Patents by Inventor Abdurrahman Sezginer

Abdurrahman Sezginer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10395361
    Abstract: Disclosed are methods and apparatus for qualifying a photolithographic reticle. A reticle inspection tool is used to acquire a plurality of images at different imaging configurations from each of a plurality of pattern areas of a test reticle. A reticle near field is recovered for each of the pattern areas of the test reticle based on the acquired images from each pattern area of the test reticle. The recovered reticle near field is then used to determine whether the test reticle or another reticle will likely result in unstable wafer pattern or a defective wafer.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: August 27, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Mohammad Mehdi Daneshpanah
  • Publication number: 20190206041
    Abstract: Disclosed are methods and apparatus for inspecting a photolithographic reticle. A near field reticle image is generated via a deep learning process based on a reticle database image produced from a design database, and a far field reticle image is simulated at an image plane of an inspection system via a physics-based process based on the near field reticle image. The deep learning process includes training a deep learning model based on minimizing differences between the far field reticle images and a plurality of corresponding training reticle images acquired by imaging a training reticle fabricated from the design database, and such training reticle images are selected for pattern variety and are defect-free.
    Type: Application
    Filed: November 27, 2018
    Publication date: July 4, 2019
    Applicant: KLA-Tencor Corporation
    Inventors: Hawren Fang, Abdurrahman Sezginer, Rui-fang Shi
  • Patent number: 10304180
    Abstract: Disclosed are methods and apparatus for qualifying a photolithographic reticle. A reticle inspection tool is used to acquire images at different imaging configurations from each of a plurality of pattern areas of a test reticle. A reticle near field for each of the pattern areas of the test reticle is recovered based on the acquired images from each pattern area of the test reticle. A lithography model is applied to the reticle near field for the test reticle to simulate a plurality of test wafer images, and the simulated test wafer images are analyzed to determine whether the test reticle will likely result in an unstable or defective wafer.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: May 28, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Abdurrahman Sezginer
  • Patent number: 10288415
    Abstract: Disclosed are methods and apparatus for facilitating an inspection of a sample using an inspection tool. An inspection tool is used to obtain an image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is converted to a CD variation that removes a flare correction CD variation so as to generate a critical dimension uniformity (CDU) map without the flare correction CD variation. This removed flare correction CD variation originates from design data for fabricating the EUV reticle, and such flare correction CD variation is generally designed to compensate for flare differences that are present across a field of view (FOV) of a photolithography tool during a photolithography process. The CDU map is stored in one or more memory devices and/or displayed on a display device, for example, of the inspection tool or a photolithography system.
    Type: Grant
    Filed: November 29, 2017
    Date of Patent: May 14, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Alex Pokrovskiy, Abdurrahman Sezginer, Weston L. Sousa
  • Publication number: 20180340886
    Abstract: In one embodiment, disclosed are apparatus, methods, and targets for determining a phase shift of a photomask having a phase-shift target. An inspection or metrology system is used to direct an incident beam towards the target and then detect a plurality of intensity measurements that are transmitted through the target in response to the incident beam. A phase shift value for the target may then be determined based on the intensity measurements.
    Type: Application
    Filed: January 29, 2018
    Publication date: November 29, 2018
    Applicant: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Kuljit Virk, Eric Vella
  • Publication number: 20180342051
    Abstract: Systems and methods increase the signal to noise ratio of optical inspection of wafers to obtain higher inspection sensitivity. The computed reference image can minimize a norm of the difference of the test image and the computed reference image. A difference image between the test image and a computed reference image is determined. The computed reference image includes a linear combination of a second set of images.
    Type: Application
    Filed: May 4, 2018
    Publication date: November 29, 2018
    Inventors: Abdurrahman Sezginer, Xiaochun Li, Pavan Kumar, Junqing Huang, Lisheng Gao, Grace H. Chen, Yalin Xiong, Hawren Fang
  • Publication number: 20180082415
    Abstract: Disclosed are methods and apparatus for qualifying a photolithographic reticle. A reticle inspection tool is used to acquire a plurality of images at different imaging configurations from each of a plurality of pattern areas of a test reticle. A reticle near field is recovered for each of the pattern areas of the test reticle based on the acquired images from each pattern area of the test reticle. The recovered reticle near field is then used to determine whether the test reticle or another reticle will likely result in unstable wafer pattern or a defective wafer.
    Type: Application
    Filed: November 3, 2017
    Publication date: March 22, 2018
    Applicant: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Mohammad Mehdi Daneshpanah
  • Publication number: 20180080759
    Abstract: Disclosed are methods and apparatus for facilitating an inspection of a sample using an inspection tool. An inspection tool is used to obtain an image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is converted to a CD variation that removes a flare correction CD variation so as to generate a critical dimension uniformity (CDU) map without the flare correction CD variation. This removed flare correction CD variation originates from design data for fabricating the EUV reticle, and such flare correction CD variation is generally designed to compensate for flare differences that are present across a field of view (FOV) of a photolithography tool during a photolithography process. The CDU map is stored in one or more memory devices and/or displayed on a display device, for example, of the inspection tool or a photolithography system.
    Type: Application
    Filed: November 29, 2017
    Publication date: March 22, 2018
    Applicant: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Alex Pokrovskiy, Abdurrahman Sezginer, Weston L. Sousa
  • Patent number: 9875534
    Abstract: A reticle is inspected with an imaging system to obtain a measured image of a structure on the reticle, and the structure has an unknown critical dimension (CD). Using a model, a calculated image is generated using a design database that describes a pattern used to form the structure on the reticle. The model generates the calculated image based on: optical properties of reticle materials of the structure, a computational model of the imaging system, and an adjustable CD. A norm of a difference between the measured and calculated images is minimized by adjusting the adjustable CD and iteratively repeating the operation of generating a calculated image so as to obtain a final CD for the unknown CD of the structure. Minimizing the norm of the difference is performed simultaneously with respect to the adjustable CD and one or more uncertain parameters of the imaging system.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: January 23, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Eric Vella, Balaji Ganapathy, Yanwei Liu
  • Patent number: 9863761
    Abstract: Disclosed are methods and apparatus for facilitating an inspection of a sample using an inspection tool. An inspection tool is used to obtain an image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is converted to a CD variation that removes a flare correction CD variation so as to generate a critical dimension uniformity (CDU) map without the flare correction CD variation. This removed flare correction CD variation originates from design data for fabricating the EUV reticle, and such flare correction CD variation is generally designed to compensate for flare differences that are present across a field of view (FOV) of a photolithography tool during a photolithography process. The CDU map is stored in one or more memory devices and/or displayed on a display device, for example, of the inspection tool or a photolithography system.
    Type: Grant
    Filed: April 16, 2013
    Date of Patent: January 9, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Alex Pokrovskiy, Abdurrahman Sezginer, Weston L. Sousa
  • Publication number: 20180003647
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Application
    Filed: September 18, 2017
    Publication date: January 4, 2018
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Patent number: 9805462
    Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: October 31, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Gang Pan, Bing Li
  • Publication number: 20170309008
    Abstract: Disclosed are methods and apparatus for qualifying a photolithographic reticle. A reticle inspection tool is used to acquire images at different imaging configurations from each of a plurality of pattern areas of a test reticle. A reticle near field for each of the pattern areas of the test reticle is recovered based on the acquired images from each pattern area of the test reticle. A lithography model is applied to the reticle near field for the test reticle to simulate a plurality of test wafer images, and the simulated test wafer images are analyzed to determine whether the test reticle will likely result in an unstable or defective wafer.
    Type: Application
    Filed: July 3, 2017
    Publication date: October 26, 2017
    Applicant: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Abdurrahman Sezginer
  • Patent number: 9766185
    Abstract: Block-to-block reticle inspection includes acquiring a swath image of a portion of a reticle with a reticle inspection sub-system, identifying a first occurrence of a block in the swatch image and at least a second occurrence of the block in the swath image substantially similar to the first occurrence of the block and determining at least one of a location, one or more geometrical characteristics of the block and a spatial offset between the first occurrence of the block and the at least a second occurrence of the block.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: September 19, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Patrick LoPresti, Joe Blecher, Rui-fang Shi, Yalin Xiong, John Fielden
  • Publication number: 20170221190
    Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.
    Type: Application
    Filed: April 10, 2017
    Publication date: August 3, 2017
    Applicant: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Gang Pan, Bing Li
  • Patent number: 9652843
    Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 16, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Gang Pan, Bing Li
  • Publication number: 20170069080
    Abstract: A reticle is inspected with an imaging system to obtain a measured image of a structure on the reticle, and the structure has an unknown critical dimension (CD). Using a model, a calculated image is generated using a design database that describes a pattern used to form the structure on the reticle. The model generates the calculated image based on: optical properties of reticle materials of the structure, a computational model of the imaging system, and an adjustable CD. A norm of a difference between the measured and calculated images is minimized by adjusting the adjustable CD and iteratively repeating the operation of generating a calculated image so as to obtain a final CD for the unknown CD of the structure. Minimizing the norm of the difference is performed simultaneously with respect to the adjustable CD and one or more uncertain parameters of the imaging system.
    Type: Application
    Filed: August 29, 2016
    Publication date: March 9, 2017
    Applicant: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Eric Vella, Balaji Ganapathy, Yanwei Liu
  • Patent number: 9547892
    Abstract: Disclosed are methods and apparatus for qualifying a photolithographic reticle. A reticle inspection tool is used to acquire images at different imaging configurations from each of the pattern areas of a calibration reticle. A reticle near field is recovered for each of the pattern areas of the calibration reticle based on the acquired images from each pattern area of the calibration reticle. Using the recovered reticle near field for the calibration reticle, a lithography model for simulating wafer images is generated based on the reticle near field. Images are then acquired at different imaging configurations from each of the pattern areas of a test reticle. A reticle near field for the test reticle is then recovered based on the acquired images from the test reticle.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: January 17, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Rui-fang Shi, Abdurrahman Sezginer
  • Publication number: 20160335753
    Abstract: Apparatus and methods for inspecting a specimen are disclosed. An inspection tool is used at one or more operating modes to obtain images of a plurality of training regions of a specimen, and the training regions are identified as defect-free. Three or more basis training images are derived from the images of the training regions. A classifier is formed based on the three or more basis training images. The inspection system is used at the one or more operating modes to obtain images of a plurality of test regions of a specimen. Three or more basis test images are derived from to the test regions. The classifier is applied to the three or more basis test images to find defects in the test regions.
    Type: Application
    Filed: July 27, 2016
    Publication date: November 17, 2016
    Applicant: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, Gang Pan, Bing Li
  • Patent number: 9494535
    Abstract: Methods and systems for performing measurements of semiconductor structures and materials based on scatterometry measurement data are presented. Scatterometry measurement data is used to generate an image of a material property of a measured structure based on the measured intensities of the detected diffraction orders. In some examples, a value of a parameter of interest is determined directly from the map of the material property of the measurement target. In some other examples, the image is compared to structural characteristics estimated by a geometric, model-based parametric inversion of the same measurement data. Discrepancies are used to update the geometric model of the measured structure and improve measurement performance. This enables a metrology system to converge on an accurate parametric measurement model when there are significant deviations between the actual shape of a manufactured structure subject to model-based measurement and the modeled shape of the structure.
    Type: Grant
    Filed: April 19, 2015
    Date of Patent: November 15, 2016
    Assignee: KLA-Tencor Corporation
    Inventors: Abdurrahman Sezginer, John Hench, Michael S. Bakeman