Patents by Inventor Alexander J. Pasadyn
Alexander J. Pasadyn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8615314Abstract: A method, apparatus and a system, for performing a process control using analysis of an upstream process is provided. The method comprises performing a first process on a workpiece and performing a qualitative analysis upon the workpiece relating to the first process, the qualitative analysis comprises analyzing at least one metrology measurement relating to the first process and a workpiece feature to evaluate a characteristic of the workpiece. The method further comprises selecting a process control parameter for performing a second process upon the workpiece based upon the qualitative analysis.Type: GrantFiled: September 2, 2004Date of Patent: December 24, 2013Assignee: Advanced Micro Devices, Inc.Inventors: Thomas J. Sonderman, Christopher A. Bode, Alexander J. Pasadyn
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Patent number: 8359494Abstract: A method and an apparatus are provided for parallel fault detection. The method comprises receiving data associated with processing of a workpiece by a first processing tool, receiving data associated with processing of a workpiece by a second processing tool and comparing at least a portion of the received data to a common fault model to determine if a fault associated with at least one of the processing of the workpiece by the first processing tool and processing of the workpiece by the second processing tool occurred.Type: GrantFiled: December 18, 2002Date of Patent: January 22, 2013Assignee: GLOBALFOUNDRIES Inc.Inventors: Elfido Coss, Jr., Ernest D. Adams, III, Robert J. Chong, Howard E. Castle, Thomas J. Sonderman, Alexander J. Pasadyn
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Patent number: 8017411Abstract: A method and an apparatus for dynamically adjusting a sampling rate relating to wafer examination. A process step is performed upon a plurality of workpieces associated with a lot. A sample rate for acquiring metrology data relating to at least one of the processed workpiece is determined. A dynamic sampling rate adjustment process is performed to adaptively modify the sample rate. The dynamic sampling rate adjustment process includes comparing a predicted process outcome and an actual process outcome and modifying the sampling rate based upon the comparison.Type: GrantFiled: December 18, 2002Date of Patent: September 13, 2011Assignee: GlobalFoundries, Inc.Inventors: Thomas J. Sonderman, Alexander J. Pasadyn, Gregory A. Cherry
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Patent number: 7797073Abstract: A method and an apparatus for processing semiconductor wafer based upon end-of-line (EOL) parameters. A target end-of-line parameter relating to a semiconductor wafer is determined. An inline parameter relating to processing of the semiconductor wafer is controlled in response to the target end-of-line parameter using a controller. Controlling the inline parameter includes adjusting a target inline parameter that correlates to the inline parameter.Type: GrantFiled: May 28, 2002Date of Patent: September 14, 2010Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, Christopher A. Bode
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Patent number: 7581140Abstract: A method and apparatus are provided for initiating test runs based on a fault detection result. The method comprises receiving operational data associated with processing of a workpiece by a processing tool, processing the operational data to determine fault detection results; and causing a test run to be performed based on at least a portion of the fault detection results.Type: GrantFiled: December 18, 2002Date of Patent: August 25, 2009Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, Elfido Coss, Jr., Brian K. Cusson, Naomi M. Jenkins
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Patent number: 7424392Abstract: A method and an apparatus are provided for applying a self-adaptive filter to a drifting process. The method includes processing a workpiece, measuring an output characteristic of the processed workpiece and modifying a previous estimated process state based at least on the measured output characteristic. The method further includes estimating a next process state based at least on the modified previous estimated process state.Type: GrantFiled: December 18, 2002Date of Patent: September 9, 2008Assignee: Advanced Micro Devices, Inc.Inventors: Jin Wang, Robert J. Chong, Christopher A. Bode, Si-Zhao J. Qin, Alexander J. Pasadyn
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Patent number: 7117062Abstract: A method and an apparatus for characterizing an uncertainty factor relating to processing workpieces. A first processing step is performed upon a workpiece. A first uncertainty factor associated with the first processing step is calculated. A final uncertainty factor associated with an end-of-line parameter relating to the workpiece is calculated based upon the first uncertainty factor. A process control function based upon the final uncertainty factor is performed.Type: GrantFiled: December 18, 2002Date of Patent: October 3, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Thomas J. Sonderman, Robert J. Chong, Brian K. Cusson, Alexander J. Pasadyn
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Patent number: 7103439Abstract: A method for initializing process controllers based on tool event data includes providing a tool having a process controller adapted to employ a control model to control an operating recipe of the tool; receiving a tool event notification; and initializing the control model in response to receiving the tool event notification. A manufacturing system includes a tool and a process controller. The tool is adapted to process wafers in accordance with an operating recipe. The process controller is adapted to employ a control model to control the operating recipe in accordance with a control algorithm. The process controller is further adapted to receive a tool event notification and initialize the control model in response to receiving the tool event notification.Type: GrantFiled: April 2, 2001Date of Patent: September 5, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Christopher A. Bode, Alexander J. Pasadyn, Anthony J. Toprac, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Thomas J. Sonderman, Michael L. Miller
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Patent number: 7067333Abstract: A method for controlling a process includes determining incoming state information associated with the process. A plurality of control models associated with the process is provided. A confidence metric is determined for each of the control models based on the incoming state information. The one of the plurality of control models having the highest associated confidence metric is selected. A control action for determining at least one parameter in an operating recipe used to implement the process is generated using the selected control model. A system includes a process tool and a process controller. The process tool is configured to process a workpiece in accordance with an operating recipe.Type: GrantFiled: June 28, 2002Date of Patent: June 27, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, Matthew A. Purdy
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Patent number: 6978189Abstract: A method and an apparatus for matching data related to an integrated metrology tool and a standalone metrology tool. At least one semiconductor wafer is processed. An integrated metrology tool and/or a standalone metrology tool is matched based upon a difference between metrology data relating to a processed semiconductor wafer acquired by the integrated metrology tool and metrology data acquired by the standalone metrology tool, using a controller.Type: GrantFiled: May 28, 2002Date of Patent: December 20, 2005Inventors: Christopher A. Bode, Matthew A. Purdy, Alexander J. Pasadyn
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Patent number: 6970757Abstract: A method for controlling a manufacturing process includes processing a plurality of workpieces in a tool; monitoring a rework rate associated with the workpieces processed in the tool; and initiating an automatic corrective action in response to the rework rate being greater than a predetermined threshold. A manufacturing system includes a tool adapted to process a plurality of workpieces and a rework controller adapted to monitor a rework rate associated with the workpieces processed in the tool and initiate an automatic corrective action in response to the rework rate being greater than a predetermined threshold.Type: GrantFiled: April 19, 2001Date of Patent: November 29, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Joyce S. Oey Hewett, Anthony J. Toprac, Christopher A. Bode, Alexander J. Pasadyn, Anastasia Oshelski Peterson, Thomas J. Sonderman, Michael L. Miller
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Patent number: 6968252Abstract: A method for dispatching based on metrology tool performance includes determining a precision metric associated with each of a plurality of metrology tools. A metrology request including context information is generated. A precision requirement for the metrology request is identified based on the context information. A set of the metrology tools capable of satisfying the metrology request is identified based on the precision requirement and the precision metrics. A manufacturing system includes a manufacturing execution system server and a metrology monitor. The manufacturing execution system server is configured to generate a metrology request including context information.Type: GrantFiled: July 14, 2003Date of Patent: November 22, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, James B. Stirton
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Patent number: 6961636Abstract: A method includes processing a plurality of workpieces in accordance with an operating recipe. Metrology data associated with the processing is collected. A control model including at least one tuning parameter having a default value is provided. A plurality of perturbations is introduced to shift the tuning parameter from its default value. Control actions are generated based on the metrology data and the perturbations to the tuning parameter in the control model to modify the operating recipe. An error signal associated with each of the perturbations is generated. The default value of the tuning parameter is modified based on the error signals.Type: GrantFiled: April 19, 2002Date of Patent: November 1, 2005Assignee: Advanced Micro Devices Inc.Inventors: Robert J. Chong, Alexander J. Pasadyn, Thomas J. Sonderman
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Patent number: 6947803Abstract: A method and an apparatus for affecting dispatch and/or disposition of a workpiece. A process step upon a workpiece is performed based upon a predetermined routing plan. An end-of-line parameter is modeled based upon the process performed upon the workpiece. A workpiece routing/disposition process is performed based upon modeling an end-of-line (EOL) parameter. The workpiece routing/disposition process includes using a controller to modify the routing plan.Type: GrantFiled: September 27, 2002Date of Patent: September 20, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Christopher A. Bode, Alexander J. Pasadyn
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Patent number: 6937914Abstract: A method for controlling a tool adapted to process workpieces in accordance with an operating recipe based on a process target value is provided. The method includes collecting manufacturing characteristic data associated with the workpieces; correlating the manufacturing characteristic data with a first manufacturing metric to generate a first manufacturing metric distribution for the workpieces; and adjusting the process target value based on the first manufacturing metric distribution. A manufacturing system includes a processing tool and a target monitor. The processing tool is adapted to process workpieces in accordance with an operating recipe based on a process target value.Type: GrantFiled: February 21, 2001Date of Patent: August 30, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Christopher A. Bode, Thomas J. Sonderman, Alexander J. Pasadyn, Anthony J. Toprac, Joyce S. Oey Hewett, Anastasia Oshelski Peterson, Michael L. Miller
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Patent number: 6925347Abstract: A method and apparatus is provided for a process control based on an estimated process result. The method comprises processing a workpiece using a processing tool, receiving trace data associated with the processing of the workpiece from the processing tool and estimating at least one process result of the workpiece based on at least a portion of the received trace data. The method further comprises adjusting processing of a next workpiece based on the estimated at least one process result.Type: GrantFiled: August 19, 2002Date of Patent: August 2, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Michael L. Miller, Thomas J. Sonderman, Alexander J. Pasadyn, Richard J. Markle, Brian K. Cusson, Patrick M. Cowan, Timothy L. Jackson, Naomi M. Jenkins
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Patent number: 6917849Abstract: A method includes collecting a first fabrication parameter associated with the processing of a selected semiconductor device. A second fabrication parameter is estimated for the selected semiconductor device. A first value for at least one electrical characteristic of the selected semiconductor device is predicted based on the collected first fabrication parameter and the estimated second fabrication parameter. A system includes a data collection unit and a prediction unit. The data collection unit is configured to collect a first fabrication parameter associated with the processing of a selected semiconductor device. The prediction unit is configured to estimate a second fabrication parameter for the selected semiconductor device and predict a first value for at least one electrical characteristic of the selected semiconductor device based on the collected first fabrication parameter and the estimated second fabrication parameter.Type: GrantFiled: December 18, 2002Date of Patent: July 12, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, Thomas J. Sonderman
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Patent number: 6912433Abstract: A method and apparatus are provided for determining a next tool state based on fault detection information. The method comprises receiving operational data associated with processing of a workpiece by a processing tool, determining at least a portion of noise associated with the processing of the workpiece based on analyzing the operational data and estimating a next state of the processing tool based on at least the determined portion of the noise.Type: GrantFiled: December 18, 2002Date of Patent: June 28, 2005Assignee: Advanced Mirco Devices, Inc.Inventors: Robert J. Chong, Michael L. Miller, Alexander J. Pasadyn, Eric O. Green
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Patent number: 6907369Abstract: A method for modifying design constraints based on observed performance includes measuring a characteristic of a plurality of devices manufactured in a process flow. A design constraint associated with the characteristic is defined. A performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint is generated. The design constraint is modified based on the performance metric. A manufacturing system includes a metrology tool and a design rule monitor. The metrology tool is configured to measure a characteristic of a plurality of devices manufactured in a process flow. The design rule monitor is configured to receive a design constraint associated with the characteristic, generate a performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint, and modify the design constraint based on the performance metric.Type: GrantFiled: May 2, 2003Date of Patent: June 14, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Richard J. Markle, Robert J. Chong, Alexander J. Pasadyn
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Patent number: 6901340Abstract: A method for distinguishing between sources of process variation includes processing a plurality of manufactured items in a process flow; storing a set of production environment data associated with each of the manufactured items; identifying manufactured items associated with a process drift; generating a plurality of characteristic threads based on the production environment data; comparing the characteristic threads for at least those manufactured items associated with the process drift; and determining at least one potential cause for the process drift based on the comparison of the characteristic threads. A manufacturing system for distinguishing between sources of process variation is also provided. The manufacturing system includes a plurality of tools for processing manufactured items in a process flow, a database server, and a drift monitor.Type: GrantFiled: April 2, 2001Date of Patent: May 31, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Alexander J. Pasadyn, Joyce S. Oey Hewett, Christopher A. Bode, Anthony J. Toprac, Anastasia Oshelski Peterson, Thomas J. Sonderman, Michael L. Miller