Abstract: A quantum device capable of securing terminals for external connection is provided. A quantum device according to an example embodiment includes a quantum chip 10, an interposer 20 on which the quantum chip 10 is mounted, and a socket 40 disposed so as to be opposed to the interposer 20, the socket 40 comprising a movable pin 47 and a housing 45 supporting the movable pin 47, in which at least one end of the movable pin 47, which includes the one end and the other end opposite to the one end, is movable relative to the housing 45, the one end being in electrical contact with a terminal of the interposer 20, and the other end is in an electrical contact with a terminal of a board 50 on which a connector 51 is formed, the connector 51 being configured to serve as an external input/output.

Abstract: A quantum device (100) includes: an interposer (112); a quantum chip (111); a first connection part (130) that is provided between the interposer (112) and the quantum chip (111) and electrically connects a wiring layer of the interposer (112) to a wiring layer of the quantum chip (111); and a second connection part (140) that is provided on a main surface of the interposer (112) where the first connection part (130) is arranged and is connected to a cooling plate (115).

Abstract: A quantum device (100) includes: an interposer (112); a quantum chip (111); and a connection part (130) that is provided between the interposer (112) and the quantum chip (111) and electrically connects a wiring layer of the interposer (112) to a wiring layer of the quantum chip (111), in which the connection part (130) includes: a plurality of pillars (131) arranged on a main surface of the interposer (112); and a metal film (132) provided on a surface of the plurality of pillars (131) in such a way that it contacts the wiring layer of the quantum chip (111) and the thickness of the metal film at outer peripheral parts of the tip of each of the plurality of pillars (131) becomes larger than the thickness of the metal film at a center part of the tip of each of the plurality of pillars (131).

Abstract: A quantum device capable of effectively cooling a quantum chip and an area (e.g., a space) therearound is provided. A quantum device 1 includes a quantum chip 10 and an interposer 20 on which the quantum chip 10 is located. The interposer 20 includes an interposer substrate 22 and an interposer wiring layer 30. The interposer wiring layer 30 is disposed on a surface 22a of the interposer substrate 22 on a side on which the quantum chip 10 is located. The interposer wiring layer 30 includes, in at least a part thereof, a superconducting material layer 32 formed of a superconducting material and a non-superconducting material layer 34 formed of a non-superconducting material.

Abstract: A quantum device capable of improving a cooling effect while securing the number of terminals is provided. A quantum device according to an example embodiment includes a quantum chip 10, and an interposer 20 on which the quantum chip 10 is mounted, in which the interposer 20 includes a conductive wiring line CL1 electrically connected to the quantum chip 10, and a metal film 70 disposed in a part of the interposer 20 that is in contact with a sample stage 30 having a cooling function, and a mounting surface 21 of the interposer 20 on which the quantum chip 10 is mounted or an opposite surface 22 opposite to the mounting surface 21 includes a first area AR11 and a second area AR12 different from the first area AR11 as viewed in a direction perpendicular to the mounting surface 21 or the opposite surface 22.

Abstract: A machining simulation display apparatus displays, on a display screen, an image of a shape of a workpiece and a shape of a tool that machines the workpiece, and includes a display update unit to provide a command to combine, at a change point on a trajectory of the tool, an image of the shape of the tool displayed on the display screen and an image of the shape of the workpiece at a first display update timing at which the image displayed on the display screen is updated or at a second display update timing that is a time point after a lapse of a constant display update interval since the first display update timing, the change point being present between the first display update timing and the second display update timing.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: Provided are a mobile terminal device and a safety verification system by which information for verifying safety can be collected and presented, while prompting evacuation. The device is provided with: a current location acquisition unit for acquiring the current location when disaster occurrence information has been received; a route display controller for displaying a route leading from the acquired current location to a preregistered evacuation site; a start display controller for displaying a start input screen via which an input indicating that evacuation has started can be entered; and an evacuation start information transmission unit which, in the event that evacuation start information indicating that evacuation has started has been input from the start input screen through an operation by the user, transmits the evacuation start information to a preregistered destination.

Abstract: A machining simulation device includes a local-region setting unit that sets a local region for a workpiece, an offset-deformation processing unit that offsets and deforms a shape of a part of a whole three-dimensional shape model of the workpiece, for which the local region is set, and generates a local three-dimensional shape model of the workpiece, a local tool-movement-data output unit that outputs local tool movement data from whole tool movement data based on a tool model and movement path data of a tool, a local cutting-deformation processing unit that cuts and deforms the local three-dimensional shape model of a workpiece based on the local tool movement data, and a display superimposing unit that superimposes the cut and deformed local three-dimensional shape model of the workpiece on the whole three-dimensional shape model of the workpiece, and displays the superimposed result.

Abstract: To determine a state of an object appropriate for shooting. The image capture apparatus is provided with: the image capture unit; the shooting information acquisition unit; the major object identification unit; and the positional relationship determination unit. The image capture means captures an image of an object. The shooting information acquisition unit acquires information relating to optical aberration in the image capture unit. The major object identification unit identifies the major object in the image captured by the image capture unit. A status of the major object identified by the major object identification unit is determined based on the information relating to optical aberration acquired by the positional relationship determination unit and the shooting information acquisition unit.

Abstract: A collision determination device includes a target cell designation unit that designates a target cell for a voxel model which represents the shape of a first object. A determination test point generation unit generates determination test points for the target cell. A spatial curve creation unit creates a spatial curve as the trajectory curve of a determination test point. A curve intersecting determination unit determines whether or not each boundary element of a boundary representation model representing the shape of a second object is intersecting the spatial curve. A distance computation unit computes the closest distance from the spatial curve to the boundary surface of the boundary representation model. A collision determination unit determines, based on the determination result and the computation result, whether there is a possibility of collision between both objects.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: To obtain an automatic programming apparatus, capable of generating a tool path for the chamfering process with a simple operation and capable of shortening the operation period and improving machining efficiency, the automatic programming apparatus includes a chamfering tool path generating unit and machining condition data. The chamfering tool path generating unit includes: a chamfered plane defining unit that generates shape data defining a chamfered plane obtained after the chamfering process is performed with respect to a shape of the chamfering target part; a reference point sequence generating unit that generates a reference point sequence used as a reference for generating the tool path data used for performing the chamfering process; and a tool reference position generating unit that, generates a reference position of a machining tool used when the machining tool passes while performing the chamfering process.

Abstract: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.

Abstract: An interface station of a coating and developing treatment system has: a cleaning unit cleaning at least a rear surface of a wafer before the wafer is transferred into an exposure apparatus; an inspection unit inspecting the rear surface of the cleaned wafer whether the wafer is exposable, before it is transferred into the exposure apparatus; wafer transfer mechanisms including arms transferring the wafer between the units and a wafer transfer control part controlling operations of the wafer transfer mechanisms. When it is determined that a state of the wafer becomes an exposable state by re-cleaning in the cleaning unit as a result of the inspection, the wafer transfer control part controls the wafer transfer mechanisms to transfer the wafer again to the cleaning unit.

Abstract: Provided are a mobile terminal device and a safety verification system by which information for verifying safety can be collected and presented, while prompting evacuation. The device is provided with: a current location acquisition unit for acquiring the current location when disaster occurrence information has been received; a route display controller for displaying a route leading from the acquired current location to a preregistered evacuation site; a start display controller for displaying a start input screen via which an input indicating that evacuation has started can be entered; and an evacuation start information transmission unit which, in the event that evacuation start information indicating that evacuation has started has been input from the start input screen through an operation by the user, transmits the evacuation start information to a preregistered destination.

Abstract: In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other, The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

Abstract: A collision determination device includes a target cell designation unit that designates a target cell for a voxel model which represents the shape of a first object. A determination test point generation unit generates determination test points for the target cell. A spatial curve creation unit creates a spatial curve as the trajectory curve of a determination test point. A curve intersecting determination unit determines whether or not each boundary element of a boundary representation model representing the shape of a second object is intersecting the spatial curve. A distance computation unit computes the closest distance from the spatial curve to the boundary surface of the boundary representation model. A collision determination unit determines, based on the determination result and the computation result, whether there is a possibility of collision between both objects.