Abstract: Once an imaging mode is set, an imaging apparatus displays a through image with a tracking frame on the predetermined position. If a shutter button is pressed halfway, an object that is overlapped by the tracking frame is recognized as a main subject that a user wants to capture. Until the shutter button is fully pressed or until the halfway-press is released, it is detected where the recognized subject is in frame image data that is captured in sequence, and the tracking frame is displayed based on the detected position. If the halfway press of the shutter button is released before the shutter button is fully pressed, the tracking frame is displayed on the predetermined position. Then if the shutter button is pressed halfway once again, the process is repeated.

Abstract: A waveguide/planar line transducer of the present invention includes a waveguide that transmits electromagnetic waves through an opening portion, and a multiplayer substrate that includes a plurality of conductive layers.

Abstract: The present invention relates to the field of mobile applications and, more specifically, to a system and method for building a mobile application in a mobile application development environment in a simple and cost effective manner.

Abstract: An image sensing apparatus according to this invention includes an image sensing unit which sequentially generates still image data, a holding unit which holds a plurality of still image data, a display unit which displays the still image data, a setting unit which sets a predetermined state as the start timing of shooting by the image sensing unit, a determination unit which determines whether the predetermined state has been obtained, a shooting control unit which causes the image sensing unit to start shooting when the determination unit determines that the predetermined state has been obtained, a display control unit which causes the display unit to sequentially display, at a display speed lower than an actual time, the still image data, a selection unit which selects one of a plurality of image data displayed on the display unit, and a recording unit which records the selected image data.

Abstract: Once an imaging mode is set, an imaging apparatus displays a through image with a tracking frame on the predetermined position. If a shutter button is pressed halfway, an object that is overlapped by the tracking frame is recognized as a main subject that a user wants to capture. Until the shutter button is fully pressed or until the halfway-press is released, it is detected where the recognized subject is in frame image data that is captured in sequence, and the tracking frame is displayed based on the detected position. If the halfway press of the shutter button is released before the shutter button is fully pressed, the tracking frame is displayed on the predetermined position. Then if the shutter button is pressed halfway once again, the process is repeated.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: A device to form a coating film which can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device is configured such that nozzles for a preceding lot and a following lot are integrated into a common movement mechanism and moved between an upper side of a liquid processing unit and a standby area. A coating method includes sucking air into the nozzle for the preceding lot to form an upper gas layer, sucking a solvent for the preceding lot in the standby area to form a thinner layer, and sucking air into the nozzle for the preceding lot to form a lower gas layer within the nozzle, and thus forming a state that a solvent layer is interposed between the upper gas layer and the lower gas layer.

Abstract: A cassette waiting block is connected to a transfer in/out block of a coating and developing treatment system, and in the cassette waiting block, a cassette transfer in/out unit, a cassette waiting unit, a cassette delivery unit, and a substrate processing unit are provided. In the cassette waiting block, a cassette transfer unit for transferring the cassette between the cassette transfer in/out unit, the cassette waiting unit, and the cassette deliver unit, and a transfer unit for transferring the substrate between the cassette in the cassette waiting unit and the substrate processing unit are provided. Each cassette waiting unit has an opening mechanism for opening a port of the cassette.

Abstract: A communication system according to the present invention includes: a communication coupler that transmits a signal outputted from a communication equipment; and a signal transmission apparatus that performs communication by propagating, as an electromagnetic field, a signal transmitted from the communication coupler. The communication coupler includes: a coupler case; and an extended conductor portion that is provided at an end portion of the coupler case, the end portion facing the signal transmission apparatus, the extended conductor portion extends so as to be parallel to the signal transmission apparatus, and the extended conductor portion increases electromagnetic coupling between the communication coupler and the signal transmission apparatus.

Abstract: An NC programming assisting apparatus that creates an NC machining program reflecting dimensional tolerance data on shape data of a machining subject includes a machining target dimension calculation unit that calculates machining target dimensions of the machining subject based on the shape data and the dimensional tolerance data; a shape data deform processing unit that sets post-movement positions of graphic elements based on positional movement information about how to move the graphic elements, the machining target dimension, and the shape data so that a dimension between graphic elements included in the shape data conforms to the corresponding machining target dimension; and an NC machining program generation processing unit that creates an NC machining program by using the shape data and the post-movement position of each graphic element.

Abstract: To obtain an automatic programming apparatus, capable of generating a tool path for the chamfering process with a simple operation and capable of shortening the operation period and improving machining efficiency, the automatic programming apparatus includes a chamfering tool path generating unit and machining condition data. The chamfering tool path generating unit includes: a chamfered plane defining unit that generates shape data defining a chamfered plane obtained after the chamfering process is performed with respect to a shape of the chamfering target part; a reference point sequence generating unit that generates a reference point sequence used as a reference for generating the tool path data used for performing the chamfering process; and a tool reference position generating unit that, generates a reference position of a machining tool used when the machining tool passes while performing the chamfering process.

Abstract: Automatic programming apparatus includes: a material shape data input unit that receives input of data of material shape; a processing program storage unit that stores therein data of material shape and processed unit data; a processed unit data input part that receives an input of other-processed-unit-reference-type processed unit data referencing processed region shape data contained in the processed unit data; a processed region shape generating unit that generates processed region shape data in the processed unit data for partial processing, based on data of material shape and processed region shape data referenced by other-processed-unit-reference-type processed unit data; and a control command generating unit that generates control command data, based on processed unit data for partial processing containing processed region shape data.

Abstract: An image pickup apparatus includes an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether the set automatic photographing condition is satisfied or not, and instructing the image pickup section to pick up a recording subject image when the set automatic photographing condition is judged to be satisfied.

Abstract: A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.

Abstract: A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

Abstract: In one embodiment, a coating and developing apparatus is provided with a processing block including a liquid processing block disposed on the carrier block side and a heating processing block disposed on the interface block side. The liquid processing block includes a first unit block, a second unit block, and one or more of developing unit blocks overlying or underlying a stack of the first unit block and the second unit block. The first unit block includes antireflection film-forming modules and resist film-forming modules disposed on both sides of the transport passage thereof. The second unit block includes upper film-forming modules and hardening modules disposed on both sides of the transport passage thereof.

Abstract: Provided is a substrate processing apparatus in which after a module is disabled, a substrate is provided to a carry-in module capable of placing the wafers most rapidly in the plurality of unit blocks and the substrates are sequentially transported to the module group by the transportation means to be delivered to the carry-out module according to a providing sequence of the substrate to the carry-in module in each of the plurality of unit blocks. In particular, the substrates are extracted from the carry-out module according to a providing sequence of the substrate to the carry-in module and transported to a rear module or a substrate placing part. Thereafter, the substrates are transported to the rear module from the carry-out module or the substrate placing part according to a predetermined sequence in which the substrate is provided to the carry-in module in a normal state.

Abstract: Herein disclosed is an imaging apparatus, carrying out a step of calculating an exposure value based on image data obtained by the imaging section, a step of computing a shutter speed by mean of, for example, a program AE control in accordance with the exposure value calculated in the calculation step; a step of determining, in accordance with the shutter speed computed in the computation step, a continuous shooting speed indicative of the number of photographs per unit time; and a step of driving the imaging section so that a photographing operation is carried out with the continuous shooting speed thus determined.

Abstract: In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes M1 and M2 adapted for abnormality. In mode M1 the processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M2, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.

Abstract: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.