Abstract: A vehicle control apparatus includes an electronic control unit. The electronic control unit is configured to perform feedback control of a motor such that a torque is output for stopping a crankshaft at a target angle. A first angle is used as the target angle during a first period from start of the feedback control to first detection of rotation of the crankshaft in a negative rotational direction for returning the crank angle. A second angle is used as the target angle during a second period from the lapse of the first period to detection of a changeover in a rotational direction of the crankshaft from the negative to a positive rotational direction. The electronic control unit is configured to return the target angle to the first angle at a first timing after the lapse of the second period.

Abstract: A detection device having: a terahertz wave generation element; a terahertz wave detection element; a first transmission path arranged upon the terahertz wave generation element; a second transmission path arranged upon the terahertz wave detection element; and a sealed section arranged between the terahertz wave generation element and the terahertz wave detection element and separated from the first transmission path and the second transmission path, so as to surround the first transmission path and the second transmission path. A space between an emission surface in the first transmission path and an incident surface in the second transmission path is connected to a space between the first transmission path and the sealed section and to a space between the second transmission path and the sealed section.

Abstract: Screen processing is performed on input image data. A boundary pixel adjacent to a white pixel in the input image data is detected. Output image data based on either the input image data or the screen-processed image data is selectively output for each pixel in accordance with the detection result of the boundary pixel.

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: A detection device having: a terahertz wave generation element; a terahertz wave detection element; a first transmission path arranged upon the terahertz wave generation element; a second transmission path arranged upon the terahertz wave detection element; and a sealed section arranged between the terahertz wave generation element and the terahertz wave detection element and separated from the first transmission path and the second transmission path, so as to surround the first transmission path and the second transmission path. A space between an emission surface in the first transmission path and an incident surface in the second transmission path is connected to a space between the first transmission path and the sealed section and to a space between the second transmission path and the sealed section.

Abstract: This invention provides a piston in which the moving piston unit can be prevented from rotating with respect the base piston unit, while suppressing the increase of the sliding resistance the piston has with respect to the cylinder. The circumferential wall of the moving piston unit has a pair of skirt parts opposing each other across a piston boss and a pair of side-wall parts coupling the skirt parts and each having an outer circumferential surface concaved toward the central axis X1 of the piston. The side-wall parts have a penetration part each, which penetrates the side-wall part and extends in the directions the moving piston unit reciprocates with respect to the base piston unit. The base piston unit has rotation preventing projections that project perpendicular to the central axis of the piston and are inserted into the penetration parts.

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: An image processing apparatus that generates a halftone image by quantizing an input image includes: a holding unit configured to hold a threshold value matrix in which different threshold values are arranged; a pixel position determination unit configured to determine a candidate of a pixel position whose threshold value is to be rewritten based on each pixel value of a plurality of pixels included in a predetermined area for the predetermined area in the input image; and a threshold value determination unit configured to determine a threshold value of the pixel position determined to be the candidate by using at least one threshold value of a plurality of threshold values corresponding to the predetermined area.

Abstract: A method for manufacturing an optical element including: a surface including a plurality of grooves arranged concentrically. Each of the grooves includes a bottom surface with a predetermined width, a side surface, and a curved surface with a predetermined curvature radius. The bottom surface extends in a radius direction of the grooves. The curved surface connects the bottom surface and the side surface.

Abstract: The aim is to regulate thickness on the optical axis in the production of wafer lenses. Disclosed is a wafer lens production method that is equipped with a dispensing process for dropping resin onto a molding die (64), an imprinting process for pressing either the molding die (64) or a glass substrate (2) toward the other, and a releasing process for releasing the glass substrate (2) from the molding die (64), and that repeats the processing from the dispensing process to the releasing process as a single cycle and successively forms resin lenses (4) on the glass substrate 2); wherein the height (A) of the non-lens area (6) surrounding the lenses (4) and the heights (B and C) of the glass substrate (2) are measured between the releasing process of a first cycle and the dispensing process of a second cycle, and the position of the molding die (64) is corrected for imprinting processes of the second cycle, on the basis of the heights (A-C).

Abstract: Screen processing is performed on input image data. A boundary pixel adjacent to a white pixel in the input image data is detected. Output image data based on either the input image data or the screen-processed image data is selectively output for each pixel in accordance with the detection result of the boundary pixel.

Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.

Abstract: A substrate cleaning apparatus for cleaning a substrate back surface includes a first substrate supporting portion supporting the substrate at a first area of the substrate back surface, the back surface facing down; a second substrate supporting portion supporting the substrate at a second area of the substrate back surface, the second area being separated from the first area; a cleaning liquid supplying portion supplying cleaning liquid to the substrate back surface; a drying portion drying the second area of the substrate back surface; and a cleaning portion cleaning a third area of the substrate back surface when the substrate is supported by the first substrate supporting portion, the third area including the second area, and cleaning a fourth area of the substrate back surface when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area.

Abstract: To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.

Abstract: A portable device has an opening formed in one case of a dual structure, a partitioning member for partitioning the opening, a projection formed on the partitioning member so as to project to a front surface side of the case, and at least two push buttons attached from a back surface side of the case to partitions partitioned by the partitioning member. The push button has a substantially flat plate-shaped push button portion, and a locking portion formed at an outer edge of the push button portion. The locking portion contacts an outer edge of the opening to prevent slip-out of the push button when the push button is attached to the partition from the back surface side of the case.

Abstract: Since a space between one of a plurality of recessed portions 42c formed in a sub-master substrate 42 and a first molding surface 31 of a master die 30 is filled with a first resin material 41b, the thickness of a sub-sub-master resin layer 51 formed on the entire sub-master substrate 42 can be made relatively small while ensuring the thickness of the first resin material 41b which faces the first molding surface 31. Therefore, warpage of the sub-master substrate 42 caused by the sub-sub-master resin layer 51 can be prevented while easily increasing the positioning accuracy of the master die 30. By providing an annular step 32 in the periphery of the first molding surface 31, a residual film portion 44 which is an outer edge portion of the sub-sub-master resin layer 51 can be formed between the step 32 and the periphery of a recessed portion 42c.

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: A shape measuring device to measure a shape of a workpiece, wherein the shape measuring device includes: the probe; a probe support shaft to pivotally support the probe; and a probe drive device to which the probe support shaft is attached to contact the probe with a measuring position of the workpiece and to move relatively the workpiece and the probe; wherein the probe is a sphere pivotally supported by the probe support shaft and has a cut face which is a shape cut so as to be nearly vertical to the probe support shaft and a shape measurement of a workpiece surface is carried out in such a manner that the cut face of the probe is faced with a face intersecting a face containing the measuring position of the workpiece surface, and a surface of the sphere is contacted with the measuring position of the workpiece.

Abstract: Disclosed are a nozzle cleaning apparatus and a nozzle cleaning method, which are capable of effectively cleaning a nozzle for discharging a process liquid to a substrate. A nozzle 30 is accommodated in a cleaning container 2 having a funnel-shaped portion 2b. A solvent T as a cleaning liquid is supplied along an inner surface of the funnel-shaped portion 2b. The solvent T forms a vortex flow whirling around the nozzle 30. By exposing the nozzle 30 to the vortex flow, the nozzle 30 can be effectively, thoroughly cleaned.

Abstract: This invention provides a piston in which the moving piston unit can be prevented from rotating with respect the base piston unit, while suppressing the increase of the sliding resistance the piston has with respect to the cylinder. The circumferential wall of the moving piston unit has a pair of skirt parts opposing each other across a piston boss and a pair of side-wall parts coupling the skirt parts and each having an outer circumferential surface concaved toward the central axis X1 of the piston. The side-wall parts have a penetration part each, which penetrates the side-wall part and extends in the directions the moving piston unit reciprocates with respect to the base piston unit. The base piston unit has rotation preventing projections that project perpendicular to the central axis of the piston and are inserted into the penetration parts.