Abstract: A papermaker's fabric, usable in the forming section of a paper machine, having a top layer and a bottom layer of cross-machine direction (CD) wefts. The top (forming) layer and bottom (wear side) layer are woven together to form a multi-layer fabric. CD packing yarns are inserted between adjacent wear side weft yarns. The packing yarns reduce the void volume on the wear side of the cloth without significantly disrupting the air permeability or increasing the caliper of the fabric. The placement of the packing yarns also adds to the CD stability and seam strength of the fabric and reduces the lateral movement of the wear side weft yarns.

Abstract: The present invention is directed to fabrics for paper making machines that are rendered contamination resistant, maintain good permeability, and enhanced seam strength as a result of a durable coating that lasts the entire life of the fabric. A polyurethane based coating containing a fluorochemical will render the fabric contamination resistant over the entire fabric lifetime. It has been found that optical brighteners and titanium dioxide also enhance fabric appearance.

Abstract: The present invention is an improved method for automatically generating chenille filled embroidery stitch patterns and/or claim stitching in a computer aided design system in which the shape to be filled is a complex polygon. Concentric polygons are constructed, such as either by using the medial axis of the polygon or by constructing offset elements and joining arcs without use of the medial axis, and sorted, and spirals are placed along the polygons with stitches being placed along the spirals. For chain stitching, rather than placing spirals, the chain stitches are placed on the perimeter of the concentric polygons.

Abstract: The present invention is an improved method for automatically generating chain stitching in a computer aided design system in which the shape to be filled is a complex polygon. The Voronoi Diagram of the polygon is determined, concentric polygons are then constructed and sorted and the chain stitches are placed on the perimeter of the concentric polygons. The chain stitches can be used to completely fill a stitch pattern, such as an embroidery stitch pattern, or in conjunction with other stitching, such as Chenille stitching in an embroidery pattern.