Patents by Inventor Alfred Viehbeck

Alfred Viehbeck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5571852
    Abstract: Disclosed are structures comprising a composite of fluorinated particulate carbon dispersed in a polymer, the fluorinated carbon being present in an amount sufficient to reduce the dielectric constant of the composition, the structure also including electrical conductor patterns.The composite can be made conductive by irradiating it with an UV excimer laser.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 5, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Juan Ayala-Esquilin, Bodil E. Braren, Shahrokh Daijavad, Elizabeth Foster, James L. Hedrick, Jr., Jeffrey C. Hedrick, Rodney T. Hodgson, Ashit A. Mehta, Steven E. Molis, Jane M. Shaw, Stephen L. Tisdale, Alfred Viehbeck
  • Patent number: 5569739
    Abstract: The disclosure describes a multilayer article of manufacture comprising a substrate having adhered to it a terminally unsaturated adhesive polyimide, where the surface of the adhesive opposite the substrate is adhered to a polyimide, the article further characterized in having one set or a plurality of alternating layers of the terminally unsaturated adhesive polyimide and the polyimide. the bonding operation.A novel adhesive polyimide is also described which is an adhesive polyimide such as ODPA-APB terminated with unsaturated heterocyclic monoamines such as azaadenines, aminobenzotriazoles, aminopurines or aminopyrazolopyrimidines and optionally anhydrides, aminoacetylenes, vinylamines or amino phosphines. The novel polyimide may also contain unsaturated heterocyclic groups in the polymer backbone or chain, either as a partial or complete replacement for the aromatic diamines used in synthesizing the polyimide.
    Type: Grant
    Filed: February 17, 1994
    Date of Patent: October 29, 1996
    Assignee: International Business Machines Corporation
    Inventors: Eleftherios Adamopoulos, Kang-Wook Lee, Terrence R. O'Toole, Sampath Purushothaman, Jane M. Shaw, Alfred Viehbeck, George F. Walker
  • Patent number: 5563273
    Abstract: An electrochemical color change cell incorporating as a color changing agent intramolecular charge transfer salt or an intermolecular charge transfer salt. The intermolecular charge transfer salts and the intramolecular charge transfer salts have a plurality of oxidation states and a wide variation in color change. The intermolecular and intramolecular charge transfer salts preferably contain a violene moiety and a moiety having a carbonyl group conjugated to an aromatic moiety. The intramolecular charge transfer salts have a stable covalent radical-anion/radical-cation configuration. The intermolecular charge transfer salts have a stable ionic radical-anion/radical-cation configuration.
    Type: Grant
    Filed: February 9, 1994
    Date of Patent: October 8, 1996
    Assignee: International Business Machines Corporation
    Inventors: Stephen L. Buchwalter, Martin J. Goldberg, Revathi Iyengar, Terrence R. O'Toole, Alfred Viehbeck
  • Patent number: 5556899
    Abstract: Disclosed is a process of effecting a change in the dielectric constant and coefficient of thermal expansion of a polyimide material, by forming a composite based on a dispersion of 2-60 wt. % of fluorinated particulate carbon material and a polyimide or polyimide precursor, and heating the dispersion to about 400.degree. C. at 65.degree.-200.degree. C./second.
    Type: Grant
    Filed: November 30, 1994
    Date of Patent: September 17, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Juan Ayala-Esquilin, Bodil E. Braren, Shahrokh Daijavad, Elizabeth Foster, James L. Hedrick, Jr., Jeffrey C. Hedrick, Rodney T. Hodgson, Ashit A. Mehta, Steven E. Molis, Jane M. Shaw, Stephen L. Tisdale, Alfred Viehbeck
  • Patent number: 5548034
    Abstract: A curable material comprising a blend of a fluorine-containing cyanate and a fluorine-containing poly(arylene ether) wherein said cyanate is a monomer having the structureN.ident.C--O--R--.sub.n --O--C.ident.Nsaid fluorine containing poly(arylene ether) has the structureX--R--.sub.m --Xwherein X is any group capable of reacting with a --C.ident.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100;said material being heat-curable at a temperatures between 180.degree. and 325.degree. C.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: August 20, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5541567
    Abstract: Structures are described having vias with more than one electrical conductor at least one of which is a solid conductor which is formed by inserting the wire into the via in a substrate wherein the wire is attached to an electrically conductive plate which is spaced apart from the substrate by a spacer which leave a space between the substrate and plate. The space is filled with a dielectric material. The space with via between the conductor and via sidewall is filled with a dielectric material. The via is used for making transformers and inductors wherein one of the via conductors is used for inner windings and another of the via conductors is used for outer windings.
    Type: Grant
    Filed: October 17, 1994
    Date of Patent: July 30, 1996
    Assignee: International Business Machines Corporation
    Inventors: Keith E. Fogel, Jeffrey C. Hedrick, David A. Lewis, Eva E. Simonyi, Alfred Viehbeck, Stanley J. Whitehair
  • Patent number: 5536921
    Abstract: A microwave processing system is provided wherein the material to be processed is in the form of a web type quantity configuration with a thickness that is small in relation to the wavelength of a particular microwave frequency. The material is passed through the field associated with a plurality of microwave standing waves of the particular frequency, each adjacent standing wave being offset 1/4 wavelength along the direction of movement of the web. A carrier gas removes volatile solvents from the material surfaces. Control is provided for the interrelationship of temperature, rate of movement, flow of carrier gas, and microwave power.
    Type: Grant
    Filed: October 25, 1995
    Date of Patent: July 16, 1996
    Assignee: International Business Machines Corporation
    Inventors: Jeffrey C. Hedrick, David A. Lewis, Jane M. Shaw, Alfred Viehbeck, Stanley J. Whitehair
  • Patent number: 5529836
    Abstract: A laminate comprising a layer of conductive metal and a plurality of layers of a cured prepreg is disclosed. The prepreg comprises a reinforcing material impregnated with a curable material. The curable material is a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.ident.C--O--R--[R.sup.1 ].sub.n --O--C.ident.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.ident.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100.
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: June 25, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5527838
    Abstract: A curable material comprising a particulate filler and a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100;The material in the cured state comprises a fluorine-containing polycyanurate network having a plurality of discrete phases of said fluorine-containing thermoplastic polymer dispersed therein wherein said thermoplastic polymer phases are of submicron size.
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: June 18, 1996
    Assignee: International Business Machines Corp.
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5527592
    Abstract: An electronic circuit package comprising an electrically conductive circuit layer on a polymer, ceramic or multi-layer substrate wherein a curable dielectric material is applied over the electrically conductive circuit layer. The curable dielectric material comprises a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100.
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: June 18, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5527566
    Abstract: A polymeric substrate is exposed to an oxygen containing plasma; and then exposed to a reducing atmosphere at an elevated temperature. The reducing treatment reverses the effects on the polymer surface chemistry imparted by action of the oxidizing plasma. In this manner, the original electroactive properties of certain polymers are regenerated at the surface.
    Type: Grant
    Filed: March 30, 1995
    Date of Patent: June 18, 1996
    Assignee: International Business Machines Corporation
    Inventors: Mark J. Schadt, Alfred Viehbeck
  • Patent number: 5527593
    Abstract: An electronic circuit package comprising an electrically conductive pattern embedded within a curable material. The curable material comprises a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100.The material in the cured state comprises a fluorine-containing polycyanurate network having a plurality of discrete phases of the fluorine-containing thermoplastic polymer dispersed therein.
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: June 18, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5523776
    Abstract: A display is constructed having a flat screen consisting of pixels which may be individually excited to create an image. The pixels are excitable between a light reflective and a transparent state in which they are visible in the reflective state and dark in the transparent state. A solar panel is mounted behind the flat screen to receive light transmitted by the transparent pixels. The solar panel converts the light to electric power to supplement the battery operation of the device.
    Type: Grant
    Filed: January 10, 1995
    Date of Patent: June 4, 1996
    Assignee: International Business Machines Corporation
    Inventors: Gareth G. Hougham, Alfred Viehbeck
  • Patent number: 5523148
    Abstract: A prepreg which is heat curable within a temperature range of between about 200.degree. C. and 325.degree. C. comprising a reinforcing material impregnated with a curable material said curable material comprising a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer wherein said cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nsaid fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.
    Type: Grant
    Filed: November 23, 1994
    Date of Patent: June 4, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Jeffrey T. Gotro, Jeffrey C. Hedrick, Konstantinos Papathomas, Niranjan M. Patel, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5519193
    Abstract: The described invention is directed to microwave methods for burning-in, electrical stressing, thermal stressing and reducing rectifying junction leakage current in fully processed semiconductor chips individually and at wafer level, as well as burning in and stressing semiconductor chip packaging substrates and the combination of a semiconductor chip mounted onto a semiconductor chip packaging substrate. Microwaves burn-in devices in a substantially shorter period of time than conventional burn-in techniques and avoid the need for special workpiece holders which are required by conventional stress and burn-in techniques. Additionally, microwave methods are described for reducing the leakage current of recitfying junctions, such as PN junctions and Schottky barrier diode junctions of semiconductor devices on fully processed semiconductor chips and wafers.
    Type: Grant
    Filed: October 27, 1992
    Date of Patent: May 21, 1996
    Assignee: International Business Machines Corporation
    Inventors: Peter E. Freiermuth, Kathleen S. Ginn, Jeffrey A. Haley, Susan J. Lamaire, David A. Lewis, Gavin T. Mills, Timothy A. Redmond, Yuk L. Tsang, Joseph J. Van Horn, Alfred Viehbeck, George F. Walker, Jer-Ming Yang, Clarence S. Long
  • Patent number: 5516874
    Abstract: A multilevel electronic package comprising at least two levels, each level including a poly(aryl ether benzimidazole), a polymide and copper. A process of preparing this package is disclosed. Several novel poly(aryl ether benzimidazoles) useful in preparing this package are also set forth.
    Type: Grant
    Filed: October 6, 1994
    Date of Patent: May 14, 1996
    Assignee: IBM Corporation
    Inventors: Kie Y. Ahn, James L. Hedrick, Jr., Jeffrey W. Labadie, Kang-Wook Lee, Robert J. Twieg, Alfred Viehbeck, George F. Walker
  • Patent number: 5495397
    Abstract: A three dimensional packaging architecture for ultimate high performance computers and methods for fabricating thereof are described. The package allows very dense packaging of multiple integrated circuit chips for minimum communication distances and maximum clock speeds of the computer. The packaging structure is formed from a plurality of subassemblies. Each subassembly is formed from a substrate which has on at least one side thereof at least one integrated circuit device. Between adjacent subassemblies there is disposed a second substrate. There are electrical interconnection members to electrically interconnect contact locations on the subassembly to contact locations on the second substrate. The electrical interconnection members can be solder mounds, wire bonds and the like. The first substrate provides electrical signal intercommunication between the electronic devices and each subassembly. The second substrate provides ground and power distribution to the plurality of subassemblies.
    Type: Grant
    Filed: April 27, 1993
    Date of Patent: February 27, 1996
    Assignee: International Business Machines Corporation
    Inventors: Evan E. Davidson, David A. Lewis, Jane M. Shaw, Alfred Viehbeck, Janusz S. Wilczynski
  • Patent number: 5462628
    Abstract: Certain organic polymeric materials are capable of reversibly accepting or donating electrons from a reducing entity. The redox sites in the polymer accept electrons and, as a result, a change in the properties of the polymer occurs. This change is useful in modifying or etching the polymeric material. The material can be modified by incorporation of metallic seeds into the material at a controlled depth. The seeds are incorporated by interaction of cations of the metals with the redox sites in the polymer, which cause the reduction of the cations to form the neutral metallic seeds. Subsequent exposure of the polymeric material containing the seeds to an electroless bath causes further deposition of metal having the desirable characteristic of good adhesion to the polymeric material. Etching of the polymeric material can be carried out as a result of an increase in solubility of the polymer in aprotic solvents when its redox sites have accepted electrons.
    Type: Grant
    Filed: April 25, 1994
    Date of Patent: October 31, 1995
    Assignee: International Business Machines Corporation
    Inventors: Alfred Viehbeck, Martin Goldberg, Stephen L. Tisdale, Stephen L. Buchwalter, Kurt R. Grebe, Caroline A. Kovac, Linda C. Matthew
  • Patent number: 5462897
    Abstract: A method for forming a thin film layer on a dielectric substrate. A nonconducting layer of material is blanket deposited on the dielectric substrate followed by a layer of polymeric dielectric material which is then patterned to partially expose the underlying layer of nonconducting material. The exposed underlying layer of material is contacted with a metallic salt solution. A key part of the present invention is the layer of nonconducting material which catalyzes the deposition of a seed layer from the metallic salt solution. Then, additional metallization may be easily electrolessly plated on the seed layer.
    Type: Grant
    Filed: February 1, 1993
    Date of Patent: October 31, 1995
    Assignee: International Business Machines Corporation
    Inventors: Thomas H. Baum, Shyama P. Mukherjee, Terrence R. O'Toole, Alice F. Tai, Alfred Viehbeck
  • Patent number: 5443865
    Abstract: Substrates are activated for subsequent metallization by contacting the substrate with a electrolyte in which reducing agents which are electrochemically generated in the electrolyte. The reducing agents are sorbed by the substrate which is contacted with a seeding medium to dispose on the substrate seed, preferably palladium seed for subsequent electroless and electrolytic metallization.
    Type: Grant
    Filed: March 23, 1992
    Date of Patent: August 22, 1995
    Assignee: International Business Machines Corporation
    Inventors: Stephen L. Tisdale, Alfred Viehbeck