two or more light sources configured to respectively emit light of different wavelengths to the air received, a pattern measuring device configured to measure scattering patterns for each wavelength of light based on detecting light that is forward-scattered by the particulate matter particles and light that is back-scattered by the particulate matter particles, and a processor configured to obtain a size of the particulate matter particles and a concentration of the particulate matter particles based on the scattering patterns for each wavelength of light.

Abstract: A measuring apparatus for determining object data of at least one test object includes at least one distribution of retroreflectors. The retroreflectors are arranged on the measuring apparatus. The distribution has at least so many retroreflectors that at least three retroreflectors are observable at at least three spatially different observation locations in at least 90% of all possible spatial orientations of the measuring apparatus. A distance range of the observation locations is 0.1 m to 30 m. Each of the retroreflectors has a maximum acceptance angle. Each of the retroreflectors has a diameter of 1 mm to 50 mm. The retroreflectors are arranged such that, for each of the observation locations, a minimum spacing of measured retroreflector distances of the observable retroreflectors is 0.1 mm to 50 mm.

Abstract: An imaging reflectometer includes a source module configured to generate a plurality of input beams at different nominal wavelengths. An illumination pupil having a first numerical aperture (NA) is arranged so that each of the plurality of input beams passes through the illumination pupil. A large field lens is configured to receive at least a portion of each of the plurality of input beams and provide substantially telecentric illumination over a sample being imaged. The large field lens is also configured to receive reflected portions of the substantially telecentric illumination reflected from the sample. The reflected portions pass through an imaging pupil having a second NA that is lower than the first NA and are received by an imaging sensor module that generates image information.

Abstract: Hyperspectral imaging with reduced fixed pattern noise is disclosed. A method includes actuating an emitter to emit a plurality of pulses of electromagnetic radiation and sensing reflected electromagnetic radiation resulting from the plurality of pulses of electromagnetic radiation with a pixel array of an image sensor. The method includes reducing fixed pattern noise in an exposure frame by subtracting a reference frame from the exposure frame. The method is such that at least a portion of the plurality of pulses of electromagnetic radiation emitted by the emitter comprises one or more of electromagnetic radiation having a wavelength from about 513 nm to about 545 nm, from about 565 nm to about 585 nm, or from about 900 nm to about 1000 nm.

Abstract: Systems, methods, and apparatuses are disclosed herein for directing, using an optical arrangement including one or more lenses, a main beam and a leading beam toward a specimen such that the main beam is incident on the specimen at a main beam incidence and the leading beam is incident on the specimen at a leading beam incidence. The main beam intensity is greater than a leading beam intensity of the leading beam. A TDI sensor receives electromagnetic radiation from the leading beam incidence, thereby generating a first accumulated charge portion, and receives electromagnetic radiation from the main beam incidence, thereby generating a second accumulated charge portion. A processor maps the first accumulated charge portion to a first FOV, thereby yielding leading beam data, and maps the second accumulated charge portion to a second FOV, thereby yielding main beam data.

Abstract: Embodiments herein describe photonic systems that include a germanium photodetector thermally coupled to a resistive element. Current flowing through the resistive element increases the temperature of the resistive element. Heat from the resistive element increases the temperature of the thermally coupled photodetector. Increasing the temperature of the photodetector increases the responsivity of the photodetector. The bias voltage of the photodetector can be increased to increase the bandwidth of the photodetector. In various embodiments, the photodetector includes at least one waveguide to receive light into the photodetector. Other embodiments include multiple resistive elements thermally coupled to the photodetector.

Abstract: A semiconductor device inspection apparatus includes: a light sensor that detects light from a semiconductor device as a DUT to which an electric signal has been input; an optical system that guides light from the semiconductor device to the light sensor; and a control device electrically connected to the light sensor. The control device includes: a data reading unit that reads mask data indicating a mask layout of the semiconductor device; a search unit that searches for a position of a transistor in the semiconductor device on the basis of polygon data of a gate layer of the semiconductor device included in the mask data; a setting unit that sets the searched position of the transistor as an optical measurement target position; and a measurement unit that performs optical measurement for the set optical measurement target position to acquire a measurement result.