Abstract: According to one embodiment, an electronic apparatus includes a camera, a first polarizer, a second polarizer, a liquid crystal panel, and a controller controlling the liquid crystal panel. The liquid crystal panel includes a first region and a second region. The controller controls a first opening mode of transmitting light through the first region and the second region, and a second opening mode of making a quantity of light transmitted through the first region smaller than a quantity of light transmitted through the second region.

Abstract: An object of the present invention is to provide a head-up display apparatus further reduced in size, the head-up display apparatus having: an image display apparatus including a light source and a display element; and a virtual image optical system in which light emitted from the image display apparatus is reflected by a windshield or a combiner of the vehicle so that a virtual image is displayed in front of the vehicle, wherein the virtual image optical system has a concave mirror and a distortion correcting lens, and the distortion correcting lens is disposed between the image display apparatus and the concave mirror, the concave mirror is disposed in a housing including an outer case along a shape of an effective light path area of the image light from the image display apparatus, and the image display apparatus is attached to part of an outer periphery of the housing.

Abstract: According to one embodiment, an electronic apparatus includes a camera, a first polarizer, a second polarizer, a liquid crystal panel, and a controller controlling the liquid crystal panel. The liquid crystal panel includes a first region and a second region. The controller controls a first opening mode of transmitting light through the first region and the second region, and a second opening mode of making a quantity of light transmitted through the first region smaller than a quantity of light transmitted through the second region.

Abstract: Provided is a storage device according to an embodiment including: a stacked body including gate electrode layers stacked in a first direction; a semiconductor layer provided in the stacked body and extending in the first direction; and a gate insulating film provided between the semiconductor layer and the gate electrode layer, the gate insulating film having a first region disposed between the gate electrode layer and the semiconductor layer and a second region disposed between the two first regions adjacent to each other in the first direction, the gate insulating film containing a hafnium oxide, in which a first thickness of the first region in the second direction from the semiconductor layer toward the gate electrode layer is smaller than a second thickness of the second region in the second direction.

Abstract: A semiconductor memory device according to an embodiment, includes a semiconductor pillar extending in a first direction, a first electrode extending in a second direction crossing the first direction, a second electrode provided between the semiconductor pillar and the first electrode, a first insulating film provided between the semiconductor pillar and the second electrode, a second insulating film provided between the first electrode and the second electrode and on two first-direction sides of the first electrode, and a conductive film provided between the second electrode and the second insulating film, the conductive film not contacting the first insulating film.

Abstract: Provided is a storage device according to an embodiment including: a stacked body including gate electrode layers stacked in a first direction; a semiconductor layer provided in the stacked body and extending in the first direction; and a gate insulating film provided between the semiconductor layer and the gate electrode layer, the gate insulating film having a first region disposed between the gate electrode layer and the semiconductor layer and a second region disposed between the two first regions adjacent to each other in the first direction, the gate insulating film containing a hafnium oxide, in which a first thickness of the first region in the second direction from the semiconductor layer toward the gate electrode layer is smaller than a second thickness of the second region in the second direction.

Abstract: A semiconductor device includes a first electrode layer and a second electrode layer formed thereon to be spaced from the first electrode layer, a columnar portion penetrating the first and second electrode layers in a first direction and including a semiconductor layer, a first insulating film between the first and second electrode layers and the semiconductor layer and in contact with the first electrode layer, a charge storage layer between the second electrode layer and the first insulating film, and an insulating film between the second electrode layer and the charge storage layer. The semiconductor layer includes a first portion facing the second electrode layer in a second direction intersecting with the first direction and a second portion in contact with the first portion in the first direction. A concentration of a impurity contained in the second portion is higher than that of the impurity contained in the first portion.

Abstract: A method for manufacturing a semiconductor device includes forming a first semiconductor layer, forming a stacked body including alternately formed first and second layers on the first semiconductor layer, forming a hole from an upper surface of the stacked body to the first semiconductor layer to expose the first semiconductor layer therein. A first insulating layer is formed on the inner wall of the hole, and a second semiconductor layer is formed on the first insulating layer within the hole, wherein the second semiconductor layer is electrically connected to the first semiconductor layer. A metal layer is provided in contact with at least one of the first and second semiconductor layers. The stacked body, semiconductor layers, insulating layer and metal layer are exposed to an annealing temperature sufficient to cause migration of metal in the metal layer into one of the first and second semiconductor layers.

Abstract: A semiconductor device includes a first electrode layer and a second electrode layer formed thereon to be spaced from the first electrode layer, a columnar portion penetrating the first and second electrode layers in a first direction and including a semiconductor layer, a first insulating film between the first and second electrode layers and the semiconductor layer and in contact with the first electrode layer, a charge storage layer between the second electrode layer and the first insulating film, and an insulating film between the second electrode layer and the charge storage layer. The semiconductor layer includes a first portion facing the second electrode layer in a second direction intersecting with the first direction and a second portion in contact with the first portion in the first direction. A concentration of a impurity contained in the second portion is higher than that of the impurity contained in the first portion.

Abstract: A method for manufacturing a semiconductor device includes forming a first semiconductor layer, forming a stacked body including alternately formed first and second layers on the first semiconductor layer, forming a hole from an upper surface of the stacked body to the first semiconductor layer to expose the first semiconductor layer therein. A first insulating layer is formed on the inner wall of the hole, and a second semiconductor layer is formed on the first insulating layer within the hole, wherein the second semiconductor layer is electrically connected to the first semiconductor layer. A metal layer is provided in contact with at least one of the first and second semiconductor layers. The stacked body, semiconductor layers, insulating layer and metal layer are exposed to an annealing temperature sufficient to cause migration of metal in the metal layer into one of the first and second semiconductor layers.

Abstract: A method for manufacturing a semiconductor device includes forming a first semiconductor layer, forming a stacked body including alternately formed first and second layers on the first semiconductor layer, forming a hole from an upper surface of the stacked body to the first semiconductor layer to expose the first semiconductor layer therein. A first insulating layer is formed on the inner wall of the hole, and a second semiconductor layer is formed on the first insulating layer within the hole, wherein the second semiconductor layer is electrically connected to the first semiconductor layer. A metal layer is provided in contact with at least one of the first and second semiconductor layers. The stacked body, semiconductor layers, insulating layer and metal layer are exposed to an annealing temperature sufficient to cause migration of metal in the metal layer into one of the first and second semiconductor layers.

Abstract: A method for manufacturing a semiconductor device includes forming a first semiconductor layer, forming a stacked body including alternately formed first and second layers on the first semiconductor layer, forming a hole from an upper surface of the stacked body to the first semiconductor layer to expose the first semiconductor layer therein. A first insulating layer is formed on the inner wall of the hole, and a second semiconductor layer is formed on the first insulating layer within the hole, wherein the second semiconductor layer is electrically connected to the first semiconductor layer. A metal layer is provided in contact with at least one of the first and second semiconductor layers. The stacked body, semiconductor layers, insulating layer and metal layer are exposed to an annealing temperature sufficient to cause migration of metal in the metal layer into one of the first and second semiconductor layers.

Abstract: A semiconductor memory device according to an embodiment, includes a semiconductor pillar extending in a first direction, a first electrode extending in a second direction crossing the first direction, a second electrode provided between the semiconductor pillar and the first electrode, a first insulating film provided between the semiconductor pillar and the second electrode, a second insulating film provided between the first electrode and the second electrode and on two first-direction sides of the first electrode, and a conductive film provided between the second electrode and the second insulating film, the conductive film not contacting the first insulating film.

Abstract: A nonvolatile memory device includes a conductive layer, a semiconductor layer extending in a first direction on the conductive layer, a first insulating layer provided between the conductive layer and the semiconductor layer, a word line extending in a second direction on the semiconductor layer, the second direction intersecting the first direction, a charge storage layer provided between the semiconductor layer and the word line, and a circuit electrically connected to the conductive layer. The circuit applies an electric potential to the conductive layer when programming data, the electric potential of the conductive layer having the same polarity as an electric potential of the word line.

Abstract: A method of manufacturing a semiconductor storage apparatus according to an embodiment includes forming an array of a plurality of memory cells. The method includes forming an interlayer insulating film that covers the memory cells. The method includes forming a first nitride film that covers an upper part of the interlayer insulating film. The method includes ion-implanting a first impurity into the first nitride film.

Abstract: According to one embodiment, there is provided a non-volatile semiconductor storage device including a memory cell and a control unit. The memory cell has a gate electrode including a control gate and a charge storage region on a semiconductor substrate and has a channel region under the gate electrode in the semiconductor substrate. The control unit, during an erase operation where electric charges written in the charge storage region are extracted to the channel region, periodically varies a voltage which is to be applied between the control gate and the channel region.

Abstract: According to one embodiment, there is provided a writing method. The method includes setting potentials of a plurality of word lines to a first potential. The first potential is a potential to allow memory cells corresponding to a selective bit line to be in on state. The method also includes setting potentials of non-adjacent word lines to a second potential while maintaining potentials of adjacent word lines at a potential which allows the memory cells corresponding to the selective bit line to be in on state and setting a potential of a selective word line to a third potential. The second potential is a potential which is determined so as to allow the memory cells corresponding to the selective bit line to be in off state. The third potential is a potential where data is written in the selective memory cell corresponding to the selective bit line.

Abstract: According to one embodiment, there is provided a writing method. The method includes setting potentials of a plurality of word lines to a first potential. The first potential is a potential to allow memory cells corresponding to a selective bit line to be in on state. The method also includes setting potentials of non-adjacent word lines to a second potential while maintaining potentials of adjacent word lines at a potential which allows the memory cells corresponding to the selective bit line to be in on state and setting a potential of a selective word line to a third potential. The second potential is a potential which is determined so as to allow the memory cells corresponding to the selective bit line to be in off state. The third potential is a potential where data is written in the selective memory cell corresponding to the selective bit line.

Abstract: According to one embodiment, there is provided a non-volatile semiconductor storage device including a memory cell and a control unit. The memory cell has a gate electrode including a control gate and a charge storage region on a semiconductor substrate and has a channel region under the gate electrode in the semiconductor substrate. The control unit, during an erase operation where electric charges written in the charge storage region are extracted to the channel region, periodically varies a voltage which is to be applied between the control gate and the channel region.

Abstract: A semiconductor device of the present invention includes: a semiconductor layer; a gate insulation film provided on the semiconductor layer and including at least one of Hf and Zr; and a gate electrode provided on the gate insulation film and including a carbonitride which includes at least one of Hf and Zr.