Patents by Inventor Alexandre Richez
Alexandre Richez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240209412Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.Type: ApplicationFiled: February 28, 2024Publication date: June 27, 2024Inventors: Wayne N. George, Alexandre Richez, M. Shane Bowen, Andrew A. Brown, Dajun Yuan, Audrey Rose Zak, Sean M. Ramirez, Raymond Campos
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Patent number: 11975478Abstract: An example of a flow cell includes a substrate and a cured, patterned resin on the substrate. The cured, patterned resin has nano-depressions separated by interstitial regions. Each nano-depression has a largest opening dimension ranging from about 10 nm to about 1000 nm. The cured, patterned resin also includes an interpenetrating polymer network. The interpenetrating polymer network of the cured, patterned resin includes an epoxy-based polymer and a (meth)acryloyl-based polymer.Type: GrantFiled: April 20, 2021Date of Patent: May 7, 2024Assignee: Illumina Cambridge LimitedInventor: Alexandre Richez
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Publication number: 20240124916Abstract: The present disclosure relates to a nanoparticle including a first layer including a first polymer and a first plurality of accessory oligonucleotides, a second layer including a second polymer and a single template site for bonding a template polynucleotide, and a third layer including a third polymer and a second plurality of accessory oligonucleotides. Also described herein is a method of making said nanoparticle, including “dip-coating,” e.g., successively dipping a surface with wettable nanodomains in different polymer solutions. Further described herein is a method of making the nanoparticles by forming them in nanowells and subsequently releasing them from the nanowells. Also described herein is a method of attaching the nanoparticle to a substrate and amplifying the template polynucleotide using a polymerase.Type: ApplicationFiled: September 15, 2023Publication date: April 18, 2024Applicant: ILLUMINA CAMBRIDGE LIMITEDInventors: Alexandra SZEMJONOV, Angelo LA ROSA, Gianluca ARTIOLI, Xavier VON HATTEN, Alexandre RICHEZ
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Publication number: 20240091782Abstract: An example of a flow cell includes a base support, a reversibly swellable resin positioned over the base support, and a depression defined in the reversibly swellable resin. The reversibly swellable resin includes at least one hydrophilic monomer selected from the group consisting of a poly(ethylene glycol) based monomer, poly(propylene glycol) based monomer, and combinations thereof. The depression has a first opening dimension when the reversibly swellable resin is in a non-swelled stated and has a second opening dimension, that is smaller than the first opening dimension, when the reversibly swellable resin is in a swelled state.Type: ApplicationFiled: August 24, 2023Publication date: March 21, 2024Inventors: Timothy J. Merkel, Wayne N. George, Andrew A. Brown, Alexandre Richez
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Patent number: 11932900Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.Type: GrantFiled: October 25, 2022Date of Patent: March 19, 2024Assignees: Illumina, Inc., Illumina Cambridge LimitedInventors: Wayne N. George, Alexandre Richez, M. Shane Bowen, Andrew A. Brown, Dajun Yuan, Audrey Rose Zak, Sean M. Ramirez, Raymond Campos
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Publication number: 20240076322Abstract: Barriers including crosslinked amphiphilic molecules, and methods of making the same, are provided herein. In some examples, a barrier between first and second fluids includes at least one layer comprising a plurality of amphiphilic molecules. Amphiphilic molecules of the plurality of amphiphilic molecules are crosslinked to one another.Type: ApplicationFiled: March 30, 2023Publication date: March 7, 2024Applicant: ILLUMINA CAMBRIDGE LIMITEDInventors: Antonio Conde-Gonzalez, Charlotte Vacogne, Istvan Kocsis, Alexandre Richez, Oliver Uttley, Miguel Angel Aleman Garcia, Yuliia Vyborna
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Publication number: 20240018381Abstract: An example nanoimprint lithography (NIL) resin composition includes a total of three monomers, wherein two of the three monomers are selected from the group consisting of two different epoxy substituted silsesquioxane monomers; two different epoxy substituted cyclosiloxane monomers; and two different non-organosilicon epoxy monomers. A third of the three monomers is a fluorinated monomer that is present in an amount ranging from about from 0.5 mass % to about 4 mass %, based on a total solids content of the NIL resin composition. The NIL resin also includes a photoinitiator and a solvent.Type: ApplicationFiled: June 28, 2023Publication date: January 18, 2024Inventors: Alexandra Szemjonov, Alexandre Richez
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Patent number: 11846580Abstract: A flow cell package includes first and second surface-modified patterned wafers and a spacer layer. The first surface-modified patterned wafer includes first depressions separated by first interstitial regions, a first functionalized molecule bound to a first silane or silane derivative in at least some of the first depressions, and a first primer grafted to the first functionalized molecule in the at least some of the first depressions. The second surface-modified patterned wafer includes second depressions separated by second interstitial regions, a second functionalized molecule bound to a second silane or silane derivative in at least some of the second depressions, and a second primer grafted to the second functionalized molecule in the at least some of the second depressions. The spacer layer bonds at least some first interstitial regions to at least some second interstitial regions, and at least partially defines respective fluidic chambers of the flow cell package.Type: GrantFiled: March 3, 2021Date of Patent: December 19, 2023Assignees: Illumina, Inc., Illumina Cambridge LimitedInventors: James Tsay, Anmiv Prabhu, David Heiner, Edwin Li, Alexandre Richez, John M. Beierle, Kevan Samiee, Kristina Munoz, Leonid Malevanchik, Ludovic Vincent, Naiqian Zhan, Peyton Shieh, Robert Yang, Samantha Schmitt, Sang Park, Scott Bailey, Sean M. Ramirez, Sunmin Ahn, Valerie Uzzell, Wei Wei, Yuxiang Huang, Tyler Jamison Dill
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Publication number: 20230391961Abstract: Methods of inserting a nanopore into a polymeric membrane are provided herein. The membrane may be destabilized using a chaotropic solvent. The nanopore may be inserted into the destabilized polymer membrane. The chaotropic solvent may be removed to stabilize the polymer membrane with the nanopore inserted therein.Type: ApplicationFiled: March 30, 2023Publication date: December 7, 2023Applicant: Illumina Cambridge LimitedInventors: Istvan Kocsis, Charlotte Vacogne, Oliver Uttley, Antonio Conde-Gonzalez, Alexandre Richez
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Publication number: 20230381718Abstract: Barriers including molecules covalently bonded to amphiphilic molecules, and methods of making the same, are provided herein. In some examples, a barrier between first and second fluids includes one or more layers comprising a plurality of amphiphilic molecules; and a first layer comprising a plurality of molecules covalently bonded to amphiphilic molecules of the plurality of amphiphilic molecules.Type: ApplicationFiled: March 30, 2023Publication date: November 30, 2023Applicant: ILLUMINA CAMBRIDGE LIMITEDInventors: Antonio Conde-Gonzalez, Alexandre Richez, Davide Garoldini, Oliver Uttley, Charlotte Vacogne
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Publication number: 20230357845Abstract: Embodiments of the present disclosure relate to compositions and kits for use in sequencing by synthesis to improve fluorescent signal intensity and reduce signal decay caused by short wavelength light source during the imaging events. Methods of sequencing using the compositions and kits described herein are also provided.Type: ApplicationFiled: March 29, 2023Publication date: November 9, 2023Inventors: Huihong YOU, Samuel CABER, Michael CHESNEY, Jie MAO, Alexandre RICHEZ, Rebecca MACLEOD, Emily WELCH, Zhong MEI, Xiaolin WU, Carole ANASTASI, Alexander FUHRMANN
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Publication number: 20230350297Abstract: In an example method, an initial depression is defined in a first resin layer of a multi-layer stack including the first resin layer over a second resin layer or a base support. The first resin layer is resistant to silanization in an organic solvent, the second resin layer or the base support is reactive toward silanization in the organic solvent, and the first resin layer and the second resin layer or the base support are orthogonally etchable. A remaining portion of the first resin layer at the initial depression is anisotropically etched, using air or O2 plasma, through to expose a surface of the second resin layer or the base support and to form a depression. The multi-layer stack is exposed to a silane in the organic solvent to selectively silanizing the surface of the second resin layer or the base support at the depression.Type: ApplicationFiled: March 16, 2023Publication date: November 2, 2023Inventors: Alexandra Szemjonov, Phillippa K. Edge, Alexandre Richez
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Publication number: 20230348970Abstract: A functionalized nanostructure includes a metal nanostructure; an un-cleavable first primer and a cleavable second primer attached to a first region of the metal nanostructure through i) a first thiol linkage attached to a first polymer chain having a first polarity or ii) respective first thiol linkages attached to respective first polymer chains having the first polarity; and a cleavable first primer and an un-cleavable second primer attached to a second region of the metal nanostructure through i) a second thiol linkage attached to a second polymer chain having a second polarity different from the first polarity or ii) respective second thiol linkages attached to respective second polymer chains having the second polarity.Type: ApplicationFiled: March 1, 2023Publication date: November 2, 2023Inventors: Gianluca Andrea Artioli, Luca Redivo, Alexandre Richez, Xavier von Hatten
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Publication number: 20230330659Abstract: Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some exemplary workflows exploit orthogonal chemistries of substrate layers such that the process does not include polishing steps. Substrates prepared by the method described herein can include a first primer set and a second primer set compatible with simultaneous paired-end sequencing methods.Type: ApplicationFiled: March 20, 2023Publication date: October 19, 2023Inventors: Alexandra Szemjonov, Wayne N. George, Alexandre Richez
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Publication number: 20230312856Abstract: Nanopore devices including barriers using diblock or triblock copolymers, and methods of making the same, are provided herein. In some examples, a barrier between first and second fluids is suspended by a barrier support defining an aperture. The barrier may include one or more layers suspended across the aperture and including molecules of a block copolymer. Each molecule of the block copolymer may include one or more hydrophilic blocks having an approximate length A and one or more hydrophobic blocks having an approximate length B. The hydrophilic blocks may form outer surfaces of the barrier and the hydrophobic blocks may be located within the barrier. The hydrophobic blocks may include a polymer selected from the group consisting of poly(dimethylsiloxane) (PDMS), polybutadiene (PBd), polyisoprene, polymyrcene, polychloroprene, hydrogenated polydiene, fluorinated polyethylene, polypeptide, and poly(isobutylene) (PIB).Type: ApplicationFiled: March 30, 2023Publication date: October 5, 2023Applicant: Illumina Cambridge LimitedInventors: Alexandre Richez, Antonio Conde-Gonzalez, Oliver Uttley, Charlotte Vacogne, Davide Garoldini, Istvan Kocsis, Miguel Angel Aleman Garcia, Yuliia Vyborna
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Publication number: 20230312857Abstract: Nanopore devices including barriers using polymers with end groups, and methods of making the same, are provided herein. In some examples, a barrier between first and second fluids is provided. The barrier may be suspended by a barrier support defining an aperture. The barrier may include one or more layers suspended across the aperture and including molecules of a block copolymer. Each molecule of the block copolymer may include one or more hydrophilic blocks having an approximate length A and one or more hydrophilic blocks having an approximate length B. The hydrophilic blocks may form outer surfaces of the barrier and the hydrophobic blocks being located within the barrier. End groups may be coupled to ends of the hydrophilic blocks that form outer surfaces of the barrier. The end groups may have a different hydrophilicity than the hydrophilic blocks.Type: ApplicationFiled: March 30, 2023Publication date: October 5, 2023Applicant: Illumina Cambridge LimitedInventors: Oliver Uttley, Davide Garoldini, Istvan Kocsis, Charlotte Vacogne, Antonio Conde-Gonzalez, Alexandre Richez, Miguel Angel Aleman Garcia, Yuliia Vyborna
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Publication number: 20230272469Abstract: An example of a method includes providing a substrate with an exposed surface comprising a first chemical group, wherein the providing optionally comprises modifying the exposed surface of the substrate to incorporate the first chemical group; reacting the first chemical group with a first reactive group of a functionalized polymer molecule to form a functionalized polymer coating layer covalently bound to the exposed surface of the substrate; grafting a primer to the functionalized polymer coating layer by reacting the primer with a second reactive group of the functionalized polymer coating layer; and forming a water-soluble protective coating on the primer and the functionalized polymer coating layer. Examples of flow cells incorporating examples of the water-soluble protective coating are also disclosed herein.Type: ApplicationFiled: May 9, 2023Publication date: August 31, 2023Inventors: Sean M. Ramirez, Brian D. Mather, Edwin Li, Sojeong Moon, Innsu Daniel Kim, Alexandre Richez, Ludovic Vincent, Xavier von Hatten, Hai Quang Tran, Maxwell Zimmerley, Julia Morrison, Gianluca Andrea Artioli, Krystal Sly, Hayden Black, Lewis J. Kraft, Hong Xie, Wei Wei, Ryan Sanford
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Patent number: 11667969Abstract: An example of a method includes providing a substrate with an exposed surface comprising a first chemical group, wherein the providing optionally comprises modifying the exposed surface of the substrate to incorporate the first chemical group; reacting the first chemical group with a first reactive group of a functionalized polymer molecule to form a functionalized polymer coating layer covalently bound to the exposed surface of the substrate; grafting a primer to the functionalized polymer coating layer by reacting the primer with a second reactive group of the functionalized polymer coating layer; and forming a water-soluble protective coating on the primer and the functionalized polymer coating layer. Examples of flow cells incorporating examples of the water-soluble protective coating are also disclosed herein.Type: GrantFiled: May 2, 2018Date of Patent: June 6, 2023Assignees: Illumina, Inc., Illumina Cambridge Limited, Illumina Singapore Pte. Ltd.Inventors: Sean M. Ramirez, Brian D. Mather, Edwin Li, Sojeong Moon, Innsu Daniel Kim, Alexandre Richez, Ludovic Vincent, Xavier von Hatten, Hai Quang Tran, Maxwell Zimmerley, Julia Morrison, Gianluca Andrea Artioli, Krystal Sly, Hayden Black, Lewis J. Kraft, Hong Xie, Wei Wei, Ryan Sanford
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Publication number: 20230109614Abstract: An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.Type: ApplicationFiled: October 25, 2022Publication date: April 6, 2023Inventors: Wayne N. George, Alexandre Richez, M. Shane Bowen, Andrew A. Brown, Dajun Yuan, Audrey Rose Zak, Sean M. Ramirez, Raymond Campos
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Publication number: 20230102870Abstract: Some of the resin compositions are ultraviolet light or thermally curable, while others are ultraviolet light curable. One example of the ultraviolet light or thermally curable resin composition consists of a predetermined mass ratio of a (meth)acrylate cyclosiloxane monomer and a non-siloxane (meth)acrylate based monomer ranging from about >0:<100 to about 80:20; from 0 mass % to about 10 mass %, based on a total solids content of the resin composition, of an initiator selected from the group consisting of an azo-initiator, an acetophenone, a phosphine oxide, a brominated aromatic acrylate, and a dithiocarbamate; a surface additive; and a solvent.Type: ApplicationFiled: September 22, 2022Publication date: March 30, 2023Inventors: Alexandra Szemjonov, Phillippa K. Edge, Alexandre Richez